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1. 发明公开

EP1582924A3 Processing apparatus 有权
标题翻译：处理装置
公开(公告)号：EP1582924A3
公开(公告)日：2009-11-11
申请号：EP05006760.2
申请日：2005-03-29
申请人： CANON KABUSHIKI KAISHA
发明人： Kasumi, Kazuyuki , Ota, Hirohisa , Kawakami, Eigo , Nakamura, Takashi , Tokita, Toshinobu
IPC分类号： G03F7/00
CPC分类号： B29C43/021 , B29C43/003 , B29C43/04 , B29C43/14 , B29C2043/025 , B29C2043/142 , B29C2043/3438 , B29C2043/3634 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and a recovery unit for recovering the resist.

2. 发明公开

EP1605308A2 Apparatus 有权
标题翻译： Vorrichtung und Verfahren zurÜbertragungeines Musters
公开(公告)号：EP1605308A2
公开(公告)日：2005-12-14
申请号：EP05012232.4
申请日：2005-06-07
申请人： CANON KABUSHIKI KAISHA
发明人： Kawakami, Eigo , Ota, Hirohisa , Nakamura, Takashi , Kasumi, Kazuyuki , Tokita, Toshinobu
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.
摘要翻译：一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的凸版图案转移到基板上的抗蚀剂上，以及将抗蚀剂暴露于抗蚀剂上的光的照射包括：用于保持模具并压缩的模具卡盘抵抗抗蚀剂的模具，以及用于当模具卡盘向模具施加压缩力时减小模具的变形的变形减小部件。

3. 发明授权

EP0646913B1 Encoder using the tunnel current effect 失效
标题翻译：编码器使用隧道电流效应
公开(公告)号：EP0646913B1
公开(公告)日：1999-01-13
申请号：EP94120561.9
申请日：1988-08-24
申请人： CANON KABUSHIKI KAISHA
发明人： Yanagisawa, Yoshihiro , Morikawa, Yuko , Matsuda, Hiroshi , Kawada, Haruki , Sakai, Kunihiro , Kawade, Hisaaki , Eguchi, Ken , Kawakami, Eigo , Kawase, Toshimitsu , Yoshii, Minoru , Saitoh, Kenji , Yamano,Akihiko , Nose, Hiroyasu
IPC分类号： G11B9/00 , G01N27/00 , G01B7/00
CPC分类号： G01D5/244 , B82Y10/00 , G01B7/003 , G01D5/2451 , G01Q10/06 , G01Q60/16 , G01Q80/00 , G11B9/1418 , G11B9/1427 , G11B9/1472 , G11B9/1481 , Y10S977/851 , Y10S977/861 , Y10S977/947

4. 发明授权

EP0358467B1 Exposure apparatus and control of the same 失效
标题翻译：曝光装置及其控制
公开(公告)号：EP0358467B1
公开(公告)日：1996-02-07
申请号：EP89308998.7
申请日：1989-09-06
申请人： CANON KABUSHIKI KAISHA
发明人： Kawakami, Eigo , Ozawa, Kunitaka , Uda, Koji , Shimoda, Isamu , Uzawa, Shunichi
IPC分类号： G03F7/20 , G03F9/00 , H01L21/00
CPC分类号： G03F7/7075 , G03F7/709

5. 发明公开

EP0361934A2 Exposure method 失效
标题翻译：曝光方法
公开(公告)号：EP0361934A2
公开(公告)日：1990-04-04
申请号：EP89309915.0
申请日：1989-09-28
申请人： CANON KABUSHIKI KAISHA
发明人： Ohta, Hirohisa , Ozawa, Kunitaka , Kawakami, Eigo , Uzawa, Shunichi
IPC分类号： G03F7/20
CPC分类号： G03F9/7023 , G03F7/201
摘要： An exposure method wherein a mask (8) and a semiconductor wafer (1) are disposed opposed to each other in a close proximity relation in respect to Z-axis direction and wherein a pattern of the mask is printed on each of different shot areas of the semiconductor wafer in a step-and-repeat manner, with a predetermined exposure energy, is disclosed. In this method, the spacing between the mask and the wafer for the paralleling of them is made larger than the spacing therebetween as assumed at the time of mask-to-wafer alignment in respect to X-Y plane or the spacing between the mask and the wafer as assumed at the time of exposure of the wafer to the mask. After the paralleling of the mask and the wafer, the mask and the wafer are relatively moved closer to each other in the Z-axis direction and the alignment and exposure is performed. This ensures that the alignment and exposure is effected at an optimum spacing while, on the other hand, contact of the mask and the wafer at the time of paralleling is precluded.
摘要翻译：一种曝光方法，其中掩模（8）和半导体晶片（1）相对于Z轴方向以彼此靠得很近的关系设置，并且其中掩模的图案被印刷在每个不同的拍摄区域上公开了具有预定曝光能量的分步重复方式的半导体晶片。在该方法中，掩模和晶片之间的并联间距大于它们之间的间隔，如假设在掩模与晶片对准时相对于XY平面或掩模与晶片之间的间隔如在将晶片暴露于掩模时所假定的那样。在掩模和晶片平行之后，掩模和晶片在Z轴方向上相对地移动得更接近并且执行对准和曝光。这确保了对准和曝光以最佳的间隔进行，而另一方面避免了并联时掩模和晶片的接触。

6. 发明授权

EP0361934B1 Exposure method 失效
标题翻译： Belichtungsverfahren
公开(公告)号：EP0361934B1
公开(公告)日：1998-11-25
申请号：EP89309915.0
申请日：1989-09-28
申请人： CANON KABUSHIKI KAISHA
发明人： Ohta, Hirohisa , Ozawa, Kunitaka , Kawakami, Eigo , Uzawa, Shunichi
IPC分类号： G03F7/20
CPC分类号： G03F9/7023 , G03F7/201

7. 发明授权

EP0341983B1 Exposure system 失效
标题翻译：曝光系统
公开(公告)号：EP0341983B1
公开(公告)日：1997-09-03
申请号：EP89304684.7
申请日：1989-05-09
申请人： CANON KABUSHIKI KAISHA
发明人： Kawakami, Eigo , Yoshii, Minoru , Uzawa, Shunichi
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/702

8. 发明授权

EP0309236B1 Microprobe, preparation thereof and electronic device by use of said microprobe 失效
标题翻译：探针，其制备方法及电子设备使用这些探针。
公开(公告)号：EP0309236B1
公开(公告)日：1994-07-06
申请号：EP88308780.1
申请日：1988-09-21
申请人： CANON KABUSHIKI KAISHA
发明人： Kawade, Hisaaki , Kawada, Haruki , Sakai, Kunihiro , Matsuda, Hiroshi , Morikawa, Yoko , Yanagisawa, Yoshihiro , Kaneko, Tetsuya , Kawase, Toshimitsu , Kumomi, Hideya , Nose, Hiroyasu , Kawakami, Eigo
IPC分类号： G01N27/00
CPC分类号： G01Q60/16 , G01Q70/10 , G01Q80/00 , Y10S977/878 , Y10S977/879

9. 发明公开

EP0309236A3 Microprobe, preparation thereof and electronic device by use of said microprobe 失效
标题翻译：麦芽糖，其制备方法和电子装置的使用麦克风
公开(公告)号：EP0309236A3
公开(公告)日：1992-07-01
申请号：EP88308780.1
申请日：1988-09-21
申请人： CANON KABUSHIKI KAISHA
发明人： Kawade, Hisaaki , Kawada, Haruki , Sakai, Kunihiro , Matsuda, Hiroshi , Morikawa, Yoko , Yanagisawa, Yoshihiro , Kaneko, Tetsuya , Kawase, Toshimitsu , Kumomi, Hideya , Nose, Hiroyasu , Kawakami, Eigo
IPC分类号： G01N27/00
CPC分类号： G01Q60/16 , G01Q70/10 , G01Q80/00 , Y10S977/878 , Y10S977/879
摘要： A microprobe (4) is provided which comprises a single crystal provided on a part of one main surface of a substrate or a part of a thin film (2) formed on one main surface of the substrate (1). The microprobe may have a single crystal having an apex portion (5) surrounded by facets having a specific plane direction and comprising a specific crystal face. The method for preparing the microprobe and an electronic device employing the microprobe also provided which is useful for recording and reproducing.

10. 发明公开

EP0358467A3 Exposure apparatus and control of the same 失效
标题翻译：曝光装置及其控制
公开(公告)号：EP0358467A3
公开(公告)日：1990-10-03
申请号：EP89308998.7
申请日：1989-09-06
申请人： CANON KABUSHIKI KAISHA
发明人： Kawakami, Eigo , Ozawa, Kunitaka , Uda, Koji , Shimoda, Isamu , Uzawa, Shunichi
IPC分类号： G03F7/20 , G03F9/00 , H01L21/00
CPC分类号： G03F7/7075 , G03F7/709
摘要： Exposure apparatus and control of the same, for exposing a semiconductor wafer to a mask with a predetermined radiation energy, for manufacture of semiconductor devices, is disclosed. During a time period in which the mask-to-wafer alignment or the exposure of the wafer to the mask is made, the operation of any other driving device that has no participation of the aligning operation or the exposure operation, is prohibited. This ensured high-precision pattern printing.

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