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3. 发明公开

EP3126893A1 FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY 审中-实审
标题翻译： FOKUSMESSUNGEN MIT SCATTEROMETRIE
公开(公告)号：EP3126893A1
公开(公告)日：2017-02-08
申请号：EP15774184.4
申请日：2015-03-30
申请人： Kla-Tencor Corporation
发明人： EL KODADI, Mohammed , AMIR, Nuriel , VOLKOVICH, Roie , LEVINSKI, Vladimir , FELER, Yoel , KANDEL, Daniel , GUTMAN, Nadav , PANDEV, Stilian , SANKO, Dzmitry
IPC分类号： G02B15/14 , H04N7/18
CPC分类号： G06F17/5081 , G01N21/4785 , G03F7/70641 , G03F7/70683 , G06F17/5072
摘要： Target designs and methods are provided, which relate to periodic structures having elements recurring with a first pitch in a first direction. The elements are periodic with a second pitch along a second direction that is perpendicular to the first direction and are characterized in the second direction by alternating, focus-sensitive and focus-insensitive patterns with the second pitch. In the produced targets, the first pitch may be about the device pitch and the second pitch may be several times larger. The first, focus-insensitive pattern may be produced to yield a first critical dimension and the second, focus-sensitive pattern may be produced to yield a second critical dimension that may be equal to the first critical dimension only when specified focus requirements are satisfied, or provide scatterometry measurements of zeroth as well as first diffraction orders, based on the longer pitch along the perpendicular direction.
摘要翻译：提供了目标设计和方法，其涉及具有在第一方向上以第一间距重复的元件的周期性结构。这些元件沿着与第一方向垂直的第二方向具有第二间距周期性，并且通过具有第二间距的交替的聚焦敏感和对焦不敏感图案在第二方向上表征。在所产生的目标中，第一节距可以是关于装置间距，并且第二节距可以是数倍大。可以产生第一个不对焦模式，以产生第一关键尺寸，并且可以产生第二焦点敏感图案以产生仅当满足指定焦点要求时可以等于第一临界尺寸的第二临界尺寸，或者基于沿着垂直方向的较长的间距来提供零和第一衍射级的散射测量。

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