专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP1421227A2 EINRICHTUNG ZUR REAKTIVEN PLASMABEHANDLUNG VON SUBSTRATEN UND VERFAHREN ZUR ANWENDUNG 审中-公开
标题翻译：装置用于基材的反应性等离子体处理方法应用
公开(公告)号：EP1421227A2
公开(公告)日：2004-05-26
申请号：EP02760136.8
申请日：2002-08-23
申请人： Roth & Rau AG
发明人： POLL, Hans-Ulrich , ROTH, Dietmar
IPC分类号： C23C16/509
CPC分类号： H01J37/32082 , C23C16/481 , C23C16/509 , C23C16/54 , H01J37/32743 , H01J37/32779 , H01J2237/2001
摘要： The invention relates to a device for reactive plasma treatment of substrates (4) comprising a vacuum chamber (1) with at least one substrate arrangement, a plasma source e.g. a high-frequency plasma source with planar electrodes (8,9), a reactive gas inlet (15) and a substrate heating device. The vacuum chamber (1) comprises a first area (6) and a second area (7) which are separated from each other by means of a separating wall made of glass or ceramics. The substrate arrangement and the reactive gas inlet (15) are arranged in the first area (6). The electrodes (8,9) of the plasma source and the substrate heating device are arranged in the second area (7). The substrate arrangement and the electrodes (8,9) of the plasma source can be arranged parallel to each other. The invention also relates to a method for the use of said device. At least one substrate (4) is introduced into the first area (6) of the vacuum chamber (1) as a substrate arrangement, the vacuum chamber (1) is evacuated, the substrate (4) is heated to a technologically predetermined temperature by means of the substrate heating device and plasma is produced (6) following deposition of a coating on the substrate (4) or in order to surface-treat the substrates (4) by means of the plasma source in the first area (6) and a reactive gas is admitted.

2. 发明授权

EP1181674B1 VERFAHREN UND EINRICHTUNG ZUR BETRIEBSUNTERBRECHUNG EINES GERÄTES SOWIE ANWENDUNG DES VERFAHRENS ODER DER EINRICHTUNG 有权
标题翻译：方法和装置设备的营业中断及程序或设备中的应用
公开(公告)号：EP1181674B1
公开(公告)日：2004-02-25
申请号：EP00945523.9
申请日：2000-04-28
申请人： Luboch, Uwe
发明人： Luboch, Uwe
IPC分类号： G07F7/00
CPC分类号： G07C9/00142 , G05B19/042
摘要： The invention relates to a method and a device for interrupting the operation of a device that requires at least one energy carrier and/or an operating medium to be available in order to operate, when a buyer has not met his contractual obligations. According to the inventive method, a reference code (R1, R2) is stored, a period of time is measured from the agreed time when the device is commissioned for use as provided and once a predetermined period has lapsed, the supply of the energy carrier and/or operating medium is interrupted. If a release code (C1, C2) corresponding to the reference code is input before the predetermined period has lapsed, the operation interruption process is stopped or re-started at the point of the first commissioning.

3. 发明授权

EP0910541B1 DICHTSYSTEM FÜR EINE SCHLIESSKLAPPE AN EINER DURCHLASSÖFFNUNG 失效
标题翻译：密封系统所涉及的闭锁瓣通道开口
公开(公告)号：EP0910541B1
公开(公告)日：2003-04-02
申请号：EP97912058.1
申请日：1997-10-16
申请人： Glatt Systemtechnik GmbH
发明人： BRETSCHNEIDER, Frank , KÜHNEMUND, Willibald
IPC分类号： B65G69/18
CPC分类号： B65G69/183
摘要： The invention relates to a sealing system for a closing flap on a through-opening of a device, which along with other similar closing flaps lying parallel to each other in a sealing plane when other devices are in a coupled position so interacts with the other flaps that the insides of both devices can be joined and the individual closing flap when closed provides a seal in relation to a pertaining through-opening along its perimeter. At least one of the two interacting closing flaps (22, 23) has a slit along its perimeter (24) which is bounded on both sides by annular shaped legs (26, 28). The slit (24) is bounded on the inside of each device (20, 21) by the leg (26) when in closed position. The leg (26) extends close to the sealing surface (27) of the through opening and the other leg (28) is radially reduced in comparison with the first one. An elastic bead (29) is located on the seal in an area which is radially outside the shortened leg (28). Said bead axially overlaps the shortened leg and rises at least partially above the sealing plane (34) between the closing flaps when the devices (20, 21) are in an uncoupled position. A pressure medium can be applied to the seal from the inside.

4. 发明公开

EP1294959A1 VERFAHREN ZUR HERSTELLUNG EINER MULTIFUNKTIONALEN MEHRLAGEN SCHICHT AUF EINEM TRANSPARENTEN KUNSTSTOFFSUBSTRAT UND EINE DANACH HERGESTELLTE MULTIFUNKTIONALE MEHRLAGENSCHICHT 有权
标题翻译：一种用于生产多功能多层层上的透明塑料基板和生产MULTIFUNKTIONALE多层镀膜
公开(公告)号：EP1294959A1
公开(公告)日：2003-03-26
申请号：EP01951436.3
申请日：2001-06-26
申请人： Roth & Rau Oberflächentechnik GmbH
发明人： DITTRICH, Karl-Heinz , ROTH, Dietmar
IPC分类号： C23C16/32 , C23C16/40 , C23C14/08 , C23C16/511
CPC分类号： C23C14/205 , C23C14/086 , C23C14/352 , C23C14/357 , C23C16/30 , Y10T428/24917
摘要： The invention relates to a method for producing a multi-functional, multi-ply layer on a transparent plastic substrate and to a multi-functional, multi-ply layer produced according to said method. According to said method, a plasma is created on a transparent plastic substrate (1) in a plasma-assisted, closed cycle operation, using a microwave plasma source and said plasma is constantly maintained during the course of said operation. A first adhesion-promoting organosilicon polymer layer (2) is deposited in the microwave plasma, followed by a first ITO layer (3), then a transparent metal and/or metal oxide layer and subsequently a second ITO layer (3), using cathode sputtering. Finally, an organosilicon polymer layer (5) is deposited. The multi-functional multi-ply layer consists of a first adhesion-promoting organosilicon polymer layer (2) with a thickness of between 50 and 300 nm, a first ITO layer (3) with a thickness of between 50 and 300 nm, at least one transparent metal and/or metal oxide layer with a thickness of between 10 and 30 nm, a second ITO layer (3) with a thickness of between 50 and 300 nm and at least one final organosilicon polymer layer (5) with a thickness of between 300 and 6000 nm.

5. 发明公开

EP1268328A1 DICHTSYSTEM AN EINEM KONSTRUKTIONSELEMENT MIT EINER VERSCHLIESSBAREN DURCHLASSÖFFNUNG UND VERFAHREN ZUR ANWENDUNG 有权
标题翻译：密封系统AT A构建元件与应用可关闭通道口和方法
公开(公告)号：EP1268328A1
公开(公告)日：2003-01-02
申请号：EP01913535.9
申请日：2001-01-25
申请人： Glatt Systemtechnik Dresden GmbH
发明人： CORNELIUS, Hans-Dieter , PRITZKE, Heinz
IPC分类号： B65G69/18 , B65B39/00 , F16K1/226
CPC分类号： F16K1/226
摘要： The invention relates to a sealing system on a first structural element (1). The inventive system is provided with a first through-opening. A first closing flap (3) that can be rotated around a centric axle and is used for closing the first through-opening is situated in said opening. The sealing system can be coupled to a second structural element (2) in an axial manner in relation to the first through-opening. The first closing flap (3) is provided with a first dynamic seal (9) on the radial outer circumference thereof. An elastic seal (8) is provided on the wall of the first through-opening and in the active area of the first dynamic seal (9). The inner diameter of the elastic seal (8) is smaller in the non-operated state than the outer diameter of the first closing flap (3). The invention can be advantageously used in a system, wherein the first structural element (1) is provided with a second closing flap (4) which essentially matches the first closing flap (3) and can be swivelled together with said flap (3). According to the invention, the dynamic seal (9) can be inflated radially towards the outside by means of inner pressure when the first closing flap (3) is in the closing position and in such a way that the elastic seal (8) is at least partially and radially displaced towards the outside.

6. 发明公开

EP1035913A1 EINRICHTUNG ZUR HERSTELLUNG EINES SCHÜTTFÄHIGEN PRODUKTES UND VERFAHREN ZUR ANWENDUNG DER EINRICHTUNG 有权
标题翻译：器具，用于产生散装产品能力和方法对设备中的应用
公开(公告)号：EP1035913A1
公开(公告)日：2000-09-20
申请号：EP99955809.1
申请日：1999-09-22
申请人： Glatt Systemtechnik Dresden GmhH , KWS Saat AG
发明人： BRETSCHNEIDER, Frank , PETER, Bruno , BRÜCKNER, Jürgen
IPC分类号： B01F9/10 , A01C1/06 , A23B9/14 , B01J8/24
CPC分类号： A01C1/06 , A23P10/22 , A23P10/28 , B01F7/00483 , B01F7/162 , B01F7/26 , B01F9/106 , B01F15/0201 , B01J2/10
摘要： The invention relates to a device consisting of a rotor chamber (1) in which a rotor (4) having a vertical rotor axis (3) is arranged, where the rotor (4) at least along its radial outer third has the shape of a conical envelope (22), and guide vanes(11) for circulating the starting material or product. The guide vanes (11) are arranged above the plane (9) of the upper edge (5) of the rotor (1) and statically against the inner wall (6) of the rotor chamber (1). Their cross-section in relation to the rotor axis (3) substantially has the shape of a segment of a circle or spiral and their inner ends are situated approximately in the central part of the rotor radius. The conical envelope (22) can have at least partly flat gas passages in the shape of holes or screens. The invention also relates to the use of the device for the production of pourable products. According to said method, cores are prepared or a coating layer is deposited on cores.

7. 发明公开

EP0666335A1 Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür 失效
标题翻译： Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtungdafür。
公开(公告)号：EP0666335A1
公开(公告)日：1995-08-09
申请号：EP95100987.7
申请日：1995-01-25
申请人： VTD-VAKUUMTECHNIK DRESDEN GMBH
发明人： Grimm, Werner , Ellrodt, Mario
IPC分类号： C23C14/00 , C23C14/32 , H01J37/32
CPC分类号： H01J37/32055 , H01J37/32064 , H05H1/48
摘要： Das Verfahren dient zum Betreiben eines als solchen bekannten Vakuumlichtbogenverdampfers zur Herstellung dünner und harter homogener Schichten, Mehrfachschichten oder Mischschichten aus leitfähigem Material. Aufgabe der Erfindung ist es, die Targetausnutzung zu erhöhen, den Regelbereich der Verdampfung zu verbreitern und die Dropletbildung zu verringern. Das wird erreicht durch Überlagerung eines Grundstromes, der im wesentlichen dem Betriebsstrom einer DC-Vakuumlichtbogenentladung entspricht, mit einem pulsierenden Strom. Die Frequenz des pulsierenden Stromes liegt im Bereich zwischen 100 Hz und 50 kHz, die Amplitude des pulsierenden Stromes liegt im Bereich zwischen 10 und 5000 A und die Pulslänge beträgt zwischen 10 ms bis 20 µs.
Die zugehörige Stromversorgungseinrichtung besteht aus einer Gleichspannungsquelle und einer parallel geschalteten Pulsstromquelle.
摘要翻译：该方法用于操作真空电弧沉积。其具有阴极靶（7），阳极，点火机构和直流电流源（10）。当有足够的电位差和电流供应时，通过点火机构在目标（7）和阳极之间触发真空电弧。电弧在沉积材料的等离子体中继续燃烧。脉冲电流叠加在阻尼器稳定运行所需的基极上。脉冲电流的频率至少为1Hz，振幅至少为10A。为了提供电流，脉冲电流源（11）并联连接到直流电流（10）。频率和/或脉冲长度和/或幅度是可以自由控制的。

8. 发明授权

EP1270750B1 Pelletiereinrichtung zur Herstellung eines sphärischen Schüttgutes 有权
标题翻译：造粒装置，用于生产球形散装材料
公开(公告)号：EP1270750B1
公开(公告)日：2005-07-27
申请号：EP02012185.1
申请日：2002-05-31
申请人： Glatt Systemtechnik GmbH
发明人： Cornelius, Hans-Dieter , Fritzsche, Wolfgang , Bretschneider, Frank, Dr.-Ing.
IPC分类号： C22B1/24 , B01J2/14
CPC分类号： C22B1/24 , B01J2/14

9. 发明授权

EP1268328B1 DICHTSYSTEM AN EINEM KONSTRUKTIONSELEMENT MIT EINER VERSCHLIESSBAREN DURCHLASSÖFFNUNG UND VERFAHREN ZUR ANWENDUNG 有权
标题翻译：密封系统AT A构建元件与应用可关闭通道口和方法
公开(公告)号：EP1268328B1
公开(公告)日：2004-03-31
申请号：EP01913535.9
申请日：2001-01-25
申请人： Glatt Systemtechnik GmbH
发明人： CORNELIUS, Hans-Dieter , PRITZKE, Heinz
IPC分类号： B65G69/18 , B65B39/00 , F16K1/226
CPC分类号： F16K1/226
摘要： The invention relates to a sealing system on a first structural element (1). The inventive system is provided with a first through-opening. A first closing flap (3) that can be rotated around a centric axle and is used for closing the first through-opening is situated in said opening. The sealing system can be coupled to a second structural element (2) in an axial manner in relation to the first through-opening. The first closing flap (3) is provided with a first dynamic seal (9) on the radial outer circumference thereof. An elastic seal (8) is provided on the wall of the first through-opening and in the active area of the first dynamic seal (9). The inner diameter of the elastic seal (8) is smaller in the non-operated state than the outer diameter of the first closing flap (3). The invention can be advantageously used in a system, wherein the first structural element (1) is provided with a second closing flap (4) which essentially matches the first closing flap (3) and can be swivelled together with said flap (3). According to the invention, the dynamic seal (9) can be inflated radially towards the outside by means of inner pressure when the first closing flap (3) is in the closing position and in such a way that the elastic seal (8) is at least partially and radially displaced towards the outside.

10. 发明授权

EP0940482B1 Vakuum-Plasma-Beschichtungsanlage und Anwendung derselben 有权
标题翻译：真空等离子体涂层系统及其应用
公开(公告)号：EP0940482B1
公开(公告)日：2003-05-28
申请号：EP99104321.7
申请日：1999-03-04
申请人： VTD Vakuumtechnik Dresden GmbH
发明人： Falz, Michael , Bücken, Bernd , Wilberg, Rüdiger
IPC分类号： C23C14/50 , H01J37/00 , C23C14/24 , C23C14/32
CPC分类号： H01J37/32422 , C23C14/22 , C23C14/24 , C23C14/325 , C23C14/505

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式