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1. 发明授权

EP3208826B1 EXPOSURE APPARATUS 有权
标题翻译：接触设备
公开(公告)号：EP3208826B1
公开(公告)日：2018-04-11
申请号：EP16204969.6
申请日：2016-12-19
申请人： Advantest Corporation
发明人： HAMAGUCHI, Shinichi , TANAKA, Hitoshi , TOKUNO, Atsushi , KOJIMA, Shinichi , YAMADA, Akio
IPC分类号： H01J37/317 , H01J37/10 , H01J37/04
CPC分类号： H01J37/3177 , H01J37/045 , H01J37/065 , H01J37/09 , H01J37/10 , H01J2237/0435 , H01J2237/0453 , H01J2237/06308 , H01J2237/0835 , H01J2237/31754
摘要： The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

2. 发明公开

EP3200216A1 CHARGED PARTICLE BEAM LENS APPARATUS, CHARGED PARTICLE BEAM COLUMN, AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS 审中-公开
标题翻译：带电粒子束透镜装置，带电粒子束柱和带电粒子束曝光装置
公开(公告)号：EP3200216A1
公开(公告)日：2017-08-02
申请号：EP16195044.9
申请日：2016-10-21
申请人： ADVANTEST CORPORATION
发明人： Abe, Tomohiko , Kojima, Shinichi
IPC分类号： H01J37/141
CPC分类号： H01J37/14 , H01J37/141 , H01J37/3174 , H01J2237/002 , H01J2237/20285 , H01J2237/31774
摘要： Provided is a charged particle beam lens apparatus having a small size and high resolution, and a charged particle beam column and a charged particle beam exposure apparatus.
A charged particle beam lens apparatus includes a lens unit positioned around a through hole through which a charged particle beam (EB) travels, where the lens unit is configured to converge or diffuse the charged particle beam, and a supporting unit (50) surrounding the lens unit. Here, at least one of an outer peripheral portion of the lens unit that is in contact with the supporting unit and an inner peripheral portion of the supporting unit that is in contact with the lens unit includes a groove (61) through which a coolant fluid flows along an outer periphery of the lens unit.
In this way, the charged particle beam lens apparatus can achieve a small size and high resolution.
摘要翻译：本发明提供一种小型且高分辨率的带电粒子束透镜装置以及带电粒子束柱和带电粒子束曝光装置。一种带电粒子束透镜装置，包括：透镜单元，围绕通过带电粒子束（EB）行进的通孔定位，透镜单元用于会聚或扩散带电粒子束;以及支撑单元（50），围绕镜头单元。这里，透镜单元的与支撑单元接触的外周部分和支撑单元的与透镜单元接触的内周部分中的至少一个包括凹槽（61），通过该凹槽（61），冷却剂流体沿着透镜单元的外周流动。这样，带电粒子束透镜装置可以实现小尺寸和高分辨率。

3. 发明公开

EP3089194A3 DEVICE, MANUFACTURING METHOD, AND EXPOSURE APPARATUS 审中-公开
标题翻译：设备，方法和曝光装置
公开(公告)号：EP3089194A3
公开(公告)日：2017-02-15
申请号：EP16166085.7
申请日：2016-04-19
申请人： ADVANTEST CORPORATION
发明人： Yamada, Akio , Sugatani, Shinji , Kurokawa, Masaki , Takizawa, Masahiro , Iwashita, Ryuma
IPC分类号： H01J37/317 , H01J37/04
CPC分类号： H01J37/3174 , H01J37/045 , H01J37/3177 , H01J2237/0213 , H01J2237/0437 , H01J2237/1501 , H01J2237/20228 , H01J2237/31766
摘要： A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section that includes a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section that includes an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode that faces the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.

4. 发明授权

EP2626742B1 Wavelength converting apparatus, light source apparatus and wavelength converting method 有权
标题翻译：波长转换装置，光源装置和波长转换方法
公开(公告)号：EP2626742B1
公开(公告)日：2015-05-06
申请号：EP12196585.9
申请日：2012-12-11
申请人： ADVANTEST CORPORATION
发明人： Sakurai, Takao
IPC分类号： G02F1/377 , G02F1/35 , G02F1/355
CPC分类号： G02F1/335 , G02F1/33 , G02F1/3534 , G02F1/3558 , G02F1/3775 , G02F2001/3546 , G02F2001/3548 , G02F2203/05 , G02F2203/24 , G02F2203/58

5. 发明公开

EP2856945A1 OPTOACOUSTIC DIAGNOSIS APPARATUS, METHOD, PROGARAM AND RECORDING MEDIUM 审中-公开
标题翻译： OPTOAKUSTISCHE DIAGNOSEVORRICHTUNG，VERFAHREN，PROGRAMM UND AUFZEICHNUNGSMEDIUM
公开(公告)号：EP2856945A1
公开(公告)日：2015-04-08
申请号：EP13800084.9
申请日：2013-05-02
申请人： Advantest Corporation
发明人： KAWAGUCHI, Yasushi , IDA, Taiichiro
IPC分类号： A61B8/06 , A61B8/08
CPC分类号： A61B5/0095 , A61B5/14542 , A61B5/14546 , A61B5/441 , A61B8/0891
摘要： A photoacoustic diagnosis device that diagnoses a state of a skin of a human body, includes a pulsed light source, an electric signal converter, a blood distribution obtaining section, and a diagnosis section. The pulsed light source generates a pulsed light. The electric signal converter receives a photoacoustic wave generated at the skin by the pulsed light and converts the photoacoustic wave into an electric signal. The blood distribution obtaining section obtains distribution of blood in the skin based on the electric signal. The diagnosis section diagnoses a state of the skin based on a result obtained by the blood distribution obtaining section.
摘要翻译：诊断人体皮肤状态的光声诊断装置包括脉冲光源，电信号转换器，血液分配获取部和诊断部。脉冲光源产生脉冲光。电信号转换器通过脉冲光接收在皮肤处产生的光声波，并将光声波转换成电信号。血液分配获取部基于电信号获取皮肤中的血液分布。诊断部基于由血液分配获取部获得的结果来诊断皮肤的状态。

6. 发明公开

EP2509099A2 Electron beam exposure apparatus and electron beam exposure method 有权
标题翻译：电子束曝光方法
公开(公告)号：EP2509099A2
公开(公告)日：2012-10-10
申请号：EP12162992.7
申请日：2012-04-03
申请人： Advantest Corporation
发明人： Kurokawa, Masaki , Yamada, Akio , Okawa, Tatsuro
IPC分类号： H01J37/302 , H01J37/317 , G03F7/20
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , G03F1/78 , H01J37/3023 , H01J2237/30461 , H01J2237/31769
摘要： In a multi-column electron beam exposure apparatus for performing exposure treatment in parallel by arranging a plurality of column cells on a wafer, a relationship between exposure intensity and a line width for each column cell is obtained (Steps S41 and S44). Then, correction parameters are obtained, which allow a relationship between exposure intensity and a line width for a correction target column cell to coincide with a relationship between exposure intensity and a line width for a reference column cell selected from among the plurality of column cells (Steps S43 and S46). Thereafter, exposure time of each column cell is obtained by correcting the exposure time of the reference column cell based on the correction parameters thus obtained (Steps S30 and S40).

7. 发明授权

EP1821171B1 TESTING APPARATUS AND ELECTRIC SOURCE CIRCUIT 有权
标题翻译：测试设备和电源电路
公开(公告)号：EP1821171B1
公开(公告)日：2012-03-21
申请号：EP05811710.2
申请日：2005-11-29
申请人： ADVANTEST CORPORATION
发明人： KODERA, Satoshi
IPC分类号： G01R31/319 , G01R31/317
CPC分类号： G01R31/31924 , G01R31/31721
摘要： A testing apparatus for testing an electronic device, having a pattern creation section for creating a testing pattern to be supplied to the electronic device, an electric source circuit for supplying source power to the electronic device, and a determination section for determining good or bad of the electronic device based on an output signal outputted by the electronic device. The electric source circuit has a voltage source for producing a predetermined input voltage to be applied to the electronic device, a power device for supplying electric source power to the electronic device based on the input voltage produced by the voltage source, an electric source for supplying drive power for the power device, and a voltage control section for controlling, based on the electric source power outputted by the power device, a drive voltage applied by the electric source to the power device.

8. 发明授权

EP1887614B1 PATTERNING METHOD 有权
标题翻译：结构化过程
公开(公告)号：EP1887614B1
公开(公告)日：2010-08-11
申请号：EP05751409.3
申请日：2005-06-03
申请人： ADVANTEST CORPORATION
发明人： MITA, Yoshio, c/o TOKYO UNIVERSITY , BOUROUINA, Tarik, c/o Ecole Sup. d'Ing. en Elec. & Electrotechn. , MARTY, Federic, Ecole Sup. d'Ing. en Electr. & Electrotechn.
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： H01L21/0273 , B82Y10/00 , B82Y40/00 , G03F7/0035 , H01J37/3174
摘要： [PROBLEMS] To provide a patterning method capable of accurately and rapidly forming a structure having a large opening and a small opening. [MEANS FOR SOLVING PROBLEMS] An electron beam resist is applied onto a film as a patterning object and the electron beam resist is subjected to electron beam exposure and development so as to form a first resist pattern defining a belt-shaped opening of a predetermined width having a first opening contour and a second opening shape. The first resist pattern is used as a mask for etching the film as a patterning object so as to form the belt-shaped opening and the second opening. After this, photoresist is applied onto the film as a patterning object and the photoresist is subjected to exposure and development so as to form a second resist pattern defining a shape of the first opening excluding the belt-shaped opening. The second resist pattern is used as a mask for etching the film as a patterning object to form the first opening.

9. 发明公开

EP2081037A8 Test apparatus 审中-公开
标题翻译：测试仪器
公开(公告)号：EP2081037A8
公开(公告)日：2010-06-23
申请号：EP09075092.8
申请日：2004-10-27
申请人： Advantest Corporation , The Furukawa Electric Co., Ltd.
发明人： Shibata, Masashi , Okayasu, Toshiyuki , Akiyama, Tsutomu
IPC分类号： G01R31/28
CPC分类号： G01R31/31905
摘要： A test equipment (100) for providing a cable laying technology satisfying limitation of curvature of a plurality of optical fibers, comprising a test head (102) having a plurality of test boards for applying a test pattern to a device under test, a main frame (104) for controlling a test sequence by the test head (102), an optical fiber cable unit (106) having a plurality of flat cables (200) for connecting the test head (102) with the main frame (104) optically, a plurality of optical fiber cables (108), a dam (107) for connecting the optical fiber cable unit (106) with the plurality of optical fiber cables (108), a unit (110) for offsetting a difference in circumferential length among the plurality of flat cables (200) in the optical fiber cable unit (106), and a cable guide unit (112) for holding the optical fiber cables (108) being connected with a test board (612) in the main frame (104) while bending them.
摘要翻译：一种用于提供满足多根光纤曲率限制的电缆敷设技术的测试设备（100），包括：测试头（102），具有用于将测试图案施加到被测设备的多个测试板;主框架（104），用于通过测试头（102）控制测试序列的光纤电缆单元（106），具有用于光学地连接测试头（102）和主框架（104）的多个扁平电缆（200）的光缆单元（106）多个光缆（108），用于连接光纤电缆单元（106）和多根光纤电缆（108）的坝（107），用于抵消在多个光纤电缆（108）之间的圆周长度差的单元（110）光纤电缆单元106中的多根扁平电缆200和用于保持光纤电缆108的电缆引导单元112与主框架104中的测试板612连接，同时弯曲它们。

10. 发明授权

EP1853933B1 COMPACT REPRESENTATION OF VENDOR HARDWARE MODULE REVISIONS IN AN OPEN ARCHITECTURE TEST SYSTEM 有权
标题翻译： COMPACT第三方硬件模块的修订
公开(公告)号：EP1853933B1
公开(公告)日：2010-05-05
申请号：EP06728786.2
申请日：2006-03-02
申请人： ADVANTEST CORPORATION
发明人： PRAMANICK, Ankan , ELSTON, Mark , ADACHI, Toshiaki
IPC分类号： G01R31/319
CPC分类号： G01R31/31907

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