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1. 发明授权

EP2472293B1 PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS 有权
标题翻译：光敏树脂组合物的微透镜
公开(公告)号：EP2472293B1
公开(公告)日：2016-06-29
申请号：EP10811596.5
申请日：2010-06-21
申请人： Nissan Chemical Industries, Ltd.
发明人： KISHIOKA, Takahiro , SAKAGUCHI, Takahiro
IPC分类号： G02B1/04 , C08F22/40 , C08L35/00 , G02B3/00 , G03F7/004 , G03F7/023
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24

2. 发明授权

EP2120095B1 USE OF A COMPOSITION FOR FORMING A RESIST LOWER LAYER FILM FOR ELECTRON LITHOGRAPHY 有权
标题翻译：的组合物A的使用抗拒电子光刻下层电影教育
公开(公告)号：EP2120095B1
公开(公告)日：2013-04-24
申请号：EP08711564.8
申请日：2008-02-19
申请人： Nissan Chemical Industries, Ltd.
发明人： ENOMOTO, Tomoyuki , SAKAGUCHI, Takahiro , SAKAMOTO, Rikimaru , NAGAI, Masaki
IPC分类号： G03F7/11 , H01L21/027
CPC分类号： G03F7/11 , G03F7/2059

3. 发明公开

EP2913352A1 NON-PHOTOSENSITIVE RESIN COMPOSITION 有权
标题翻译： LIGHT RESISTANTS树脂组合物
公开(公告)号：EP2913352A1
公开(公告)日：2015-09-02
申请号：EP13848555.2
申请日：2013-10-04
申请人： Nissan Chemical Industries, Ltd.
发明人： SAKAGUCHI, Takahiro , ADACHI, Isao
IPC分类号： C08F220/30 , C08F220/32 , C08G59/34 , C08L33/14 , G02B1/04 , G02B3/00 , G02B5/20
CPC分类号： G02B3/0018 , C08F220/20 , C08F220/30 , C08F220/32 , C08F220/58 , C08J5/18 , C08J2329/10 , C08J2333/10 , C08J2333/26 , C08J2429/10 , C08J2433/10 , C08J2433/26 , C08L33/14 , C08L63/00 , G02B1/04 , G02B1/105 , G02B1/12 , G02B1/14 , G02B3/0012 , G02B5/20 , C08L33/068 , C08F2220/325
摘要： There is provided a thermosetting non-photosensitive resin composition. A non-photosensitive resin composition comprising: a self-cross-linkable copolymer having structural units of Formulae (1) and (2):

wherein each R 0 is independently a hydrogen atom or a methyl group; X is an -O- group or an -NH- group; R 1 is a single bond or a C 1-6 alkylene group; R 2 is a C 1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1 ≤ a + b ≤ 5, and b is 2, 3, or 4, such R 2 optionally differ from each other; R 3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and R 4 is an organic group having an epoxy group:

wherein c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6; and a solvent.

4. 发明授权

EP2913352B1 NON-PHOTOSENSITIVE RESIN COMPOSITION 有权
标题翻译：非光敏树脂组合物
公开(公告)号：EP2913352B1
公开(公告)日：2018-05-02
申请号：EP13848555.2
申请日：2013-10-04
申请人： Nissan Chemical Industries, Ltd.
发明人： SAKAGUCHI, Takahiro , ADACHI, Isao
IPC分类号： C08F220/30 , C08F220/32 , C08G59/34 , C08L33/14 , G02B1/04 , G02B3/00 , G02B5/20
CPC分类号： G02B3/0018 , C08F220/20 , C08F220/30 , C08F220/32 , C08F220/58 , C08J5/18 , C08J2329/10 , C08J2333/10 , C08J2333/26 , C08J2429/10 , C08J2433/10 , C08J2433/26 , C08L33/14 , C08L63/00 , G02B1/04 , G02B1/105 , G02B1/12 , G02B1/14 , G02B3/0012 , G02B5/20 , C08L33/068 , C08F2220/325
摘要： There is provided a thermosetting non-photosensitive resin composition. A non-photosensitive resin composition comprising: a self-cross-linkable copolymer having structural units of Formulae (1) and (2): wherein each R 0 is independently a hydrogen atom or a methyl group; X is an -O- group or an -NH- group; R 1 is a single bond or a C 1-6 alkylene group; R 2 is a C 1-6 alkyl group; a is an integer of 1 to 5, b is an integer of 0 to 4, and when a and b satisfy 1 ‰¤ a + b ‰¤ 5, and b is 2, 3, or 4, such R 2 optionally differ from each other; R 3 is a divalent organic group of Formula(I), Formula (II), or Formula (III), and R 4 is an organic group having an epoxy group: wherein c is an integer of 0 to 3, d is an integer of 1 to 3, and each e is independently an integer of 2 to 6; and a solvent.

5. 发明授权

EP2302456B1 POSITIVE RESIST COMPOSITION;PATTTERN FORMING METHOD; MICROLENS AND PLANARIZATION FILM THEREFROM; SOLID-STATE IMAGING DEVICE, LIQUID CRYSTAL DISPLAY DEVICE AND LED DISPLAY DEVICE COMPRISING THE SAME 有权
标题翻译：正光刻胶组合; 结构教育过程; 微透镜和平坦化膜物; 固态图像装置，液晶显示装置及LED显示装置
公开(公告)号：EP2302456B1
公开(公告)日：2015-09-02
申请号：EP09797841.5
申请日：2009-07-07
申请人： Nissan Chemical Industries, Ltd.
发明人： YUKAWA, Shojiro , KISHIOKA, Takahiro , SAKAGUCHI, Takahiro , SODA, Hiroyuki
IPC分类号： G03F7/023 , G02B3/00 , G03F7/09 , G03F7/40
CPC分类号： G03F7/0233 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/0012 , G03F7/094 , G03F7/40 , C08F220/06 , C08F212/08 , C08F212/14

6. 发明公开

EP2833203A1 PHOTOSENSITIVE RESIN COMPOSITION 审中-公开
标题翻译： LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG
公开(公告)号：EP2833203A1
公开(公告)日：2015-02-04
申请号：EP13768760.4
申请日：2013-03-15
申请人： Nissan Chemical Industries, Ltd.
发明人： ADACHI, Isao , SAKAGUCHI, Takahiro , SODA, Hiroyuki
IPC分类号： G03F7/023 , C08F220/10 , C08F222/40 , G02B3/00 , G03F7/004 , H01L21/027
CPC分类号： G03F7/038 , C08F220/32 , C08F220/36 , C08F222/40 , G02B1/04 , G02B1/041 , G02B3/0012 , G03F7/0005 , G03F7/0233
摘要： There is provided a photosensitive resin composition. A photosensitive resin composition comprising a component (A), a component (B); and a solvent, wherein the component (A) is a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2):

(where R 0 is a hydroxy group or a carboxy group; R 1 is a hydrogen atom or a methyl group; R 2 is a single bond or a C 1-5 alkylene group; R 3 is a thermally cross-linkable monovalent organic group; and in a plurality of structural units of Formula (2), R 1 are optionally different from each other), and the component (B) is a photosensitizer.
摘要翻译：提供感光性树脂组合物。一种包含组分（A），组分（B）; 和溶剂，其中组分（A）是具有式（1）的结构单元和式（2）的结构单元的共聚物：其中R 0是羟基或羧基; R 1是氢原子或甲基; R 2是单键或C 1-5亚烷基; R 3是可热交联的一价有机基团;并且在式（2）的多个结构单元中，R 1是任选的彼此不同），组分（B）是光敏剂。

7. 发明公开

EP2530494A1 MICROLENS PRODUCTION METHOD 审中-公开
标题翻译： HERSTELLUNGSVERFAHRENFÜRMIKROLINSEN
公开(公告)号：EP2530494A1
公开(公告)日：2012-12-05
申请号：EP11734721.1
申请日：2011-01-20
申请人： Nissan Chemical Industries, Ltd.
发明人： ARASE, Shinya , SAKAGUCHI, Takahiro
IPC分类号： G02B3/00 , H01L27/14
CPC分类号： G02B3/0012 , G02B3/0056 , H01L27/14627 , H01L27/14685
摘要： There is provided a solid-state imaging device excellent in eliminating gaps between the lenses adjacent to each other during the microlens formation and forming an overlap structure between the lenses, excellent in lens curvature controlling property, and having a high effective sensitivity by enhancing microlens formation stability; and a production method thereof. A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, comprising: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.
摘要翻译：提供了一种在微透镜形成期间消除彼此相邻的透镜之间的间隙的优异的固态成像装置，并且在透镜之间形成重叠结构，透镜曲率控制特性优异，并且通过增强微透镜形成具有高有效灵敏度稳定性; 及其制造方法。一种固态成像装置的制造方法，其中微透镜在衬底上彼此相邻地布置，包括：第一工艺，在衬底的表面上形成第一微透镜，在其间留下空间以提供第二微透镜; 以及将外涂层材料施加到其上形成有第一微透镜的基板的表面上的第二过程，干燥外涂层材料，使用灰度掩模将外涂层材料暴露于光，并显影外露的外涂层材料，以便在彼此相邻的第一微透镜之间的空间中形成第二微透镜。

8. 发明公开

EP2472293A1 PHOTOSENSITIVE RESIN COMPOSITION FOR MICROLENS 有权
标题翻译： LICHTEMPFINDLICHE HARZZUSAMMENSETZUNGFÜRMIKROLINSEN
公开(公告)号：EP2472293A1
公开(公告)日：2012-07-04
申请号：EP10811596.5
申请日：2010-06-21
申请人： Nissan Chemical Industries, Ltd.
发明人： KISHIOKA, Takahiro , SAKAGUCHI, Takahiro
IPC分类号： G02B1/04 , C08F22/40 , C08L35/00 , G02B3/00 , G03F7/004 , G03F7/023
CPC分类号： C08F26/06 , G02B1/043 , G03F7/0005 , G03F7/0233 , G03F7/40 , C08L33/24
摘要： There is provided a photosensitive resin composition for a microlens. A photosensitive resin composition for a microlens, comprising a component (A), a component (B) and a component (C), wherein the component (A) is a polymer having a maleimide structural unit of Formula (1), the component (B) is a cross-linking agent, and the component (C) is a photosensitizing agent.
摘要翻译：提供了用于微透镜的感光性树脂组合物。包含组分（A），组分（B）和组分（C）的微透镜感光树脂组合物，其中组分（A）是具有式（1）的马来酰亚胺结构单元，组分（ B）是交联剂，组分（C）是光敏剂。

9. 发明公开

EP2302456A1 POSITIVE-TYPE RESIST COMPOSITION, AND METHOD FOR PRODUCTION OF MICROLENS 有权
标题翻译：正光刻胶组合; 结构教育过程; 微透镜和平坦化膜物; 固态图像装置，液晶显示装置及LED显示装置
公开(公告)号：EP2302456A1
公开(公告)日：2011-03-30
申请号：EP09797841.5
申请日：2009-07-07
申请人： Nissan Chemical Industries, Ltd.
发明人： YUKAWA, Shojiro , KISHIOKA, Takahiro , SAKAGUCHI, Takahiro , SODA, Hiroyuki
IPC分类号： G03F7/023 , C08F12/32 , G02B1/04 , G02B3/00 , G02F1/1333 , G03F7/004
CPC分类号： G03F7/0233 , C08F2/48 , C08F212/32 , C09D125/08 , G02B3/0012 , G03F7/094 , G03F7/40 , C08F220/06 , C08F212/08 , C08F212/14
摘要： There is provided a positive resist composition excellent in transparency, heat resistance, and refractive index particularly for forming a microlens and for forming a planarization film; and a microlens and a planarization film formed from the positive resist composition. A positive resist composition comprising a component (A): an alkali-soluble polymer comprising a unit structure having a biphenyl structure; a component (B): a compound having an organic group to be photolyzed to generate an alkali-soluble group; and a component (C): a solvent. The positive resist composition wherein the alkali-soluble polymer as the component (A) is a polymer comprising a unit structure of Formula (1):

where when the total number of unit structures constituting the polymer (A) is assumed to be 1.0, the ratio n1 of the unit structure of Formula (1) constituting the polymer (A) satisfies 0.3≤n1≤1.0.
摘要翻译：本发明提供一种正型抗蚀剂具有优异的透明性，耐热性，和折射率的组合物特别是用于形成微透镜和形成平坦化膜 - ; 以及微透镜和平坦化膜形成为从正型抗蚀剂组合物。一种正型抗蚀组合物，含有（A）成分：碱可溶性聚合物，其包含具有联苯结构的结构单元; 成分（B）：具有有机基团的化合物进行光分解而产生碱溶性基团; 和组分（C）：溶剂。的正型抗蚀剂组合物worin的碱溶性聚合物作为组分（A）是包含式结构单元的聚合物（1）：其中，当假定构成聚合物（A）的结构单元的总数设为1.0时，（1）构成式单元结构的比N1的聚合物（A）SATIS外资企业0.3‰‰¤1.0¤n1。

10. 发明公开

EP2154569A1 PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS 审中-公开
标题翻译： LICHTEMPFINDLICHES HARZ UND VERFAHREN ZUM HERSTELLEN EINER MIKROLINSE
公开(公告)号：EP2154569A1
公开(公告)日：2010-02-17
申请号：EP08752731.3
申请日：2008-05-14
申请人： Nissan Chemical Industries, Ltd.
发明人： NEGI, Takayuki , SAKAGUCHI, Takahiro , KISHIOKA, Takahiro
IPC分类号： G03F7/023 , G02B3/00 , G03F7/004
CPC分类号： G03F7/0233 , G02B3/00 , G03F7/0005 , G03F7/38
摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
摘要翻译：提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物（A）和具有光分解产生碱溶性基团的具有有机基团的化合物（B）。正型抗蚀剂组合物的折射率在633nm下的涂膜性质为1.6以上，波长为400〜730nm的透射率为80％以上。图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。

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