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    • 9. 发明公开
    • High purity hafnium, high purity hafnium target and method of manufacturing a thin film using high purity hafnium
    • 高纯度铪,以及高纯度Hafniumtarget方法使用高纯度铪的制造薄膜
    • EP2017360A2
    • 2009-01-21
    • EP08165172.1
    • 2004-10-25
    • Nippon Mining & Metals Co., Ltd.
    • SHINDO, Yuichiro
    • C22B34/14
    • C22C27/00C22B34/14C23C14/3414
    • The present invention relates to high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and an oxygen content of 40wtppm or less, and a target and thin film formed from such high purity hafnium, and high purity hafnium having a purity of 4N or higher excluding zirconium and gas components and in which the content of sulfur and phosphorus is respectively 10wtppm or less. The present invention also relates to a high purity hafnium material which uses a hafnium sponge with reduced zirconium as the raw material, and in which the content of oxygen, sulfur and phosphorus containing in the hafnium is reduced, as well as to a target and thin film formed from such material, and to the manufacturing method of high purity hafnium. Thereby provided is efficient and stable manufacturing technology which enables the manufacture of a high purity hafnium material, and a target and thin film formed from such material.
    • 本发明涉及高纯度铪具有纯度为4N或更高不含锆和气体成分和40重量ppm或更低的氧含量,并寻求高纯度铪靶和薄膜形成,并且具有的纯度的高纯度铪 4N以上不含锆和气体成分并且其中的硫和磷的含量分别为10重量ppm或更低。 因此,本发明涉及一种使用具有减小的锆作为原料海绵铪高纯度铪材料,并且其中氧,硫和在铪含磷的含量降低时,以及到目标和薄 寻求材料成膜,并以高纯度铪的制造方法。 从而提供了有效且稳定的制造技术,使高纯度铪材料的制造中,与目标和从寻求材料的薄膜形成的。