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1. 发明公开

EP3103893A1 VACUUM VAPOR DEPOSITION METHOD 有权
标题翻译： VAKUUMDAMPFABSCHEIDUNGSVERFAHREN
公开(公告)号：EP3103893A1
公开(公告)日：2016-12-14
申请号：EP16177892.3
申请日：2010-06-28
申请人： Mitsubishi Heavy Industries, Ltd.
发明人： Yanagi, Yuji
IPC分类号： C23C14/12 , C23C14/24
CPC分类号： C23C14/24 , C23C14/12 , C23C14/243 , C23C14/543
摘要： In a vacuum vapor deposition method including a plurality of linear-shaped vaporization sources, equal-thickness surfaces (19a, 19b) are calculated for vaporization containers (8a, 8b), respectively. Each of the equal-thickness surfaces (19a, 19b) indicates where a deposition amount of vapor of a vaporization material released from release holes (13a, 13b) in the corresponding vaporization container (8a, 8b) is the same per unit time. Then, the vaporization containers (8a, 8b) are placed in such a manner that contact points of the respective equal-thickness surfaces (19a, 19b) all coincide with each other on a deposition surface of a substrate (4), each of the contact points being where the corresponding equal-thickness surfaces (19a, 19b) come in contact with the deposition surface of the substrate (4).
摘要翻译：在包括多个线性蒸发源的真空气相沉积方法中，分别为蒸发容器（8a，8b）计算等厚度的表面（19a，19b）。每个等厚度表面（19a，19b）表示在相应的蒸发容器（8a，8b）中从释放孔（13a，13b）释放的蒸发材料的蒸气的沉积量在每单位时间相同的地方。然后，将蒸发容器（8a，8b）以这样的方式设置，使得各个等厚度表面（19a，19b）的接触点在基板（4）的沉积表面上彼此重合，接触点是相应的等厚度表面（19a，19b）与衬底（4）的沉积表面接触的位置。

2. 发明公开

EP2873750A4 METHOD FOR SUPPLYING DEPOSITION MATERIAL, METHOD FOR PRODUCING SUBSTRATE, CONTROL DEVICE, AND DEPOSITION DEVICE 有权
标题翻译：方法喂养沉积材料，用于生产衬底控制装置与分离装置
公开(公告)号：EP2873750A4
公开(公告)日：2015-08-05
申请号：EP12886815
申请日：2012-10-19
申请人： MITSUBISHI HEAVY IND LTD
发明人： YAMAGUCHI RYUTA , GOTO TETSUYA , SHIGEOKA NOBUYUKI
IPC分类号： C23C14/24
CPC分类号： C23C14/246 , C23C14/24 , C23C14/543

3. 发明授权

EP2508645B1 Evaporation system with measurement unit 有权
标题翻译： Verdampfungssystem mit Messeinheit
公开(公告)号：EP2508645B1
公开(公告)日：2015-02-25
申请号：EP11161343.6
申请日：2011-04-06
申请人： Applied Materials, Inc.
发明人： Hoffmann, Uwe
IPC分类号： C23C14/54 , C23C14/24
CPC分类号： B05D1/60 , B05B1/005 , B05B1/20 , B05B1/24 , C23C14/243 , C23C14/543 , H01L51/0008

4. 发明公开

EP1975928A2 Method of and apparatus for substantially preventing condensation on surfaces of a flow path for lubricant vapor flowing to a magnetic disk to form a lubricant coating on the disk 审中-公开
标题翻译：用于基本防止对磁盘上流动的蒸汽授粉的流动路径的表面上的冷凝的方法和设备，以在该盘授粉的涂层
公开(公告)号：EP1975928A2
公开(公告)日：2008-10-01
申请号：EP08251172.6
申请日：2008-03-28
申请人： INTEVAC, INC.
发明人： Petersen, Carl , Ames, Kenneth
IPC分类号： G11B5/84
CPC分类号： G11B5/8408 , C23C14/12 , C23C14/543
摘要： Condensation is prevented on surfaces in a flow path for lubricant vapor that applies lubricant coatings to magnetic disks 18 in the flow path. The vapor is derived by heating liquid in a reservoir 24. The flow path includes a vapor chamber between the reservoir and an apertured diffuser 30. The vapor chamber has a first wall extending in the same direction as a straight-line path between the reservoir and the disk and a second wall providing a heat conduction path between the heater and the reservoir. The relative temperatures of the first and second walls is controlled to prevent substantial condensation on surfaces of the flow path.
摘要翻译：缩合防止在表面上的在润滑剂蒸汽的流动路径没有适用的润滑剂涂层，以在所述流动路径磁盘18。所述的蒸汽是通过在贮存器中加热的液体导出24.流路包括贮存器之间，并有孔的蒸气腔室漫30.蒸汽室具有第一壁在相同的方向上储液器和盘和第二壁提供所述加热器和所述贮存器之间的热传导路径之间的直线路径延伸。所述第一壁和第二壁的相对温度被控制以防止在流动路径的表面基本上冷凝。

5. 发明公开

EP1975926A2 Method of and apparatus for monitoring flow of lubricant vapor forming lubricant coatings of magnetic disks 审中-公开
标题翻译：用于润滑剂蒸气流的控制方法及装置，以形成用于磁盘润滑剂涂层
公开(公告)号：EP1975926A2
公开(公告)日：2008-10-01
申请号：EP08251147.8
申请日：2008-03-28
申请人： INTEVAC, INC.
发明人： Petersen, Carl , Ames, Kenneth
IPC分类号： G11B5/72
CPC分类号： G11B5/8408 , C23C14/12 , C23C14/543
摘要： Lubricant coatings are applied as lubricant vapor to magnetic disks 18 in a lubricant vapor flow path between the disks and a reservoir 24 for liquid lubricant that is heated to the vapor. The flow path includes a vapor chamber between the reservoir and an apertured diffuser 30. Plural piezoelectric crystals selectively, at different times, monitor the flow rate of lubricant vapor flowing in the vapor chamber, a result achieved by selectively positioning a shutter 28 that is selectively opened and closed between the vapor flowing in the vapor chamber and the crystals. Temperature variations of the crystals are compensated by a feedback arrangement for maintaining the crystal temperature constant.
摘要翻译：润滑剂涂层被应用为润滑剂蒸气向磁盘18在磁盘和用于液体润滑剂的贮存器24之间的润滑剂蒸气流动路径并加热至蒸汽。该流动路径包括储存器之间，并有孔扩散器30中的蒸汽室，多个压电晶体选择性地，在不同的时间，监测润滑剂蒸汽的流速在蒸汽室中流动，通过选择性地定位挡板28做取得的结果被选择性打开和在蒸汽室和所述晶体中流动的蒸汽之间关闭。晶体的温度变化是通过反馈装置用于维持晶体温度恒定补偿。

6. 发明公开

EP0421015A1 Process for producing transparent conductive film 失效
标题翻译： Verfahren und Vorrichtung zur Herstellung eines leitenden，durchsichtigen Films。
公开(公告)号：EP0421015A1
公开(公告)日：1991-04-10
申请号：EP89118603.3
申请日：1989-10-06
申请人： NIHON SHINKU GIJUTSU KABUSHIKI KAISHA
发明人： Nakamura, Kyuzo c/o Nihon Shinku Gijutsu K.K. , Ishibashi, Satoru c/o Nihon Shinku Gijutsu K.K. , Ota, Yoshifumi c/o Nihon Shinku Gijutsu K.K. , Higuchi, Yasushi c/o Nihon Shinku Gijutsu K.K.
IPC分类号： C23C14/08 , C23C14/35 , C23C14/54 , H01J37/34
CPC分类号： C23C14/543 , C23C14/086 , C23C14/35
摘要： In a process for producing an In-O or In-Sn-O based transparent conductive film by a sputtering process, a sputtering is effected in such a condition that the intensity of a magnetic field on a surface of a target is adjusted in a range of 400 Oe or more so that the sputtering voltage, during sputtering film formation operation, is kept constant. An apparatus for procuding an In-O or In-Sn-O based transparent conductive film on a substrate 4 by a plasma discharge generated between the substrate 4 and a target 8, both of which are mounted in opposition to each other within a vacuum chamber 1, comprises an electromagnet 10 for adjusting the intensity of a magnetic field on the surface of the target 8 is provided on the rear surface side of the target 8, and a controller 13 for controlling the electric current supplied to the electromagnet 10, in accordance with a change in sputtering voltage, is so provided as to be connected to a DC power supply source 9 for the electromagnet 10.
摘要翻译：在通过溅射法制造In-O或In-Sn-O系透明导电膜的方法中，在目标表面上的磁场强度调整到一定范围的条件下进行溅射为400Oe以上，使得在溅射成膜操作期间的溅射电压保持恒定。一种用于通过在基板4和目标8之间产生的等离子体放电在基板4上生成In-O或In-Sn-O系透明导电膜的装置，两者均在真空室内彼此相对安装如图1所示，包括用于调整目标8的表面上的磁场强度的电磁体10设置在目标8的后表面侧，以及控制器13，用于控制供应到电磁体10的电流溅射电压的变化被提供为连接到用于电磁体10的直流电源9。

7. 发明授权

EP2873750B1 METHOD FOR SUPPLYING DEPOSITION MATERIAL, METHOD FOR PRODUCING SUBSTRATE, CONTROL DEVICE, AND DEPOSITION DEVICE 有权
标题翻译：方法喂养沉积材料，用于生产衬底控制装置与分离装置
公开(公告)号：EP2873750B1
公开(公告)日：2016-10-05
申请号：EP12886815.5
申请日：2012-10-19
申请人： Mitsubishi Heavy Industries, Ltd.
发明人： YAMAGUCHI Ryuta , GOTO Tetsuya , SHIGEOKA Nobuyuki
IPC分类号： C23C14/24 , C23C14/54
CPC分类号： C23C14/246 , C23C14/24 , C23C14/543

8. 发明公开

EP2519656A4 VAPORIZATION APPARATUS AND METHOD FOR CONTROLLING THE SAME 有权
标题翻译： VERDAMPFUNGSVORRICHTUNG UND VERFAHREN ZU IHRER STEUERUNG
公开(公告)号：EP2519656A4
公开(公告)日：2014-08-20
申请号：EP10841200
申请日：2010-12-24
申请人： SNU PRECISION CO LTD
发明人： SEO SEUNG CHEOL , GONG DOO WON , LEE JONG HA , LEE KYUNG BUM , JUNG SUNG JAE , CHO WHANG SIN
IPC分类号： C23C14/24 , B01D1/00 , C23C14/54 , C23C16/448 , C23C16/52
CPC分类号： C23C16/4485 , B01D1/0017 , B01D1/0082 , C23C14/24 , C23C14/543 , C23C16/52

9. 发明公开

EP2469268A1 Evaporation system with measurement unit 审中-公开
标题翻译：带测量单元的蒸发系统
公开(公告)号：EP2469268A1
公开(公告)日：2012-06-27
申请号：EP10196882.4
申请日：2010-12-23
申请人： Applied Materials, Inc.
发明人： Dieguez-Campo, Jose Manuel , Hoffmann, Uwe , Johannes, Hans Herrmann , Fabig, Stefan , Kowalski, Wolfgang
IPC分类号： G01N21/85 , C23C14/54
CPC分类号： G01N21/85 , C23C14/243 , C23C14/543 , G01N2021/8416 , G01N2021/8557
摘要： An evaporation system for applying vapor to a substrate in a vacuum chamber at a coating rate comprises a distribution pipe with an inlet for receiving the vapor; an evaporation section having a first outlet for applying the vapor to a substrate, the evaporation section defining a first fluidal path for the vapor to go from the inlet to the first outlet; a measurement section having a second outlet for displacing the vapor from the measurement section, the measurement section defining a second fluidal path for the vapor to go from the inlet to the second outlet; and a light sensitive detector for measuring at least one characteristic property of the vapor in the measurement section. Further, a vacuum chamber including an evaporation system is disclosed, and a method for measuring the application rate of a vapor.
摘要翻译：用于以涂布速率将蒸汽施加到真空室中的基底的蒸发系统包括具有用于接收蒸气的入口的分配管; 蒸发部分，具有用于将蒸汽施加到基底的第一出口，蒸发部分限定蒸汽从入口到第一出口的第一流体路径; 测量部分，其具有用于从测量部分移动蒸汽的第二出口，测量部分限定用于蒸气从入口到第二出口的第二流体路径; 以及用于测量测量部分中的蒸气的至少一个特性的光敏检测器。此外，公开了包括蒸发系统的真空室和用于测量蒸气的施用率的方法。

10. 发明公开

EP2284292A1 Vacuum vapor deposition apparatus 审中-公开
标题翻译：真空气相沉积设备
公开(公告)号：EP2284292A1
公开(公告)日：2011-02-16
申请号：EP10167474.5
申请日：2010-06-28
申请人： Mitsubishi Heavy Industries, Ltd.
发明人： Yanagi, Yuji
IPC分类号： C23C14/12 , C23C14/24
CPC分类号： C23C14/24 , C23C14/12 , C23C14/243 , C23C14/543
摘要： In a vacuum vapor deposition apparatus including a plurality of linear-shaped vaporization sources, equal-thickness surfaces (19a, 19b) are calculated for vaporization containers (8a, 8b), respectively. Each of the equal-thickness surfaces (19a, 19b) indicates where a deposition amount of vapor of a vaporization material released from release holes (13a, 13b) in the corresponding vaporization container (8a, 8b) is the same per unit time. Then, the vaporization containers (8a, 8b) are placed in such a manner that contact points of the respective equal-thickness surfaces (19a, 19b) all coincide with each other on a deposition surface of a substrate (4), each of the contact points being where the corresponding equal-thickness surfaces (19a, 19b) come in contact with the deposition surface of the substrate (4).
摘要翻译：在具有多个线状的气化源的真空蒸镀装置中，分别计算蒸发容器（8a，8b）的等厚面（19a，19b）。每个等厚表面（19a，19b）指示从相应汽化容器（8a，8b）中的释放孔（13a，13b）释放的汽化材料的蒸汽沉积量每单位时间相同的位置。然后，以使各等厚表面（19a，19b）的接触点在基板（4）的蒸镀面上全部一致的方式配置蒸发容器（8a，8b）接触点是对应的等厚度表面（19a，19b）与衬底（4）的沉积表面接触的地方。

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