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2. 发明公开

EP0298126A1 OPTICAL CVD PROCESS 失效
标题翻译： OPTISCHES CVD-VERFAHREN。
公开(公告)号：EP0298126A1
公开(公告)日：1989-01-11
申请号：EP88900591.4
申请日：1987-12-25
申请人： KAWASAKI STEEL CORPORATION
发明人： OHTA, Tomohiro , SASAKI, Hiroaki , MITOMO, Tohru , KUBOTA, Naoki
IPC分类号： C23C16/48
CPC分类号： C23C16/483 , H01L21/268
摘要： In order to solve the technical problems such as an increase in a film formation speed in an optical CVD process, an improvement in film quality and elimination of restrictions imposed to a light source and a starting gas, the present invention provides an optical CVD process which can be applied particularly advantageously to the fabrication of semiconductors by conjoint use of a pulsating laser beam and continuous light, by application of a plurality of laser beams for applying a second pulsating laser beam to between pulses of a first pulse train and by introduction of an additional gas into a reaction vessel besides the starting gas in order to promote photo decomposition of the starting gas.
摘要翻译：光学CVD（化学气相沉积）工艺提高了成膜速度和薄膜质量。将底板放置在引入起始气体的反应容器中。起始气体包括气体膜的成分形成在基板上。起始气体通过用脉冲激光束照射分解。产生的光分解活性气体物质布置在基板上以形成膜。连续光也用于照射起始气体，并且可以用于照射底板以及所生产的膜层。梁是可见的。从一个或两个激光器。如果使用两个激光器，则它们产生具有不同相位的脉冲串。可以向起始气体中加入另外的气体以促进起始气体的光分解。该附加气体吸收波长185nm以上的光。起始气体被规定为含有至少一种烃类气体，含氧气体。或卤化烃或硅烷。额外的气体被规定为含有至少一种类型的卤素，卤素或氧分子的气体。

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