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1. 发明公开

EP2081912A1 HETEROCYCLIC BRIDGED BIPHENYLS AND THEIR USE IN OLEDS 有权转让
标题翻译：杂环桥联联苯和它们在有机发光二极管
公开(公告)号：EP2081912A1
公开(公告)日：2009-07-29
申请号：EP07803193.7
申请日：2007-09-04
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： WENDEBORN, Frédérique , SCHMIDHALTER, Beat , SCHÄFER, Thomas , MURER, Peter , BARDON, Kristina
IPC分类号： C07D235/18 , C07D241/42 , C07D263/56 , C07D209/58 , C07D403/14 , C07D413/14 , C07F7/10 , C07F9/53 , H01L51/30
CPC分类号： C07D235/18 , C07D209/58 , C07D241/42 , C07D263/57 , C07D403/14 , C07D413/14 , C07F9/65068 , C07F9/65324
摘要： The present invention relates electroluminescent devices, comprising a compound of the formula (I), especially as host for phosphorescent compounds. The hosts may function with phosphorescent materials to provide improved efficiency, stability, manufacturability, or spectral characteristics of electroluminescent devices.

2. 发明公开

EP1648908A1 PROCESS FOR PREPARING ACYLPHOSPHANES AND DERIVATIVES THEREOF 有权转让
标题翻译：用于生产acylphosphines及其衍生物
公开(公告)号：EP1648908A1
公开(公告)日：2006-04-26
申请号：EP04741983.3
申请日：2004-07-09
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： SOMMERLADE, Reinhard H. , BOULMA Z, Souâd , WOLF, Jean-Pierre , GEIER, Jens , GRÜTZMACHER, Hansjörg , SCHERER, Markus , SCHÖNBERG, Hartmut , STEIN, Daniel , MURER, Peter , BURKHARDT, Stephan
IPC分类号： C07F9/50
CPC分类号： C07F9/5036 , C07F9/5337
摘要： The present invention relates to a new, selective process for the preparation of mono- and bisacylphosphanes of formula (I) n and m are each independently of the other 1 or 2; R1, if n = 1, is e.g. phenyl R1, if n = 2, is e.g. C1-C18alkylene or phenylene; R2 is e. g. C1-C18alkyl, phenyl or substituted phenyl; R3 is e. g. C1-C18alkyl, by (1) reacting a phosphorous halide of formula Ila or a phosphorous halide oxide of formula (Ilb) or a phosphorous halide sulfide of formula (IIc) with an alkali metal in a solvent in the presence of a proton source; (2) subsequent reaction with m acid halides of formula (III) An oxidation step may follow to obtain mono- and bisacylphosphane oxides or mono-and bisacylphosphane sulfides.

3. 发明公开

EP1392736A2 ACID MACROMONOMERS AND THEIR METHOD OF PREPARATION 审中-公开
标题翻译： HECTELLUNG DEREN的SAUR MAKROMONOMERE
公开(公告)号：EP1392736A2
公开(公告)日：2004-03-03
申请号：EP02722115.9
申请日：2002-02-21
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MURER, Peter
IPC分类号： C08F2/38 , C08F20/04 , C08F2/50 , C08F293/00
CPC分类号： C08F8/44 , B33Y70/00 , C07C381/12 , C07F9/5428 , C08F265/02
摘要： The invention relates to a composition comprising: a) an acid monomer or oligomer of acrylic acid or of an acid derivative of acrylic acid or mixtures thereof; or a mixture of an ethylenically unsaturated monomer or oligomer and an acid monomer or oligomer of acrylic acid or of an acid derivative of acrylic acid; b) at least one radical initiator which forms a radical upon heating or upon irradiation with (UV) light in the range from 305 nm to 450 nm; and c) a compound of the formulae (Ia), (Ib) or (Ic) wherein Y represents a group that activates nucleophilic addition reactions at the adjacent double bond; X represents halogen or the anion of an aliphatic or aromatic monocarboxylic or dicarboxylic acid of 1-12 carbon atoms, of a monovalent or divalent oxo acid or of a complex acid; n represents 0 or 1; R1, R2, R3 independently of one another represent hydrogen, C1-C18alkyl, C3-C18alkyl interrupted by at least one nitrogen or oxygen atom, C3-C18 alkenyl, C3-C18alkynyl, C7-C9phenylalkyl, C3-C12cycloalkyl or C3-C12cycloalkyl containing at least one nitrogen or oxygen atom; or C1-C18alkyl, C3- C18alkyl interrupted by at least one nitrogen or oxygen atom, C3-C18 alkenyl, C3-C18alkynyl, C7-C9phenylalkyl, C3-C12cycloalkyl or C3-C12cycloalkyl containing at least one nitrogen or oxygen atom, which are substituted with at least one substituent selected from the group consisting of NO2, halogen, amino, hydroxy, cyano, carboxy, C1-C4alkoxy, C1-C4 alkylthio, C1-C4alkylamino, di(C1-C4alkyl)amino and-O-C(=0)-C1C18alkyl; or phenyl or naphthyl or phenyl and naphtyl substituted with at least one substituent selected from the group consisting of C1-C4alkyl, C1-C4alkoxy, C1-C4alkylthio, halogen, cyano, hydroxy, carboxy, C1-C4alkylamino and di)C1-C4alkyl)amino; or R1 and R2 together with the linking N, P or S-heteroatoms form a C3-C12 heterocycloalkyl radical; or R1 and R2 together form the groups: (Id); or (Ie); or R1, R2 and R3 together form the groups (If) or (Ig). The invention relates also to acid macromomers and to their method of preparation by radically initiated polymerisation.
摘要翻译：本发明涉及一种组合物，其包含：a）酸性单体或丙烯酸或丙烯酸的酸衍生物或其混合物的低聚物; 或烯属不饱和单体或低聚物的混合物和丙烯酸或丙烯酸的酸衍生物的酸单体或低聚物; b）至少一种自由基引发剂，其在加热或在305nm至450nm范围内的（UV）光照射时形成基团; 和c）式（I），（Ib）或（Ic）的化合物，其中Y表示在相邻双键处活化亲核加成反应的基团; X表示一价或二价含氧酸或络合酸的卤素或1-12个碳原子的脂族或芳族单羧酸或二羧酸的阴离子; n表示0或1; R 1，R 2，R 3和R 3彼此独立地表示氢，C 1 -C 1 - C 1 -C 18烷基，C 3 -C 18烷基，被至少一个氮或氧原子间隔，C 3 -C 3 C 18链烯基，C 3 -C 18炔基，C 7 -C 9苯基烷基，C 1 -C 6烷基，含有至少一个氮原子或氧原子的C 3 -C 12环烷基和C 3 -C 12 -C 12环烷基，其被至少一个选自下列的取代基取代：NO 2，卤素，氨基，羟基，氰基，羧基，C 1 -C 4烷基，烷氧基，C 1 -C 4烷硫基，C 1 -C 4烷基氨基，二（C

4. 发明授权

EP1648908B1 PROCESS FOR PREPARING ACYLPHOSPHANES AND DERIVATIVES THEREOF 有权转让
标题翻译：制备酰基膦的方法及其衍生物
公开(公告)号：EP1648908B1
公开(公告)日：2006-10-18
申请号：EP04741983.3
申请日：2004-07-09
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： SOMMERLADE, Reinhard H. , BOULMAAZ, Souâd , WOLF, Jean-Pierre , GEIER, Jens , GRÜTZMACHER, Hansjörg , SCHERER, Markus , SCHÖNBERG, Hartmut , STEIN, Daniel , MURER, Peter , BURKHARDT, Stephan
IPC分类号： C07F9/50
CPC分类号： C07F9/5036 , C07F9/5337
摘要： The present invention relates to a new, selective process for the preparation of mono- and bisacylphosphanes of formula (I) n and m are each independently of the other 1 or 2; R1, if n = 1, is e.g. phenyl R1, if n = 2, is e.g. C1-C18alkylene or phenylene; R2 is e. g. C1-C18alkyl, phenyl or substituted phenyl; R3 is e. g. C1-C18alkyl, by (1) reacting a phosphorous halide of formula Ila or a phosphorous halide oxide of formula (Ilb) or a phosphorous halide sulfide of formula (IIc) with an alkali metal in a solvent in the presence of a proton source; (2) subsequent reaction with m acid halides of formula (III) An oxidation step may follow to obtain mono- and bisacylphosphane oxides or mono-and bisacylphosphane sulfides.
摘要翻译：本发明涉及用于制备式（I）的单酰基膦和双酰基磷酰基的新的选择性方法，其中n和m各自独立地为1或2; 如果n = 1，则R1是例如如果n = 2，则苯基R 1是例如 C1-C18亚烷基或亚苯基; R2是e。 G。 C1-C18烷基，苯基或取代的苯基; R3是e。 G。（1）在质子源存在下，使式IIa的卤化磷或式（IIb）的卤化磷氧化物或式（IIc）的卤化磷硫化物与碱金属在溶剂中反应; （2）随后与式（III）的m个酰卤反应可以进行氧化步骤以获得单 - 和双酰基磷烷氧化物或单 - 和双酰基磷烷硫化物。

5. 发明公开

EP1814891A1 PROCESS FOR PREPARING ACYLPHOSPHANES AND DERIVATIVES THEREOF 有权转让
标题翻译：酰基磷烷及其作为光引发剂，用于生产ACYLPHOSPHANEN
公开(公告)号：EP1814891A1
公开(公告)日：2007-08-08
申请号：EP05817544.9
申请日：2005-11-14
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MURER, Peter , WOLF, Jean-Pierre , BURKHARDT, Stephan , GRÜTZMACHER, Hansjörg , STEIN, Daniel , DIETLIKER, Kurt
IPC分类号： C07F9/50
CPC分类号： G03F7/029 , C07F9/5036 , C07F9/5337 , C07F9/5537 , C07F9/65515 , C07F9/6552
摘要： The invention relates to a process for the preparation of (bis)acylphosphanes of formula I, wherein n and m are each independently of the other 1 or 2; R1 if n = 1 , is e.g. unsubstituted or substituted C1-C18alkyl or C2-C18alkenyl, or phenyl, R1 if n = 2, is e.g. a divalent radical of the monovalent radical defined above; R2 is e.g. C1-C18alkyl, C3-C12cycloalkyl, C2-C18alkenyl, mesityl, phenyl, naphthyl; R3 is one of the radicals defined under R1; the process comprises the steps a) contacting e.g. elemental phosphorous [P]∞, P(Hal)3 with a reducing metal optionally in the presence of a catalyst or an activator in a solvent to obtain metal phosphides Me3P or Me'3P2, wherein Me is an alkali metal and Me' is an earth alkali metal or to obtain metal polyphosphides b) optionally adding a proton source, optionally in the presence of a catalyst or an activator to obtain metal dihydrogen phosphides MePH2; c) subsequent acylation reaction with m acid halides of formula III or m carboxylic acid esters of formula IV or, in case that in formula I m = 1, with one carboxylic ester of formula IV followed by one acid halide of formula III or vice versa, wherein R is the residue of an alcohol and R2 is as defined above; d) alkylation reaction subsequent reaction with an electrophilic agent R1Hal or other electrophilic agents to obtain the compounds of formula I. An oxidation step may follow to obtain mono- and bisacylphosphane oxides or mono- and bisacylphosphane sulfides, which are used as photoinitiators.

6. 发明授权

EP1392675B1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译：国际海运联合会副主席
公开(公告)号：EP1392675B1
公开(公告)日：2005-02-09
申请号：EP02732733.7
申请日：2002-05-23
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20 , C07C309/66 , C07C309/73 , C07C215/62 , G03F7/004
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R'6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.
摘要翻译：式（I）和（II）的新的肟磺酸酯化合物，其中R 1是C 1 -C 12烷基，C _{-C _{12 烷氧基; R 2，R 3，R 4和R 5是例如氢或C 1， / SUB> -C _{12 烷基; R 6是例如C 1 -C 18烷基磺酰基，苯基-C 1 -C 1 - 3烷基磺酰基或苯基磺酰基; R 6'是例如亚苯基二磺酰基或二苯基二磺酰基; R 7，R 8和R 9例如是氢或C 1 -C 6烷基， / SUB>烷基; R 10和R 11是例如氢或C 1 -C 18烷基; R 12是例如氢，苯基或C 1 -C 18烷基; A是S，O，NR 13或式A1，A2或A3的基团，R 21和R 22彼此独立地具有对R给出的含义之一 _{7 ; R 23，R 24，R 25和R 26彼此独立地是例如氢，C 1 -C 6烷基， C 1 -C 4烷基，卤素或苯基; Z是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CR 22或N; 并且Z 1是CH 2，S，O或NR 13特别适合作为抗蚀剂应用中的光潜伏酸。}}}}

7. 发明公开

EP1858976A1 NOVEL POLYMERS 有权转让
标题翻译：高分子新材料
公开(公告)号：EP1858976A1
公开(公告)日：2007-11-28
申请号：EP06708681.9
申请日：2006-03-08
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： SCHÄFER, Thomas , HINTERMANN, Tobias , SCHMIDHALTER, Beat , BARDON, Kristina , MURER, Peter
IPC分类号： C08L65/00 , C07C211/00
CPC分类号： H01L51/0035 , C08G61/12 , C08G61/122 , C08G61/124 , C08G61/125 , C08G61/126 , H01L51/5012 , Y02E10/549
摘要： The present invention relates to polymers comprising a repeating unit of the formula (I), and their use in electronic devices. The polymers according to the invention have excellent 5 solubility in organic solvents and excellent film-forming properties. In addition, high charge carrier mobilities and high temperature stability of the emission color are observed, if the polymers according to the invention are used in polymer light emitting diodes (PLEDs).

8. 发明公开

EP1595182A2 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译： HALOGENIER OXIM-DERIVATE UND IHRE VERWENDUNG ALS LATENTESÄUREN
公开(公告)号：EP1595182A2
公开(公告)日：2005-11-16
申请号：EP04709242.4
申请日：2004-02-09
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： YAMATO, Hitoshi , ASAKURA, Toshikage , MATSUMOTO, Akira , MURER, Peter , HINTERMANN, Tobias
IPC分类号： G03F7/004 , C07C317/04 , C07C251/32
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula (I) or (II) wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D1-D-phenylene or -A r'1-A1-Y1-A1-A r'1-; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for exampfe a direct bond, -0-, -S-, or -NR6-; Y, inter alia is C1-C18alkylene; X is halogen; D is for example -0-, -S- or -NR6-; D, inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译：式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-亚苯基或-Ar“1-A1-Y1-A1-Ar” 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部任意取代; A1例如是直接键，-O - ， - S-或-NR 6 - ; Y1尤其是C1-C18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。

9. 发明公开

EP1472576A2 SULFONATE DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 有权
标题翻译： SUVFONAT-DERIVATE UND IHRE VERWENDUNG ALS LATENTESÄURE
公开(公告)号：EP1472576A2
公开(公告)日：2004-11-03
申请号：EP03704479.9
申请日：2003-01-28
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MATSUMOTO, Akira, , YAMATO, Hitoshi , ASAKURA, Toshikage,4-16-46, Minoo , MURER, Peter
IPC分类号： G03F7/004 , C07D291/00 , C07C301/00
CPC分类号： G03F7/0037 , B33Y70/00 , C07C323/66 , C07C381/00 , G03F7/001 , G03F7/0045 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0758 , Y10S430/114
摘要： Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva), (Ivb), (Va), (Vb) or (VIa), wherein n is 1 or 2; m is 0 or 1; X0 is -[CH2]h-X or -CH=CH2; h is 2, 3, 4, 5 or 6; R1 when n is 1, is for example optionally substituted phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl; R1, when n is 2, is for example optionally substituted phenylene or naphthylene; R2 for example has one of the meanings of R1; X is for example -OR20, -NR21R22, -SR23; X' is -X1-A3-X2-; X1 and X2 are for example -O-, -S- or a direct bond; A3 is e.g. phenylene; R3 has for example one of the meanings given for R1; R4 has for example one of the meaning given for R2; R5 and R6 e.g. are hydrogen; G i.a. is -S- or -O-; R7 when n is 1, e.g. is phenyl, optionally substituted, when n is 2, is for example phenylene; R8 and R9 e.g. are C1-C18alkyl; R10 has one of the meanings given for R7; R11 i.a. is C1-C18alkyl; R12, R13, R14, R15 R16, R17 and R18 for example are hydrogen or C1-C18alkyl; R20, R21, R22 and R23 i.a. are phenyl or C1-C18alkyl; give high resolution with good resist profile.
摘要翻译：化学扩增的光致抗蚀剂组合物，其包含（a）在酸的作用下固化的化合物或其在酸的作用下溶解度增加的化合物; 和（b）式（Ia），（Ib），（IIa），（IIb），（IIIa），（IIIb），（Iva），（Ivb），（Va），（Vb） VIa），其中n为1或2; m为0或1; X 是 - [CH 2] n -X或-CH-CH 2; h为2,3,4,5或6; 当n为1时，R 1为例如任选取代的苯基，萘基，蒽基，菲基或杂芳基; 当n为2时，R 1为例如任选取代的亚苯基或亚萘基; R 2例如具有R 1的含义之一; X是例如-OR 20，-NR 21 R 22，-SR 23; X'是-X 1 -X 3 -X 2 -X 2。 X 1和X 2是例如-O - ， - S-或直接键; A 3是例如。苯; R 3具有例如R 1中给出的含义之一; R 4具有例如R 2 2给出的含义之一; R 5和R 6，例如，是氢; a. a. 是-S-或-O-; 当n为1时，R 7为例如。当n为2时任选被取代的苯基是例如亚苯基; R 8和R 9，例如，是C 1 -C 18烷基; R 10具有R 7给出的含义之一; R 11 i.a。是C 1 -C 18烷基; R 12，R 13，R 14，R 15，R 16，R 15，例如，R 17和R 18是氢或C 1 -C 18烷基; R 20，R 21，R 22和R 23是苯基或C 1〜 SUB> -C _{18 烷基; 给出高分辨率和良好的光刻胶}

10. 发明公开

EP1392675A1 SUBSTITUTED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS 有权
标题翻译：取代肟衍生物及其作为递延ACIDS
公开(公告)号：EP1392675A1
公开(公告)日：2004-03-03
申请号：EP02732733.7
申请日：2002-05-23
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MATSUMOTO, Akira , YAMATO, Hitoshi , ASAKURA, Toshikage , OHWA, Masaki , MURER, Peter
IPC分类号： C07D333/20 , C07C309/66 , C07C309/73 , C07C215/62 , G03F7/004
CPC分类号： G03F7/0045 , B33Y70/00 , C07C309/00 , C07D333/36 , G03F7/0007 , G03F7/001 , G03F7/0382 , G03F7/0392 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1-C4haloalkyl, hydrogen, OR9, NR10R11, SR12 or is phenyl which is unsubstituted or substituted by OH, C1-C18alkyl, halogen and/or C1-C12alkoxy; R2, R3, R4 and R5 are for example hydrogen or C1-C12alkyl; R6 is for example is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl or phenylsulfonyl; R'6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R7, R8 and R9 for example are hydrogen or C1-C6alkyl; R10 and R11, are for example hydrogen or C1-C18alkyl; R12 is for example hydrogen, phenyl or C1-C18alkyl; A is S, O, NR13, or a group of formula A1, A2 or A3, R21 and R22 independently of one other have one of the meanings given for R7; R23, R24, R25 and R26 independently of one another are for example hydrogen, C1-C4alkyl, halogen or phenyl; Z is CR22 or N; and Z1 is CR22 or N; and Z1 is CR22 or N; and Z1 is CH2-, S, O or NR13 are particularly suitable as photo-latent acids in resist applications.

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