专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2872666A1 HOCHLEISTUNGSIMPULSBESCHICHTUNGSVERFAHREN 有权转让
标题翻译： - 高功率脉冲涂装工艺
公开(公告)号：EP2872666A1
公开(公告)日：2015-05-20
申请号：EP13735196.1
申请日：2013-06-29
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , KURAPOV, Denis
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： C23C14/3485 , C23C14/345 , C23C14/3464 , H01J37/3405 , H01J37/3467 , H01J2237/332
摘要： The present invention relates to a method for determining the reactive gas consumption in a coating process using plasma, comprising the following steps: a) admitting reactive gas into a coating chamber, wherein the corresponding reactive gas flow is measured and, at the same time, the partial pressure prevailing in the coating chamber is measured, without igniting a plasma; b) admitting reactive gas into a coating chamber, wherein the corresponding reactive gas flow is measured and, at the same time, the partial pressure prevailing in the coating chamber is measured, wherein a plasma is ignited. The method is characterized in that - the steps a) and b) are carried out in the case of a plurality of different reactive gas flows and thus the partial pressure dependence of the reactive gas flow can be determined both with plasma or without plasma, - in the case of a given partial pressure, deduction of the reactive gas flow value that has been determined without plasma from the reactive gas flow value that has been determined with plasma and equating the difference to the reactive gas consumption.

2. 发明公开

EP2756276A2 VERFAHREN ZUR TEMPERATURMESSUNG VON SUBSTRATEN IN EINER VAKUUMKAMMER 审中-公开
标题翻译：的程序对真空室低温基底
公开(公告)号：EP2756276A2
公开(公告)日：2014-07-23
申请号：EP12756380.7
申请日：2012-09-07
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , ESSELBACH, Markus
IPC分类号： G01J5/06 , G01J5/00
CPC分类号： G01K7/10 , G01J5/0003 , G01J5/0007 , G01J5/061 , G01J2005/0048 , G01J2005/065 , G01J2005/068 , G01K7/04
摘要： The invention relates to a temperature-measuring system, comprising a temperature sensor and a reference body, wherein means for determining temperature changes of the reference body and/or for control of the temperature of the reference body are provided. When the temperature measuring-system is used in a vacuum, the reference body forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor.

3. 发明公开

EP2502255A1 TEILSPULENSYSTEM ZUR SIMULATION VON KREISSPULEN FÜR VAKUUMVORRICHTUNGEN 有权
标题翻译： PART探头系统用于模拟电路用线圈真空器件
公开(公告)号：EP2502255A1
公开(公告)日：2012-09-26
申请号：EP10768183.5
申请日：2010-10-05
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32431 , H01L21/67201
摘要： The invention relates to a vacuum treatment chamber, comprising a coil arrangement for generating a magnetic field in the chamber, wherein the coil assembly comprises at least one first coil section and a second coil section. The first coil section and the second coil section are disposed in cross-section side by side, preferably in one plane, such that at least a partial section of the first coil substantially follows the course of a partial section of the second coil, wherein the spacing of the first partial section from the second partial section is at least one order of magnitude smaller than the cross-section of the optionally smaller coil section.

4. 发明公开

EP2018653A2 ARCQUELLE UND MAGNETANORDNUNG 有权
标题翻译：弧源和磁装置
公开(公告)号：EP2018653A2
公开(公告)日：2009-01-28
申请号：EP07728997.3
申请日：2007-05-10
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg , GWEHENBERGER, Juergen
IPC分类号： H01J37/00
CPC分类号： H01J37/3266 , C23C14/325 , C23C14/564 , H01J37/32055 , H01J37/32614 , H01J37/345 , H01J37/3452 , H01J37/3458
摘要： The invention relates to an arc source comprising a target (1), a front face (2) of the target for the vacuum evaporation of the target material, a rear face comprising a cooling plate (4), a central target region (Z), and a target edge. Said arc source also comprises a magnet arrangement (8, 9) comprising an inner magnet system (8) and/or an outer magnet system (9), for generating a magnetic field in the region of the front face of the target. At least one of the magnet systems (8) is radially polarised and causes, either alone or together with the other magnet system, the extension of the lines of the magnetic field essentially parallel to the front face (2) of the target.

5. 发明公开

EP2700082A1 HOCHLEISTUNGSZERSTÄUBUNGSQUELLE 有权转让
公开(公告)号：EP2700082A1
公开(公告)日：2014-02-26
申请号：EP12714576.1
申请日：2012-03-30
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , RUHM, Kurt
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： C23C14/35 , C23C14/352 , H01J37/3405 , H01J37/3444 , H01J37/3464 , H01J37/3467 , H01J37/3497
摘要： The invention relates to a magnetron sputtering process that allows material to be sputtered from a target surface in such a way that a high percentage of the sputtered material is provided in the form of ions. According to the invention, said aim is achieved using a simple generator, the power of which is fed to multiple magnetron sputtering sources spread out over several time intervals, i.e. the maximum power is supplied to one sputtering source during one time interval, and the maximum power is supplied to the following sputtering source in the subsequent time interval, such that discharge current densities of more than 0.2A/cm
2 are obtained. The sputtering target can cool down during the off time, thus preventing the temperature limit from being exceeded.
摘要翻译：本发明涉及一种磁控溅射工艺，该工艺允许从靶表面溅射材料，使得高比例的溅射材料以离子形式提供。根据本发明，所述目标是通过使用简单的发生器实现的，其发射功率被馈送到分布在多个时间间隔上的多个磁控溅射源，即，在一个时间间隔期间将最大功率提供给一个溅射源，并且最大值在随后的时间间隔内将功率提供给下一个溅射源，使得获得大于0.2A / cm 2的放电电流密度。在关闭时间期间，溅射靶可以冷却，从而防止超过温度限制。

6. 发明公开

EP2359382A1 ZÜNDVORRICHTUNG FÜR ARC QUELLEN 有权
标题翻译：对于ARC-源点火装置
公开(公告)号：EP2359382A1
公开(公告)日：2011-08-24
申请号：EP09743852.7
申请日：2009-10-08
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , HAGMANN, Juerg
IPC分类号： H01J37/32
CPC分类号： H01J37/32 , C23F1/08 , H01J37/32009 , H01J37/32055
摘要： The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and anode. Contact is established by means of an ignition finger which can move on a forced path. On account of the forced path, the ignition finger can be moved to a park position, which is protected against coating, by means of a simple mechanical drive and said ignition finger can also be used to ignite a second target.

7. 发明公开

EP2274763A1 METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE 有权转让
标题翻译：过程：用于产生表面工件IONENGEÄTZTER
公开(公告)号：EP2274763A1
公开(公告)日：2011-01-19
申请号：EP09734820.5
申请日：2009-04-15
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , ESSELBACH, Markus
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

8. 发明公开

EP2081700A1 METHOD AND APPARATUS FOR MANUFACTURING CLEANED SUBSTRATES OR CLEAN SUBSTRATES WHICH ARE FURTHER PROCESSED 审中-公开
标题翻译：用于制造清洗过的衬底的或纯SUBSTRATES的方法和设备这仍然PROCESSED
公开(公告)号：EP2081700A1
公开(公告)日：2009-07-29
申请号：EP06807618.1
申请日：2006-10-27
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , GSTOEHL, Oliver , LENDI, Daniel
IPC分类号： B08B7/00 , H01J37/32 , H01L21/306 , H01L21/00
CPC分类号： B08B7/0035 , H01J37/32568 , H01J37/32623 , H01J37/32633 , H01J2237/335 , H01L21/67028 , H01L21/67069
摘要： Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.

9. 发明公开

EP2872665A1 HOCHLEISTUNGSIMPULSBESCHICHTUNGSMETHODE 有权转让
标题翻译： - 高功率脉冲涂法
公开(公告)号：EP2872665A1
公开(公告)日：2015-05-20
申请号：EP13732096.6
申请日：2013-06-24
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , KURAPOV, Denis
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： C23C14/3485 , C23C14/345 , C23C14/3464 , H01J37/3405 , H01J37/3467 , H01J2237/332
摘要： The invention relates to a method for coating substrates by sputtering of target material, the method comprising the following steps: - applying a first sputtering target made of a first material in a coating chamber to a power pulse by which, during a first time interval, a first amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50W/cm
2 and preferably 500W/cm
2 ; - applying a second sputtering target made of a second material that is different from the first material in the coating chamber to a power pulse by which, during a second time interval, a second amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50W/cm
2 and preferably 500W/cm
2 , characterized in that the first amount of energy differs from the second amount of energy.

10. 发明公开

EP2789006A1 REAKTIVER SPUTTERPROZESS 有权转让
标题翻译：反应溅射
公开(公告)号：EP2789006A1
公开(公告)日：2014-10-15
申请号：EP12810067.4
申请日：2012-11-23
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried
IPC分类号： H01J37/34 , C23C14/00 , C23C14/34
CPC分类号： C23C14/3485 , C23C14/0094 , H01J37/3467 , H01J37/3485
摘要： The invention relates to a method for reactive sputtering in which, by means of ion bombardment, material is ejected from the surface of a first target and undergoes transition to the gas phase, wherein negative voltage is applied pulsewise to the target in such a way that an electric current having a current density of greater than 0.5A/cm
2 occurs at the target surface, such that the material undergoing transition to the gas phase is at least partly ionized, and in which a reactive gas flow is established and reactive gas reacts with the material of the target surface, characterized in that the duration of a voltage pulse is chosen such that, during the voltage pulse, the target surface, at the location or locations at which the current flows, most of the time is covered at least partly with a compound composed of reactive gas and target material and, consequently, the target surface is in a first intermediate state, and this covering is smaller at the end of the voltage pulse than at the start of the voltage pulse and, consequently, the target surface is in a second intermediate state at the end of the voltage pulse.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式