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1. 发明授权

EP1811341B1 Positive photosensitive composition and method of forming pattern using the same 有权
标题翻译：该正型感光性组合物和方法，用于形成结构，使得
公开(公告)号：EP1811341B1
公开(公告)日：2012-11-07
申请号：EP07001487.3
申请日：2007-01-24
申请人： Fujifilm Corporation
发明人： Takahashi, Hyou , Sugimoto, Naoya , Kodama, Kunihiko , Yamamoto, Kei
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , C08F224/00 , G03F7/26 , G03F7/38 , Y10S430/106 , Y10S430/111

2. 发明公开

EP1970761A1 Photosensitive composition, and cured relief pattern production method and semiconductor device using the same 有权
标题翻译： Lichtempfindliche Zusammensetzung und HerstellungsverfahrenfüreingehärtetesReliefmuster
公开(公告)号：EP1970761A1
公开(公告)日：2008-09-17
申请号：EP08004849.9
申请日：2008-03-14
申请人： FUJIFILM Corporation
发明人： Sato, Kenichiro , Sugimoto, Naoya
IPC分类号： G03F7/023 , G03F7/039 , H01L21/00
CPC分类号： H01L21/02118 , G03F7/0233 , G03F7/0392 , G03F7/0751 , G03F7/40 , H01L21/312
摘要： A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a compound having at least one of an alkoxymethyl group and an acyloxymethyl group,

wherein R 1 represents a divalent to octavalent organic group containing 2 or more carbon atoms, R 2 represents a divalent to hexavalent organic group containing 2 or more carbon atoms, each of R 0 and R 3 independently represents a hydrogen atom or an organic group containing 1 to 20 carbon atoms, m represents an integer of 0 to 2, and each of p and q represents an integer of 0 to 4, provided that p + q > 0.
摘要翻译：感光性树脂组合物包含（a）包含由下式（1）表示的重复单元的树脂; （b）感光剂; （c）热酸发生器; 和（d）具有烷氧基甲基和酰氧基甲基中的至少一个的化合物，其中R 1表示含有2个或更多个碳原子的二价至八价有机基团，R 2表示含有2个以上碳原子的二价至六价有机基团原子，R 0和R 3各自独立地表示氢原子或含有1〜20个碳原子的有机基团，m表示0〜2的整数，p和q各自表示0〜4的整数，条件是 p + q> 0。

3. 发明授权

EP1970761B1 Photosensitive composition and method of producing a cured relief pattern 有权
标题翻译：的固化浮雕图案的光敏组合物和制造方法
公开(公告)号：EP1970761B1
公开(公告)日：2012-02-29
申请号：EP08004849.9
申请日：2008-03-14
申请人： FUJIFILM Corporation
发明人： Sato, Kenichiro , Sugimoto, Naoya
IPC分类号： G03F7/023 , G03F7/039 , H01L21/00
CPC分类号： H01L21/02118 , G03F7/0233 , G03F7/0392 , G03F7/0751 , G03F7/40 , H01L21/312
摘要： A photosensitive resin composition includes (a) a resin comprising a repeating unit represented by a following formula (1); (b) a photosensitive agent; (c) a thermo-acid generator; and (d) a compound having at least one of an alkoxymethyl group and an acyloxymethyl group, wherein R 1 represents a divalent to octavalent organic group containing 2 or more carbon atoms, R 2 represents a divalent to hexavalent organic group containing 2 or more carbon atoms, each of R 0 and R 3 independently represents a hydrogen atom or an organic group containing 1 to 20 carbon atoms, m represents an integer of 0 to 2, and each of p and q represents an integer of 0 to 4, provided that p + q > 0.

4. 发明公开

EP1811341A1 Positive photosensitive composition and method of forming pattern using the same 有权
标题翻译： Zusammensetzung und Verfahren zur Strukturformung damit
公开(公告)号：EP1811341A1
公开(公告)日：2007-07-25
申请号：EP07001487.3
申请日：2007-01-24
申请人： Fujifilm Corporation
发明人： Takahashi, Hyou , Sugimoto, Naoya , Kodama, Kunihiko , Yamamoto, Kei
IPC分类号： G03F7/039
CPC分类号： G03F7/0397 , C08F224/00 , G03F7/26 , G03F7/38 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations:

wherein Xa 1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa 2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A 2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.
摘要翻译：正型感光性组合物包括：通过酸的作用使碱性显影液中的溶解速度增加的树脂（A），含有通式（I）表示的酸分解重复单元的树脂（A）和酸不分解性由通式（II）表示的重复单元; 以及能够在照射活性射线和辐射之一时产生酸的化合物（B）：其中Xa 1表示氢原子，烷基，氰基和卤素原子中的一个，A 1表示单键和二价连接基团，ALG表示离去烃基的酸，Xa 2表示氢原子，烷基，氰基和卤素原子中的一个，A 2表示单键和二价连接组，ACG表示酸性非离子性烃基。

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