发明公开
EP1117005A1 Polymer compound, method of producing the same, photosensitive composition, and pattern formation method
审中-公开
基本信息:
- 专利标题： Polymer compound, method of producing the same, photosensitive composition, and pattern formation method
- 专利标题（中）：聚合物，用于生产用于制造图案是相同的，光敏组合物和方法
- 申请号：EP01101002.2 申请日：2001-01-17
- 公开(公告)号：EP1117005A1 公开(公告)日：2001-07-18
- 发明人： Utsunomiya, Shin, Photosensitive Materials Res.Lab , Yamada, Seigo, Photosensitive Materials Res.Lab
- 申请人： Toyo Gosei Kogyo Co., Ltd.
- 申请人地址： 1603, Kamimyoden Ichikawa-shi, Chiba 272-0012 JP
- 专利权人： Toyo Gosei Kogyo Co., Ltd.
- 当前专利权人： Toyo Gosei Kogyo Co., Ltd.
- 当前专利权人地址： 1603, Kamimyoden Ichikawa-shi, Chiba 272-0012 JP
- 代理机构： Strehl Schübel-Hopf & Partner
- 优先权： JP2000007728 20000117; JP2000395738 20001226
- 主分类号： G03F7/038
- IPC分类号： G03F7/038 ; C08F220/06 ; C08F222/10 ; C08F290/06
摘要：
The present invention provides a cross-linkable polymer compound which can be developed with an aqueous developer and exhibits excellent patterning properties; a photosensitive composition containing the same; and a pattern formation method employing the composition. The polymer compound containing monomer units represented by formulas (I) to
wherein each of R 1 to R 4 is hydrogen and/or a methyl group; p represents an integer between 1 to 10 inclusive; X represents hydrogen, an alkali metal, or an ammonium represented by formula (1):
wherein each of R 5 to R 8 represents hydrogen, a C1-C3 alkyl group, or a C1-C3 alkanol group; and a plurality of Xs may be the same or different from one another, the compositional proportions of the monomer units falling within the following ranges: 2 mol% ≤ 1 ≤ 73 mol%; 8 mol% ≤ m ≤ 83 mol%; and 15 mol% ≤ n ≤ 80 mol%.
摘要（中）：
wherein each of R 1 to R 4 is hydrogen and/or a methyl group; p represents an integer between 1 to 10 inclusive; X represents hydrogen, an alkali metal, or an ammonium represented by formula (1):
wherein each of R 5 to R 8 represents hydrogen, a C1-C3 alkyl group, or a C1-C3 alkanol group; and a plurality of Xs may be the same or different from one another, the compositional proportions of the monomer units falling within the following ranges: 2 mol% ≤ 1 ≤ 73 mol%; 8 mol% ≤ m ≤ 83 mol%; and 15 mol% ≤ n ≤ 80 mol%.
本发明提供了可以在wässrige显影剂显影并且显示出优异的图案形成性的交联性聚合物化合物; 的光敏组合物含有相同; 和图案形成方法用人组合物。 含有由式（I）〜式单体单元的高分子化合物 worin每个R1至R4是氢和/或甲基; p darstellt要求1至10（含）之间整数; X darstellt氢，碱金属，或铵的由式（1）：氢 worin每个R5至R8 darstellt，一个C1-C3烷基或C1-C3的烷醇基; 与变量Xs的多元性可相同或彼此，落入以下范围内的单体单元的组成比例不同：2摩尔％≤1≤73％（摩尔）; 8摩尔％≤米≤83％（摩尔）; 和15摩尔％≤N≤80摩尔％。