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1. 发明公开

EP2762503A1 OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME 有权
标题翻译：材料FÜREIN OPTISCHES ELEMENT UND VERFAHREN ZU SEINER HERSTELLUNG
公开(公告)号：EP2762503A1
公开(公告)日：2014-08-06
申请号：EP12835136.8
申请日：2012-09-25
申请人： Maruzen Petrochemical Co., Ltd.
发明人： HAYASHIDA, Yoshihisa , SATSUKA, Takuro , IKEDA, Teruyo
IPC分类号： C08F226/12 , C08F2/50 , C08F16/32 , C08F220/10 , G02B1/04 , G02B5/30
CPC分类号： C09D139/04 , C08F2/50 , C08F222/1006 , C08F226/12 , G02B1/04 , G02B1/10 , G02B1/12 , C08L39/00 , C08L45/00 , C08F2220/1883 , C08F2222/1026 , C08F226/08 , C08F2220/301
摘要： Provided is an optical element material characterized in being obtained by curing a resin composition for photoimprinting, wherein the content weight ratio of a photocurable monomer (A) represented by formula (1) and a photocurable monomer (B) represented by formula (2) is 30/70 to 87/13, and the content of a photopolymerization initiator (C) is 0.01 to 30 parts by weight per the total of 100 parts by weight of the photocurable monomer (A) and the photocurable monomer (B). Also provided is a method for producing the same.

In formula (1), R 1 is a -CH=CH 2 , -CH 2 CH 2 -O-CH=CH 2 , -CH 2 CH 2 -O-CO-CH=CH 2 , -CH 2 CH 2 -O-CO-C(CH 3 )=CH 2 , -CH 2 -C(CH 3 ) =CH 2 or a glycidyl group; R 2 and R 3 are the same or different and are hydrogen or a C 1-4 alkyl group. In formula (2), R 4 and R 5 are the same or different and -O-CH=CH 2 , O-CH 2 CH 2 -O-CH=CH 2 , -O-CO-CH=CH 2 , O-CO-C(CH 3 ) =CH 2 , -O-CH 2 CH 2 -O-CO-CH=CH 2 , -O-CH 2 CH 2 -O-CO-C(CH 3 ) =CH 2 or glycidyl ether groups. R 6 and R 7 are the same or different and are hydrogen or C 1-4 alkyl groups.
摘要翻译：提供一种光学元件材料，其特征在于通过固化光密封用树脂组合物获得，其中由式（1）表示的光固化性单体（A）和由式（2）表示的光固化性单体（B）的含量重量比为 30/70〜87/13，光聚合引发剂（C）的含量相对于100重量份的光固化性单体（A）和光固化性单体（B）的总计为0.01〜30重量份。还提供了其制造方法。式（1）中，R 1为-CH = CH 2，-CH 2 CH 2 -O-CH = CH 2，-CH 2 CH 2 -O-CO-CH = CH 2，-CH 2 CH 2 - O-CO-C（CH 3）= CH 2，-CH 2 -C（CH 3）= CH 2或缩水甘油基; R 2和R 3相同或不同，为氢或C 1-4烷基。在式（2）中，R 4和R 5相同或不同，-O-CH = CH 2，O-CH 2 CH 2 -O-CH = CH 2，-O-CO-CH = CH 2，O -CO-C（CH 3）= CH 2，-O-CH 2 CH 2 -O-CO-CH = CH 2，-O-CH 2 CH 2 -O-CO-C（CH 3）= CH 2或缩水甘油醚基团。 R 6和R 7相同或不同，为氢或C 1-4烷基。

2. 发明公开

EP2174983A1 RESIN SOLUTION FOR THERMAL IMPRINT, RESIN THIN FILM FOR THERMAL IMPRINT, METHODS FOR PRODUCTION OF THE RESIN SOLUTION AND THE RESIN THIN FILM 审中-公开
标题翻译：用于热印刷的树脂溶液，用于热印刷的树脂薄膜，用于生产树脂溶液和树脂薄膜的方法
公开(公告)号：EP2174983A1
公开(公告)日：2010-04-14
申请号：EP08790129.4
申请日：2008-07-02
申请人： Maruzen Petrochemical CO., LTD. , Scivax Corporation
发明人： TAKAYA, Yoshiaki , SATSUKA, Takuro , NAGAI, Go , HAYASHIDA, Yoshihisa , KUSUURA, Takahisa , MITRA, Anupam
IPC分类号： C08L45/00 , B05D1/40 , B29C59/02 , C08K5/01
CPC分类号： C08K5/01 , C08L45/00
摘要： There are provided a resin solution substantially applicable to thermal imprinting, a thin film thereof, and manufacturing methods of those. A thermal imprinting resin solution for forming a thin film used for thermal imprinting applications comprises a thermoplastic resin and greater than or equal to at least one kind of solvent which can dissolve the resin, and an containing amount of foreign particles having a grain diameter larger than or equal to 0.2 µm is controlled to be less than 3000 particles/cm 3 . Moreover, remaining volatile compositions in a thin film are set to be less than or equal to 0.25 % when the thin film is formed from the thermal imprinting resin solution.
摘要翻译：提供了一种基本上适用于热敏印记的树脂溶液，其薄膜及其制造方法。用于形成用于热敏印记应用的薄膜的热敏记录树脂溶液包含热塑性树脂和大于或等于至少一种能够溶解树脂的溶剂和含有量的粒径大于或者等于0.2μm被控制为小于3000个颗粒/ cm 3。而且，当薄膜由热压印树脂溶液形成时，将薄膜中剩余的挥发性组合物设定为小于或等于0.25％。

3. 发明授权

EP2762503B1 OPTICAL ELEMENT MATERIAL AND METHOD FOR PRODUCING SAME 有权
标题翻译：光学元件材料及其制造方法
公开(公告)号：EP2762503B1
公开(公告)日：2017-11-08
申请号：EP12835136.8
申请日：2012-09-25
申请人： Maruzen Petrochemical Co., Ltd.
发明人： HAYASHIDA, Yoshihisa , SATSUKA, Takuro , IKEDA, Teruyo
IPC分类号： C08F226/12 , C08F2/50 , C08F16/32 , C08F220/10 , G02B1/04 , G02B5/30
CPC分类号： C09D139/04 , C08F2/50 , C08F222/1006 , C08F226/12 , G02B1/04 , G02B1/10 , G02B1/12 , C08L39/00 , C08L45/00 , C08F2220/1883 , C08F2222/1026 , C08F226/08 , C08F2220/301

4. 发明授权

EP2664628B1 RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK 有权
标题翻译：树脂组合物拍摄和结构及其方法蚀刻掩模
公开(公告)号：EP2664628B1
公开(公告)日：2015-08-12
申请号：EP11855405.4
申请日：2011-12-02
申请人： Maruzen Petrochemical Co., Ltd.
发明人： HAYASHIDA, Yoshihisa , SATSUKA, Takuro , IKEDA, Teruyo , FUTAESAKU, Norio , TAKEMORI, Toshifumi
IPC分类号： C08F2/50 , C08F271/02 , H01L21/027 , C08F220/30
CPC分类号： C08F226/12 , B05D3/12 , B82Y10/00 , B82Y40/00 , C08F2/50 , C08J3/28 , C09D4/00 , G03F7/0002 , G03F7/027 , G03F7/032 , H01L21/3081 , Y10T428/24802

5. 发明公开

EP2664628A1 RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERNING METHOD AND ETCHING MASK 有权
标题翻译： HARZZUSAMMENSETZUNGFÜRFOTODRUCK SOWIE STRUKTURIERUNGSVERFAHREN UNDÄTZMASKEDAFÜR
公开(公告)号：EP2664628A1
公开(公告)日：2013-11-20
申请号：EP11855405.4
申请日：2011-12-02
申请人： Maruzen Petrochemical Co., Ltd.
发明人： HAYASHIDA, Yoshihisa , SATSUKA, Takuro , IKEDA, Teruyo , FUTAESAKU, Norio , TAKEMORI, Toshifumi
IPC分类号： C08F2/50 , C08F271/02 , H01L21/027
CPC分类号： C08F226/12 , B05D3/12 , B82Y10/00 , B82Y40/00 , C08F2/50 , C08J3/28 , C09D4/00 , G03F7/0002 , G03F7/027 , G03F7/032 , H01L21/3081 , Y10T428/24802
摘要： To provide a resin composition for photoimprinting, a cured product of which is excellent in the etching resistance and the heat resistance, and a pattern forming process using it.
A resin composition for photoimprinting, comprising a photocurable monomer (A), a photocurable monomer (B) and a photopolymerization initiator (C), wherein the photocurable monomer (A) contains at least one carbazole compound represented by the following formula (1), the photocurable monomer (B) contains at least one member selected from the group consisting of compounds represented by the following formulae (2), (3) and (4), and the weight ratio of the photocurable monomer (A) to the photocurable monomer (B) (the weight of the photocurable monomer (A)/the weight of the photocurable monomer (B)) is from 30/70 to 87/13:

wherein R 1 is -CH=CH 2 or the like, and each of R 2 and R 3 is hydrogen or the like;

wherein each of R 4 and R 5 is -O-CH=CH 2 or the like, and each of R 6 and R 7 is hydrogen or the like;

wherein X is -O-CH=CH 2 or the like, each of A 1 to A 4 is a hydrogen atom or the like, and each of m, n and o is 0 or 1; and

wherein each of R 8 and R 9 is -O-CH=CH 2 or the like, and p is an integer of 0 or at least 1.
摘要翻译：为了提供一种用于光电印刷的树脂组合物，其耐腐蚀性和耐热性优异的固化产物和使用它的图案形成方法。光固化性单体（A），光固化性单体（B）和光聚合引发剂（C）的光固化性树脂组合物，其中，所述光固化性单体（A）含有至少一种下述式（1）表示的咔唑化合物，光固化性单体（B）含有选自由下式（2），（3）和（4）表示的化合物中的至少一种，光固化性单体（A）与光固化性单体的重量比（B）（光固化性单体（A）的重量/光固化性单体（B）的重量）为30/70〜87/13，式中，R 1为-CH = CH 2等， R 2和R 3是氢等; 其中R 4和R 5各自为-O-CH = CH 2等，R 6和R 7各自为氢等; 其中X为-O-CH = CH 2等，A 1至A 4各自为氢原子等，m，n和o各自为0或1; 并且其中R 8和R 9各自为-O-CH = CH 2等，p为0或至少为1的整数。

6. 发明公开

EP2221162A1 ETCHING MASK, BASE MATERIAL HAVING ETCHING MASK, FINELY PROCESSED ARTICLE, AND METHOD FOR PRODUCTION OF FINELY PROCESSED ARTICLE 审中-公开
标题翻译：蚀刻掩模，WITH蚀刻掩模，FINE加工制品并产生精细加工制品方法基本物质
公开(公告)号：EP2221162A1
公开(公告)日：2010-08-25
申请号：EP08848634.5
申请日：2008-11-13
申请人： Maruzen Petrochemical CO., LTD. , Scivax Corporation
发明人： TAKAYA, Yoshiaki , SATSUKA, Takuro , HAYASHIDA, Yoshihisa , KUSUURA, Takahisa , MITRA, Anupam
IPC分类号： B29C59/02 , C08L45/00 , C08L65/00 , H01L21/027
CPC分类号： C08G61/08 , B82Y10/00 , B82Y40/00 , C09D145/00 , G03F7/0002 , G03F7/11 , H01L21/0271
摘要： There are provided an etching mask which has a superior thermal imprinting characteristic and also a good anti-etching characteristic, a base material with the etching mask, a microfabricated product to which those etching mask and base material are applied, and a production method of the microfabricated product. The etching mask formed of a thermoplastic resin containing at least one kind of skeleton expressed by a chemical formula (1) or a chemical formula (2) in a main chain (R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , R 8 in the formulae (1), (2) can be different or same one another, each of which is a hydrogen atom, a deuterium atom, a hydrocarbon group having a carbon number of 1 to 15, a halogen atom, or a substituent group containing a hetero atom like oxygen or sulfur, and may form a ring structure one another. m and n are integers equal to or greater than 0).

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