基本信息:
- 专利标题： Cleaning apparatus
- 专利标题（中）：净化器
- 申请号：EP05253885.7 申请日：2005-06-22
- 公开(公告)号：EP1612847A3 公开(公告)日：2007-11-28
- 发明人： O'Donnell, Robert J.
- 申请人： LAM RESEARCH CORPORATION
- 申请人地址： 4650 Cushing Parkway Fremont, CA 94538 US
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： 4650 Cushing Parkway Fremont, CA 94538 US
- 代理机构： Thomson, Paul Anthony
- 优先权： US883301 20040630; US956799 20040930
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
An apparatus for processing a substrate is provided which includes a proximity head proximate to a surface of the substrate when in operation. The apparatus also includes an opening on a surface of the proximity head to a cavity defined in the proximity head where the cavity delivers an active agent to the surface of the substrate through the opening. The apparatus further includes a plurality of conduits on the surface of the proximity head that generates a fluid meniscus on the surface of the substrate surrounding the opening.
公开/授权文献:
- EP1612847B1 Cleaning apparatus 公开/授权日：2010-11-17
IPC结构图谱:
| H | 电学 |
| --H01 | 基本电气元件 |
| ----H01L | 半导体器件；其他类目未包含的电固体器件 |
| ------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |