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    • 10. 发明公开
    • PHOTOSENSITIVE RESIN, PHOTOSENSITIVE COMPOSITION AND PHOTOCROSSLINKED ITEM
    • LICHTEMPFINDLICHES HARZ,LICHTEMPFINDLICHE ZUSAMMENSETZUNG UND LICHTVERNETZTES ELEMENT
    • EP1865012A1
    • 2007-12-12
    • EP06730105.1
    • 2006-03-27
    • TOYO GOSEI KOGYO CO., LTD.
    • IKEYA, Takeshi, Photosensitive Mat. Research Ctr.SHIBUYA, Toru,c/o Photosensitive Mat. Research CtrMIYAZAKI, Kana, Photosensitive Mat. Research Ctr.
    • C08G65/333C08L71/02G03F7/004G03F7/012
    • C08G65/333G03F7/012
    • The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.
      The photosensitive resin is represented by the following formula (1):

      (wherein n represents a mean polymerization degree and is 5 or more; R 1 and R 2 , which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2):

      or either one of X and Y represents a photosensitive unit represented by the above formula (2) and the other represents an amino group; R 3 represents a group selected from among the groups represented by the following formula set (3):

      R 4 represents a group selected from among the groups represented by the following formula set (4):

      at least one of R 3 and R 4 has at least one azido group; and R 5 represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).
    • 本发明提供一种光敏树脂,其可以通过光交联容易地形成具有亲水性和高生物适应性的表面涂层; 含有感光性树脂的感光性组合物; 和由感光性组合物得到的光交联结构。 感光性树脂由下式(1)表示:(其中n表示平均聚合度且为5以上; R 1和R 2可以相同或不同,表示亚烷基, 亚芳基,氧化烯基或单键; X和Y各自表示由下式(2)表示的感光单元:或X和Y中的任一个表示由上述式(2)表示的感光单元, 另一个表示氨基; R 3表示选自由下式(3)表示的基团中的基团:R 4表示选自由下式(4)表示的基团中的基团:至少 R 3和R 4中的一个具有至少一个叠氮基; R 5表示氢原子,烷基,含缩醛基的烷基,芳基,芳烷基或含有碱基的取代基, 形成氮原子)。