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    • 5. 发明公开
    • BEAM PATH MONITORING DEVICE, AND BEAM PATH MONITORING SYSTEM
    • 用于监控光路和监测系统的光路
    • EP2284514A1
    • 2011-02-16
    • EP09758230.8
    • 2009-05-25
    • Sumitomo Electric Industries, Ltd.
    • HASEGAWA TakemiHAYASHI TetsuyaNAKAJI Haruo
    • G01M11/00
    • G01M11/3136G01M11/3145
    • An optical line monitoring apparatus and optical line monitoring system which can measure a reflectance distribution in an optical line with a high spatial resolution in a short time are provided. An optical line monitoring apparatus 14A provided in a station 10A comprises an OCDR measurement section 15 for carrying out OCDR measurement, an OTDR measurement section 16 for carrying out OTDR measurement, an optical switch 13 for selectively connecting one of the OCDR measurement section 15 and OTDR measurement section 16 to the optical coupler 12, a control section 17, and a storage device 18. The control section 17 performs a predetermined arithmetic operation according to an OCDR measurement result acquired by causing the OCDR measurement section 15 to carry out the OCDR measurement and an OTDR measurement result acquired by causing the OTDR measurement section 16 to carry out the OTDR measurement.
    • 本发明提供一种光线路监视装置和光线路监视系统,其可以在与在短时间内高空间分辨率的光学线测量的反射率分布。 在站OCDR测定部15的10A包括用于执行OCDR测定到OTDR测定部16用于执行OTDR测量到光开关13,用于选择性地将OCDR测定部15及OTDR的一个中提供的光线路监视装置14A 测量部16与光学耦合器12,一个控制部17,以及存储装置18。控制部17在通过使OCDR测定部15进行OCDR测定及取得OCDR测定结果执行预定的算术运算雅丁到 到通过使OTDR测定部16进行OTDR测定取得OTDR测定结果。