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1. 发明公开

EP1565931A4 STRAINED FINFET CMOS DEVICE STRUCTURES 有权
标题翻译：权力结构对CMOS的FinFET设备
公开(公告)号：EP1565931A4
公开(公告)日：2006-04-19
申请号：EP02791319
申请日：2002-11-25
申请人： IBM
发明人： DORIS BRUCE B , CHIDAMBARRAO DURESETI , IEONG MEIKEI , MANDELMAN JACK A
IPC分类号： H01L21/00 , H01L21/336 , H01L21/8238 , H01L27/092 , H01L27/12 , H01L29/786
CPC分类号： H01L29/785 , H01L21/823807 , H01L21/823828 , H01L27/092 , H01L27/1203 , H01L29/66795 , H01L29/7842 , H01L29/7843
摘要： A semiconductor device structure, includes a PMOS device (200) and an NMOS device (300) disposed on a substrate (1, 2) the PMOS device including a compressive layer (6) stressing an active region of the PMOS device, the NMOS device including a tensile layer (9) stressing an active region of the NMOS device, wherein the compressive layer includes a first dielectric material, the tensile layer includes a second dielectric material, and the PMOS and NMOS devices are FinFET devices (200, 300).

2. 发明公开

EP0814507A1 Trench capacitor DRAM cell and method of making the same 失效
标题翻译： Grabenkondensator-Speicherzelle und Verfahren zur Herstellung derselben
公开(公告)号：EP0814507A1
公开(公告)日：1997-12-29
申请号：EP97304339
申请日：1997-06-20
申请人： SIEMENS AG , IBM
发明人： HAMMERL ERWIN , MANDELMAN JACK A , POSCHENRIEDER BERNHARD , SHORT ALVIN P , SRINIVASAN RADHIKA , STENGL REINHARD J , HO HERBERT L
IPC分类号： H01L27/00 , H01L21/822 , H01L21/8242 , H01L27/04 , H01L27/108
CPC分类号： H01L27/10861 , H01L27/10832
摘要： Method for forming three-dimensional device structures such as a trench capacitor DRAM cell comprising a second device (370) formed over a first device (315) is disclosed. A layer (350,355) having a single crystalline top surface (350) is formed above the first device (315) to provide the base for forming the active area of the second device.
摘要翻译：公开了一种用于形成三维器件结构的方法，例如包括形成在第一器件（315）上的第二器件（370）的沟槽电容器DRAM单元。具有单晶顶表面（350）的层（350,355）形成在第一装置（315）上方，以提供用于形成第二装置的有效区域的基座。

3. 发明公开

EP1977425A4 MULTIPLE PORT MEMORY HAVING A PLURALITY OF PARALLEL CONNECTED TRENCH CAPACITORS IN A CELL 审中-公开
标题翻译：多个并行电容器攫取更多的端口存储器在单元格中
公开(公告)号：EP1977425A4
公开(公告)日：2009-04-29
申请号：EP07710032
申请日：2007-01-10
申请人： IBM
发明人： CHENG KANGGUO , DIVAKARUNI RAMACHANDRA , MANDELMAN JACK A , RADENS CARL J , WANG GENG
IPC分类号： G11C11/24 , H01L21/8242
CPC分类号： G11C8/16 , G11C11/405 , G11C11/4097 , H01L27/0207 , H01L27/108 , H01L27/10861
摘要： An integrated circuit is provided which includes a memory having multiple ports per memory cell for accessing a data bit within each of a plurality of the memory cells. Such memory includes an array of memory cells in which each memory cell includes a plurality of capacitors (102) connected together as a unitary source of capacitance. A first access transistor (104) is coupled between a first one of the plurality of capacitors and a first bitline and a second access transistor (106) is coupled between a second one of the plurality of capacitors and a second bitline. In each memory cell, a gate of the first access transistor is connected to a first wordline and a gate of the second access transistor is connected to a second wordline.

4. 发明公开

EP0794567A3 Process for forming a deep trench-type storage node for a DRAM 失效
标题翻译：一种制备存储节点具有用于DRAM深度严重结构过程
公开(公告)号：EP0794567A3
公开(公告)日：2000-01-12
申请号：EP97102901
申请日：1997-02-21
申请人： SIEMENS AG , IBM
发明人： HO HERBERT L , SRINIVASAN RADHIKA , HALLE SCOTT D , HAMMERL ERWIN , DOBUZINSKY DAVID M , MANDELMAN JACK A , JASO MARK ANTHONY
IPC分类号： H01L27/04 , H01L21/02 , H01L21/762 , H01L21/822 , H01L21/8242 , H01L27/108 , H01L21/70
CPC分类号： H01L27/10861 , H01L21/76232 , H01L27/10832 , H01L28/82 , Y10S438/973
摘要： A simplified method of fabricating a storage node for a deep trench-based DRAM on a semiconductor substrate. The method involves the etching a trench in a surface of the substrate and then forming a layer of dielectric material on a sidewall of the trench the top portion of which is subsequently removed from the sidewall. Next, a layer of oxide is grown on the exposed portion of the sidewall. A portion of this layer of oxide is then removed from the sidewall in order to orient the layer of oxide a predetermined distance from the surface of the substrate. Finally, the trench is filled with a semiconductive material.

5. 发明公开

EP1588403A4 LOW-GIDL MOSFET STRUCTURE AND METHOD FOR FABRICATION 有权
标题翻译：具有低GIDL和方法MOSFET结构
公开(公告)号：EP1588403A4
公开(公告)日：2010-03-24
申请号：EP04702490
申请日：2004-01-15
申请人： IBM
发明人： RADENS CARL , DOKUMACI OMER H , DORIS BRUCE B , GLUSCHENKOV OLEG , MANDELMAN JACK A
IPC分类号： H01L29/78 , H01L21/265 , H01L21/28 , H01L21/336 , H01L29/49
CPC分类号： H01L29/4983 , H01L21/26586 , H01L21/28105 , H01L29/66484 , H01L29/665 , H01L29/6656 , H01L29/6659 , H01L29/7831 , H01L29/7836 , Y10S257/90

6. 发明公开

EP1584108A4 HIGH PERFORMANCE EMBEDDED DRAM TECHNOLOGY WITH STRAINED SILICON 审中-公开
标题翻译：应变硅高性能的嵌入式DRAM技术
公开(公告)号：EP1584108A4
公开(公告)日：2006-06-07
申请号：EP03701269
申请日：2003-01-08
申请人： IBM
发明人： MANDELMAN JACK A , GAMBINO JEFFREY P , WANG GENG
IPC分类号： H01L21/20 , H01L21/308 , H01L21/8242
CPC分类号： H01L27/10894 , H01L21/02381 , H01L21/02532 , H01L21/02639 , H01L21/3081 , H01L27/10864
摘要： Semiconductor devices are fabricated in a strained layer region and strained layer-free region of the same substrate. A first semiconductor device, such as a memory cell, e.g. a deep trench storage cell, is formed in a strained layer-free region of the substrate. A strained layer region is selectively formed in the same substrate. A second semiconductor device (66, 68, 70), such as an FET, e.g. an MOSFET logic device, is formed in the strained layer region.

7. 发明公开

EP0720218A3 Methods for reducing anomalous narrow channel effect in trench-bounded buried-channel p-MOSFETS 失效
标题翻译：一种用于通过一个信道沟减少begrabenem具有有限在p-MOSFET的异常窄沟道效应的方法
公开(公告)号：EP0720218A3
公开(公告)日：1998-12-16
申请号：EP95119309
申请日：1995-12-07
申请人： SIEMENS AG , IBM
发明人： ALSMEIER JOHANN , MANDELMAN JACK A
IPC分类号： H01L21/8234 , H01L21/8242 , H01L29/78 , H01L21/76 , H01L29/10
CPC分类号： H01L27/10873 , H01L21/823412 , H01L29/7838
摘要： Methods of manufacturing trench-bounded buried-channel p-type metal oxide semiconductor field effect transistors (p-MOSFETs), as used in dynamic random access memory (DRAM) technologies, for significantly reducing the anomalous buried-channel p-MOSFET sensitivity to device width. In one embodiment, the method comprises the initiation of a low temperature annealing step using an inert gas after the deep phosphorous n-well implant step, and prior to the boron buried-channel implant and 850°C gate oxidation steps. Alternatively, the annealing step may be performed after the boron buried-channel implant and prior to the 850°C gate oxidation step. In another embodiment, a rapid thermal oxidation (RTO) step is substituted for the 850°C gate oxidation step, following the deep phosphorous n-well and boron buried-channel implant steps. Alternatively, an 850°C gate oxidation step may follow the RTO gate oxidation step.
摘要翻译：如动态随机存取存储器（DRAM）技术中，用于显着地减少到设备异常埋沟道p-MOSFET灵敏度制造沟槽界定埋沟p型金属氧化物半导体场效应晶体管（P-MOSFET）的，的方法宽度。在一个实施方式中，该方法包括深磷n阱注入步骤之后，使用惰性气体的低温退火步骤的开始，和硼埋沟道注入之前和850℃栅极氧化步骤。可替代地，退火步骤可以在硼埋沟植入物和850℃栅极氧化步骤之前，之后进行。在另一个实施方式快速热氧化（RTO）的步骤代替了850℃栅极氧化步骤，继深磷n阱和硼埋入沟道注入步骤。可替换地，在850℃下栅极氧化步骤可跟随RTO栅极氧化步骤。

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