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    • 4. 发明公开
    • Process and apparatus for producing oxide films and chemical vapor deposition
    • 对于通过沉积从气相产生的氧化物层的方法和装置
    • EP0733721A1
    • 1996-09-25
    • EP96104339.5
    • 1996-03-19
    • MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    • Fujii, EijiTomozawa, AtsushiTorii, HideoTakayama, Ryoichi
    • C23C16/50C23C16/40C23C16/44
    • C23C16/45561C23C16/406C23C16/455C23C16/5096
    • The present invention relates to a process for producing crystallographic oriented oxide thin films having an NaCl-type structure, a spinel structure or a Wurtzite structure used as a buffer layer to obtain a functional oxide thin film such as a superconductive oxide thin film and a ferroelectric thin film, and a chemical vapor deposition apparatus used therefor. A rotatable substrate holder (4) is provided in a reaction chamber (1). The substrate holder (4), which holds substrates (3) thereunder, includes a substrate heater (2). The substrate holder (4) is grounded to provide an electrode. Another electrode (5), which is connected to a high frequency power source (10), is located opposing the substrate holder (4) in the reaction chamber (1). At a side wall of the reaction chamber (1), an exhaust (6) is arranged. In a plasma electric discharge area (7) formed between the substrate holder (4) and the electrode (5), a material gas supplier (8) is located, having a predetermined tilt angle θ with respect to the substrate holder (4).
    • 本发明涉及一种方法,用于生产具有NaCl型结构,尖晶石结构或用作缓冲层,以获得功能性氧化物薄膜纤锌矿结构结晶取向氧化物薄膜:诸如超导氧化物薄膜和铁电 薄膜,和化学气相沉积设备为此使用。 可旋转的基座衬底支架(4)在反应室(1)提供。 衬底保持器(4),其根据(3)有保持基板,包括:基板加热器(2)。 基板保持器(4)被接地,以提供电极。 另一个电极(5),其连接到一个高频电源(10)位于相对的基板保持器(4)在反应室(1)。 在反应室的侧壁(1)排气(6)被布置。 在基板保持器FORMED(4)和(8)电极(5)之间的等离子体放电区域(7),一原料气体供应商的位置,具有规定的倾斜角θ驱动&; 相对于所述基板保持器(4)。
    • 5. 发明公开
    • Thin film sensor element and method of manufacturing the same
    • Dünnfilm-Sensorelement sowie Verfahren zu seiner Herstellung
    • EP0667532A2
    • 1995-08-16
    • EP95100861.4
    • 1995-01-23
    • Matsushita Electric Industrial Co., Ltd.
    • Torii, HideoKamada, TakeshiHayashi, ShigenoriTakayama, RyoichiHirao, TakashiHattori, Masumi
    • G01P15/08H01L37/00
    • G01P15/0922G01P15/0802H01L41/0478H01L41/0815H01L41/313Y10T29/42Y10T29/4981
    • A thin film sensor element includes a sensor holding substrate having an opening part and a multilayer film adhered thereon at least consisting of an electrode film A, an electrode film B having (100) plane orientation, and a piezoelectic dielectric oxide film present between the electrode film A and the electrode film B. As a result, a thin film sensor element which is small, light, highly accurate, and inexpensive can be attained which can be used for an acceleration sensor element and a pyroelectric infrared sensor element.
      On the surface of a flat plate KBr substrate 1, a rock-salt crystal structure oxide of a conductive NiO 12 is formed by a plasma MOCVD method whose vertical direction is crystal-oriented to (100) direction against the substrate surface. By means of a sputtering method, a PZT film 4 is formed by an epitaxial growth on that surface, and a Ni-Cr electrode film 15 is formed thereon. Next, the multilayer film structure is reversed and adhered to a sensor substrate 7 having an opening part with an adhesive 20. After a connection electrode 19 is connected, the whole structure is washed with water, thereby removing the KBr substrate 1.
    • 薄膜传感器元件包括:传感器保持基板,其具有至少由电极膜A,具有(100)面取向的电极膜B和存在于电极之间的压电介电氧化物膜组成的开口部分和多层膜; 膜A和电极膜B.结果,可以获得可用于加速度传感器元件和热电型红外线传感器元件的小,轻,高精度和便宜的薄膜传感器元件。 在平板KBr衬底1的表面上,导电NiO 12的岩盐晶体结构氧化物通过等离子体MOCVD方法形成,其垂直方向是晶体取向为< Lang&100&Rang&反对衬底表面的方向。 通过溅射法,在该表面上通过外延生长形成PZT膜4,在其上形成Ni-Cr电极膜15。 接下来,将多层膜结构反转并粘附到具有开口部的粘合剂20的传感器基板7.连接电极19连接后,将整个结构用水洗涤,从而除去KBr基板1。