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1. 发明公开

EP1652866A1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS 有权
标题翻译： ACRYLPOLYMERE UND STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
公开(公告)号：EP1652866A1
公开(公告)日：2006-05-03
申请号：EP04771184.1
申请日：2004-08-04
申请人： JSR Corporation
发明人： FUJIWARA, Kouichi , YAMAGUCHI, Hiroshi , NAKAMURA, Atsushi
IPC分类号： C08F220/28 , G03F7/039 , H01L21/30
CPC分类号： C08F220/30 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R" and R‴ are each hydrogen, methyl, or trifluoromethyl; R 1 is hydrogen, C 1-4 linear or branched alkyl, alkoxy, or C 1-4 linear or branched fluoroalkyl; X is a C 7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R 2 and R 3 are each independently C 1-4 linear or branched alkyl; R 4 is a C 4-20 alicyclic hydrocarbon group; R 5 is C 1-4 linear or branched alkyl; and R 6 and R 7 are each hydrogen or C 1-4 linear or branched alkyl.
摘要翻译：提供一种在抗蚀剂溶剂中溶解性优异且几乎不依赖于烘烤温度的抗蚀剂，并且可以形成线边缘粗糙度降低的显影图案。一种丙烯酸类聚合物，其特征在于包含通式（1）的单元，通式（2）的单元和通式（3）的单元和/或通式（4）的单元，其中R，R'，R“ R 1是氢，甲基或三氟甲基; R 1是氢，C 1-4直链或支链烷基，烷氧基或C 1-4直链或支链氟烷基; X是C 7-20多环脂族烃基由碳原子和氢原子组成; R 2和R 3各自独立地为C 1-4直链或支链烷基; R 4为C 4-20脂环族烃基; R 5为C 1-4直链或支链烷基;和 R 6和R 7各自为氢或C 1-4直链或支链烷基。

2. 发明授权

EP1652866B1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS 有权
标题翻译：丙烯酸聚合物和辐射敏感性树脂组合物
公开(公告)号：EP1652866B1
公开(公告)日：2008-12-24
申请号：EP04771184.1
申请日：2004-08-04
申请人： JSR Corporation
发明人： FUJIWARA, Kouichi , YAMAGUCHI, Hiroshi , NAKAMURA, Atsushi
IPC分类号： C08F220/28 , G03F7/039 , H01L21/30
CPC分类号： C08F220/30 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要： [PROBLEMS] To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. [MEANS FOR SOLVING PROBLEMS] An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R'' and R''' are each hydrogen, methyl, or trifluoromethyl; R is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R and R are each independently C1-4 linear or branched alkyl; R is a C4-20 alicyclic hydrocarbon group; R is C1-4 linear or branched alkyl; and R and R are each hydrogen or C1-4 linear or branched alkyl.

3. 发明公开

EP2309332A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD 审中-公开
标题翻译： UR UR UR ICH UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR
公开(公告)号：EP2309332A1
公开(公告)日：2011-04-13
申请号：EP09797918.1
申请日：2009-07-14
申请人： JSR Corporation
发明人： ANNO, Yuusuke , FUJIWARA, Kouichi , SUGIURA, Makoto , WAKAMATSU, Gouji
IPC分类号： G03F7/40 , C08F220/28 , G03F7/039 , H01L21/027
CPC分类号： H01L21/0273 , C08F220/18 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40 , C08F220/22
摘要： A positive-tone radiation-sensitive composition is used for a resist pattern-forming method that includes double exposure as a given step, and includes (B) a polymer that includes an acid-labile group and a crosslinkable group, (C) a photoacid generator, and (D) a solvent.
摘要翻译：正色辐射敏感性组合物用于包含双重曝光作为给定步骤的抗蚀剂图案形成方法，并且包括（B）包含酸不稳定基团和可交联基团的聚合物，（C）光酸发电机，（D）溶剂。

4. 发明公开

EP1602975A1 RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
标题翻译：辐射敏感性树脂组合物
公开(公告)号：EP1602975A1
公开(公告)日：2005-12-07
申请号：EP03789633.9
申请日：2003-12-24
申请人： JSR Corporation
发明人： NISHIMURA, Isao , FUJIWARA, Kouichi , KOBAYASHI, Eiichi , SHIMOKAWA, Tsutomu , NAKAMURA, Atsushi , YONEDA, Eiji , WANG, Yong
IPC分类号： G03F7/004 , G03F7/039 , C08F4/00
CPC分类号： G03F7/039 , G03F7/0046 , G03F7/0397 , G03F7/2006
摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing-resin is smaller than 1.5.
摘要翻译：一种辐射敏感树脂组合物，其包含通过活性自由基聚合获得的含酸不稳定基团的树脂和光酸产生剂，其中所述含酸不稳定基团的树脂通过活性自由基聚合获得，所述树脂具有不溶于或几乎不溶于碱但通过酸的作用变为碱溶性的特定结构，含酸不稳定基团的树脂的重均分子量与数均分子量之比（重均分子量/数均分子量）小于1.5。

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