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1. 发明授权

EP1835345B1 Photosensitive silane coupling agent, method of modifying surface, method of forming a microparticle pattern, and uses of the silane coupling agent 有权
标题翻译：感光硅烷偶联剂，用于形成微粒图案和所述硅烷偶联剂的使用的表面改性方法的工艺
公开(公告)号：EP1835345B1
公开(公告)日：2014-07-16
申请号：EP07102685.0
申请日：2007-02-20
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki , Mizutani, Natsuhiko , Yamaguchi, Takako , Inao, Yasuhisa
IPC分类号： C07F7/12 , C07F7/18 , G03F7/022 , G03F7/16 , G03F7/075
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1836 , G03F7/022 , G03F7/0751 , G03F7/165

2. 发明公开

EP2243622A2 Method for producing optical part 审中-公开
标题翻译：赫尔斯特朗·赫斯特伦
公开(公告)号：EP2243622A2
公开(公告)日：2010-10-27
申请号：EP10003797.7
申请日：2010-04-08
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki
IPC分类号： B29D11/00
CPC分类号： B29D11/00355 , B29D11/00442
摘要： A method for producing an optical part provided with composition ratio distributions, including a refractive index distribution, in an order of mm is provided. The method includes an irradiation process for irradiating a radiation-sensitive polymerizable composition (1) with a radiation (5). The composition (1) includes at least a polymerizable compound (a) and a polymerizable or non-polymerizable component (c). The irradiation process includes at least a first step of irradiating with a radiation (5) only a first irradiation region that is a portion of the composition (1) and a second step of irradiating with a radiation (5) only a second irradiation region that is a portion of the composition (1) and is different from the first irradiation region in at least one of size and position. When the component (c) is polymerizable, the polymerization rate of the component (c) is lower than that of the compound (a) in the first and the second steps.
摘要翻译：提供了一种制造具有包括折射率分布的组成比分布的光学部件的方法，其数量为毫米。该方法包括用辐射（5）照射辐射敏感性聚合性组合物（1）的照射方法。组合物（1）至少包含可聚合化合物（a）和可聚合或不可聚合组分（c）。照射方法至少包括仅使用作为组合物（1）的一部分的第一照射区域的辐射（5）照射的第一步骤和仅照射第二照射区域的辐射（5）的第二步骤是组合物（1）的一部分，并且在尺寸和位置中的至少一个中不同于第一照射区域。当组分（c）可聚合时，组分（c）的聚合速率低于第一步和第二步中化合物（a）的聚合速率。

3. 发明公开

EP1835345A2 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device 有权
标题翻译：感光硅烷偶联剂，用于形成微粒图案和所述硅烷偶联剂的使用的表面改性方法的工艺
公开(公告)号：EP1835345A2
公开(公告)日：2007-09-19
申请号：EP07102685.0
申请日：2007-02-20
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki , Mizutani, Natsuhiko , Yamaguchi, Takako , Inao, Yasuhisa
IPC分类号： G03F7/075
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1836 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl group.
摘要翻译：本发明提供用于形成低缺陷的微粒图案，点阵排列图案，或通过更少的步骤孔阵列图案的光敏硅烷偶联剂，以及使用搜索光敏硅烷偶联剂的图案的方法。采用的是包含1,2-萘醌-2-二叠氮基-5-磺酰基或1,2-萘醌-2-二叠氮-4-磺酰基的感光硅烷偶联剂。

4. 发明公开

EP1956429A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process 审中-公开
标题翻译：感光化合物，感光组合物，方法，制造抗蚀图案及其制造方法的装置
公开(公告)号：EP1956429A1
公开(公告)日：2008-08-13
申请号：EP08151052.1
申请日：2008-02-05
申请人： Canon Kabushiki Kaisha
发明人： Ito, Toshiki , Yamaguchi, Takako
IPC分类号： G03F7/039 , C08G8/28
CPC分类号： G03F7/039 , C07C37/055 , C07C49/84 , C07C225/22 , C08G8/28 , C08L61/14 , C07C39/04
摘要： A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):

wherein R 1 to R 10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
摘要翻译：一种光敏化合物具有两个或更多个结构单元，在一个分子中，由以下通式（1）：其中R 1至R 10选自氢原子，卤素原子，烷基，烷氧基，苯基中选择的基，萘基，和烷基，其中的一部分或全部氢原子都用substituiertem氟原子; 并且X是substituiertem奥德unsubstituiertem亚苯基或亚萘基substituiertem奥德unsubstituiertem。

5. 发明公开

EP1865379A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution 有权
标题翻译：方法zur Fotolack-Strukturierung und Prozess zur Herstellung eines Bausteins
公开(公告)号：EP1865379A1
公开(公告)日：2007-12-12
申请号：EP07108733.2
申请日：2007-05-23
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki , Yamaguchi, Takako
IPC分类号： G03F7/004 , G03F7/039 , C07C205/35 , C07C205/00 , G03F7/023
CPC分类号： C07C205/34 , G03F7/0045 , G03F7/023 , G03F7/039
摘要： A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented by C 6 R 2-6 -CHR 1 -OR 7 or C 6 R 2-6 -CHR 1 -COOR 7 where R 1 is a hydrogen atom or an alkyl group, at least one of R 2 , R 3 , R 4 , R 5 , and R 6 is a nitro group, and others are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl, an alkoxy, a phenyl, a naphthyl, and an alkyl in which a part or the entire of hydrogen atoms are substituted by a fluorine atom, and R 7 is a substituted or unsubstituted phenylene or naphthylene group dissolved in an organic solvent, irradiating the resist layer selectively with a radiation ray, and developing a portion irradiated by the ray to form a pattern of the resist layer.
摘要翻译：用于形成抗蚀剂图案的方法包括以下步骤：在基材上施加光敏抗蚀剂层，所述感光组合物包含至少一种在分子中具有两个或更多个由C 6 R 2-6 - CHR 1 -OR 7或C 6 R 2-6 -CHR 1 -COOR 7其中R 1是氢原子或烷基，R 2，R 3，R 4，R 5和R 6中的至少一个是硝基等，选自氢原子，卤素原子，烷基，烷氧基，苯基，萘基和其中一部分或全部氢原子被氟原子，R 7为溶解在有机溶剂中的取代或未取代的亚苯基或亚萘基，用辐射线选择性地照射抗蚀剂层，并且使用该光线照射的部分显影以形成抗蚀剂层的图案。

6. 发明授权

EP1865379B1 Method for resist pattern formation, and process for device prodution 有权
标题翻译：光致抗蚀剂的结构和工艺方法，用于制造器件
公开(公告)号：EP1865379B1
公开(公告)日：2013-01-16
申请号：EP07108733.2
申请日：2007-05-23
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki , Yamaguchi, Takako
IPC分类号： G03F7/004 , G03F7/039 , C07C205/35 , C07C205/00 , G03F7/023
CPC分类号： C07C205/34 , G03F7/0045 , G03F7/023 , G03F7/039

7. 发明公开

EP1956430A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process 审中-公开
标题翻译：感光化合物，感光组合物，方法，制造抗蚀图案及其制造方法的装置
公开(公告)号：EP1956430A1
公开(公告)日：2008-08-13
申请号：EP08151053.9
申请日：2008-02-05
申请人： Canon Kabushiki Kaisha
发明人： Ito, Toshiki , Yamaguchi, Takako
IPC分类号： G03F7/039 , C08G8/28
CPC分类号： G03F7/039 , C07C37/055 , C08G8/28 , C08L61/14 , Y10S430/106 , Y10S430/108 , C07C39/04
摘要： A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1):

wherein R 1 to R 5 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, acetoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
摘要翻译：一种光敏化合物具有两个或更多个结构单元，在一个分子中，由以下通式（1）：其中R 1至R 5选自氢原子，卤素原子，烷基，烷氧基，乙酰氧基中选择的基，苯基，萘基，和烷基，其中的一部分或全部氢原子都用substituiertem氟原子; 并且X是substituiertem奥德unsubstituiertem亚苯基或亚萘基substituiertem奥德unsubstituiertem。

8. 发明公开

EP2243622A3 Method for producing optical part 审中-公开
标题翻译：一种制造光学部件的方法
公开(公告)号：EP2243622A3
公开(公告)日：2015-06-03
申请号：EP10003797.7
申请日：2010-04-08
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki
IPC分类号： B29D11/00
CPC分类号： B29D11/00355 , B29D11/00442
摘要： A method for producing an optical part provided with composition ratio distributions, including a refractive index distribution, in an order of mm is provided. The method includes an irradiation process for irradiating a radiation-sensitive polymerizable composition (1) with a radiation (5). The composition (1) includes at least a polymerizable compound (a) and a polymerizable or non-polymerizable component (c). The irradiation process includes at least a first step of irradiating with a radiation (5) only a first irradiation region that is a portion of the composition (1) and a second step of irradiating with a radiation (5) only a second irradiation region that is a portion of the composition (1) and is different from the first irradiation region in at least one of size and position. When the component (c) is polymerizable, the polymerization rate of the component (c) is lower than that of the compound (a) in the first and the second steps.

9. 发明公开

EP2372405A1 Lens and method for producing lens 审中-公开
标题翻译： Linse und Verfahren zur Linsenherstellung
公开(公告)号：EP2372405A1
公开(公告)日：2011-10-05
申请号：EP11002266.2
申请日：2011-03-18
申请人： Canon Kabushiki Kaisha
发明人： Ito, Toshiki
IPC分类号： G02B3/00 , B29D11/00 , G02B1/04
CPC分类号： G02B3/0087 , B29D11/00355 , G02B1/041 , C08L33/08 , C08L33/10
摘要： A lens (103) includes a transparent member (101), wherein the transparent member contains a plurality of polymers formed from organic monomers; the transparent member has a refractive index distribution due to the plurality of polymers; and particles (102) having a lower thermal expansion coefficient than the transparent member are dispersed in the transparent member.
摘要翻译：透镜（103）包括透明构件（101），其中透明构件包含由有机单体形成的多个聚合物; 透明构件由于多个聚合物而具有折射率分布; 并且具有比透明构件更低的热膨胀系数的颗粒（102）分散在透明构件中。

10. 发明公开

EP1835345A3 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device 有权
标题翻译：感光硅烷偶联剂，用于图案形成和用于生产的设备的表面改性方法的工艺
公开(公告)号：EP1835345A3
公开(公告)日：2011-05-18
申请号：EP07102685.0
申请日：2007-02-20
申请人： CANON KABUSHIKI KAISHA
发明人： Ito, Toshiki , Mizutani, Natsuhiko , Yamaguchi, Takako , Inao, Yasuhisa
IPC分类号： G03F7/075
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1836 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl group.

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