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    • 3. 发明公开
    • PLASMA DISCHARGE PROCESSING DEVICE AND PRODUCTION METHOD OF GAS BARRIER FILM
    • 等离子电视机
    • EP1921180A1
    • 2008-05-14
    • EP06796496.5
    • 2006-08-17
    • KONICA MINOLTA HOLDINGS, INC.
    • OZAKI, KojiFUKUDA, KazuhiroARITA, Hiroaki
    • C23C16/54C23C16/50
    • C23C16/45595C23C16/517C23C16/545H01J37/3277
    • Provide is a method of preparing a highly-functional film capable of reducing surface failure and of improving the yield, and a manufacturing apparatus thereof. This is a plasma discharge treatment apparatus to plasma-discharge-treat for the surface of a substrate conveyed between a winder and an unwinder at atmospheric pressure or approximately atmospheric pressure, and is a plasma discharge treatment apparatus by which the substrate is conveyed with no contact by only nip roller separating the discharge section from outside. Provided is a method of preparing a gas barrier film exhibiting high gas barrier, together with reduction of surface failure (crack failure) during gas barrier thin layer formation. The surface on the gas barrier thin layer side of the gas barrier film has a curvature radius of at least 75 mm during conveyance, and the surface on the opposite side has a curvature radius of at least 37.5 mm.
    • 提供一种制备能够降低表面破坏并提高产率的高功能膜的方法及其制造装置。 这是等离子体放电处理装置,用于在大气压或大气压下在卷绕机和退绕机之间输送的基板的表面进行等离子体放电处理,并且是等离子体放电处理装置,其中基板不接触地被输送 仅通过将排出部分从外部分离的夹持辊。 本发明提供一种制备阻气性较好的气体阻隔膜的方法,同时减少阻气薄层形成时的表面破坏(裂纹破坏)。 阻气膜的阻气性薄膜侧的表面在输送时的曲率半径为75mm以上,相反侧的面的曲率半径为37.5mm以上。