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61. 发明公开

EP0289661A3 Verfahren zur reproduzierbaren Bildung von Materialschichten und/oder zur Behandlung von Halbleiter-Materialschichten 失效
标题翻译：可重复形成材料层和/或用于处理半导体材料层的程序
公开(公告)号：EP0289661A3
公开(公告)日：1989-02-01
申请号：EP87118299.4
申请日：1987-12-10
申请人： Messerschmitt-Bölkow-Blohm Gesellschaft mit beschränkter Haftung
发明人： Meyer, Meinhard, Dr. , Störmer, Oswald
IPC分类号： H01L21/66 , H01L21/205 , C23C14/54 , C23C16/52 , H01C17/06 , G01R27/30
CPC分类号： C23C14/545 , C23C14/54 , C23C16/52
摘要： Zur reproduzierbaren Bildung von Materialschichten im Wege des Aufdampfend oder Zerstäubens oder der chemischen Abscheidung usw. und/oder zur Behandlung von Materialschichten, insbesondere von Halbleiterschichten durch Diffusion oder Ionenimplantation, wobei während der Schichtbildung zumindest ein Parameter der Materialschicht gemessen und als Meßsignal in einer digitalen Auswerteschaltung zur On-Line-Steuerung des Schichtbildungsprozesses berücksichtigt wird, wird in bestimmten Zeitabständen kurzzeitig ein Prüfsignal mit vorgegebenem Verlauf oder Frequenzspektrum oder vorgegebener Frequenzfolge an die Materialschicht angelegt. In einem Prozeßrechner der digitalen Auswerteschaltung werden aus dem jeweiligen Prüfsignal (Stromsignal) und dem zugeordneten Meßsignal (Spannungssignal) zeitlich voneinander trennbare Impedanz-Anteile ermittelt, die untereinander abweichende Werte oder Wertebereiche von Zeitkonstanten und gegebenenfalls zusätzlich von Leitfähigkeiten aufweisen und die insgesamt kennzeichnend sind für den durch die sich bildende Schicht fließenden Strom, nämlich den Strom durch die homogenen Materialbereiche der Schicht (Intrinsik-Strom i₂), den über die Partikel-Grenzflächen (Korngrenzen-Strom i₃) fließenden Strom und den über die Schichtoberfläche fließenden Strom (Oberflächenstrom i₁).

62. 发明公开

EP0299752A2 Plasma thin film deposition process control 失效
标题翻译： Kontrolle eines Verfahrens zur Abscheidung einesdünnenFilmes mittels Plasma。
公开(公告)号：EP0299752A2
公开(公告)日：1989-01-18
申请号：EP88306431.3
申请日：1988-07-13
申请人： The BOC Group, Inc.
发明人： Felts, John T , Lopata, Eugene S.
IPC分类号： C23C14/22 , C23C14/34 , C23C16/44 , C23C16/52 , G01N21/00
CPC分类号： C23C14/0042 , C23C14/54 , C23C16/52
摘要： In a process of depositing a thin film onto a surface of a substrate with the use of a plasma, wherein the plasma optical emission is monitored, analyzed, and the results used to automatically control the nature of the plasma in order to control the characteristics of the deposited thin film. One aspect of the emission that is detected is the intensity of each of two emission lines of different wavelength bands from the same plasma species, the intensities being ratioed and the ratio compared to a predetermined value known to provide a resulting film with uniform and repeatable characteristics. This ratio is also related to the average electron temperature of the plasma, which can be calculated from it. Additionally, the intensity of another emission line from another of the plasma species may be measured and ratioed to one of the foregoing line intensities if additional control is desired.
摘要翻译：在使用等离子体将薄膜沉积到衬底的表面上的过程中，其中监测，分析等离子体发射，并且用于自动控制等离子体性质的结果以控制等离子体的特性沉积的薄膜。检测到的发射的一个方面是来自相同等离子体种类的不同波长带的两个发射线中的每个发射线的强度，比例的强度和与已知提供具有均匀和可重复特性的所得膜的预定值相比的比率。该比例也与等离子体的平均电子温度有关，可从其计算。另外，如果需要额外的控制，则可以测量来自另一个等离子体物质的另一发射线的强度并且与上述线强度之一成比例。

63. 发明公开

EP0259961A3 Ion beam dosimetry 失效
标题翻译：离子束计量
公开(公告)号：EP0259961A3
公开(公告)日：1988-10-12
申请号：EP87306517
申请日：1987-07-23
申请人： MILLSPIN LIMITED
发明人： Dearnaley, Geoffrey , Hughes, Antony Elwyn , Rosenbaum, Steven
IPC分类号： C23C14/52
CPC分类号： C23C14/48 , C23C14/54
摘要： A work piece 13 is implanted with N⁺ ions from a source 1 to improve its surface hardness. The dosage of implanted ions is monitored by a member 14 which changes its colour in dependence upon the dose. The member 14 may comprise a tantalum plate 15 with an anodic oxide layer 16 of a thickness to produce intereference coulours. In accordance with the invention this layer 16 changes colours as a function of the ion dosage.

64. 发明公开

EP0151737A3 Process for controlling and monitoring the incorporation of a doping material into conductive metallic layers during their manufacture 失效
标题翻译：在制造过程中控制和监测掺杂材料进入导电金属层的过程
公开(公告)号：EP0151737A3
公开(公告)日：1988-03-30
申请号：EP84115049
申请日：1984-12-10
申请人： Siemens Aktiengesellschaft
发明人： Hieber, Konrad, Dr. rer. nat. , Mayer, Norbert, Dr. rer. nat.
IPC分类号： C23C14/54 , G01R27/00 , G05D05/03 , H01C17/08
CPC分类号： C23C14/54 , G01R27/00 , G05D5/03 , H01C17/08 , H01C17/12

65. 发明公开

EP0227438A2 Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias 失效
标题翻译：磁控溅射，设置有单独的磁约束场与靶相隔，并与一个由射频极化加强。
公开(公告)号：EP0227438A2
公开(公告)日：1987-07-01
申请号：EP86309903.2
申请日：1986-12-18
申请人： VARIAN ASSOCIATES, INC.
发明人： Mintz, Donald M.
IPC分类号： H01J37/34
CPC分类号： C23C14/54 , C23C14/351 , H01J37/3405 , H01J37/3408 , H01J37/3458
摘要： A first target for a magnetron sputter device has a planar annular emitting surface bounded by an inner radius R1 and an outer radius R2. A second target has a sloped emitting surface defined by a side wall of a frustum of a cone. The second target is limited by an inner radius R3 and outer radius R4. R3 is greater than R2. Each target element has pins in diametrically opposite holes to assist in holding the target elements in situ in bayonet slots in the sputter device. The targets are fit closely in cooling rings so that as the targets heat during operation, thermal expansion of the targets assists thermal conduction into the cooling rings. A coil is formed behind the workpiece to act as a mirror to the plasma. The field of the coil moves the plasma away from the workpiece which permits putting high power R.F. bias on the workpiece. The R.F. bias in combination with gas heating the wafer from behind aids in sputtering a coating of superior conformality.
摘要翻译：为磁控溅射装置的第一目标具有通过在内半径R1和R2的外半径为界的平面环形设计发射面。第二靶具有通过圆锥台的侧壁所限定的倾斜发射表面。第二目标是通过在innerRadius R3和R4 outerRadius限制。 R3大于R2。每个目标元件具有在直径上相对的孔中的销，以帮助保持在卡口槽的原位靶元素在溅射装置。这些目标是紧密配合在冷却环所以也：作为目标手术期间加热时，靶的热膨胀有助于热传导到冷却环。甲线圈工件充当镜到等离子体的后方形成。线圈的领域从工件允许把高功率射频移动血浆远偏在工件上。该射频偏压与气体中溅射保形优越的涂层从后面助剂加热晶片组合。

66. 发明授权

EP4133118B1 METHOD FOR MONITORING PROCESS CONDITIONS OF, AND METHOD FOR CONTROLLING, A PLASMA PVD PROCESS 有权
公开(公告)号：EP4133118B1
公开(公告)日：2024-08-07
申请号：EP21716868.1
申请日：2021-03-29
IPC分类号： H01J37/34 , C23C14/34 , C23C14/35 , C23C14/54
CPC分类号： C23C14/35 , C23C14/345 , C23C14/54 , C23C14/543 , H01J37/3467

67. 发明公开

EP3368705A1 VORRICHTUNG UND VERFAHREN ZUM BESCHICHTEN ÜBERLANGER FLÄCHENHAFTER SUBSTRATE, INSBESONDERE GLASSCHEIBEN, IN EINER VAKUUM-BESCHICHTUNGSANLAGE 有权
公开(公告)号：EP3368705A1
公开(公告)日：2018-09-05
申请号：EP16797448.4
申请日：2016-10-20
申请人： Grenzebach Maschinenbau GmbH
发明人： GAWER, Olaf , RICHERT, Holger , ELLRICH, Jens
IPC分类号： C23C14/56
CPC分类号： C23C14/562 , C23C14/54 , C23C14/566 , C23C14/568
摘要： The invention relates to a device and a method for coating extra-long sheet-type substrates, in particular glass panes, in a vacuum coating system, said system having the following features: a) a series connection of chambers, through which each substrate sheet (9) passes and which are arranged on the entry side, namely a load lock chamber (1), a buffer chamber (2) and a transfer chamber (3), the entry side of each of said chambers being vacuum-sealable by a check valve (8, 11, 15), wherein an area of process chambers (4) follows the transfer chamber (3) and an exit-side series connection of a transfer chamber (5), buffer chamber (7) and load lock chamber (8) follows the process chambers (4); b) a conveyor device (10) constructed on rollers; c) a single high-power vacuum pump (13) with an adapter flange (14) in the region of the buffer chamber (2); d) at least two flow baffles (12) in the region of the buffer chamber (2); e) a system (16) for the longitudinal displacement of the flow baffles (12) and a system (17) for adjusting the height of the flow baffles (12); f) an assembly for controlling the dynamic processes.

68. 发明公开

EP3330579A4 PISTON RING AND MANUFACTURING METHOD THEREOF 有权
公开(公告)号：EP3330579A4
公开(公告)日：2018-07-18
申请号：EP16832939
申请日：2016-07-29
申请人： NIPPON PISTON RING CO LTD
发明人： OZAKI TAKUYA , SUGIURA HIROYUKI
IPC分类号： F16J9/26 , C23C14/06 , C23C14/32 , C23C14/54 , F02F5/00
CPC分类号： F16J9/26 , C23C14/0605 , C23C14/325 , C23C14/54 , F02F5/00
摘要： To provide a piston ring comprising a hard carbon film that is easy to form and exhibits excellent adhesion and wear resistance, and a manufacturing method therefor. The above-described problem is solved by means of a piston ring comprising a hard carbon film 50 formed on at least an outer peripheral sliding surface 11 of a piston ring base material 1, wherein the hard carbon film 50 is a laminated film comprising a plurality of layers, including an upper layer 5 with a lamination pitch within a range of 3 nm to 50 nm inclusive, a middle layer 4 with a lamination pitch less than that of the upper layer 5, and a lower layer 3 with a lamination pitch within the same range as that of the upper layer 5 and greater than that of the middle layer 4. This hard carbon film 50 may be configured to have an sp 2 component ratio within a range of 35% to 80% inclusive, measured in a TEM-EELS spectrum formed by combining electron energy loss spectroscopy (EELS) with a transmission electron microscope (TEM), and a hydrogen content within a range of 0.1 atom% to 5 atom% inclusive.

69. 发明授权

EP1818505B2 Verfahren zum Herstellen einer Beschichtungsprobe 有权转让
标题翻译：生产涂层样品的方法
公开(公告)号：EP1818505B2
公开(公告)日：2017-12-13
申请号：EP06002582.2
申请日：2006-02-08
申请人： Siemens Aktiengesellschaft
发明人： Berndt, Thomas , Ladru, Francis-Jurjen, Dr. , Mensing, Marcus , Reymann, Helge , Wanigasinghe, Mahinda
IPC分类号： F01D5/28 , C23C30/00 , G01N1/00
CPC分类号： F01D5/288 , C23C4/01 , C23C4/12 , C23C14/54 , C23C28/3215 , C23C28/345 , C23C28/3455 , F05D2230/232 , G01N2203/0246 , G01N2203/0664 , Y02T50/67

70. 发明授权

EP2834389B1 BESCHICHTUNGSQUELLE MIT EINEM AN EINE INDIREKTE KÜHLVORRICHTUNG ANGEPASSTEN TARGET 有权转让
标题翻译：涂层源的间接COOLER匹配的目标
公开(公告)号：EP2834389B1
公开(公告)日：2016-11-30
申请号：EP13709319.1
申请日：2013-03-05
申请人： Oerlikon Surface Solutions AG, Pfäffikon
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg
IPC分类号： C23C14/34
CPC分类号： H01J37/3497 , C09J7/22 , C23C14/34 , C23C14/3407 , C23C14/54 , H01J37/3411 , H01J37/3417 , H01J37/3435 , H01J2237/002

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