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1. 发明公开

EP1367447A3 Projection exposure device and position alignment device and position alignment method 审中-公开
标题翻译：投影曝光装置，对齐和对准
公开(公告)号：EP1367447A3
公开(公告)日：2008-06-25
申请号：EP03011165.2
申请日：2003-05-26
申请人： Adtec Engineering Co., Ltd.
发明人： Hirabayashi, Youichi, Adtec Engineering Co.,Ltd. , Matsumoto, Noriyoshi, Adtec Engineering Co.,Ltd.
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7011 , G03F9/7019 , G03F9/7065
摘要： The invention provides a projection exposure device that makes precise positional alignment possible.
With a printed circuit board 76 placed on a mobile stage 70, a mask mark 90 is irradiated by an ultra-violet light source 60 of an ultra-violet illumination device 6, thereby the image of the mask mark 90 is passed through a projection exposure lens 71 and a half-mirror 11, then reflected by an ultra-violet reflection surface mirror 10, thereafter further passed through a beam splitter 34 and an image formation lens 32, forming an image on a CCD 30. The center coordinate of the image is measured by an image recognition device 2. Next, a board mark 91 on the printed circuit board 76 is illuminated by an infrared light source 50 of an infrared illumination device 5, and its image is passed through the ultra-violet reflection surface mirror 10, the half-mirror 11, the beam splitter 34, a reflector 43, an image formation lens 42, and a beam splitter 52, forming an image on a CCD 40. The positional alignment is implemented by moving the mobile stage 70 in the XY directions or rotating it in θ degree angle by controlling a moving mechanism 81 in the way the center coordinate of the board mark 91 on the infrared CCD 40 is aligned with the center coordinate of the mask mark 90 on the ultra-violet CCD 30.

2. 发明公开

EP1367447A2 Projection exposure device and position alignment device and position alignment method 审中-公开
标题翻译： Projektionsbelichtungsanlage，Ausrichtvorrichtung und Ausrichtverfahren
公开(公告)号：EP1367447A2
公开(公告)日：2003-12-03
申请号：EP03011165.2
申请日：2003-05-26
申请人： Adtec Engineering Co., Ltd.
发明人： Hirabayashi, Youichi, Adtec Engineering Co.,Ltd. , Matsumoto, Noriyoshi, Adtec Engineering Co.,Ltd.
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7011 , G03F9/7019 , G03F9/7065
摘要： The invention provides a projection exposure device that makes precise positional alignment possible.
With a printed circuit board 76 placed on a mobile stage 70, a mask mark 90 is irradiated by an ultra-violet light source 60 of an ultra-violet illumination device 6, thereby the image of the mask mark 90 is passed through a projection exposure lens 71 and a half-mirror 11, then reflected by an ultra-violet reflection surface mirror 10, thereafter further passed through a beam splitter 34 and an image formation lens 32, forming an image on a CCD 30. The center coordinate of the image is measured by an image recognition device 2. Next, a board mark 91 on the printed circuit board 76 is illuminated by an infrared light source 50 of an infrared illumination device 5, and its image is passed through the ultra-violet reflection surface mirror 10, the half-mirror 11, the beam splitter 34, a reflector 43, an image formation lens 42, and a beam splitter 52, forming an image on a CCD 40. The positional alignment is implemented by moving the mobile stage 70 in the XY directions or rotating it in θ degree angle by controlling a moving mechanism 81 in the way the center coordinate of the board mark 91 on the infrared CCD 40 is aligned with the center coordinate of the mask mark 90 on the ultra-violet CCD 30.
摘要翻译：本发明提供了使得精确位置对准成为可能的投影曝光装置。通过放置在移动台70上的印刷电路板76，由紫外线照明装置6的紫外光源60照射掩模标记90，掩模标记90的图像通过投影曝光透镜71和半透镜11，然后被紫外反射面镜10反射，然后进一步通过在CCD 30上形成图像的分束器34和图像形成透镜32.图像的中心坐标通过图像识别装置2测量。接下来，印刷电路板76上的板标记91被红外线照明装置5的红外光源50照射，并且其图像通过紫外反射面反射镜10 ，半反射镜11，分束器34，反射器43，图像形成透镜42和分束器52，在CCD 40上形成图像。通过在XY中移动移动台70来实现位置对准方向或旋转它通过以红外CCD 40上的板标记91的中心坐标与紫外线CCD 30上的掩模标记90的中心坐标对齐的方式控制移动机构81来获得¸度角。

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