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    • 3. 发明公开
    • Improved polysilicon and process therefor
    • Polysilicium和Verfahren zu seiner Herstellung。
    • EP0450393A2
    • 1991-10-09
    • EP91104236.4
    • 1991-03-19
    • ETHYL CORPORATION
    • Allen, Robert Hall
    • C01B33/027B01J8/26
    • C01B33/029
    • Semiconductor grade polysilicon in the form of free flowing, approximately spherical particles produced in a fluidized bed, and having a reduced surface silicon dust content and hydrogen content. Such products are formed in two operations utilizing fluidized beds. In the first operation, silicon is deposited on polysilicon seed particles. In the second operation, trichlorosilane or other halogenated silane is decomposed at an elevated temperature to provide a thin silicon coat, which binds the silicon fines to the larger particles. While the particles are exposed to the decomposition temperature employed, hydrogen diffuses out of the particles resulting in a reduction in hydrogen content and producing a polysilicon particle with a smooth shiny surface.
    • 在流化床中产生的自由流动的近似球形的颗粒形式的半导体级多晶硅,并具有降低的表面硅粉含量和氢含量。 这样的产品在利用流化床的两个操作中形成。 在第一操作中,硅沉积在多晶硅种子颗粒上。 在第二操作中,三氯硅烷或其它卤代硅烷在升高的温度下分解,以提供将硅细粉与较大颗粒结合的薄硅涂层。 当颗粒暴露于所用的分解温度时,氢从颗粒中扩散,导致氢含量的降低并产生具有光滑光泽表面的多晶硅颗粒。
    • 6. 发明公开
    • Preparation of polysilicon by silane pyrolysis
    • Herstellung von polykristallinem Silizium durch Pyrolyse von Silan。
    • EP0258027A2
    • 1988-03-02
    • EP87307464.5
    • 1987-08-24
    • ETHYL CORPORATION
    • Gautreaux, Marcelian FrancisAllen, Robert Hall
    • C01B33/02
    • B01J8/26C01B33/027C01B33/029Y10S117/912Y10T428/2991Y10T428/2995
    • A polysilicon process is disclosed in which the fines which are inherently produced in a fluid bed deposition type operation using silicon seed particles and a silane feed are in effect glued on to the product part­icles so as to reduce the undesirable effect of the silicon fines. The process comprises operating a fluid bed in two modes. In the first mode, high productivity is favored at the expense of producing fines which are produced by homogeneous decomposition of the silane feed. In the second mode, the fines are in effect glued on to the particles to which they are adhered by means of deposition of a thin layer of silicon. In the second mode, the concentration of the silane in the feed gases is reduced thus favoring hetergeneous deposition of the silicon on the silicon particles in the bed. The process can be operated using a single fluid bed reactor by alternating cycles or in a more continuous manner utilizing two fluid bed reactors, the first reactor being operated at the high productivity rate with the second reactor taking the silicon particles from the first reactor and operated at the gluing on conditions.
    • 公开了一种多晶硅工艺,其中在使用硅种子颗粒和硅烷进料的流化床沉积型操作中固有产生的细粒实际上胶合到产物颗粒上,以便减少硅细粉的不期望的影响。 该方法包括以两种模式操作流化床。 在第一种模式中,以生产通过硅烷进料的均匀分解产生的细粉为代价,高生产率是有利的。 在第二种模式中,通过沉积薄的硅层,细粒实际上胶合到它们所粘附的颗粒上。 在第二模式中,进料气体中硅烷的浓度降低,从而有利于硅在床中的硅颗粒上的杂质沉积。 该方法可以使用单个流化床反应器通过交替循环或以更连续的方式利用两个流化床反应器来操作,第一反应器以高生产率操作,第二反应器从第一反应器取出硅颗粒并操作 在胶合条件下。
    • 7. 发明公开
    • Polysilicon with diminished hydrogen content
    • Polysilicium mit vermindertem Wasserstoffgehalt。
    • EP0363742A1
    • 1990-04-18
    • EP89117962.4
    • 1989-09-28
    • ETHYL CORPORATION
    • Allen, Robert HallBoone, James Edward
    • C01B33/029
    • C01B33/037C01B33/029
    • The hydrogen content of polysilicon can be reduced by heat treatment. The process is preferably conducted on polysilicon particles in bead-like form produced by chemi­cal vapor deposition in a fluidized bed. The heat treat­ment is preferably conducted at a temperature of 1000-­1200°C. for a time sufficient to reduce the hydrogen content, and insufficient to cause agglomeration of the particles being treated. In order to reduce the tendency of particles to agglomerate at the process temperature employed, the particle bed is preferably maintained in motion during the dehydrogenation. The products produced by the process can have a hydrogen content of 30 ppma or less. These improved products can be used to produce monocrystalline silicon for the production of semicon­ductor devices.
    • 通过热处理可以减少多晶硅的氢含量。 该方法优选在通过化学气相沉积在流化床中产生的珠状形式的多晶硅颗粒上进行。 热处理优选在1000-1200℃的温度下进行足以降低氢含量的时间,并且不足以引起被处理颗粒的团聚。 为了降低所使用的工艺温度下颗粒聚集的倾向,优选在脱氢过程中保持颗粒床运动。 该方法生产的产品可以具有30ppma或更低的氢含量。 这些改进的产品可用于制造用于生产半导体器件的单晶硅。