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1. 发明公开

EP3507653A1 DIFFRACTION-BASED FOCUS METROLOGY 审中-实审
公开(公告)号：EP3507653A1
公开(公告)日：2019-07-10
申请号：EP17860979.8
申请日：2017-06-02
申请人： KLA-Tencor Corporation
发明人： LEVINSKI, Vladimir
IPC分类号： G03F7/20 , G03F7/00 , G03F1/84

2. 发明公开

EP2601675A2 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 有权
标题翻译：多层OVERLAP测目标及相关OVERLAP METROLOGY测量系统
公开(公告)号：EP2601675A2
公开(公告)日：2013-06-12
申请号：EP11815104.2
申请日：2011-07-28
申请人： KLA-Tencor Corporation
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , COHEN, Guy
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.

3. 发明公开

EP3916758A1 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 审中-实审
公开(公告)号：EP3916758A1
公开(公告)日：2021-12-01
申请号：EP21186660.3
申请日：2011-07-28
申请人： Kla-Tencor Corporation
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , Cohen, Guy
IPC分类号： H01L21/027
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.

4. 发明公开

EP3779598A3 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 有权
公开(公告)号：EP3779598A3
公开(公告)日：2021-04-14
申请号：EP20177915.4
申请日：2012-04-04
申请人： Kla-Tencor Corporation
发明人： KANDEL, Daniel , COHEN, Guy , KLEIN, Dana , LEVINSKI, Vladimir , SAPIENS, Noam , SHULMAN, Alex , KAMENETSKY, Vladimir , AMIT, Eran , VAKSHTEIN, Irina
IPC分类号： G03F7/20
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

5. 发明公开

EP3639166A1 RETICLE OPTIMIZATION ALGORITHMS AND OPTIMAL TARGET DESIGN 审中-实审
公开(公告)号：EP3639166A1
公开(公告)日：2020-04-22
申请号：EP17912654.5
申请日：2017-06-06
申请人： KLA-Tencor Corporation
发明人： FELER, Yoel , LEVINSKI, Vladimir
IPC分类号： G06F17/50

6. 发明公开

EP3387371A1 CONTROL OF AMPLITUDE AND PHASE OF DIFFRACTION ORDERS USING POLARIZING TARGETS AND POLARIZED ILLUMINATION 有权
公开(公告)号：EP3387371A1
公开(公告)日：2018-10-17
申请号：EP16873498.6
申请日：2016-06-01
申请人： KLA-Tencor Corporation
发明人： LEVINSKI, Vladimir
IPC分类号： G01B11/02 , G01B9/02
CPC分类号： G01N21/47 , G01B11/24 , G01B11/2513 , G01B11/2536 , G01B2210/56 , G01N21/00 , G01N21/4788 , G01N2021/4792 , G03F7/70633 , G03F7/70683
摘要： Metrology scatterometry targets, optical systems and corresponding metrology tools and measurement methods are provided. Targets and/or optical systems are designed to enhance first order diffraction signals with respect to a zeroth order diffraction signal from the scatterometry target by creating a phase shift of 180° between zeroth order diffraction signals upon illumination of the scatterometry targets. For example, the targets may be designed to respond to polarized illumination by producing a first phase shift between zeroth order diffraction signals upon illumination thereof and optical systems may be designed to illuminate the target by polarized illumination and to analyze a resulting diffraction signal to yield a second phase shift between zeroth order diffraction signals upon illumination thereof. The phase shifts add up to 180° to cancel out the zeroth order diffraction signals, with either phase shift being between 0 and 180°.

7. 发明公开

EP3126893A1 FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY 审中-实审
标题翻译： FOKUSMESSUNGEN MIT SCATTEROMETRIE
公开(公告)号：EP3126893A1
公开(公告)日：2017-02-08
申请号：EP15774184.4
申请日：2015-03-30
申请人： Kla-Tencor Corporation
发明人： EL KODADI, Mohammed , AMIR, Nuriel , VOLKOVICH, Roie , LEVINSKI, Vladimir , FELER, Yoel , KANDEL, Daniel , GUTMAN, Nadav , PANDEV, Stilian , SANKO, Dzmitry
IPC分类号： G02B15/14 , H04N7/18
CPC分类号： G06F17/5081 , G01N21/4785 , G03F7/70641 , G03F7/70683 , G06F17/5072
摘要： Target designs and methods are provided, which relate to periodic structures having elements recurring with a first pitch in a first direction. The elements are periodic with a second pitch along a second direction that is perpendicular to the first direction and are characterized in the second direction by alternating, focus-sensitive and focus-insensitive patterns with the second pitch. In the produced targets, the first pitch may be about the device pitch and the second pitch may be several times larger. The first, focus-insensitive pattern may be produced to yield a first critical dimension and the second, focus-sensitive pattern may be produced to yield a second critical dimension that may be equal to the first critical dimension only when specified focus requirements are satisfied, or provide scatterometry measurements of zeroth as well as first diffraction orders, based on the longer pitch along the perpendicular direction.
摘要翻译：提供了目标设计和方法，其涉及具有在第一方向上以第一间距重复的元件的周期性结构。这些元件沿着与第一方向垂直的第二方向具有第二间距周期性，并且通过具有第二间距的交替的聚焦敏感和对焦不敏感图案在第二方向上表征。在所产生的目标中，第一节距可以是关于装置间距，并且第二节距可以是数倍大。可以产生第一个不对焦模式，以产生第一关键尺寸，并且可以产生第二焦点敏感图案以产生仅当满足指定焦点要求时可以等于第一临界尺寸的第二临界尺寸，或者基于沿着垂直方向的较长的间距来提供零和第一衍射级的散射测量。

8. 发明公开

EP3811154A1 OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDERS IMAGING 审中-实审
公开(公告)号：EP3811154A1
公开(公告)日：2021-04-28
申请号：EP18931575.7
申请日：2018-12-14
申请人： Kla-Tencor Corporation
发明人： SHALIBO, Yoni , PASKOVER, Yuri , LEVINSKI, Vladimir , MANASSEN, Amnon , EISANBACH, Shlomo , LAREDO, Gilad , HILDESHEIM, Ariel
IPC分类号： G03F7/20 , G02B7/38 , G01N21/47 , G01N21/952

9. 发明公开

EP3779598A2 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 有权
公开(公告)号：EP3779598A2
公开(公告)日：2021-02-17
申请号：EP20177915.4
申请日：2012-04-04
申请人： Kla-Tencor Corporation
发明人： KANDEL, Daniel , COHEN, Guy , KLEIN, Dana , LEVINSKI, Vladimir , SAPIENS, Noam , SHULMAN, Alex , KAMENETSKY, Vladimir , AMIT, Eran , VAKSHTEIN, Irina
IPC分类号： G03F7/20 , G01N37/00
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

10. 发明授权

EP2694983B1 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 有权
公开(公告)号：EP2694983B1
公开(公告)日：2020-06-03
申请号：EP12768608.7
申请日：2012-04-04
申请人： KLA-Tencor Corporation
发明人： KANDEL, Daniel , COHEN, Guy , KLEIN, Dana , LEVINSKI, Vladimir , SAPIENS, Noam , SHULMAN, Alex , KAMENETSKY, Vladimir , AMIT, Eran , VAKSHTEIN, Irina
IPC分类号： G03F7/20 , G03F1/48

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