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1. 发明公开

EP2528592A2 MOIRE PATTERNS GENERATED BY ANGULAR ILLUMINATION OF SURFACES 审中-公开
标题翻译： MITTELS WINKELIGER BELEUCHTUNG VONFLÄCHENERZEUGTEMOIRÉ-MUSTER
公开(公告)号：EP2528592A2
公开(公告)日：2012-12-05
申请号：EP11705718.2
申请日：2011-01-25
申请人： NanoInk, Inc.
发明人： HE, Bo , ROSNER, Bjoern
IPC分类号： A61K9/20 , B42D15/00 , G07D7/20 , G02B27/60
CPC分类号： G09F3/0341 , G02B27/60 , G07D7/207 , G09F2003/0213 , G09F2003/0277
摘要： Improved methods, devices, compositions, and systems are provided for concealing information on articles in commerce, such as pharmaceuticals (120), to improve detection of counterfeits. Embodiments are provided where Moire patterns on article surfaces are detectable using a revealing layer only when the surfaces are illuminated at or near particular angles. Embodiments incorporating revealing layers into detection systems, such as microscopes, are also provided. A method comprising: providing at least one pharmaceutical composition which comprises at least one surface which comprises at least one area (121, 122, 123) which is adapted to provide a Moire base layer; illuminating the area at an angle; imaging the illuminated area with a Moire revealing layer to generate a Moire pattern. Such embodiments provide an additional layer of security over previous methods of detecting counterfeit articles.
摘要翻译：提供了改进的方法，设备，组合和系统，用于隐藏诸如药品等商业文章的信息，以改进对假冒伪劣的检测。提供了实施例，其中仅当表面在特定角度或接近特定角度照射时，才能使用露出层检测物品表面上的莫尔图案。还提供了将显露层结合到诸如显微镜的检测系统中的实施例。一种方法，包括：提供至少一种药物组合物，其包含至少一个表面，所述至少一个表面包含适于提供莫尔底层的至少一个区域; 以一定角度照射该区域; 用Moiré显露层成像照明区域以产生莫尔图案。这样的实施例提供了与先前检测伪造物品的方法相比的额外的安全层。

2. 发明公开

EP2389615A1 LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING SUBSTRATE TEMPERATURE CONTROL 审中-公开
标题翻译：制造具有衬底温度控制齐次大面积安排的
公开(公告)号：EP2389615A1
公开(公告)日：2011-11-30
申请号：EP10702950.6
申请日：2010-01-25
申请人： Nanoink, Inc.
发明人： AMRO, Nabil, A. , SANEDRIN, Raymond , RENDLEN, Jeffrey, R. , NELSON, Michael, R.
IPC分类号： G03F7/00
CPC分类号： G03F7/0002
摘要： Improved patterning at small scale including nanoscale. A method comprising: providing at least one cantilever comprising at least one tip thereon, and a material deposited on the tip, contacting the cantilever with a substrate so that the material is deposited from the tip onto the substrate to form a material deposit, wherein the temperature of the substrate is adapted to control a size of the material deposit. A device comprising: at least one heat sink, at least one heating or cooling stage, at least one vacuum system, wherein the device is adapted to function with a substrate to be subjected to a material deposition and to keep the substrate temperature substantially constant during deposition.

3. 发明公开

EP2203529A1 LITHOGRAPHY OF NANOPARTICLE BASED INKS 审中-公开
标题翻译： LITHOGRAPHIE INK纳米颗粒基地的
公开(公告)号：EP2203529A1
公开(公告)日：2010-07-07
申请号：EP08839215.4
申请日：2008-10-14
申请人： Nanoink, Inc.
发明人： PARPIA, Mohammed , TEVAARWERK, Emma , AMRO, Nabil , SANEDRIN, Raymond
IPC分类号： C09D11/00 , G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C09D11/322 , C09D11/52
摘要： An ink composition comprising: a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water, and wherein the composition is formulated for slow dry rate and proper viscosity for DPN. Also, a method comprising: depositing a composition onto a cantilever, wherein the composition comprises a plurality of metallic nanoparticles suspended in a carrier, wherein the carrier comprises water and at least one organic solvent miscible with water. The composition can be used in direct writing onto surfaces to form patterns and arrays using cantilevers, microcontact printing, ink jet printing, and other methods. The composition is particularly useful for preparing nanoscale features and forming high quality continuous conductive lines and dots, including silver based lines and dots. Applications include surface repair.

4. 发明公开

EP2419793A1 CONDUCTING LINES, NANOPARTICLES, INKS, AND PATTERNING 审中-公开
标题翻译：导线，纳米粒子，墨水和结构
公开(公告)号：EP2419793A1
公开(公告)日：2012-02-22
申请号：EP10715403.1
申请日：2010-04-13
申请人： Nanoink, Inc.
发明人： HUNG, Sheng-chun , NAFDAY, Omkar , HAAHEIM, Jason, R.
IPC分类号： G03F7/00 , C09D11/00
CPC分类号： G03F7/0002 , H05K1/097 , H05K3/1241 , H05K2203/0195 , Y10T428/24802
摘要： Patterning and direct writing of nanoparticle inks formulated to provide conductive lines upon annealing. Patterning methods include stamp and tip based methods including microcontact printing and DPN printing. Ink viscosity, metal content, and density can be controlled to provide good results. Low temperature of annealing can be used to generate volume resistivities comparable to bulk resistivity. Long lines can be drawn. Addressable patterning can be achieved.

5. 发明公开

EP2227718A2 CANTILEVER WITH PIVOTING ACTUATION 审中-公开
标题翻译：摆动操作悬臂
公开(公告)号：EP2227718A2
公开(公告)日：2010-09-15
申请号：EP08853459.9
申请日：2008-11-25
申请人： Nanoink, Inc.
发明人： SHILE, Raymond, Roger
IPC分类号： G03F7/00 , G12B21/02 , H01H59/00
CPC分类号： G01Q70/02 , G01Q80/00 , H01H1/0094 , H01H2057/006 , H01H2061/006 , Y10T29/49002
摘要： Improved actuation device useful in direct-write nanolithography and imaging including use of a pivot point for downward deflection of a cantilever with long travel path. A device comprising at least one holder, at least one cantilever, an extension of the said cantilever wherein the extension is integrated with an actuator, wherein the cantilever is adapted for actuated movement. The actuator can be electrostatic, thermal, or piezoelectric. The cantilever can comprise a tip, and material can be transferred from the tip to a surface.

6. 发明授权

EP1556737B1 METHODS FOR FABRICATION OF NANOMETER-SCALE ENGINEERED STRUCTURES FOR MASK REPAIR APPLICATION 有权
标题翻译：用于生产纳米范围内的结构FOR USE IN THE MASK修复
公开(公告)号：EP1556737B1
公开(公告)日：2008-12-31
申请号：EP03783067.6
申请日：2003-10-21
申请人： Nanoink, Inc.
发明人： VAN CROCKER, Percy, c/o Nanoink, Inc. , CRUCHON-DUPEYRAT, Sylvain , DEMERS, Linette, c/o NanoInk, Inc. , ELGHANIAN, Robert, c/o NanoInk, Inc. , DISAWAL, Sandeep, c/o NanoInk, Inc. , AMRO, Nabil, c/o NanoInk, Inc. , ZHANG, Hua c/o NanoInk, Inc.
IPC分类号： G03F1/00
CPC分类号： C23C18/14 , C09D11/52 , C23C18/06 , C23C18/1208 , C23C18/1254 , C23C18/1605 , C23C18/161 , C23C18/1612 , C23C18/1658 , G03F1/72 , G03F7/0002 , Y10S977/857 , Y10S977/863
摘要： Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including solgel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.

7. 发明公开

EP1556737A2 NANOMETER-SCALE ENGINEERED STRUCTURES, METHODS AND APPARATUS FOR FABRICATION THEREOF, AND APPLICATIONS TO MASK REPAIR, ENHANCEMENT, AND FABRICATION 有权
标题翻译：用于生产纳米范围内的结构FOR USE IN THE MASK修复
公开(公告)号：EP1556737A2
公开(公告)日：2005-07-27
申请号：EP03783067.6
申请日：2003-10-21
申请人： Nanoink, Inc.
发明人： VAN CROCKER, PercyNanoink, Inc. , CRUCHON-DUPEYRAT, Sylvain , DEMERS, LinetteNanoInk, Inc. , ELGHANIAN, RobertNanoInk, Inc. , DISAWAL, SandeepNanoInk, Inc. , AMRO, NabilNanoInk, Inc. , ZHANG, HuaNanoInk, Inc.
IPC分类号： G03F1/00
CPC分类号： C23C18/14 , C09D11/52 , C23C18/06 , C23C18/1208 , C23C18/1254 , C23C18/1605 , C23C18/161 , C23C18/1612 , C23C18/1658 , G03F1/72 , G03F7/0002 , Y10S977/857 , Y10S977/863
摘要： Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including solgel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.

8. 发明公开

EP2564270A1 FORCE CURVE ANALYSIS METHOD FOR PLANAR OBJECT LEVELING 审中-公开
标题翻译：功率曲线分析方法进行找平平面物体
公开(公告)号：EP2564270A1
公开(公告)日：2013-03-06
申请号：EP11720208.5
申请日：2011-04-26
申请人： Nanoink, Inc.
发明人： HAAHEIM, Jason, R. , BUSSAN, John, Edward , SOLHEIM, Edward, R. , MOSKAL, John , NELSON, Michael, R. , VAL-KHVALABOV, Vadim
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetween, one or more force sensors configured to measure a force between the array and the surface, and a device configured calculate a force curve parameter of the force over the distance or time. The apparatus is configured to level the array relative to the surface by varying a relative tilting between the array and the substrate surface based on the force curve parameter or to measure the relative tilting based on the force curve parameter. Methods and software also are provided.

9. 发明公开

EP2558907A1 IMPROVED CANTILEVERS FOR DEPOSITION 审中-公开
标题翻译：改进BOOM FOR分离
公开(公告)号：EP2558907A1
公开(公告)日：2013-02-20
申请号：EP11718805.2
申请日：2011-04-13
申请人： Nanoink, Inc.
发明人： FRAGALA, Joseph, S. , SHILE, R., Roger , ROZHOK, Sergey, V.
IPC分类号： G03F7/00 , B82B3/00
CPC分类号： G03F7/0002 , B81B2203/0118 , B81C1/00031 , B81C99/0025 , B82B3/00 , B82Y10/00 , B82Y40/00 , G03F7/2049
摘要： Cantilever design for patterning from a cantilever tip can be improved with, for example, a recessed area surrounding the cantilever tip. A device for printing nanoscopic and microscopic patterns includes at least one cantilever having a front surface, a first side edge, a second side edge, and a first end which is a free end and a second end which is a non-free end. The front surface includes at least one first sidewall disposed at the first cantilever side edge and at least one second sidewall disposed at the second cantilever side edge opposing the first cantilever side edge, at least one channel, adapted to hold a fluid, disposed between the first and second sidewalls, wherein the channel, the first sidewall, and the second sidewall extend toward the cantilever free end but do not reach the free end, and a base region having a boundary defined by the first edge, the second edge, and the cantilever free end and also the first sidewall, second sidewall, and the channel, wherein the base region comprises a tip extending away from the cantilever front surface. Improved deposition can result. Fluidic inks comprising biomolecules can be patterned successfully.

10. 发明公开

EP2389613A1 LARGE AREA, HOMOGENEOUS ARRAY FABRICATION INCLUDING CONTROLLED TIP LOADING VAPOR DEPOSITION 审中-公开
标题翻译：齐次大面积安排与蒸发受控TIP LOADING生产
公开(公告)号：EP2389613A1
公开(公告)日：2011-11-30
申请号：EP10702947.2
申请日：2010-01-25
申请人： Nanoink, Inc.
发明人： AMRO, Nabil, A. , SANEDRIN, Raymond
IPC分类号： G03F7/00 , G01Q60/00
CPC分类号： G03F7/0002 , G01Q80/00
摘要： Improved methods for loading arrays of tips with a material for subsequent deposition of the material from the tip to the substrate. Tip loading can be done by controlled vapor deposition which reduces the amount of non-specific material deposition onto a substrate. Improved nanoscale and microscale engineering and lithography can be achieved. Applications include better cellular studies including stem cell studies and stem cell differentiation control.

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