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    • 1. 发明公开
    • HIGH FREQUENCY ANTENNA AND PLASMA PROCESSING DEVICE
    • EP3896717A1
    • 2021-10-20
    • EP21168282.8
    • 2021-04-14
    • EMD CorporationTomoegawa Co., Ltd.
    • EBE, AkinoriTSUDA, HajimeMORIUCHI, Hideki
    • H01J37/32H01Q1/00
    • [OBJECT]
      To provide a radio-frequency antenna through which a high amount of current can be efficiently passed even at a radio-frequency level for plasma generation, as well as a plasma processing device utilizing the radio-frequency antenna.
      [MEANS FOR SOLVING PROBLEM]
      A radio-frequency antenna (10) according to the present invention includes a metal fiber sheet. A plasma processing device according to the present invention includes: a vacuum container (21) including a wall (211) having an opening (213); a radio-frequency antenna (10) including a metal fiber sheet and located at the opening (213); and a dielectric protection plate (12) located closer to the interior of the vacuum container (21) than the radio-frequency antenna (10) and configured to close the opening (213) in a gas-tight manner. The radio-frequency antenna (10) including a metal fiber sheet has a larger surface area and an accordingly lower impedance to a radio-frequency current than a radio-frequency antenna including a metal plate having the same outer shape. Therefore, it allows a radio-frequency current commonly used for plasma generation (e.g., at a frequency of 13.56 MHz) to be more efficiently passed through in large amounts.