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1. 发明公开

EP3955446A1 PULSED DC POWER SOURCE DEVICE AND MAGNETIC SATURATION RESET METHOD FOR PULSED DC POWER SOURCE DEVICE 审中-公开
公开(公告)号：EP3955446A1
公开(公告)日：2022-02-16
申请号：EP19924016.9
申请日：2019-11-08
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , ADACHI, Toshiyuki , YONEYAMA, Tomohiro , MIYAZAKI, Koichi
IPC分类号： H02M3/155 , H02M3/28 , H02M9/02
摘要： In the present invention, when a DC reactor is in a magnetically saturated state, the on/off operations of a switching element are suspended and the switching element is set to an off state for a predetermined period of time, thereby resetting the magnetic saturation of the DC reactor and maintaining the supply of power to a load. After resetting the magnetic saturation, the pulse output of the normal pulse mode is restarted.

2. 发明公开

EP3916991A1 DC-PULSE POWER SUPPLY DEVICE 无效
公开(公告)号：EP3916991A1
公开(公告)日：2021-12-01
申请号：EP19911240.0
申请日：2019-11-08
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , ADACHI, Toshiyuki , YONEYAMA, Tomohiro , MIYAZAKI, Koichi
IPC分类号： H02M9/02 , H02M1/34 , H02M3/155 , H02M3/28 , H02M7/537
摘要： This DC-pulse power supply device is provided with: a DC power supply; a pulse unit (20) for generating a pulse output using a step-up chopper circuit connected to the DC power supply; and a voltage superimposing unit (30A, 30B) connected to a DC reactor of the step-up chopper circuit. The voltage superimposing unit (30A, 30B) superimposes an amount (Vc, VDCL2) corresponding to a superimposed voltage on the output voltage of the step-up chopper circuit. The pulse unit (20) outputs, in a pulse form, the output voltage (Vo) on which the amount (Vc, VDCL2) corresponding to the superimposed voltage is superimposed by the voltage superimposing unit (30A, 30B). The amount corresponding to the superimposed voltage is superimposed on the pulse output of the step-up chopper circuit, thereby raising the output voltage of the pulse output of the step-up chopper circuit.

3. 发明公开

EP2947971A1 DC POWER SOURCE, AND DC POWER SOURCE CONTROL METHOD 有权
标题翻译： DC电源及控制方法相同的电源
公开(公告)号：EP2947971A1
公开(公告)日：2015-11-25
申请号：EP13894361.8
申请日：2013-12-26
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , KODAMA, Shinichi , ADACHI, Toshiyuki
IPC分类号： H05H1/46 , C23C14/34 , H02J1/00 , H02M3/155 , H02M3/158
CPC分类号： H02M7/53871 , H01J37/32027 , H01J37/3444 , H02M1/36 , H02M3/155 , H02M3/1582 , H02M7/48 , H02M2001/007 , H05H1/46
摘要： A DC power source to supply DC power to a plasma generator is configured as a simple and small-sized device that forms high voltage for generating a plasma discharge. A step of passing a short-circuit current for extremely short time through the voltage source step-down chopper provided in the DC power source and accumulating energy in a reactor is performed repeatedly more than once, so as to discharge the energy accumulated in the reactor to the output capacitance and raise the output voltage sequentially, thereby boosting the voltage up to the ignition set voltage. The short-circuit current is formed by a switching element of a boosting circuit provided in the DC power source. Boosting the voltage at the output terminal by accumulating and discharging the short-circuit current is repeated to raise the voltage at the output terminal of the DC power source up to the ignition set voltage.

4. 发明公开

EP2879257A1 DC POWER SUPPLY DEVICE, AND CONTROL METHOD FOR DC POWER SUPPLY DEVICE 有权
标题翻译：相同的功率控制装置及方法对于相同的功率器件
公开(公告)号：EP2879257A1
公开(公告)日：2015-06-03
申请号：EP12884309.1
申请日：2012-09-05
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , ADACHI, Toshiyuki , KODAMA, Shinichi
IPC分类号： H02J1/00
CPC分类号： H02M3/33507 , H01J37/32027 , H01J37/32045 , H01T1/02 , H01T15/00 , H02J1/00 , H02M1/36 , H02M3/156 , H02M7/5387 , H02M2001/007 , H02M2001/325 , H05H1/46 , H05H1/48 , H05H2001/4682
摘要： A phase of the pulse control signal upon restarting is synchronized with the phase of the pulse control signal upon suspending, thereby suppressing fluctuations of output voltage in each phase of the inverter upon restarting and further suppressing fluctuations of voltage supplied to the load. Upon supplying DC power to a plasma generator, when arc discharge occurs in the plasma generator, supplying of the DC power is suspended to reduce damage on the electrodes and substrate, and further upon extinguishing of the arc discharge, supplying of the DC power is restarted. In suspending and resuming the DC output, the current flowing in the chopper upon suspending is held in the form of circulating current, and upon restarting the inverter, this circulating current is supplied to the load. Accordingly, it is possible to reduce a delay in supplying the DC power to the load, upon resuming the DC output.

5. 发明公开

EP2833703A1 HIGH-FREQUENCY POWER SUPPLY DEVICE AND REFLECTED WAVE POWER CONTROL METHOD 有权
标题翻译：高频电源的装置和方法的功率控制反射波
公开(公告)号：EP2833703A1
公开(公告)日：2015-02-04
申请号：EP13807713.6
申请日：2013-06-03
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , AIKAWA, Satoshi , KUNITAMA, Hiroshi
IPC分类号： H05H1/46 , H05H1/00
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32146 , H01J37/32183 , H01J37/32944 , H01J37/3299 , H02M1/08 , H02M7/539 , H05H1/46 , H05H2001/4682
摘要： In an RF power supply for supplying RF power to a plasma load, reflected wave power control is performed in which the reflected wave power of an RF generator is detected and, using the detected reflected wave power, the RF generator is controlled. For a short-time variation in reflected wave power, control is performed based on a peak value variation in the detection value of reflected wave power. For a long-time variation in reflected wave power, control is performed based on a variation in a smoothed value obtained by smoothing detection values of reflected wave power. A reflected wave power control loop system includes a reflected wave power peak value dropping loop system and an arc blocking system that perform control based on a peak variation in reflected wave power and a reflected wave power amount dropping loop system that performs control based on a smoothed power amount of reflected wave power. In the non-ignition state before plasma is ignited, the RF generator provides total reflected wave power tolerance that is the ability to tolerate total reflected wave power generated when forward wave power all returns to the generator side as reflected wave power.

6. 发明公开

EP2833702A1 HIGH-FREQUENCY POWER SUPPLY DEVICE AND IGNITION VOLTAGE SELECTION METHOD 有权
标题翻译：赫尔辛基广播电视大剧院在ZÜNDSPANNUNGSAUSWAHLVERFAHREN
公开(公告)号：EP2833702A1
公开(公告)日：2015-02-04
申请号：EP13806362.3
申请日：2013-06-03
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , AIKAWA, Satoshi , KUNITAMA, Hiroshi
IPC分类号： H05H1/46 , H02M7/48
CPC分类号： H05H1/46 , H01J37/32091 , H01J37/32174 , H01J37/32183 , H02M7/5387 , H02M7/53871 , H05H2001/4682
摘要： An object of the present invention is to increase the load-end voltage and to select an ignition voltage high enough for the load-end voltage of a plasma load to generate a plasma discharge. When RF power is supplied from an RF generator to a load via a power supply unit,
(a) the internal impedance of the RF generator is made lower than the characteristic impedance of the power supply unit, and
(b) the load-end voltage is increased by selecting the electrical length L E of the power supply unit, which connects between the RF generator and the load to supply RF power, so that the electrical length L E has a predetermined relation with the fundamental wavelength λ of the RF AC. More specifically, the electrical length L E of the power supply unit is selected in such a way that, when the load end, which is the input end of the load, is in an open state, the electrical length L E is (2n-1)·(λ/4)-k·λ≤L E ≤(2n-1)·(λ/4)+k·λ (n is an integer, k is {π-2·cos -1 (1/K)}/(4π)) with respect to the fundamental wavelength λ of the RF AC.
摘要翻译：本发明的目的是增加负载端电压并选择足够高的等离子体负载的负载端电压产生等离子体放电的点火电压。当RF功率从RF发生器通过电源单元提供给负载时，（a）使RF发生器的内部阻抗低于电源单元的特性阻抗，（b）负载端电压通过选择连接RF发生器和负载以提供RF功率的电源单元的电长度LE来增加，使得电长度LE与RF AC的基波长»具有预定的关系。更具体地说，选择供电单元的电长度LE，使得当作为负载的输入端的负载端处于打开状态时，电长度LE为（2n-1） ·（·/ 4）-k·‰¤LE‰（2n-1）·（»/ 4）+ k··（n是整数，k是{À-2·cos -1（1 / K ）} /（4±））相对于RF AC的基波长λ。

7. 发明公开

EP2677652A1 CURRENT SOURCE INVERTER DEVICE, AND METHOD FOR CONTROLLING CURRENT SOURCE INVERTER DEVICE 有权
标题翻译：，电源转换器设备及其控制方法动力源转换器设备
公开(公告)号：EP2677652A1
公开(公告)日：2013-12-25
申请号：EP12869041.9
申请日：2012-02-23
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , ADACHI, Toshiyuki , KODAMA, Shinichi
IPC分类号： H02M7/48
CPC分类号： H02M3/33569 , H02M7/48 , H02M2007/4815 , Y02B70/1441
摘要： In controlling switching elements of a current source inverter, a switching loss in the switching element is prevented according to a normal switching operation for a commutation operation, without requiring any particular control.
In the commutation operation of the current source inverter, a timing for driving the switching elements is controlled in such a manner that an overlap period is generated, during when both a switching element at the commutation source and a switching element at the commutation target are set to be the ON state, a resonant circuit is controlled based on the control of the switching elements having this overlap period, and resonant current of the resonant circuit reduces the switching loss upon commutation operation of the switching elements. By controlling the generation of the resonant current of the resonant circuit by using the control of the switching elements having the overlap period, the resonant current generated by this control renders current and voltage of the switching element at the commutation source to zero when commutation is performed, thereby reducing the switching loss in the commutation operation.
摘要翻译：在控制电流源逆变器的开关元件，在开关元件的开关损耗，防止gemäß一种用于换向手术通常的开关操作，无需任何需要特别控制。在电流源逆变器的换流术，用于驱动开关元件在寻求的方式被控制的时序没有重叠周期内产生，在当两个换流源的开关元件和换流目标的开关元件被设置成为导通状态，谐振电路被控制，基于具有该重叠周期的开关元件的控制，并且所述谐振电路的谐振电流减小时的操作开关元件的换向开关损耗。通过使用具有该重叠期间的开关元件的控制来控制所述谐振电路的谐振电流的产生，当换向，进行由该控制所产生的谐振电流使电流和换流源到零开关元件的电压，由此减小在换向操作中的开关损耗。

8. 发明公开

EP4297265A1 WIDEBAND RF POWER SUPPLY AND CONTROL METHOD 审中-实审
公开(公告)号：EP4297265A1
公开(公告)日：2023-12-27
申请号：EP21926792.9
申请日：2021-12-17
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , YONEYAMA, Tomohiro , KOBAYASHI, Shohei , HOSOYAMADA, Yu
IPC分类号： H02M7/48
摘要： A carrier wave generation unit comprising a wideband RF power supply divides a whole modulation wave variable frequency range, in which a modulation wave frequency fs is variable, into a plurality of modulation wave frequency sections associated with the number of PWM pulses N based on upper and lower limit frequencies of a carrier wave. In each modulation wave frequency section, an integer number of PWM pulses N associated to each modulation wave frequency section and the modulation wave frequency fs are used to vary a carrier wave frequency fc that satisfies a relationship of fc=N • fs. Then, the number of PWM pulses N is changed to one associated with the modulation wave frequency section which includes the changed modulation wave frequency fs to make the carrier frequency fc variable based on the relationship of fc=N • fs, thereby synchronizing the frequency between a carrier wave C and a modulation wave S to satisfy periodicity.

9. 发明授权

EP3236718B1 RADIO FREQUENCY POWER SOURCE DEVICE, AND POWER SOURCE FOR DUAL CATHODES 有权
公开(公告)号：EP3236718B1
公开(公告)日：2019-05-08
申请号：EP15881133.1
申请日：2015-02-20
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , KODAMA, Shinichi , ADACHI, Toshiyuki
IPC分类号： H01J37/34

10. 发明授权

EP3010098B1 HIGH-FREQUENCY POWER SUPPLY DEVICE, AND PLASMA IGNITION METHOD 有权
公开(公告)号：EP3010098B1
公开(公告)日：2018-08-15
申请号：EP14881474.2
申请日：2014-03-12
申请人： Kyosan Electric Mfg. Co., Ltd.
发明人： YUZURIHARA, Itsuo , AIKAWA, Satoshi , OHMA, Ryosuke
IPC分类号： H01J37/32 , H05H1/46
CPC分类号： H05H1/46 , H01J37/32146 , H01J37/32155 , H01J37/32174 , H01J37/32183 , H01J37/32926 , H05H2001/4645
摘要： A high-frequency power supply device is provided with a plasma ignition step that supplies pulse power to ignite plasma, and drive power supply step to supply drive power for maintaining the plasma being generated. In the plasma ignition step, an ignition pulse being applied in an ignition pulse output operation is configured as including a main pulse that induces ignition, and a prepulse with lower power than the power of the main pulse and being applied at a stage prior to the main pulse. Since the ignition pulse is configured as including the main pulse and the prepulse, this enables protection of a high-frequency power source against reflected wave power, as well as reliably igniting the plasma.

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