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1. 发明公开

EP1657061A2 Inkjet print head and method of fabricating the same 审中-公开
标题翻译：喷墨打印头及其制造方法
公开(公告)号：EP1657061A2
公开(公告)日：2006-05-17
申请号：EP05257065.2
申请日：2005-11-15
申请人： Samsung Electronics Co., Ltd.
发明人： Min, Jae-sik , Chu, Kang-soo , Ha, Young-ung
IPC分类号： B41J2/14
CPC分类号： B41J2/1632 , B41J2/14129 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1639 , B41J2/1642 , B41J2/1646 , B41J2002/14387
摘要： An inkjet print head and method of fabricating the same. The inkjet print head includes: a substrate (100) having an ink-feed hole (101), an interlayer dielectric layer (142) formed around the ink-feed hole (101) on the substrate (100), at least one metal layer (151, 152) formed on the interlayer dielectric layer (142), and an anti-moisture part (190) formed between the ink-feed hole (101) and the at least one metal layer (151, 152) to prevent ink moisture in the ink-feed hole (101) from contacting the at least one metal layer (151, 152). The inkjet print head and the method of fabricating the same are capable of preventing problems such as de-lamination between layers, electrical short-circuit, circuit malfunction, and corrosion of a metal interconnection layer, since it is possible to prevent penetration of ink moisture from layers having absorbent characteristics into the metal interconnection layer, a logic region (130), or a pressure driving part. Therefore, it is possible to improve the lifespan and reliability of the inkjet print head as well as to increase productivity and reduce manufacturing cost by increasing yield.
摘要翻译：一种喷墨打印头及其制造方法。该喷墨打印头包括：具有供墨孔（101）的基板（100）;在基板（100）上的供墨孔（101）周围形成的层间介电层（142）;至少一个金属层形成在层间介电层（142）上的金属层（151,152）;以及在供墨孔（101）和至少一个金属层（151,152）之间形成的防湿部分（190），以防止墨水湿气在供墨孔（101）中与所述至少一个金属层（151,152）接触。喷墨打印头及其制造方法能够防止诸如层间剥离，电短路，电路故障和金属互连层腐蚀之类的问题，因为可以防止墨水渗透从具有吸收特性的层到金属互连层，逻辑区域（130）或压力驱动部分。因此，可以提高喷墨打印头的寿命和可靠性，并且可以通过增加产量来提高生产率并降低制造成本。

2. 发明授权

EP1383163B1 Methods for forming silicon dioxide layers on substrates using atomic layer deposition 有权转让
标题翻译：一种通过原子层沉积形成的二氧化硅的过程
公开(公告)号：EP1383163B1
公开(公告)日：2012-03-28
申请号：EP03253968.6
申请日：2003-06-24
申请人： SAMSUNG ELECTRONICS CO., LTD.
发明人： Lee, Joo-won , Chu, Kang-soo , Park, Jae-eun , Yang, Jong-ho
IPC分类号： H01L21/316 , C23C16/40 , C23C16/02
CPC分类号： H01L21/31612 , C23C16/402 , C23C16/45534 , C23C16/56 , H01L21/02164 , H01L21/02208 , H01L21/02277 , H01L21/0228 , H01L21/02337 , H01L21/0234 , H01L21/3122 , H01L21/3141

3. 发明公开

EP1383163A2 Methods for forming silicon dioxide layers on substrates using atomic layer deposition 有权转让
标题翻译：一种通过原子层沉积形成的二氧化硅的过程
公开(公告)号：EP1383163A2
公开(公告)日：2004-01-21
申请号：EP03253968.6
申请日：2003-06-24
申请人： Samsung Electronics Co., Ltd.
发明人： Lee, Joo-won , Chu, Kang-soo , Park, Jae-eun , Yang, Jong-ho
IPC分类号： H01L21/316 , C23C16/40 , C23C16/02
CPC分类号： H01L21/31612 , C23C16/402 , C23C16/45534 , C23C16/56 , H01L21/02164 , H01L21/02208 , H01L21/02277 , H01L21/0228 , H01L21/02337 , H01L21/0234 , H01L21/3122 , H01L21/3141
摘要： Improved methods are disclosed for catalyst-assisted atomic layer deposition (ALD) to form a silicon dioxide layer having superior properties on a semiconductor substrate by using a first reactant component consisting of a silicon compound having at least two silicon atoms, or using a tertiary aliphatic amine as the catalyst component, or both in combination, together with related purging methods and sequencing.
摘要翻译：改进的方法是圆盘游离缺失为催化剂辅助原子层沉积（ALD）以形成通过使用具有至少两个硅原子的第一反应物组分组成的有机硅化合物，或者使用叔脂族具有在半导体衬底的优异性能的二氧化硅层胺作为催化剂组分或两者的组合，与相关吹扫方法和测序在一起。

4. 发明公开

EP1657061A3 Inkjet print head and method of fabricating the same 审中-公开
公开(公告)号：EP1657061A3
公开(公告)日：2009-09-02
申请号：EP05257065.2
申请日：2005-11-15
申请人： Samsung Electronics Co., Ltd.
发明人： Min, Jae-sik , Chu, Kang-soo , Ha, Young-ung
IPC分类号： B41J2/14
CPC分类号： B41J2/1632 , B41J2/14129 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1639 , B41J2/1642 , B41J2/1646 , B41J2002/14387
摘要： An inkjet print head and method of fabricating the same. The inkjet print head includes: a substrate (100) having an ink-feed hole (101), an interlayer dielectric layer (142) formed around the ink-feed hole (101) on the substrate (100), at least one metal layer (151, 152) formed on the interlayer dielectric layer (142), and an anti-moisture part (190) formed between the ink-feed hole (101) and the at least one metal layer (151, 152) to prevent ink moisture in the ink-feed hole (101) from contacting the at least one metal layer (151, 152). The inkjet print head and the method of fabricating the same are capable of preventing problems such as de-lamination between layers, electrical short-circuit, circuit malfunction, and corrosion of a metal interconnection layer, since it is possible to prevent penetration of ink moisture from layers having absorbent characteristics into the metal interconnection layer, a logic region (130), or a pressure driving part. Therefore, it is possible to improve the lifespan and reliability of the inkjet print head as well as to increase productivity and reduce manufacturing cost by increasing yield.

5. 发明公开

EP1383163A3 Methods for forming silicon dioxide layers on substrates using atomic layer deposition 有权转让
标题翻译：使用原子层沉积在衬底上形成二氧化硅层的方法
公开(公告)号：EP1383163A3
公开(公告)日：2004-07-07
申请号：EP03253968.6
申请日：2003-06-24
申请人： Samsung Electronics Co., Ltd.
发明人： Lee, Joo-won , Chu, Kang-soo , Park, Jae-eun , Yang, Jong-ho
IPC分类号： H01L21/316 , C23C16/40 , C23C16/02
CPC分类号： H01L21/31612 , C23C16/402 , C23C16/45534 , C23C16/56 , H01L21/02164 , H01L21/02208 , H01L21/02277 , H01L21/0228 , H01L21/02337 , H01L21/0234 , H01L21/3122 , H01L21/3141
摘要： Improved methods are disclosed for catalyst-assisted atomic layer deposition (ALD) to form a silicon dioxide layer having superior properties on a semiconductor substrate by using a first reactant component consisting of a silicon compound having at least two silicon atoms, or using a tertiary aliphatic amine as the catalyst component, or both in combination, together with related purging methods and sequencing.
摘要翻译：公开了改进的方法用于通过使用由具有至少两个硅原子的硅化合物组成的第一反应物组分或使用叔脂肪族化合物的催化剂辅助原子层沉积（ALD）在半导体衬底上形成具有优异性能的二氧化硅层胺作为催化剂组分，或两者结合，以及相关的清除方法和测序。

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