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1. 发明公开

EP4411476A1 EXPOSURE UNIT WITH IMPROVED LIGHT INTENSITY UNIFORMNESS FOR EXPOSING A RELIEF PLATE PRECURSOR 审中-公开
公开(公告)号：EP4411476A1
公开(公告)日：2024-08-07
申请号：EP24155747.9
申请日：2024-02-05
申请人： XSYS Prepress NV
发明人： WATTYN, Bart Marc Luc , DE RAUW, Dirk Ludo Julien
IPC分类号： G03F7/00 , F21V8/00 , G03F7/20 , G03F7/24
CPC分类号： G03F7/2004 , G03F7/201 , G03F7/24 , G03F7/202 , G03F7/2008 , G03F7/70558
摘要： Exposure unit (10) for exposing a relief plate precursor, said exposure unit (10) comprising: a support structure (12) with a support surface (14) configured for supporting a relief plate precursor; a plurality of UV light sources (16) arranged next to each other and configured to emit UV light to a side of the relief plate precursor, said plurality of UV light sources (16) covering a light source area (LA) parallel to the support surface (14); and a light adjustment structure (20) configured to block and/or reflect a portion of the light emitted by the plurality of UV light sources (16) so as to render a light intensity measured in the support surface (14) more uniform as compared to a situation without the light adjustment structure (20); wherein the light adjustment structure (20) is arranged at least partially between the light source area (LA) and the support surface (14).

2. 发明公开

EP4381349A1 PROCÉDÉ DE FABRICATION D'UN COMPOSANT HORLOGER 审中-实审
公开(公告)号：EP4381349A1
公开(公告)日：2024-06-12
申请号：EP22758446.3
申请日：2022-07-28
申请人： ROLEX SA
发明人： CALAME, Florian , MULTONE, Xavier
IPC分类号： G03F7/20 , G04B13/02 , G04B15/14 , G04B19/04 , G04D3/00 , C25D1/10
CPC分类号： G04B13/02 , G04B15/14 , G04B19/042 , G04D3/0046 , G03F7/201 , C25D1/003

3. 发明授权

EP3101477B1 LIGHT-CURING TYPE 3D PRINTING DEVICE AND IMAGE EXPOSURE SYSTEM THEREOF 有权
公开(公告)号：EP3101477B1
公开(公告)日：2018-12-05
申请号：EP14880796.9
申请日：2014-10-16
申请人： Prismlab China Ltd.
发明人： HOU, Feng
IPC分类号： G03F7/20 , B29C67/00 , G03F7/00
CPC分类号： G03F7/702 , B29C64/129 , B29C64/20 , B33Y30/00 , G03F7/0037 , G03F7/201 , G03F7/70416
摘要： An image exposure system of a 3D printing device comprises: a spatial light modulator (206), a light source (201), a projection lens (208), a micro-displacement driving mechanism and a controller. The spatial light modulator (206) is provided with a plurality of micromirrors (311) for adjusting the reflective direction of light illuminating the micromirrors according to a control signal, wherein each micro mirror (311) is a concave mirror for converging the light illuminating the micromirror to create a micro light spot of which the size is smaller than a pixel size corresponding to the micromirror (311); the light source (201) generates a light beam illuminating the spatial light modulator (206); the projection lens (208) is aligned with a first direction of the spatial light modulator (206) so that a micro light spot array formed through the micromirror (311) by the light source (201) is projected onto the surface of a light-sensitive material; the micro-displacement driving mechanism is connected with the spatial light modulator (206), and can drive the spatial light modulator to move in third and fourth directions that are perpendicular to each other, in order to finely adjust the position on the surface of the light-sensitive material onto which the micro light spot array is projected; and the controller is used for instructing the light source to perform multiple exposures, and also instructing the micro-displacement driving mechanism to move upon every exposure, in order to project the micro light spot arrays of the various exposures onto different positions on the surface of the light-sensitive material.

4. 发明授权

EP2124104B1 Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope 有权
标题翻译：使用光隧道具有镜像壁和一个多边形横截面像一个万花筒光固化印刷板的固化
公开(公告)号：EP2124104B1
公开(公告)日：2016-07-13
申请号：EP09161039.4
申请日：2009-05-25
申请人： Esko-Graphics Imaging GmbH
发明人： Sievers, Wolfgang
IPC分类号： G03F7/20
CPC分类号： G03F7/2051 , G03F7/2008 , G03F7/201 , G03F7/2012 , G03F7/2057 , G03F7/24

5. 发明公开

EP0990239A1 A METHOD AND APPARATUS FOR MAKING LARGE AREA TWO-DIMENSIONAL GRIDS 失效
标题翻译：一种方法和生产的大平面的二维网格的VORICHTUNG
公开(公告)号：EP0990239A1
公开(公告)日：2000-04-05
申请号：EP98930469.6
申请日：1998-06-19
申请人： Creatv Microtech, Inc.
发明人： TANG, Cha-Mei
IPC分类号： G21K1/00
CPC分类号： G03F7/0007 , G03F7/201 , G21K1/025
摘要： Disclosed are methods for making large area antiscatter grids consisting of focussed and unfocussed holes in sheets of metal. The grid consists of thin metal walls (30) surrounding hollow openings (31). The projections of all walls converge to a focal spot in the focussed grid, and are parallel in an unfocussed grid. A grid having a large area is made by interlocking together smaller grid pieces. A tall device is made by stacking layers of focussed grids. The openings of the grid can be filled with phosphor or other scintillating material (33) to make an integrated grid/scintillator structure.

6. 发明公开

EP0967524A3 Projection exposure method and apparatus 失效
标题翻译：用于投影曝光方法和设备
公开(公告)号：EP0967524A3
公开(公告)日：2000-01-05
申请号：EP99203179.9
申请日：1991-11-15
申请人： Nikon Corporation
发明人： Shiraishi, Naomasa
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G03F9/7088 , G03F7/201 , G03F7/70066 , G03F7/70108 , G03F7/70141 , G03F7/70158 , G03F7/70208 , G03F7/70316 , G03F7/70333 , G03F7/70358
摘要： A projection exposure apparatus consists of: an illumination optical system, including a light source (1), for irradiating a mask (27); a projection optical system (29) for projecting a hyperfine pattern image on a substrate (31); an optical integrator (7) for illuminating the mask in a homogeneous illuminance distribution; and a luminous flux distributing member (12) for distributing the luminous fluxes from the integrator into two luminous fluxes (L4,L5) in two different directions for focusing intensity distributions over the Fourier transform surface or the surface in the vicinity thereof on two portions part from the optical axis of the illumination optical system. An exposure method of exposing the mask patterns (28) onto an exposed member (30) comprises: a step of starting the exposure when setting a movable optical member in a first position; a step of switching the movable optical member from the first position to a second position; a step of shielding the illumination light during the switching process; and a step of finishing the irradiation of the mask with the luminous fluxes when an exposure quantity reaches a preset value.

7. 发明公开

EP0967524A2 Projection exposure method and apparatus 失效
标题翻译： Verfahren und Vorrichtung zur Projektionsbelichtung
公开(公告)号：EP0967524A2
公开(公告)日：1999-12-29
申请号：EP99203179.9
申请日：1991-11-15
申请人： Nikon Corporation
发明人： Shiraishi, Naomasa
IPC分类号： G03F7/20 , G02B27/00
CPC分类号： G03F9/7088 , G03F7/201 , G03F7/70066 , G03F7/70108 , G03F7/70141 , G03F7/70158 , G03F7/70208 , G03F7/70316 , G03F7/70333 , G03F7/70358
摘要： A projection exposure apparatus consists of: an illumination optical system, including a light source, for irradiating a mask; a projection optical system for projecting a hyperfine pattern image on a substrate; an optical integrator for illuminating the mask in a homogeneous illuminance distribution; and a luminous flux distributing member for distributing the luminous fluxes from the integrator into two luminous fluxes in two different directions for focusing intensity distributions over the Fourier transform surface or the surface in the vicinity thereof on two portions part from the optical axis of the illumination optical system.
An exposure method of exposing the mask patterns onto an exposed member comprises: a step of starting the exposure when setting a movable optical member in a first position; a step of switching the movable optical member from the first position to a second position; a step of shielding the illumination light during the switching process; and a step of finishing the irradiation of the mask with the luminous fluxes when an exposure quantity reaches a preset value.
摘要翻译：投影曝光装置包括：照明光学系统，包括用于照射掩模（27）的光源（1）; 投影光学系统（29），用于将超精细图案图像投影在基板（31）上; 用于在均匀的照度分布中照亮所述掩模的光学积分器（7）; 以及光束分配构件（12），用于将两个部分上的傅里叶变换表面或其附近的聚焦强度分布在两个不同方向上分布成从积分器的光通量到两个光束（L4，L5）从照明光学系统的光轴。将掩模图案（28）暴露在暴露部件（30）上的曝光方法包括：将可动光学部件设置在第一位置时开始曝光的步骤; 将可动光学构件从第一位置切换到第二位置的步骤; 在切换过程中屏蔽照明光的步骤; 以及当曝光量达到预设值时完成具有光通量的掩模的照射的步骤。

8. 发明公开

EP0909987A1 Photolithographic processing method and apparatus 失效
标题翻译：光刻处理方法和装置
公开(公告)号：EP0909987A1
公开(公告)日：1999-04-21
申请号：EP98124749.7
申请日：1991-09-25
申请人： CANON KABUSHIKI KAISHA
发明人： Komatsu, Toshiyuki , Sato, Yasue , Kawate, Shin-Ichi
IPC分类号： G03F7/004
CPC分类号： H01L21/02071 , C23C16/047 , G03F1/68 , G03F7/00 , G03F7/0035 , G03F7/0042 , G03F7/2002 , G03F7/201 , G03F7/2022 , G03F7/2043 , G03F7/2053 , G03F7/265 , G03F7/36 , G03F7/38 , G03F7/7005 , G03F7/70841 , G03F7/70866 , G03F7/70875 , G03F7/70991 , H01L21/033 , H01L21/0332 , H01L21/0337 , H01L21/28556 , H01L21/28562 , H01L21/3086 , H01L21/31116 , H01L21/31144 , H01L21/31662 , H01L21/31683 , H01L21/32 , H01L21/321 , H01L21/32139
摘要： The present invention provides a processing method which comprises the steps of subjecting in a modifying gas atmosphere the surface of a substrate (60) to selective irradiation with light that has an energy greater than a binding energy of a compound constituting said surface of the substrate and is capable of reducing said compound, to form on said surface of the substrate a surface-modified layer having a pattern structure constituted of a reduced product; and etching the surface-unmodified layer using said surface-modified layer as a protective film. Furthermore, the present invention provides a processing apparatus which comprises a surface photo-processing zone comprising a first reaction vessel (606), a light guiding means (610) and an evacuating means (603b); and an etching zone comprising a second reaction vessel (613), a reactive gas feeding means (605c) and an energy supplying means (614).
摘要翻译：本发明提供了一种处理方法，该方法包括以下步骤：在改性气氛中对衬底（60）的表面进行选择性照射，所述光的能量大于构成所述衬底表面的化合物的结合能，能够还原所述化合物，以在所述基底的所述表面上形成具有由还原产物构成的图案结构的表面改性层; 以及使用所述表面改性层作为保护膜来蚀刻表面未改性层。此外，本发明提供了一种处理装置，其包括：包括第一反应容器（606），光导装置（610）和抽空装置（603b）的表面光处理区; 以及包括第二反应容器（613），反应气体供给装置（605c）和能量供给装置（614）的蚀刻区域。

9. 发明授权

EP0560310B1 Method for the manufacture of high-quality total internal reflection holograms 失效
标题翻译：一种用于制造高品质的全内反射全息图的方法
公开(公告)号：EP0560310B1
公开(公告)日：1998-06-10
申请号：EP93103807.9
申请日：1993-03-10
申请人： HOLTRONIC TECHNOLOGIES LTD.
发明人： Clube, Francis Stace Murray
IPC分类号： G03H1/26 , G03F7/20 , G03H1/00
CPC分类号： G03F7/70425 , G03F7/201 , G03F7/70475 , G03H1/00 , G03H1/26

10. 发明公开

EP3362855A1 MICROSTRUCTURE PATTERNS 有权转让
公开(公告)号：EP3362855A1
公开(公告)日：2018-08-22
申请号：EP16854644.8
申请日：2016-10-13
申请人： Micro Tau IP Pty Ltd
发明人： BILINSKY, Henry Claudius
IPC分类号： G03F7/00 , B05D5/00 , C09D133/00 , C09D175/04 , G03F7/038 , G03F7/039 , G03F7/26 , G03F1/00
CPC分类号： G03F7/038 , B64G1/22 , C09D133/00 , G03F7/201 , G03F7/24 , G03F7/30
摘要： In one aspect, there is provided a method of creating a microstructure pattern on an exterior surface of an aircraft, boat, automobile or other vehicle is disclosed. A layer of photopolymer (44) is applied to the top coat or substrate (43) by nozzles (45). The photopolymer is selectively irradiated to activate its photoinitiator and the unirradiated polymer is removed. The irradiation can be via a mask (49) which does not come into contact with the polymer, or via a beam splitting arrangement (63, 64) or a diffraction grating (71). The pattern can be formed by either leaving the exposed photopolymer in situ, or using the exposed photopolymer to mask the substrate, etching the substrate, and then removing the exposed photopolymer. In another aspect, there is provided a method 1100 comprising the step 1102 of applying a layer of photocurable material to the exterior surface, the step 1104 of irradiating the photocurable material with radiation including a predetermined irradiation intensity profile, and the step 1106 of removing uncured photocurable material to form the microstructure pattern. The radiation initiates curing of the irradiated photocurable material, causing a curing depth profile across the layer of the photocurable material corresponding to the selected intensity pro file.

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