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    • 24. 发明公开
    • Apparatus for combinatorial molecular beam epitaxy
    • Vorrichtungfürkombinatorische Molekularstrahlepitaxie
    • EP1161986A2
    • 2001-12-12
    • EP01113525.8
    • 1999-11-05
    • Oxxel Oxide Electronics Technology, Inc.
    • Bozovic, Ivan
    • B01J19/00C01B13/32C01G3/02C30B23/02C30B29/22
    • C23C14/24B01J19/0046B01J2219/00351B01J2219/00416B01J2219/0043B01J2219/00443B01J2219/00495B01J2219/00527B01J2219/0059B01J2219/00596B01J2219/00605B01J2219/00635B01J2219/00659B01J2219/00689B01J2219/00695B01J2219/00698C23C14/08C23C14/22C30B23/02C30B29/22C40B60/14
    • Apparatus for combinatorial molecular beam epitaxy comprising:

      a vacuum chamber,
      a substrate holder for holding a substrate inside said vacuum chamber having a substrate surface bounded by two or more pairs of opposite side regions and defining a plurality of surface regions at known position with respect to said side regions,
      a gaseous source of oxygen atoms and
      a plurality of elemental metal sources with source shutters contained in said vacuum chamber,
      further comprising at least one device being selected from the group consisting of:

      a heater system for heating said substrate so as to produce a temperature gradient on progressing between one side region and another in a pair of opposite side regions of said substrate,
      a system for applying said oxygen atoms to said substrate to achieve a gradient of the partial pressure of said source of oxygen atoms and the substrate surface regions,
      a sieve mask in front of each elemental metal source effective to produce a desired gradient of atomic flux through said sieve mask on progressing between one side region and another in a pair of opposite side regions of the substrate or effective to produce a uniform atomic flux through said sieve mask and
      a movable substrate-shadowing shutter placed between each elemental metal source and the target placeable at a plurality of selected positions.
    • 用于组合分子束外延的装置,包括:真空室,用于将衬底保持在所述真空室内的衬底保持器,所述衬底保持器具有由两对或更多对相对侧区域限定的衬底表面,并且在已知位置处限定多个表面区域 所述侧区域,氧原子的气体源和多个元素金属源,其中包含所述真空室中的源百叶窗,还包括至少一个选自以下的装置:加热器系统,用于加热所述基板,以便 在所述衬底的一对相对侧区域中产生在一侧区域和另一侧区域之间进行的温度梯度,用于将所述氧原子施加到所述衬底以实现所述氧原子源和衬底的分压梯度的系统 表面区域,每个元素金属源前面的筛面有效产生所需的梯度 在衬底的一对相对侧区域中在一个侧面区域和另一个侧面区域之间进行通过所述筛面罩的有效通量通过所述筛子掩模产生均匀的原子通量,或有效地通过所述筛子掩模产生均匀的原子通量,以及放置在每个元素金属源和 所述目标可放置在多个选定位置。