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31. 发明授权

EP2159236B1 PHOTOCURABLE COMPOSITION AND PROCESS FOR PRODUCING MOLDED OBJECT HAVING FINE PATTERN IN SURFACE 有权
标题翻译：固化性组合物中，生成精细表面结构的形状点方法
公开(公告)号：EP2159236B1
公开(公告)日：2012-05-02
申请号：EP08711219.9
申请日：2008-02-13
申请人： Asahi Glass Company, Limited
发明人： KAWAGUCHI, Yasuhide , TSUNOZAKI, Kentaro
IPC分类号： C08F220/20 , B29C59/02 , C08F220/22 , H01L21/027 , B82Y10/00 , G03F7/027 , G03F7/033 , C08F2/48
CPC分类号： C08F220/20 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F220/22 , G02B5/1852 , G02B5/1857 , G03F7/0002 , G03F7/0046 , G03F7/0048 , G03F7/027 , G03F7/033 , C08F222/1006
摘要： A photocurable composition which can give a cured object excellent in releasability and mechanical strength; and a process for producing a molding with excellent durability which has, in a surface thereof, a fine pattern which is a precisely transferred pattern reverse to the pattern of a mold. The photocurable composition (20) comprises: 15-60 mass% compound (A) which is either an aromatic compound having two or more rings or an alicyclic compound having two or more rings and has two (meth)acryloyloxy groups; 5-40 mass% compound (B) having a fluorine atom and one or more carbon-carbon unsaturated double bonds (provided that the compound (A) is excluded); 10-55 mass% compound (C) having one (meth)acryloyloxy group (provided that the compound (B) is excluded); and 1-12 mass% photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass%).

32. 发明公开

EP2414896A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权转让
标题翻译： ACTINIC RAY敏感或辐射敏感的树脂组合物和使用相同的图案形成方法
公开(公告)号：EP2414896A1
公开(公告)日：2012-02-08
申请号：EP10758878.2
申请日：2010-03-26
申请人： FUJIFILM Corporation
发明人： TANGO, Naohiro , SHIRAKAWA, Michihiro , FUJITA, Mitsuhiro , YAMAGUCHI, Shuhei , SHUBUYA, Akinori , KATAOKA, Shohei
IPC分类号： G03F7/004 , C07C381/12 , C07D217/08 , C07D285/00 , C07D333/16 , C08F20/10 , G03F7/039 , G03F7/38 , H01L21/027
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass% based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译：光化射线敏感或辐射敏感树脂组合物包括：（A）能够通过酸的作用提高树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）通过用光化射线或放射线照射能够产生酸的化合物，其中（B）在光化射线或辐射照射下能够产生酸的化合物的含量为10-30质量％基于光化射线敏感或辐射敏感树脂组合物的全部固体含量，并且图案形成方法使用该组合物。

33. 发明公开

EP2389359A1 SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME 有权
标题翻译：自身建设的反射涂料组合物抗性照片插图MIXES和程序
公开(公告)号：EP2389359A1
公开(公告)日：2011-11-30
申请号：EP10756762.0
申请日：2010-03-24
申请人： International Business Machines Corporation
发明人： HUANG, Wu-Song , POPOVA, Irene , VARANASI, Pushkara, Rao , VYKLICKY, Libor
IPC分类号： C07C409/22 , G03C1/00
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
摘要： A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.

34. 发明授权

EP1730209B1 BROMINATED POLYMERS, AND FIRE RETARDANT ARTICLES COMPRISING THEM 有权
标题翻译：溴化聚合物类，含阻燃物体
公开(公告)号：EP1730209B1
公开(公告)日：2011-10-05
申请号：EP05703131.2
申请日：2005-01-25
申请人： B.G. Polymers A.C.A. Ltd. , Bromine Compounds Ltd.
发明人： BAREKET, Yifat
IPC分类号： C08F220/22 , C08K5/03 , C08F2/16
CPC分类号： C08F2/20 , C08F220/06 , C08F220/22 , C08F220/58 , C08K3/2279 , C09K21/14
摘要： The present invention provides a polymer, an aqueous suspension of a polymer, methods for obtaining them, and fire-retardant products comprising a polymer and antimony oxide. The polymer of the invention is made of (i) at least one non-brominated monomer and (ii) at least one brominated monomer having the structure A-B-C, wherein A is a phenyl, substituted with 3-5 bromine atoms, B is a C1 to C4 alkyl, optionally substituted with 1 to 8 bromine atoms, and C is an acrylic or methacrylic group. An example of a suitable brominated monomer is penta bromo methyl acrylate. Preferable polymers have at least 20%w/w bromine. Preferable aqueous suspensions have at least 40% solid content. Fire-retardant products according to the invention comprise a polymer made of at least one bromine-containing monomer and at least one non-brominated monomer. Preferable fire-retardant products include polymers according to the invention.

35. 发明公开

EP2320467A1 RESIN COMPOSITION, GATE INSULATING LAYER AND ORGANIC THIN FILM TRANSISTOR 有权
标题翻译： HARZZUSAMMENSETZUNG，GATEISOLIERSCHICHT UND ORGANISCHERDÜNNSCHICHTTRANSISTOR
公开(公告)号：EP2320467A1
公开(公告)日：2011-05-11
申请号：EP09809889.0
申请日：2009-08-25
申请人： Sumitomo Chemical Company, Limited
发明人： YAHAGI, Isao
IPC分类号： H01L29/786 , C08F212/14 , C08F220/22 , C08L101/02 , H01L21/312 , H01L51/05 , H01L51/30
CPC分类号： C08F220/22 , C08F12/20 , C08F12/24 , C08F212/08 , C08F212/10 , C08F212/14 , C08F220/18 , C08F220/36 , C08F2220/343 , C08K5/0025 , C08L25/18 , C08L2205/02 , H01L51/052 , H01L51/0541 , H01L51/0545 , C08L2666/04
摘要： The subject of the present invention is to provide an organic thin film transistor with a small hysteresis. The means for solving the subject is a resin composition for an organic thin film transistor gate insulating layer comprising (A) a macromolecule that comprises at least one repeating unit selected from the group consisting of repeating units represented by Formula (1), repeating units represented by Formula (1'), and repeating units represented by Formula (2) and contains two or more first functional groups in its molecule, wherein the first functional group is a functional group that generates, by the action of electromagnetic waves or heat, a second functional group that reacts with active hydrogen, and (B) at least one compound selected from the group consisting of low-molecular compounds containing two or more active hydrogens in each molecule and macromolecules containing two or more active hydrogens in each molecule.
摘要翻译：本发明的主题是提供具有小滞后的有机薄膜晶体管。用于解决问题的方法是一种有机薄膜晶体管栅极绝缘层的树脂组合物，其包含（A）大分子，其包含至少一个选自由式（1）表示的重复单元，重复单元由式（1'）表示的重复单元和式（2）表示的重复单元，在分子中含有两个以上的第一官能团，其中，第一官能团是通过电磁波或热而产生的官能团与活性氢反应的第二官能团和（B）至少一种选自每个分子中含有两个或更多个活性氢的低分子化合物的化合物和在每个分子中含有两个或更多个活性氢的大分子的化合物。

36. 发明公开

EP2309332A1 POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD 审中-公开
标题翻译： UR UR UR ICH UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR UR
公开(公告)号：EP2309332A1
公开(公告)日：2011-04-13
申请号：EP09797918.1
申请日：2009-07-14
申请人： JSR Corporation
发明人： ANNO, Yuusuke , FUJIWARA, Kouichi , SUGIURA, Makoto , WAKAMATSU, Gouji
IPC分类号： G03F7/40 , C08F220/28 , G03F7/039 , H01L21/027
CPC分类号： H01L21/0273 , C08F220/18 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40 , C08F220/22
摘要： A positive-tone radiation-sensitive composition is used for a resist pattern-forming method that includes double exposure as a given step, and includes (B) a polymer that includes an acid-labile group and a crosslinkable group, (C) a photoacid generator, and (D) a solvent.
摘要翻译：正色辐射敏感性组合物用于包含双重曝光作为给定步骤的抗蚀剂图案形成方法，并且包括（B）包含酸不稳定基团和可交联基团的聚合物，（C）光酸发电机，（D）溶剂。

37. 发明公开

EP2220134A2 BIOMEDICAL DEVICES 审中-公开
标题翻译：生物医学设备
公开(公告)号：EP2220134A2
公开(公告)日：2010-08-25
申请号：EP08862262.6
申请日：2008-12-08
申请人： Bausch & Lomb Incorporated
发明人： LAI, Yu-chin , LANG, Weihong
IPC分类号： C08F220/22 , G02B1/04 , C08F220/08 , C08F220/26
CPC分类号： C08F220/22 , C08F220/18 , C08F220/26 , C08F226/10 , C08F230/08 , G02B1/043 , Y10S524/916
摘要： Biomedical devices are provided herein which are formed from a polymerization product of a mixture comprising (a) a copolymer which is the reaction product of one or more polymerizable polyhydric alcohols and one or more polymerizable fluorine- containing monomers; and (b) a biomedical device-forming comonomer.

38. 发明公开

EP2196488A1 Fluorine-containing acrylate 有权
标题翻译： Fluorhaltiges Acrylat
公开(公告)号：EP2196488A1
公开(公告)日：2010-06-16
申请号：EP09178350.6
申请日：2009-12-08
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Sakano, Yasunori , Koike, Noriyuki , Kishita, Hirofumi
IPC分类号： C08G77/04 , C07F7/21 , C09D4/00 , C09D175/16
CPC分类号： C08G77/045 , C07F7/21 , C08F220/22 , C08F220/24 , C08F230/08 , C08G18/61 , C08G18/8116 , C08G77/38 , C08G77/388 , C09D175/16
摘要： The present invention is a fluorine-containing acrylate or alpha-substituted, fluorine-containing acrylate, represented by the following formula (1):

wherein a is an integer of from 1 to 4 and b is an integer of from 1 to 4, provided that the total of a and b is 3, 4, or 5;
R 1 is a group represented by the following formula (2):

-(C 4 H 8 O) d (C 3 H 6 O) e (C 2 H 4 O) f (CH 2 O) g - (2)

wherein d, e, f, and g are, independently of each other, an integer of from 0 to 4, provided that the molecular weight of R 1 is in the range of 30 to 300, and
these repeating units may be sequenced at random;
R 2 is an acryl group- or alpha-substituted acryl group-containing group having 4 to 20 carbon atoms and represented by the following formula (3):

wherein R 3 is, independently of each other, a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group,
R 4 is a divalent or trivalent linking moiety having 1 to 18 carbon atoms, optionally having an ether bond and/or an ester bond, and
n is 1 or 2;

Rf is a perfluoropolyether residue represented by the following formula (4):

wherein j, k, 1, and m are, independently of each other, an integer of from 0 to 50, provided that the molecular weight of Rf is in the range of 200 to 6000,
X is a fluorine atom or a trifluoromethyl group, and these repeating units may be sequenced at random;
Z is a divalent organic group; and
c is 0 or 1.
摘要翻译：本发明是由下式（1）表示的含氟丙烯酸酯或α-取代的含氟丙烯酸酯，其中a为1〜4的整数，b为1〜4的整数， a和b的总和是3,4或5; R 1是由下式（2）表示的组：ƒ€ƒ€ƒ€ƒ€ƒ€ƒ - （C 4 H 8 O）d（C 3 H 6 O）e（C 2 H 2 O）f（CH 2 O）g - €ƒ€ƒ€ƒ（ƒ）其中d，e，f和g彼此独立地为0至4的整数， R 1的分子量在30〜300的范围内，这些重复单元可以随机排序; R 2是具有4〜20个碳原子的丙烯酰基或α-取代的含丙烯酰基的基团，由下式（3）表示：其中R 3彼此独立地为氢原子，氟原子，甲基或三氟甲基，R 4是具有1至18个碳原子的任选具有醚键和/或酯键的二价或三价连接部分，n为1或2; Rf是由下式（4）表示的全氟聚醚残基：其中j，k，1和m彼此独立地为0至50的整数，条件是Rf的分子量在 200〜6000，X为氟原子或三氟甲基，这些重复单元可以随机排列; Z是二价有机基团; c为0或1。

39. 发明公开

EP2159236A1 PHOTOCURABLE COMPOSITION AND PROCESS FOR PRODUCING MOLDED OBJECT HAVING FINE PATTERN IN SURFACE 有权
标题翻译：固化性组合物中，生成精细表面结构的形状点方法
公开(公告)号：EP2159236A1
公开(公告)日：2010-03-03
申请号：EP08711219.9
申请日：2008-02-13
申请人： Asahi Glass Company, Limited
发明人： KAWAGUCHI, Yasuhide , TSUNOZAKI, Kentaro
IPC分类号： C08F220/20 , B29C59/02 , C08F220/22 , H01L21/027
CPC分类号： C08F220/20 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F220/22 , G02B5/1852 , G02B5/1857 , G03F7/0002 , G03F7/0046 , G03F7/0048 , G03F7/027 , G03F7/033 , C08F222/1006
摘要： To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.
A photocurable composition 20 comprising from 15 to 60 mass% of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass% of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass% of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass% of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass%) is used.
摘要翻译：为了提供从该光固化性组合物具有优异的脱模性和机械强度的固化物能够获得，以及一种用于制造模制产品具有优良的耐久性，与具有精确地转印其表面上具有模具的反转图案的精细图案的方法，一种光固化性组合物20通过将化合物（A），所有这些是具有至少两个环或脂环族化合物具有至少两个环，并具有两个（甲基）丙烯酰氧基团的芳族化合物，从5到40的质量包括从15％至60％％由化合物（B）的质量具有氟原子和通过将化合物（C）的质量具有一个（甲基）丙烯酰氧基具有至少一个碳 - 碳不饱和双键（不包括化合物（A）），从10至55％组（不包括化合物（B））光聚合引发剂（D）的质谱和1至12％（提供没有（A）+（B）+（C）+（D）= 100质量％）被使用。

40. 发明授权

EP1553151B1 WATER-AND-OIL REPELLANT COMPOSITION 有权
标题翻译：水和油涂料组合物
公开(公告)号：EP1553151B1
公开(公告)日：2010-01-20
申请号：EP03754141.4
申请日：2003-10-15
申请人： Asahi Glass Company, Limited
发明人： SUGIMOTO, Shuichiro, c/o Asahi Glass Company Ltd. , SHIMADA, Minako, c/o Asahi Glass Company Ltd. , SHIMADA, Toyomichi, c/o Asahi Glass Company Ltd. , SEKI, Ryuji, c/o Asahi Glass Company Ltd. , MAEKAWA, Takashige,c/o Asahi Glass Company, Ltd.
IPC分类号： C09K3/18 , C08F220/22 , C08L33/16 , C08F214/18
CPC分类号： D06M15/256 , C08F218/08 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/34 , C08F220/36 , C08F230/08 , C09K3/18 , D06M15/263 , D06M2200/00 , D06M2200/11 , D06M2200/12 , D06M2200/50
摘要： A water-and-oil repellant composition with excellent durability which can impart excellent water-and-oil repellency to an article even through a low-temperature treatment. The article to which water-and-oil repellency has been imparted by the composition can give a soft feeling. The water-and-oil repellant composition contains as an essential ingredient a copolymer comprising units derived from the following monomer (a) and units derived from the following monomer (b). Monomer (a): An Rf group-containing monomer giving a homopolymer which has no melting point attributable to fine crystals derived from the Rf groups contained therein or has a melting point of 55°C or lower attributable to the crystals and which has a glass transition temperature of 20°C or higher. Monomer (b): A monomer having no Rf groups and having a crosslinkable functional group.
摘要翻译：耐久性优异的拒水拒油剂组合物，即使通过低温处理也能赋予物品优异的拒水拒油性。通过该组合物赋予了拒水拒油性的物品可以赋予柔软感。该拒水拒油性组合物含有作为必须成分的共聚物，该共聚物含有来源于下述单体（a）的单元和来自下述单体（b）的单元。单体（a）：含有R f基的单体可以得到不具有来源于其中所含的Rf基的微晶的熔点的均聚物，或者具有归因于该晶体的熔点为55℃或更低并且具有玻璃转变温度为20°C或更高。单体（b）：不具有Rf基团并具有可交联官能团的单体。

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