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    • 5. 发明公开
    • ENTSCHICHTUNGSVERFAHREN FÜR HARTE KOHLENSTOFFSCHICHTEN
    • ENTSCHICHTUNGSVERFAHRENFÜRHARTE KOHLENSTOFFSCHICHTEN
    • EP2718481A1
    • 2014-04-16
    • EP12725315.1
    • 2012-05-31
    • Oerlikon Trading AG, Trübbach
    • RAMM, JürgenWIDRIG, Beno
    • C23G5/00
    • C23G5/00
    • The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.
    • 该方法包括将衬底布置在真空室(6)中的衬底保持器上。 将反应性气体进料到真空室中以除去气体形式的碳。 在真空室中进行等离子体放电过程以支持用于剥离涂覆的基底上的碳的化学反应。 等离子体放电产生为低电压直流电弧放电,放电电流为20-1000A或50-300A,放电电压为120V或20-80V。反应气体为氢,氧或氮气。
    • 8. 发明公开
    • VERFAHREN ZUM BETREIBEN EINER GEPULSTEN ARCQUELLE
    • 一种用于操作脉冲电弧源
    • EP1869690A2
    • 2007-12-26
    • EP06705363.7
    • 2006-03-01
    • Oerlikon Trading AG, Trübbach
    • RAMM, JürgenGSTOEHL, OliverWIDRIG, BenoLENDI, Daniel
    • H01J37/32
    • H01J37/3444C23C14/024C23C14/0641C23C14/08C23C14/081C23C14/083C23C14/325F01D5/288F05D2230/313H01J37/32055H01J37/34
    • Operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current, comprises covering the surface of the target with an insulating layer. Independent claims are also included for: (1) operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current and the direct current component is 100-300% of the holding current; (2) operating an arc source by generating an electric spark discharge on the surface of a target, where the spark discharge is supplied simultaneously with direct current and pulsed or alternating current and the direct current component is 30-90 A; (3) coating process in which an arc source as above is driven to deposit one or more layers on a workpiece; (4) etching process in which an arc source as above is driven to etch a workpiece with metal ions while applying a direct, pulsed or alternating current bias; (5) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a pulsed high-amperage current supply and another current supply; (6) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a secondary current supply whose signal is modulated so as to apply a DC holding current on which is superimposed a pulsed or AC signal; (7) arc source with a target and at least one counterelectrode and a current supply unit connected to the target, where the current supply unit comprises a primary current supply whose signal is modulated so as to apply a DC holding current on which is superimposed a pulsed or AC signal.