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    • 66. 发明公开
    • APPARATUS AND METHOD FOR FLOW OF PROCESS GAS IN AN ULTRA-CLEAN ENVIRONMENT
    • VORRICHTUNG UND VERFAHRENFÜRDEN FLUSS VON PROZESSGAS IN EINER ULTRASAUBEREN UMGEBUNG
    • EP1313896A4
    • 2006-02-15
    • EP01973670
    • 2001-08-28
    • REFLECTIVITY INC
    • PATEL SATYADEVSCHAADT GREGORY PMACDONALD DOUGLAS BMACDONALD NILES K
    • H01L21/00H01L21/302C03C15/00C25F3/12H01L20060101
    • H01L21/67063C03C15/00C03C2218/33H01L21/67017
    • Processes for the addition or removal of a layer or region from a workpiece (14) material by contact with a process gas, in the manufacture of a microstructure, are enhanced by the use of a recirculation of the process gas. Recirculation is effected by a pump (18) that has no sliding or abrading parts that contact the process gas nor any wet (such as oil) seals or purge gas in the pump (18). Improved processing can be achieved by a process chamber (15) that contains a baffle (16), a perforated plate (17), or both, appropriately situated in the chamber (15) to deflect the incoming process gas and distribute it over the workpiece (14) surface. In certain embodiments, a diluent gas is added to the recirculation loop (36) and continuously recirculated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop (36). Also, cooling of the process gas, etching chamber (15) and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample (14) of microscopic dimensions.
    • 通过使用工艺气体的再循环来增强在制造微结构中通过与工艺气体接触从w工件材料中添加或除去层或区域的工艺。 循环由不具有接触处理气体的滑动或研磨部件的泵进行,而不是在泵中的任何湿的(例如油)密封件或吹扫气体。 可以通过包含挡板,多孔板或两者的处理室来实现改进的处理,适当地位于室中以偏转进入的工艺气体并将其分布在工件表面上。 在某些实施方案中,将稀释气体加入到再循环回路中并在其中连续循环,随后将工艺气体(例如蚀刻剂气体)渗出到再循环回路中。 此外,处理气体,蚀刻室和/或样品台的冷却可以帮助蚀刻工艺。 该方法对于从微观尺寸的样品中添加或除去材料特别有用。