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1. 发明公开

EP2248930A1 PROCESS FOR RECOVERY OF VALUABLE METALS FROM SCRAP IZO 审中-公开
标题翻译：回收 - Verfahren von wertvollen Metallen aus Izo-Schrott
公开(公告)号：EP2248930A1
公开(公告)日：2010-11-10
申请号：EP08873155.9
申请日：2008-12-09
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25C1/16 , C22B3/44 , C22B5/12 , C22B7/00 , C22B19/30 , C22B58/00 , C25C1/22
CPC分类号： C25C1/16 , C22B3/045 , C22B3/44 , C22B7/006 , C22B19/30 , C22B58/00 , C25C1/22 , Y02P10/234
摘要： Provided is a method of recovering valuable metals from IZO scrap in which valuable metals are recovered as indium and zinc metals or suboxides by performing electrolysis using an insoluble electrode as an anode and an IZO scrap as a cathode. Specifically, this method enables the efficient recovery of indium and zinc from IZO scrap such as an indium-zinc oxide (IZO) sputtering target or IZO mill ends that arise during the manufacture of such a sputtering target.
摘要翻译：提供从IZO废料中回收贵重金属的方法，其中通过使用不溶性电极作为阳极和IZO废料作为阴极进行电解，将贵金属作为铟和锌金属或低氧化物回收。具体地说，该方法能够在制造这样的溅射靶的过程中产生的诸如铟 - 氧化锌（IZO）溅射靶或IZO研磨端的IZO废料有效地回收铟和锌。

2. 发明公开

EP2078767A1 METHOD FOR COLLECTION OF VALUABLE METAL FROM ITO SCRAP 有权
标题翻译：从ITO碎石收集有价值金属的方法
公开(公告)号：EP2078767A1
公开(公告)日：2009-07-15
申请号：EP07767700.3
申请日：2007-06-27
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25C1/14
CPC分类号： C25C1/14 , C22B3/045 , C22B7/006 , C22B25/06 , C22B58/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap including a step of collecting tin by subjecting the ITO scrap to electrolysis. Further proposed is a method for collecting valuable metal from an ITO scrap including the steps of providing an ITO electrolytic bath and a tin collecting bath, dissolving the ITO scrap in the electrolytic bath, and thereafter collecting tin in the tin collecting bath. Additionally proposed is a method for collecting valuable metal from an ITO scrap including the steps of dissolving the ITO scrap by subjecting it to electrolysis as an anode in electrolyte, precipitating only tin contained in the solution as tin itself or a substance containing tin, extracting the precipitate, placing it in a collecting bath, re-dissolving this to obtain a solution of tin hydroxide, and performing electrolysis or neutralization thereto in order to collect tin. Consequently, provided is a method for efficiently collecting tin from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arising during the manufacture of such ITO sputtering target.
摘要翻译：提出了一种从ITO废料中回收有价金属的方法，包括通过对ITO废料进行电解来回收锡的步骤。还提出了从ITO废料中回收有价金属的方法，包括提供ITO电解槽和锡收集槽，将ITO废料溶解在电解槽中，然后将锡收集在锡收集槽中的步骤。另外提出了一种从ITO废料中回收有价金属的方法，包括以下步骤：通过将ITO废料作为电解液作为阳极溶解在电解质中，仅沉淀溶液中含有的锡作为锡本身或含锡的物质，沉淀，将其置于收集槽中，将其重新溶解以获得氢氧化锡溶液，并对其进行电解或中和以收集锡。因此，提供了一种用于从ITO铟锡氧（ITO）溅射靶的ITO废料或ITO废料（例如在制造这种ITO溅射靶期间产生的ITO碾磨端）有效地收集锡的方法。

3. 发明公开

EP2130947A1 METHOD OF RECOVERING VALUABLE METAL FROM SCRAP CONTAINING CONDUCTIVE OXIDE 有权转让
标题翻译： VERFAHREN ZURRÜCKGEWINNUNGVON WERTMETALL AUS ALTMETALL MITLEITFÄHIGEMOXID
公开(公告)号：EP2130947A1
公开(公告)日：2009-12-09
申请号：EP08721548.9
申请日：2008-03-07
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Koichi
IPC分类号： C25C1/14 , C22B1/02 , C22B3/04 , C22B3/44 , C22B5/12 , C22B7/00 , C22B19/34 , C22B25/06 , C22B58/00 , C25B1/00 , C25C1/16 , C25C1/22
CPC分类号： C22B3/045 , C22B3/44 , C22B7/006 , C22B25/04 , C22B25/06 , C22B58/00 , C25B1/04 , C25C1/14 , Y02E60/366 , Y02P10/228 , Y02P10/234
摘要： Provided is a method of recovering valuable metal from oxide system scrap including the steps of performing electrolysis using an insoluble electrode as an anode and an oxide system scrap as a cathode, and recovering the scrap of the cathode as metal or suboxide. Specifically, this method enables the efficient recovery of valuable metal from oxide system scrap of an indium-tin oxide (ITO) sputtering target or oxide system scrap such as mill ends that arise during the production of such a sputtering target.
摘要翻译：本发明提供从氧化物系废料中回收贵重金属的方法，包括使用不溶性电极作为阳极和氧化物系废料作为阴极进行电解，并将阴极的废料回收为金属或低氧化物的步骤。具体地说，该方法能够有效地回收氧化铟锡（ITO）溅射靶的氧化物系废料，或者在制造这样的溅射靶时产生的氧化物系废料例如轧制端。

4. 发明公开

EP2241656A1 METHOD OF RECOVERING VALUABLE METALS FROM IZO SCRAP 有权转让
标题翻译：回收 - VERFAHREN VON WERTVOLLEN METALLEN AUS IZO-SCHROTT
公开(公告)号：EP2241656A1
公开(公告)日：2010-10-20
申请号：EP09710686.8
申请日：2009-01-30
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25C1/22 , C01G9/02 , C01G15/00 , C22B3/44 , C22B7/00 , C22B19/30 , C22B58/00 , C25C1/16
CPC分类号： C22B58/00 , C01G9/02 , C01G15/00 , C22B3/045 , C22B3/22 , C22B7/006 , C22B19/30 , C25B1/00 , C25C1/22 , Y02P10/234
摘要： Provided are a method of recovering valuable metals from IZO scrap, wherein valuable metals are recovered as hydroxides of indium and zinc by using an insoluble electrode as an anode or a cathode and an IZO scrap as the other cathode or anode as the opposite electrode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and valuable metals are recovered as oxides of indium and zinc. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.
摘要翻译：提供了从IZO废料中回收贵重金属的方法，其中通过使用不溶性电极作为阳极或阴极以及作为另一阴极或阳极的IZO废料作为相对电极，有价金属作为铟和锌的氢氧化物回收，以及在周期性地反转极性的同时执行电解; 以及从IZO废料中回收有价金属的方法，其中通过电解获得的铟和锌的氢氧化物被焙烧，有价金属作为铟和锌的氧化物回收。具体地说，提供了一种能够在制造这样的溅射靶的过程中产生的诸如废铟 - 氧化锌（IZO）溅射靶和IZO研磨端的IZO废料有效地回收铟和锌的方法。

5. 发明公开

EP2224024A1 HIGHLY PURE LANTHANUM, SPUTTERING TARGET COMPRISING HIGHLY PURE LANTHANUM, AND METAL GATE FILM MAINLY COMPOSED OF HIGHLY PURE LANTHANUM 审中-公开
标题翻译：高纯度镧，用高纯镧，主要通过高纯氧化镧现有金属栅膜溅射靶
公开(公告)号：EP2224024A1
公开(公告)日：2010-09-01
申请号：EP08866745.6
申请日：2008-10-31
申请人： Nippon Mining & Metals Co., Ltd.
发明人： TAKAHATA, Masahiro , SHINDO, Yuichiro , KANOU, Gaku
IPC分类号： C22B59/00 , C22B9/22 , C22C28/00 , C23C14/34 , H01L21/283 , H01L21/285 , H01L29/423 , H01L29/49 , H01L29/78
CPC分类号： C22C28/00 , C22B9/228 , C22B59/00 , C23C14/3414 , H01L21/28079 , H01L21/2855 , H01L29/495
摘要： Provided are high-purity lanthanum, wherein the purity excluding rare-earth elements and gas components is 4N or higher, and amounts of aluminum, iron and copper in the lanthanum are respectively 100wtppm or less; as well as high-purity lanthanum, wherein the purity excluding rare-earth elements and gas components is 4N or higher, amounts of aluminum, iron and copper in the lanthanum are respectively 100wtppm or less, oxygen content is 1500wtppm or less, elements of alkali metals and alkali earth metals are respectively 1wtppm or less, elements of transition metals and high-melting-point metals other than those above are respectively 10wtppm or less, and radioactive elements are respectively 10wtppb or less. The invention aims to provide technology capable of efficiently and stably providing high-purity lanthanum, a sputtering target comprising high-purity lanthanum, and a thin film for metal gate mainly comprising high-purity lanthanum.
摘要翻译：提供的是高纯度镧，worin不含稀土元素和气体成分以外的纯度为4N以上，镧中的铝，铁和铜的量分别为100重量ppm以下; 以及高纯度镧，worin不含稀土元素和气体成分以外的纯度为4N以上，镧中的铝，铁和铜的量分别为100重量ppm以下，氧含量为1500重量ppm以下，的碱金属元素金属和碱土金属是分别为1重量ppm以下，过渡金属和除上述那些其他的高融点金属的各元素分别为10重量ppm以下，放射性元素分别为10重量ppb以下。本发明目的在于提供能够有效且稳定地提供高纯度镧，溅射靶，含有高纯度镧，和薄膜为金属栅主要包含高纯度镧的技术。

6. 发明公开

EP2110463A1 METHODS OF RECOVERING VALUABLE METAL FROM SCRAP CONTAINING ELECTRICALLY CONDUCTIVE OXIDE 审中-公开
标题翻译：中回收有价值金属废钢的导电氧化物含有
公开(公告)号：EP2110463A1
公开(公告)日：2009-10-21
申请号：EP08710986.4
申请日：2008-02-08
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25B1/00 , C22B7/00
CPC分类号： C22B58/00 , C22B3/045 , C22B3/44 , C22B7/006 , C22B25/04 , C22B25/06 , C25B1/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method of recovering valuable metal from scrap containing conductive oxide including the steps of using scrap containing conductive oxide and performing electrolysis while periodically inverting the polarity, and recovering the scrap as hydroxide. With the foregoing method of recovering valuable metal from scrap containing conductive oxide, oxide system scrap is conductive oxide and a substance that can be reduced to metal or suboxide with hydrogen. This method enables to efficiently recover valuable metal from sputtering target scrap containing conductive oxide or scrap such as mill ends of conductive oxide that arise during the production of such a sputtering target.
摘要翻译：一种回收来自废料含有导电氧化物包括使用废料含有导电氧化物和进行电解，同时周期性地反转极性，并回收废料作为氢氧化物的步骤有价金属的方法。从废料含有导电氧化物中回收有价值金属的上述方法中，氧化物废料是导电氧化物和一物质没有可以被还原为金属或低氧化物用氢。这种方法能够有效地从含有导电氧化物的废料或废料溅射靶回收有价值的金属：例如导电氧化物的边角料生产谋求溅射靶的过程中没有出现。

7. 发明公开

EP2078768A1 METHOD FOR COLLECTION OF VALUABLE METAL FROM ITO SCRAP 审中-公开
标题翻译： VERFAHREN ZUM SAMMELN VON WERTMETALL AUS ITO-ABFALL
公开(公告)号：EP2078768A1
公开(公告)日：2009-07-15
申请号：EP07767697.1
申请日：2007-06-27
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25C1/22 , C22B3/00 , C22B25/06
CPC分类号： C25C1/22 , C22B3/045 , C22B3/44 , C22B7/006 , C22B25/06 , C22B58/00 , C25B1/00 , Y02P10/228 , Y02P10/234
摘要： Proposed is a method for collecting valuable metal from an ITO scrap by subjecting the ITO scrap to electrolysis and collecting the result as metallic indium. Specifically, the present invention proposes a method for selectively collecting metallic indium including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane, subsequently extracting anolyte temporarily, eliminating tin contained in the anolyte by a neutralization method, a replacement method or other methods, placing a solution from which the tin was eliminated in a cathode side again and performing electrolysis thereto; or a method for collecting valuable metal from an ITO scrap including the steps of obtaining a solution of In or Sn in an ITO electrolytic bath, eliminating the Sn in the solution, and collecting In in the collecting bath. These methods enable the efficient collection of metallic indium from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.
摘要翻译：提出了通过对ITO废料进行电解并将结果作为金属铟收集从ITO废料中收集有价金属的方法。具体地说，本发明提出了一种选择性收集金属铟的方法，包括以下步骤：在隔膜或离子交换膜分隔的电解槽中对ITO废料进行电解，随后暂时提取阳极电解液，通过中和方法，替代方法或其他方法，再次将阴极中除去锡的溶液放置并进行电解; 或从ITO废料中收集有价金属的方法，包括以下步骤：在ITO电解槽中获得In或Sn溶液，除去溶液中的Sn，并在收集槽中收集In。这些方法能够在ITO溅射靶的制造过程中有效地收集来自铟锡氧化物（ITO）溅射靶的ITO废料的金属铟或ITO粉末等ITO废料。

8. 发明公开

EP2017360A2 High purity hafnium, high purity hafnium target and method of manufacturing a thin film using high purity hafnium 有权
标题翻译：高纯度铪，以及高纯度Hafniumtarget方法使用高纯度铪的制造薄膜
公开(公告)号：EP2017360A2
公开(公告)日：2009-01-21
申请号：EP08165172.1
申请日：2004-10-25
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro
IPC分类号： C22B34/14
CPC分类号： C22C27/00 , C22B34/14 , C23C14/3414
摘要： The present invention relates to high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and an oxygen content of 40wtppm or less, and a target and thin film formed from such high purity hafnium, and high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and in which the content of sulfur and phosphorus is respectively 10wtppm or less. The present invention also relates to a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus containing in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium. Thereby provided is efficient and stable manufacturing technology which enables the manufacture of a high purity hafnium material, and a target and thin film formed from such material.
摘要翻译：本发明涉及高纯度铪具有纯度为4N或更高不含锆和气体成分和40重量ppm或更低的氧含量，并寻求高纯度铪靶和薄膜形成，并且具有的纯度的高纯度铪 4N以上不含锆和气体成分并且其中的硫和磷的含量分别为10重量ppm或更低。因此，本发明涉及一种使用具有减小的锆作为原料海绵铪高纯度铪材料，并且其中氧，硫和在铪含磷的含量降低时，以及到目标和薄寻求材料成膜，并以高纯度铪的制造方法。从而提供了有效且稳定的制造技术，使高纯度铪材料的制造中，与目标和从寻求材料的薄膜形成的。

9. 发明公开

EP2241655A1 METHOD OF RECOVERING VALUABLE METALS FROM IZO SCRAP 有权
标题翻译：从IZO废料回收价值金属的方法
公开(公告)号：EP2241655A1
公开(公告)日：2010-10-20
申请号：EP09710064.8
申请日：2009-01-30
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro , TAKEMOTO, Kouichi
IPC分类号： C25C1/22 , C01G9/02 , C01G15/00 , C22B3/44 , C22B7/00 , C22B19/20 , C22B19/30 , C22B58/00 , C25C1/16
CPC分类号： C22B3/045 , C01G9/02 , C01G15/00 , C22B3/22 , C22B7/006 , C22B19/30 , C22B58/00 , C25B1/00 , C25C1/22 , Y02P10/234
摘要： Provided are a method of recovering valuable metals from IZO scrap, wherein indium and zinc are recovered as hydroxides by using an IZO scrap as both an anode and a cathode, and performing electrolysis while periodically reversing polarity; and a method of recovering valuable metals from IZO scrap, wherein the hydroxides of indium and zinc obtained by the electrolysis are roasted and indium and zinc are recovered as oxides. Specifically, provided is a method which enables the efficient recovery of indium and zinc from IZO scrap such as a spent indium-zinc oxide (IZO) sputtering target and IZO mill ends arising during the manufacture of such a sputtering target.
摘要翻译：本发明提供一种从IZO废料中回收有价金属的方法，其中通过使用IZO废料作为阳极和阴极并且在周期性地反转极性的同时进行电解来回收铟和锌作为氢氧化物; 以及从IZO废料中回收有价金属的方法，其中通过电解得到的铟和锌的氢氧化物被焙烧并且铟和锌作为氧化物被回收。具体而言，提供一种能够从制造这种溅射靶时产生的IZO废料如废铟锌氧化物（IZO）溅射靶和IZO研磨末端有效回收铟和锌的方法。

10. 发明公开

EP2017360A3 High purity hafnium, high purity hafnium target and method of manufacturing a thin film using high purity hafnium 有权
标题翻译：高纯度铪，以及高纯度Hafniumtarget方法用于通过使用高纯度的制造薄膜Hafnuims
公开(公告)号：EP2017360A3
公开(公告)日：2009-08-05
申请号：EP08165172.1
申请日：2004-10-25
申请人： Nippon Mining & Metals Co., Ltd.
发明人： SHINDO, Yuichiro
IPC分类号： C22B34/14
CPC分类号： C22C27/00 , C22B34/14 , C23C14/3414
摘要： The present invention relates to high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and an oxygen content of 40wtppm or less, and a target and thin film formed from such high purity hafnium, and high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and in which the content of sulfur and phosphorus is respectively 10wtppm or less. The present invention also relates to a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus containing in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium. Thereby provided is efficient and stable manufacturing technology which enables the manufacture of a high purity hafnium material, and a target and thin film formed from such material.

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