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41. 发明公开

EP2847167A1 OXIME ESTER PHOTOINITIATORS 失效
标题翻译： OXIME酯摄影师
公开(公告)号：EP2847167A1
公开(公告)日：2015-03-18
申请号：EP13721682.6
申请日：2013-05-06
申请人： BASF SE
发明人： NISHIMAE, Yuichi , KURA, Hisatoshi , KUNIMOTO, Kazuhiko , YAMAGAMI, Ryuhei , TANAKA, Keita
IPC分类号： C07D209/88 , G03F7/031
CPC分类号： G03F7/027 , C07D209/86 , C07D209/88 , C08F122/20 , C09D135/02 , G02B5/20 , G03F7/0007 , G03F7/031 , G03F7/033 , G03F7/20 , G03F7/2002 , G03F7/2037 , G03F7/26 , G03F7/30
摘要： Oxime ester compounds of the formula V wherein Z 2 is for example unsubstituted or substituted C 7 -C 20 aroyl; R 1 , R 2 , R 3 , R 4 , R 5 and R 6 for example are hydrogen, halogen, or unsubstituted or substituted C 1 -C 20 alkyl, unsubstituted or substituted C 6 -C 20 aryl, or unsubstituted or substituted C 4 -C 20 heteroaryl; R 10 for example is hydrogen, halogen, OR 16 , unsubstituted or substituted C 1 -C 20 alkyl; R 14 is for example unsubstituted or substituted C 6 -C 20 aryl or C 3 -C 20 heteroaryl Q 3 is for example phenylene; L is for example O-alkylene-O-; R 15 is for example hydrogen or C 1 -C 20 alkyl; R 20 is for example hydrogen, or unsubstituted or substituted C 1 -C 20 alkyl; are effective photoinitiators.
摘要翻译：式I，II，III，IV或V的肟酯化合物，其中Z为例如（式A）; Z 1为NO 2，未取代或取代的C 7 -C 20芳酰基或未取代或取代的C 4 -C 20杂芳酰基; 条件是至少一个Z 1不是NO 2; Z 2例如为未取代的或取代的C 7 -C 20芳酰基; 例如R 1，R 2，R 3，R 4，R 5和R 6为氢，卤素或未取代或取代的C 1 -C 20烷基，未取代或取代的C 6 -C 20芳基或未取代或取代的C 4 - C20杂芳基; 例如R 9，R 10，R 11，R 12和R 13是氢，卤素，OR 16，未取代或取代的C 1 -C 20烷基; 条件是R 9和R 13既不是氢也不是氟; R 14例如为未取代或取代的C 6 -C 20芳基或C 3 -C 20杂芳基，Q为例如C 6 -C 20亚芳基或C 3 -C 20杂亚芳基; Q 1是-C 1 -C 20亚烷基-CO-; Q 2是萘并萘; Q 3例如是亚苯基; L例如是O-亚烷基-O-; R 15例如是氢或C 1 -C 20烷基; R 20例如为氢，或未取代或取代的C 1 -C 20烷基; 是有效的光引发剂。

42. 发明公开

EP2806315A2 A method and apparatus for fabricating a coloured component for a watch 审中-公开
标题翻译：对于用于钟表制造颜色分量的方法和装置
公开(公告)号：EP2806315A2
公开(公告)日：2014-11-26
申请号：EP14169164.2
申请日：2014-05-20
申请人： Master Dynamic Limited
发明人： Wang, Yingnan , Kong, Ching Tom
IPC分类号： G04D3/00 , G04B19/12
CPC分类号： G04B19/268 , C23C14/35 , G03F7/20 , G03F7/26 , G04B19/12 , G04D3/0092
摘要： A method of fabricating a component including a wafer for use in a watch includes depositing a first thin film (301) onto the wafer (300), the first thin film being adapted to allow light reflected away from the wafer to be indicative of a first colour characteristic. The first thin film (301) may include silicon nitride and have a refractive index greater than 2. The method may also include defining a pattern (12, 13) on the first thin film (301) using photolithography and processing a region within a boundary of the pattern, e.g. by depositing a metal or a ceramic material within the boundary of the pattern, so that the region allows light reflected away from the wafer (300) to be indicate of a second colour characteristic.
摘要翻译：一种制造构件包括用于在手表中使用的晶片的方法包括，在这些晶片（300）上沉积第一薄膜（301），所述第一薄膜是angepasst以允许反射的光从晶片离开为指示第一的色彩特性。所述第一薄膜（301）可以包括硅氮化物和具有折射率大于2因此，该方法可以包括图案限定在第一薄膜（301）（12，13），使用光刻法和边界内的处理的区域图案的，例如由金属或图案的边界内的陶瓷材料上沉积，象区域允许光反射从晶片（300）要离开的第二颜色特性的指示。

43. 发明授权

EP1811341B1 Positive photosensitive composition and method of forming pattern using the same 有权
标题翻译：该正型感光性组合物和方法，用于形成结构，使得
公开(公告)号：EP1811341B1
公开(公告)日：2012-11-07
申请号：EP07001487.3
申请日：2007-01-24
申请人： Fujifilm Corporation
发明人： Takahashi, Hyou , Sugimoto, Naoya , Kodama, Kunihiko , Yamamoto, Kei
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , C08F224/00 , G03F7/26 , G03F7/38 , Y10S430/106 , Y10S430/111

44. 发明授权

EP1805560B1 METHOD OF PREVENTING PREMATURE CURING OF CUT SURFACES OF A PHOTOSENSITIVE PRINTING ELEMENT, PHOTOSENSITIVE PRINTING ELEMENT OBTAINABLE BY SUCH A METHOD 有权
标题翻译：方法，以防止光敏元件压力过早固化切割面，通过这样的方法制备压敏发光元件
公开(公告)号：EP1805560B1
公开(公告)日：2012-10-03
申请号：EP05782469.0
申请日：2005-08-01
申请人： MacDermid Printing Solutions, LLC
发明人： ROSHELLI, Albert, G., Jr. , RECCHIA, David
IPC分类号： G03F7/24 , G03F1/00 , B41N1/12
CPC分类号： G03F7/168 , G03F7/11 , G03F7/202 , G03F7/26

45. 发明公开

EP2492340A1 Soft substrate for cell culture and process for preparing the same 有权
标题翻译： WEICHES SUBSTRATFÜRZELLKULTUR UND VERFAHREN ZU DESSEN HERSTELLUNG
公开(公告)号：EP2492340A1
公开(公告)日：2012-08-29
申请号：EP11305122.1
申请日：2011-02-07
申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
发明人： Tseng, Qingzong , Thery, Manuel
IPC分类号： C12N5/00
CPC分类号： C12N5/0068 , C12N2503/02 , C12N2535/10 , G01N33/5011 , G03F7/2014 , G03F7/26
摘要： The present invention relates to a method for producing a soft substrate and to the soft substrate produced thereby, said substrate being particularly useful for cell culture.
摘要翻译：本发明涉及一种软质基材的制造方法和由此制备的软质基材，该基材特别适用于细胞培养。

46. 发明公开

EP2174757A2 polymeric web exhibiting a soft and silky tactile impression 审中-公开
标题翻译： Polymerische Bahn，die beimBerühreneinen weichen und seidigen Eindruck vermittelt
公开(公告)号：EP2174757A2
公开(公告)日：2010-04-14
申请号：EP09165784.1
申请日：2003-12-19
申请人： The Procter and Gamble Company
发明人： Stone, Keith Joseph , Gray, Brian Francis , Broyles, Norman Scott , Collias, Dimitris Ioannis , Lee, Yann-Per
IPC分类号： B26F1/26 , A61F13/512 , B29C59/02
CPC分类号： G03F7/26 , A61F13/15731 , A61F13/51121 , A61F13/512 , A61F13/5122 , B23K26/0006 , B23K26/06 , B23K26/361 , B23K26/382 , B23K26/384 , B23K2203/16 , B23K2203/30 , B23K2203/42 , B23K2203/50 , B26F1/26 , B29C59/025 , B29C59/06 , B29C59/16 , B29C2791/009 , B29L2031/4878 , B33Y80/00 , G03F7/0015 , Y10T428/24174 , Y10T428/24273 , Y10T428/31504
摘要： A polymeric web exhibiting a soft and silky tactile impression on at least one side thereof. The silky feeling side of the web exhibits a plurality of discrete generally columnar protruded extensions integral with the film. The protruded extensions have an aspect ratio of at least 0,5.
摘要翻译：聚合物纤维网在其至少一侧具有柔软和丝滑的触感。纤维网的丝滑感觉侧呈现与膜成一体的多个离散的大体上柱状突出的延伸部分。突出的延伸部的长宽比至少为0.5。

47. 发明公开

EP2009671A2 Substrate treating apparatus 有权转让
标题翻译： Substratbehandlungsgerät
公开(公告)号：EP2009671A2
公开(公告)日：2008-12-31
申请号：EP08011368.1
申请日：2008-06-23
申请人： Sokudo Co., Ltd.
发明人： Fukutomi, Yoshiteru , Mitsuhashi, Tsuyoshi , Ogura, Hiroyuki , Morinishi, Kenya , Kawamatsu, Yasuo , Nagashima, Hiromichi
IPC分类号： H01L21/00
CPC分类号： H01L21/67178 , B05B14/43 , B05B14/44 , B05C13/00 , B05C13/02 , B05D3/0486 , G03F7/26 , H01L21/67017 , H01L21/6715 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67201 , H01L21/67225 , H01L23/34 , H01L2924/0002 , Y10S414/135 , H01L2924/00
摘要： A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines.
摘要翻译：基板处理装置包括垂直布置的多个基板处理线。每个基板处理线具有水平布置的多个主输送机构，并且为每个用于处理基板的主输送机构设置多个处理单元。对于基板进行一系列处理，每个主传送机构将基板传送到与其相关联的处理单元，并将基板传送到与其水平相邻的另一主传送机构。基板处理装置通过基板处理线平行地处理基板来实现增加的处理能力。

48. 发明公开

EP1589919A2 METHOD FOR MAKING POLYMERIC WEB EXHIBITING SOFT AND SILKY TACTILE IMPRESSION 有权
标题翻译：方法用于生产具有柔软，如丝般感觉如果聚合物火车
公开(公告)号：EP1589919A2
公开(公告)日：2005-11-02
申请号：EP03814321.0
申请日：2003-12-19
申请人： THE PROCTER & GAMBLE COMPANY
发明人： STONE, Keith, Joseph , GRAY, Brian, Francis , O'NEIL, Julie, Ann
IPC分类号： A61F13/15 , B26F1/26 , B29C59/02 , D04H1/46 , D06C23/00
CPC分类号： G03F7/26 , A61F13/15731 , A61F13/51121 , A61F13/512 , A61F13/5122 , B23K26/0006 , B23K26/06 , B23K26/361 , B23K26/382 , B23K26/384 , B23K2203/16 , B23K2203/30 , B23K2203/42 , B23K2203/50 , B26F1/26 , B29C59/025 , B29C59/06 , B29C59/16 , B29C2791/009 , B29L2031/4878 , B33Y80/00 , G03F7/0015 , Y10T428/24174 , Y10T428/24273 , Y10T428/31504
摘要： A polymeric web exhibiting a soft and silky tactile impression on at least one side thereof is disclosed. The silky feeling side of the web exhibits a pattern of discrete hair-like fibrils, each of the hair-like fibrils being a protruded extension of the web surface and having a side wall defining an open proximal portion and a closed distal portion. The hair-like fibrils exhibit a maximum lateral cross-sectional diameter of between 2 and 5 mils, and an aspect ratio from 1 to 3. Methods and apparatus for making the polymeric web utilize a three-dimensional forming structure having a plurality of protrusions being generally columnar forms having an average aspect ratio of at least about 1.

49. 发明公开

EP1413924A1 COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN 审中-公开
标题翻译：与用于形成PERMITIVITÄTSMUSTERS的辐射敏感性可变电容和方法组成
公开(公告)号：EP1413924A1
公开(公告)日：2004-04-28
申请号：EP02755662.0
申请日：2002-07-25
申请人： JSR Corporation
发明人： NISHIMURA, Isao , BESSHO, Nobuo , KUMANO, Atsushi , YAMADA, Kenji
IPC分类号： G03F7/004 , G03F7/36 , C08L101/00 , H01L21/312 , H01L23/12
CPC分类号： H05K1/162 , G03F7/001 , G03F7/0045 , G03F7/0047 , G03F7/039 , G03F7/0392 , G03F7/0757 , G03F7/26 , G03F7/38 , H01L21/02126 , H01L21/02186 , H01L21/02282 , H01L21/02343 , H01L21/02348 , H01L21/312 , H05K1/0286 , H05K2201/0116 , H05K2201/0187 , H05K2203/107 , H05K2203/1163 , Y10S430/106
摘要： A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.
The composition allows its dielectric constant to be changed by a simple method, has a sufficiently large difference between its changed dielectric constant and its original dielectric constant and can provide a dielectric constant pattern and an optical material which are stable regardless of their use conditions.

50. 发明公开

EP1143297A3 Method for forming pattern 失效
标题翻译：一种用于生产图案处理
公开(公告)号：EP1143297A3
公开(公告)日：2003-12-10
申请号：EP01113823.7
申请日：1996-03-06
申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
发明人： Endo, Masayuki , Katsuyama, Akiko
IPC分类号： G03F7/004 , G03F7/26 , G03F7/20 , G03F7/039 , G03F7/16
CPC分类号： G03F7/70866 , G03F7/0045 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/26
摘要： A method for forming a pattern, comprising: a first step of setting the humidity in an enviroment for forming a resist pattern at a low level when the profile of the resist pattern tends to be a T-top profile as compared with a reference pattern profile but setting the humidity at a high level when the profile of the resist pattern tends to be a round-shoulder profile as compared with the reference pattern profile; a second step of forming a resist film by coating a substrate with a resist; a third step of exposing said resist film through a mask in an environment with the humidity set at said first step; and a fourth step of developing said resist film which is exposed to thereby form a resist pattern.

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