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1. 发明授权

EP2669925B1 Improved ion beam processing and imaging using a plasma ion source 有权
公开(公告)号：EP2669925B1
公开(公告)日：2020-08-26
申请号：EP13169946.4
申请日：2013-05-31
申请人： FEI COMPANY
发明人： Miller, Tom , Kellogg, Sean , Zhang, Shouyin , Maazouz, Mostafa , Graupera, Anthony
IPC分类号： H01J37/02 , H01J37/16 , H01J37/18 , H01J37/08

2. 发明授权

EP2492950B1 Method for rapid switching between a high current mode and a low current mode in a charged particle beam system 有权
标题翻译：用于在带电粒子束系统中在高电流模式和低电流模式之间进行快速切换的方法
公开(公告)号：EP2492950B1
公开(公告)日：2018-04-11
申请号：EP12155691.4
申请日：2012-02-16
申请人： FEI Company
发明人： Miller, Tom
IPC分类号： H01J37/30 , H01J37/305
CPC分类号： H01J37/3053 , H01J37/1472 , H01J37/3005 , H01J37/3056 , H01J2237/0453 , H01J2237/049 , H01J2237/08 , H01J2237/30472 , H01J2237/31745 , H01J2237/31749
摘要： A method for rapid switching between operating modes with differing beam currents in a charged particle system is disclosed. Many FIB milling applications require precise positioning of a milled pattern within a region of interest (Rol). This may be accomplished by using fiducial marks near the Rol, wherein the FIB is periodically deflected to image these marks during FIB milling. Any drift of the beam relative to the Rol can then be measured and compensated for, enabling more precise positioning of the FIB milling beam. It is often advantageous to use a lower current FIB for imaging since this may enable higher spatial resolution in the image of the marks. For faster FIB milling, a larger beam current is desired. Thus, for optimization of the FIB milling process, a method for rapidly switching between high and low current operating modes is realized.

3. 发明公开

EP2704179A2 Dose-based end-pointing for low-kv FIB milling in TEM sample preparation 有权
标题翻译： Dissbasierte Endpunktbestimungfürdas Nieder-kV-FIB-Ätzenbei der TEM-Probenherstellung
公开(公告)号：EP2704179A2
公开(公告)日：2014-03-05
申请号：EP13182112.6
申请日：2013-08-29
申请人： FEI COMPANY
发明人： Miller, Tom , Arjavac, Jason , Moriarty, Michael
IPC分类号： H01J37/304 , H01J37/305 , H01J37/302 , G01N1/32
CPC分类号： C23F1/04 , G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/30466 , H01J2237/31745
摘要： A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae (104) using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer (402) to produce the finished sample lamella (304) including at least a portion of the feature of interest.
摘要翻译：一种用于使用聚焦离子束形成透射电子显微镜样品薄片（104）的方法，系统和计算机可读介质，包括将高能量聚焦离子束引向体积体积的材料; 铣削不需要的体积的材料以产生具有一个或多个具有损伤层的暴露面的未完成的样品薄片; 表征聚焦离子束的去除速率; 在表征去除速率之后，将低能量聚焦离子束朝向未完成的样品层引导预定的研磨时间，以从低能量聚焦离子束输送每个面积的特定剂量的离子; 以及用低能量聚焦离子束研磨未完成的样品薄片以去除损伤层（402）的至少一部分，以产生包括感兴趣特征的至少一部分的成品样品薄片（304）。

4. 发明公开

EP2362410A2 Plasma igniter for an inductively coupled plasma ion source 有权
标题翻译：用于电感耦合等离子体离子源的等离子体点火器
公开(公告)号：EP2362410A2
公开(公告)日：2011-08-31
申请号：EP11154434.2
申请日：2011-02-15
申请人： FEI COMPANY
发明人： Graupera, Anthony , Kellogg, Sean , Miller, Tom , Laur, Dustin , Zhang, Shouyin
IPC分类号： H01J37/08 , H01J37/24
CPC分类号： H01J37/08 , H01J37/24 , H01J2237/0815 , H01J2237/31749 , H05H1/36
摘要： A focused ion beam (FIB) system (900) is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber (954) containing the plasma, a conducting source biasing electrode (906) in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures (914,956,in 906). The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses (912,942) which form a focused ion beam on the surface of a sample (940) to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter (950) mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.
摘要翻译：公开了一种聚焦离子束（FIB）系统（900），其包括感应耦合等离子体离子源，包含等离子体的绝缘等离子体室（954），与等离子体接触并且偏向于等离子体的导电源偏置电极（906）用于控制样品处的离子束能量的高电压以及多个孔（906中的914,956）。等离子体腔室内的等离子体用作包括一个或多个透镜（912,942）的离子柱的虚拟源，该透镜在要成像和/或FIB处理的样品（940）的表面上形成聚焦离子束。等离子体由等离子体点火器（950）启动，等离子体点火器（950）安装在柱附近或柱上，其在源偏置电极上引起高电压振荡脉冲。通过在柱附近安装等离子体点火器，连接源偏压电极和偏压电源的电缆的电容效应被最小化。通过适当的孔径材料选择，孔的离子束溅射被最小化。

5. 发明公开

EP2341525A2 Plasma source for charged particle beam system 有权
标题翻译： Plasmaquellefürein Teilchenstrahlsystem
公开(公告)号：EP2341525A2
公开(公告)日：2011-07-06
申请号：EP10196692.7
申请日：2010-12-23
申请人： FEI Company
发明人： Kellog, Sean , Miller, Tom , Zhang, Shouyin , Graupera, Anthony , McGinn, James , Dirriwachter, Tom , Smith, Noel
IPC分类号： H01J37/02 , H01J37/08
CPC分类号： H01J37/08 , H01J27/16 , H01J2237/002 , H01J2237/006 , H01J2237/026 , H01J2237/038 , H01J2237/0815 , H01J2237/31749
摘要： An inductively coupled plasma source (100) for a focused charged particle beam system includes a dielectric liquid (126) that insulates and cools the plasma chamber (102). A flow restrictor (158) at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.
摘要翻译：用于聚焦带电粒子束系统的电感耦合等离子体源（100）包括绝缘和冷却等离子体室（102）的电介质液体（126）。由于气体中的电压降主要发生在相对较高的压力下，电流下的流量限制器（158）是等离子体电位的大部分减少电弧。

6. 发明公开

EP2711684A3 Substrate, method for its creation, and system and method for ex situ TEM, STEM, or SEM analysis of said substrate 审中-公开
标题翻译：基材，其制备方法，和用于基片的非原位分析系统和方法通过TEM，STEM，或扫描电镜
公开(公告)号：EP2711684A3
公开(公告)日：2015-07-22
申请号：EP13185853.2
申请日：2013-09-25
申请人： FEI COMPANY
发明人： Miller, Tom , Arjavac, Jason , Heer, Damon , Strauss, Michael , Veen, van, Gerard
IPC分类号： G01N1/32 , H01J37/20 , H01J37/305
CPC分类号： G01N1/28 , G01N1/32 , H01J37/02 , H01J37/20 , H01J37/3023 , H01J37/3056 , H01J2237/31745
摘要： An asymmetrical lamella (27) for use in an ex situ TEM, SEM, or STEM procedure, and a method and system for creating the lamella is disclosed. The shape of the lamella provides for easy orientation such that a region of interest (82) in the lamella can be placed over a hole (81) in a carbon film (19) providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.

7. 发明公开

EP2492950A2 Method for rapid switching between a high current mode and a low current mode in a charged particle beam system 有权
标题翻译：一种用于在带电粒子束系统高功率模式和一个低电流模式之间的快速切换处理
公开(公告)号：EP2492950A2
公开(公告)日：2012-08-29
申请号：EP12155691.4
申请日：2012-02-16
申请人： FEI Company
发明人： Miller, Tom
IPC分类号： H01J37/30 , H01J37/305
CPC分类号： H01J37/3053 , H01J37/1472 , H01J37/3005 , H01J37/3056 , H01J2237/0453 , H01J2237/049 , H01J2237/08 , H01J2237/30472 , H01J2237/31745 , H01J2237/31749
摘要： A method for rapid switching between operating modes with differing beam currents in a charged particle system is disclosed. Many FIB milling applications require precise positioning of a milled pattern within a region of interest (Rol). This may be accomplished by using fiducial marks near the Rol, wherein the FIB is periodically deflected to image these marks during FIB milling. Any drift of the beam relative to the Rol can then be measured and compensated for, enabling more precise positioning of the FIB milling beam. It is often advantageous to use a lower current FIB for imaging since this may enable higher spatial resolution in the image of the marks. For faster FIB milling, a larger beam current is desired. Thus, for optimization of the FIB milling process, a method for rapidly switching between high and low current operating modes is realized.

8. 发明公开

EP2341525A3 Plasma source for charged particle beam system 有权
标题翻译：等离子体源，用于粒子束
公开(公告)号：EP2341525A3
公开(公告)日：2012-03-07
申请号：EP10196692.7
申请日：2010-12-23
申请人： FEI Company
发明人： Kellog, Sean , Miller, Tom , Zhang, Shouyin , Graupera, Anthony , McGinn, James , Dirriwachter, Tom , Smith, Noel
IPC分类号： H01J37/02 , H01J37/08
CPC分类号： H01J37/08 , H01J27/16 , H01J2237/002 , H01J2237/006 , H01J2237/026 , H01J2237/038 , H01J2237/0815 , H01J2237/31749
摘要： An inductively coupled plasma source (100) for a focused charged particle beam system includes a dielectric liquid (126) that insulates and cools the plasma chamber (102). A flow restrictor (158) at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.

9. 发明公开

EP3018693A1 AUTOMATED TEM SAMPLE PREPARATION 有权
标题翻译：自动化TEM-PROBENHERSTELLUNG
公开(公告)号：EP3018693A1
公开(公告)日：2016-05-11
申请号：EP15192862.9
申请日：2015-11-04
申请人： FEI Company
发明人： Brogden, Valerie , Blackwood, Jeff , Schmidt, Michael , Trivedi, Dhruti , Young, Richard , Miller, Tom , Routh, Jr., Brian , Stone, Stacey , Templeton, Todd
IPC分类号： H01J37/304 , G01N1/28
CPC分类号： H01J37/3023 , G01N1/286 , G01N2001/2873 , H01J37/28 , H01J37/285 , H01J37/3045 , H01J37/31 , H01J2237/208 , H01J2237/31745
摘要： Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.
摘要翻译：描述了有助于自动提取薄片并将薄片附着到样品网格上以在透射电子显微镜上观察的技术。本发明的一些实施例涉及使用机器视觉来确定薄片，探针和/或TEM网格的位置，以将探针附着到薄片和将薄片附接到TEM网格。便于使用机器视觉的技术包括成形探针尖端，使其位置可以被图像识别软件容易地识别。图像减法技术可用于确定附着于探针的薄片的位置，以将薄片移动到TEM网格以进行附着。在一些实施例中，参考结构在探头上或薄片上铣削以便于图像识别。

10. 发明公开

EP2704179A3 Dose-based end-pointing for low-kv FIB milling in TEM sample preparation 有权
标题翻译：剂量基于Endpunktbestimung低千伏FIB在TEM样品制备蚀刻
公开(公告)号：EP2704179A3
公开(公告)日：2015-10-14
申请号：EP13182112.6
申请日：2013-08-29
申请人： FEI COMPANY
发明人： Miller, Tom , Arjavac, Jason , Moriarty, Michael
IPC分类号： H01J37/304 , H01J37/305 , H01J37/302 , G01N1/32
CPC分类号： C23F1/04 , G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/30466 , H01J2237/31745
摘要： A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae (104) using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer (402) to produce the finished sample lamella (304) including at least a portion of the feature of interest.

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