基本信息:
- 专利标题： ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS
- 专利标题（中）：丙烯酸聚合物和辐射敏感性树脂组合物
- 申请号：EP04771184.1 申请日：2004-08-04
- 公开(公告)号：EP1652866B1 公开(公告)日：2008-12-24
- 发明人： FUJIWARA, Kouichi , YAMAGUCHI, Hiroshi , NAKAMURA, Atsushi
- 申请人： JSR Corporation
- 申请人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 专利权人： JSR Corporation
- 当前专利权人： JSR Corporation
- 当前专利权人地址： 6-10, Tsukiji 5-chome, Chuo-ku Tokyo 104-8410 JP
- 代理机构： TBK-Patent
- 优先权： JP2003286389 20030805
- 国际公布： WO2005012374 20050210
- 主分类号： C08F220/28
- IPC分类号： C08F220/28 ; G03F7/039 ; H01L21/30
摘要：
[PROBLEMS] To provide a resist which is excellent in the solubility in a resist solvent and little dependent on baking temperature and can form developed patterns reduced in line edge roughness. [MEANS FOR SOLVING PROBLEMS] An acrylic polymer characterized by comprising units of the general formula (1), units of general formula (2), and units of general formula (3) and/or units of general formula (4), wherein R, R', R'' and R''' are each hydrogen, methyl, or trifluoromethyl; R is hydrogen, C1-4 linear or branched alkyl, alkoxy, or C1-4 linear or branched fluoroalkyl; X is a C7-20 polycyclic aliphatic hydrocarbon group consisting of carbon atoms and hydrogen atoms; R and R are each independently C1-4 linear or branched alkyl; R is a C4-20 alicyclic hydrocarbon group; R is C1-4 linear or branched alkyl; and R and R are each hydrogen or C1-4 linear or branched alkyl.
公开/授权文献:
- EP1652866A1 ACRYLIC POLYMERS AND RADIATION-SENSITIVE RESIN COMPOSITIONS 公开/授权日：2006-05-03
IPC结构图谱:
| C | 化学；冶金 |
| --C08 | 有机高分子化合物；其制备或化学加工；以其为基料的组合物 |
| ----C08F | 仅用碳—碳不饱和键反应得到的高分子化合物 |
| ------C08F220/00 | 具有1个或更多不饱和脂族基化合物的共聚物，每个不饱和脂族基只有1个碳—碳双键，并且只有1个是仅以羧基或它的盐、酐、酯、酰胺、酰亚胺或腈为终端 |
| --------C08F220/02 | .具有少于10个碳原子的一元羧酸；它的衍生物 |
| ----------C08F220/10 | ..酯 |
| ------------C08F220/22 | ...含卤素的酯 |
| --------------C08F220/28 | ....在醇部不含芳族环 |