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    • 73. 发明公开
    • METHOD FOR MANUFACTURING METAL-FILLED MICROSTRUCTURE
    • 制造金属填充微结构的方法
    • EP3040450A1
    • 2016-07-06
    • EP14839465.3
    • 2014-08-21
    • Fujifilm Corporation
    • YAMASHITA Kosuke
    • C25D1/00C25D1/10C25D11/04C25D11/24
    • C25D1/20C25D1/006C25D1/10C25D3/38C25D11/045C25D11/20C25D11/24G01R1/06H01L24/27H01R12/7076H01R2201/20H05K3/32H05K2203/162
    • An object of the present invention is to provide a method for manufacturing a metal-filled microstructure, capable of easily filling micropores with metal and suppressing the generation of residual stress caused by metal filling. A method for manufacturing a metal-filled microstructure according to the present invention includes: an anodic oxidation treatment step of anodically oxidizing a single surface of an aluminum substrate to form an anodic oxidation film on the single surface of the aluminum substrate, the anodic oxidation film including micropores, which are present in a thickness direction, and a barrier layer which is present in a bottom portion of the micropores; a barrier layer removal step of removing the barrier layer of the anodic oxidation film after the anodic oxidation treatment step; a metal filling step of filling the inside of the micropores with metal through an electroplating treatment after the barrier layer removal step; and a substrate removal step of removing the aluminum substrate to obtain a metal-filled microstructure after the metal filling step.
    • 本发明的一个目的是提供一种用于制造金属填充微结构的方法,其能够容易地用金属填充微孔并且抑制由金属填充引起的残余应力的产生。 根据本发明的用于制造金属填充微结构的方法包括:阳极氧化处理步骤,阳极氧化铝基板的单个表面以在铝基板的单个表面上形成阳极氧化膜,阳极氧化膜 包括存在于厚度方向上的微孔和存在于微孔底部中的阻挡层; 在阳极氧化处理步骤之后去除阳极氧化膜的阻挡层的阻挡层去除步骤; 金属填充步骤,在阻挡层去除步骤之后通过电镀处理用金属填充微孔的内部; 和在金属填充步骤之后除去铝基板以获得金属填充的微结构的基板去除步骤。