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21. 发明公开

EP0341315A1 METHOD OF STABILIZING LASER WAVELENGTH AND LASER DEVICE WITH STABILIZED WAVELENGTH 失效
标题翻译： VERFAHREN ZUR STABILISIERUNG DERLASERWELLENLÄNGEUND SO STABILISIERTE LASERANORDNUNG。
公开(公告)号：EP0341315A1
公开(公告)日：1989-11-15
申请号：EP88909365.4
申请日：1988-10-28
申请人： MITSUBISHI DENKI KABUSHIKI KAISHA
发明人： NAKATANI, Hajime Mitsubishi Denki Kabushiki , MINOWA, Yoshibumi Mitsubishi Denki Kabushiki , KANEKO, Hiromi Mitsubishi Denki Kabushiki , WAKATA, Hitoshi; Mitsubishi Denki Kabushiki , HARUTA, Kenyu; Mitsubishi Denki Kabushiki , NAGAI, Haruhiko; Mitsubishi Denki Kabushiki , YASUDA, Kenichi Mitsubishi Denki Kabushiki , MUKUMOTO, Hiroyuki; Mitsubishi Denki Engineering
IPC分类号： H01S3/137
CPC分类号： H01S3/137 , H01S3/225
摘要： Part of laser beams whose wavelength is selected by two pieces of etalons in the laser oscillator are polarized, and one etalon is controlled based on the result of analysis of the polarized laser beams to stabilize the wavelength of the laser beams. Other parts of the laser beams are used to measure a change in the laser output, and the change is analyzed to control another etalon in order to suppress the reduction in the laser output.
摘要翻译：波长由激光振荡器中的两个标准具选择的激光束的一部分被极化，基于偏振激光束的分析结果来控制一个标准具，以稳定激光束的波长。激光束的其他部分用于测量激光输出的变化，并分析变化以控制另一个标准具，以抑制激光输出的降低。

22. 发明授权

EP3635826B1 VERFAHREN ZUR ERHALTUNG DER SYNCHRONITÄT EINES FOURIER DOMAIN MODE LOCKED (FDML) LASERS 有权
公开(公告)号：EP3635826B1
公开(公告)日：2024-02-28
申请号：EP18731765.6
申请日：2018-06-08
发明人： HUBER, Robert , PFEIFFER, Tom
IPC分类号： H01S3/137 , H01S3/139 , H01S3/1109 , H01S3/08 , H01S3/106 , H01S3/00 , H01S3/13

24. 发明公开

EP3812722A1 SPECTROMETER INCLUDING TUNABLE ON-CHIP LASER AND SPECTRUM MEASUREMENT METHOD 审中-实审
公开(公告)号：EP3812722A1
公开(公告)日：2021-04-28
申请号：EP20199491.0
申请日：2020-10-01
申请人： Samsung Electronics Co., Ltd.
发明人： LANTSOV, Alexey Dmitrievich , SHCHEKIN, Alexey Andreevich , KOPTYAEV, Sergey Nikolaevich , ANIKANOV, Alexey Grigorievich , RYABKO, Maksim Vladimirovich , IVSHIN, Pavel Alexandrovich , GRIGORIEV, Vasiliy Viktorovich , KOPYSOVA, Tatyana Igorevna
IPC分类号： G01J3/10 , G01J3/02 , H01S3/137 , H01S5/14 , G01J3/42
摘要： A spectrometer may include: a tunable on-chip laser source configured to irradiate a biological tissue with laser radiation; a photodetector configured to receive the laser radiation reflected from the biological tissue; and at least one processor. The tunable on-chip laser source may include: a semiconductor gain chip having a gain bandwidth for operating the tunable on-chip laser source in a predetermined wavelength range; and a plurality of resonator cavities connected between the semiconductor gain chip and the at least one processor, and configured to perform a coarse high-speed measurement and a fine measurement to measure a spectrum of the laser radiation reflected from the biological tissue.

25. 发明公开

EP3454139A1 SYSTÈME DE MESURE OPTIQUE À ASSERVISSEMENT DAVLL STABILISÉ 有权
公开(公告)号：EP3454139A1
公开(公告)日：2019-03-13
申请号：EP18192357.4
申请日：2018-09-04
申请人： Commissariat à l'énergie atomique et aux énergies alternatives
发明人： BEATO, François , PALACIOS LALOY, Agustin
IPC分类号： G04F5/14 , H01S3/137 , H01S5/0687 , H03L7/26
摘要： L'invention est relative à l'asservissement de la longueur d'onde d'un laser (2) sur une transition atomique. Elle propose notamment un procédé comprenant les étapes consistant à :
- émettre un faisceau laser en direction d'une cellule (3) remplie d'une vapeur atomique ;
- réaliser un apport d'énergie aux atomes de la vapeur atomique à l'aide d'une source d'énergie (4) ;
- générer un signal DAVLL (S DAVLL ) à partir du faisceau laser ayant traversé la cellule (3); et
- asservir la longueur d'onde du laser à l'aide du signal DAVLL.
Selon l'invention, l'apport d'énergie aux atomes de la vapeur atomique est modulé pour réaliser l'alternance d'une première phase et d'une deuxième phase, la première phase apportant plus d'énergie que la deuxième phase.

26. 发明公开

EP2137798A4 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：方法和设备用于稳定和调节激光的带宽
公开(公告)号：EP2137798A4
公开(公告)日：2014-04-02
申请号：EP08742695
申请日：2008-04-09
申请人： CYMER INC A NEVADA CORP
发明人： PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
IPC分类号： H01S3/22 , G02B27/64 , H01S3/1055 , H01S3/137 , H01S3/139 , H01S3/225
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02

27. 发明公开

EP1942566A3 Monitoring light pulses 有权
标题翻译：光脉冲监控
公开(公告)号：EP1942566A3
公开(公告)日：2011-01-05
申请号：EP07122228.5
申请日：2007-12-04
申请人： Palo Alto Research Center Incorporated
发明人： Kiesel, Peter , Schmidt, Oliver
IPC分类号： H01S3/137 , G01J3/02 , G01J3/26 , G01J9/02
CPC分类号： H01L31/02165 , G01J3/02 , G01J3/0259 , G01J3/26 , G01J9/0246 , H01S3/0014 , H01S3/1305
摘要： To monitor light pulses from a light source, such as a laser, sense signals are provided to a photosensing component or array, causing photosensing during a series of one or more sense periods for the light pulse. Each light pulse can be provided through a transmission structure, such as a layered structure, that provides output light with an energy-dependent position on the photosensing component. A pulse's sensing results can be used to obtain a set of one or more differential quantities; for example, with a photosensing array, two cells of the array can be read out and compared. For a narrow band light pulse, a transmission structure can provide a spot on the photosensing component, and the light spot position can be sensed.

28. 发明公开

EP2068406A1 Tunable laser light source and controlling method of the same 审中-公开
标题翻译： Abstimmbare Laserlichtquelle und Steuerverfahrendafür
公开(公告)号：EP2068406A1
公开(公告)日：2009-06-10
申请号：EP08160511.5
申请日：2008-07-16
申请人： Tecdia Co., Ltd.
发明人： Koyama, Etsuo , Nagai, Yasuo
IPC分类号： H01S5/026 , H01S5/0687 , H01S5/14 , H01S3/13 , H01S3/137 , H01S3/139 , H01S3/067
CPC分类号： H01S3/105 , H01S3/067 , H01S3/1305 , H01S3/139 , H01S5/0687 , H01S5/141
摘要： The objective of the present invention is to provide with a tunable laser light source and controlling method of the same capable of detecting the degree of out-of-tune-ness, maintaining simple configuration. The tunable laser light source comprises a gain medium 1, a tunable band rejector 2, an etalon 3, and a transmitted light detector 4. The gain medium 1 is capable of amplifying light within a wavelength band including a target wavelength. The a tunable band rejector 2 is positioned opposite the gain medium thereby forming an edge of a laser resonator and is capable of rejecting light with a certain wavelength tunable to the target wavelength from the incident light emanating from the gain medium while transmitting the remaining. The an etalon 3 is positioned between the gain medium and the tunable band rejector and is capable of selectively transmitting light with certain wavelengths including the target wavelength. The a transmitted light detector 4 is positioned to the place where its incident light enters through the tunable band rejector and is capable of detecting the power of the light. The tunable laser light source 100 may further comprise an optical coupler 5, a beam splitter 6, and a branched off light detector 7. Here, the optical coupler 5 is capable of coupling with the laser beam emanating from the gain medium 1. The beam splitter 6 branches off a part of this laser beam. The branched off light detector 7 consists of such as a photodiode and is capable of detecting the beam branched off by the beam splitter 6.
摘要翻译：本发明的目的是提供一种可调谐激光光源及其能够检测失调程度的控制方法，保持简单的配置。可调激光光源包括增益介质1，可调波段放射器2，标准具3和透射光检测器4.增益介质1能够放大包括目标波长的波长带内的光。可调谐带排放器2与增益介质相对设置，从而形成激光谐振器的边缘，并且能够在传输剩余的情况下从具有从增益介质发射的入射光中抑制具有可调谐到目标波长的特定波长的光。标准号3位于增益介质和可调波段退出器之间，并且能够选择性地透射包括目标波长的特定波长的光。透射光检测器4位于其入射光通过可调谐带排放器进入的位置，并且能够检测光的功率。可调激光光源100还可以包括光耦合器5，分束器6和分支光检测器7.这里，光耦合器5能够与从增益介质1发出的激光束耦合。光束分路器6分支该激光束的一部分。分支光检测器7由光电二极管组成，并且能够检测由分束器6分支的光束。

29. 发明公开

EP1430573A4 SIX TO TEN KHz, OR GREATER GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：食品乳制品麻省理工学院
公开(公告)号：EP1430573A4
公开(公告)日：2006-07-05
申请号：EP02757140
申请日：2002-08-16
申请人： CYMER INC
发明人： WATSON TOM A , UJAZDOWSKI RICHARD C , IVASCHENKO ALEX P , SHANNON ROBERT A , SANDSTROM RICHARD L , WEBB ROBERT KYLE , PALENSCHAT FREDERICK A , HOFMANN THOMAS , RETTIG CURTIS L , NESS RICHARD L , MELCHER PAUL C , ERSHOV ALEXANDER I
IPC分类号： H01S3/134 , H01S3/225 , G03F7/20 , H01S3/00 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/23
CPC分类号： H01S3/0385 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： The present invention provides gas discharge laser systems capable of reliable long-term operation in a production line capacity at repetition rates in the range of 6,000 to 10,000 pulses per second. Preferred embodiments are configured as KrF, ArF and F2 lasers used in photolithography. Improvements include a suction fan (555) in the immediate vicinity of the anode (542) to increase gas flow. The intake of the fan (555) is between the anode (542) and the insulating spacer (544B).
摘要翻译：本发明提供一种气体放电激光系统，其能够以6,000至10,0000次脉冲功率秒的重复频率在生产线容量中可靠地长期运行。优选实施例被配置为用于集成电路光刻的光源的KrF，ArF和F 2 N 2激光器。改进包括一种改进的高压电源，其能够将磁压缩脉冲电力系统的初始电容器充电至每秒6,000至10,0000次的精确目标电压，以及用于监测脉冲能量并确定脉冲 - 逐脉冲基础。公开了用于在放电间隔期间从激光电极之间的放电区域去除产生的碎屑的几种技术。在一个实施例中，放电区域的宽度从约3mm减小到约1mm，使得设计用于4000Hz操作的气体循环系统可用于10,000Hz操作。在其他实施例中，电极之间的气流充分增加，以允许10,000Hz的操作，放电区域宽度为3mm。为了提供这些显着增加的气体流速，申请人已经公开了使用现有技术的切向形式的优选实施例，但是具有改进的和更强大的电动机和新颖的轴承设计。新的轴承设计包括陶瓷轴承和磁性轴承。在其他实施例中，一些或全部气体循环动力设置有位于激光室外部的鼓风机。外部鼓风机可以位于激光柜或分开的位置。

30. 发明公开

EP1218985A4 HIGH POWER GAS DISCHARGE LASER WITH LINE NARROWING UNIT 审中-公开
标题翻译： HOCHLEISTUNGS GASENTLADUNGSLASER MIT EINEM LINIENBREITENVERRINGERNDEN MODUL
公开(公告)号：EP1218985A4
公开(公告)日：2006-03-22
申请号：EP00959882
申请日：2000-08-31
申请人： CYMER INC
发明人： CYBULSKI RAYMOND F , ERSHOV ALEXANDER I , ONKELS ECKEHARD D , DAS PALASH P , RICHARDSON DANILO D , BUCK JESSE D
IPC分类号： H01S3/225 , G03F7/20 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/04 , H01S3/08 , H01S3/081 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/034 , H01S3/036 , H01S3/0401 , H01S3/08009 , H01S3/08059 , H01S3/0812 , H01S3/086 , H01S3/13 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2256
摘要： A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of hot gas layers present on the face of the grating. In preferred embodiments the effect of the hot gas layer is reduced with the use of helium as a purge gas. One of the preferred embodiments includes a barrier plate (60) and a barrier cover (62) to force the purge flow across the face of the grating. In further embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译：用于生产高能量激光束的线窄激光器的基于光栅的线窄化装置。提供了用于最小化存在于光栅表面上的热气层的不利影响的技术。在优选实施例中，气流被引导穿过光栅的表面。在其它实施例中，通过使用氦气作为净化气体来减少热气体层的影响，在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

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