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191. 发明公开

EP1079253A4 PROJECTION EXPOSURE APPARATUS AND METHOD, AND REFLECTION REFRACTION OPTICAL SYSTEM 审中-公开
标题翻译： DEVICE AND METHOD FOR投射曝光和光学系统以反射和折射
公开(公告)号：EP1079253A4
公开(公告)日：2004-09-01
申请号：EP99912115
申请日：1999-04-06
申请人： NIPPON KOGAKU KK
发明人： TAKAHASHI TOMOWAKI , TSUKAMOTO HIROYUKI
IPC分类号： G02B17/08 , G03F7/20 , G02B13/14 , G02B13/18 , H01L21/027
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70241 , G03F7/70358 , G03F7/70958
摘要： A projection exposure apparatus has an illumination optical system 3 for illuminating a mask 4 formed with a pattern with beams of radiation, and a projection optical system 7 for forming an image of the pattern on a workpiece 8 on the basis of radiation from the mask. The illumination optical system supplies an illumination radiation having a center wavelength of 180 nm or smaller, and the projection optical system includes at least one concave mirror, fifteen or less pieces of refracting lenses, and four or more aspherical surfaces.

192. 发明公开

EP1115019A3 Projection exposure lens with aspheric elements 审中-公开
标题翻译：与非球面投影透镜元件
公开(公告)号：EP1115019A3
公开(公告)日：2004-07-28
申请号：EP00127786.2
申请日：2000-12-19
申请人： Carl Zeiss , Carl-Zeiss-Stiftung trading as Carl Zeiss
发明人： Shafer, David R. , Ulrich, Wilhelm , Beierl, Helmut
IPC分类号： G02B13/18 , G03F7/20 , G02B17/08
CPC分类号： G02B17/0892 , G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G03F7/70225 , G03F7/70241
摘要： The invention relates to a projection exposure lens with an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double passed lens system arranged between the optical elements for separating beams and the concave mirror, and a third lens system arranged between the optical elements for separating beams and the image plane. The invention is characterized in that at least one of the lens or mirror surfaces of the first, second or third lens system is aspheric and the numerical aperture NA of the projection exposure lens is 0,7 or greater, preferably 0,8 or greater with a maximum image height exceeding 10mm.

193. 发明公开

EP1430346A1 CATADIOPTRIC REDUCTION LENS 审中-公开
标题翻译： CATADIOPTRIC还原透镜
公开(公告)号：EP1430346A1
公开(公告)日：2004-06-23
申请号：EP02799405.2
申请日：2002-09-13
申请人： Carl Zeiss SMT AG
发明人： ULRICH, Wilhelm , SHAFER, David, R. , EPPLE, Alexander , BEIERL, Helmut , DODOC, Aurelian
IPC分类号： G02B17/08 , G02B27/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译：一种折反射投影透镜，用于将布置在物平面中的图案成像到图像平面上，优选地同时产生真实中间图像，包括具有凹面镜的反射折射第一透镜部分和具有分束表面的物理分束器，以及第二透镜部分优选是折射的并且在其物平面和像平面之间跟随分束器。正屈光力布置在物平面的光学近场中，其被布置在距投影透镜的第一光学表面的工作距离处。分光镜位于低边缘光线高度附近，可以配置完全校正纵向色差的投影镜头，同时采用少量材料，特别是制造分束器所需的材料。

194. 发明公开

EP1417530A1 INTRINSIC BIREFRINGENCE COMPENSATION FOR BELOW 200 NANOMETER WAVELENGTH OPTICAL LITHOGRAPHY COMPONENTS WITH CUBIC CRYSTALLINE STRUCTURES 审中-公开
标题翻译：下的光学光刻波长范围INTRISISCHE双折射补偿200米，与晶体结构NANO CUBIC组件
公开(公告)号：EP1417530A1
公开(公告)日：2004-05-12
申请号：EP02750066.9
申请日：2002-07-16
申请人： CORNING INCORPORATED
发明人： ALLAN, Douglas, C. , WEBB, James, E. , BRUNING, John, H.
IPC分类号： G02B27/14 , G02F1/07 , G02F1/1333 , G01J4/00 , G01R33/02 , H01J40/14 , G01L1/24
CPC分类号： G02B17/0892 , G01L1/241 , G02B1/02 , G02B5/3091 , G02B17/0808 , G02B17/086 , G02F1/0131 , G03F7/70225 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures (12) in deep ultraviolet (less than 200 nm) microlithographic imaging systems (10). Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.

195. 发明授权

EP1098215B1 Catadioptric objective comprising two intermediate images 有权
标题翻译：反射折射物镜具有两个中间图像
公开(公告)号：EP1098215B1
公开(公告)日：2004-03-10
申请号：EP00122738.8
申请日：2000-10-19
申请人： Carl Zeiss SMT AG
发明人： Herkommer, Alois , Fürter, Gerd , Schuster, Karl-Heinz , von Bünau, Rudolf , Shafer, David R. , Ulrich, Wilhelm
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275

196. 发明公开

EP1318425A3 Catadioptric optical system and exposure apparatus equipped with the same 有权
标题翻译：反射折射光学系统和装有它的曝光设备
公开(公告)号：EP1318425A3
公开(公告)日：2003-10-29
申请号：EP03000101.0
申请日：2000-07-13
申请人： NIKON CORPORATION
发明人： Suenaga, Yutaka , Miyashita, Tomohiro , Yamaguchi, Kotaro
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A catadloptric optical system comprising a first imaging optical system for forming an intermediate image of a first plane surface, a second imaging optical system for forming a final image of the first plane surface onto a second plane surface which is substantially parallel to the first plane surface, and a catadioptric type optical system disposed in the optical path from the first plane surface to the second plane surface and including a first reflecting surface which reflects light coming from through the first plane surface and a second reflecting surface for directing the light reflected by the first reflecting surface toward the second plane surface. At least one of the first and second reflecting surfaces Is a concave reflecting surface. All of the optical elements of the catadloptric optical system are disposed on a single linear optical axis.
摘要翻译： 1.一种发射光学系统，包括用于形成第一平面表面的中间图像的第一成像光学系统，用于将第一平面表面的最终图像形成到基本平行于第一平面表面的第二平面表面上的第二成像光学系统以及反射折射型光学系统，设置在从第一平面到第二平面的光路中，并且包括反射来自第一平面表面的光的第一反射表面和反射由第二平面表面反射的光的第二反射表面，第一反射表面朝向第二平面表面。第一和第二反射表面中的至少一个是凹反射表面。发射光学系统的所有光学元件都布置在单个线性光轴上。

197. 发明授权

EP0883029B1 Exposure apparatus 无效
公开(公告)号：EP0883029B1
公开(公告)日：2003-09-03
申请号：EP98110088.6
申请日：1998-06-03
申请人： NIKON CORPORATION
发明人： Takahashi, Tetsuo, c/o Nikon Corporation , Mizoroke, Shigeo, c/o Nikon Corporation , Omura, Yasuhiro, c/o Nikon Corporation
IPC分类号： G03F7/20 , G02B17/08 , G02B27/18
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70858

198. 发明公开

EP1298494A2 High numerical aperture projection system for microlithography 审中-公开
标题翻译： Aperturfürdie Mikrolithographie Projektionssystem mit hoher numerischer Aperturfürdie Mikrolithographie
公开(公告)号：EP1298494A2
公开(公告)日：2003-04-02
申请号：EP02018247.3
申请日：2002-08-21
申请人： ASML US, Inc.
发明人： Oskotsky, Mark L. , Smirnov, Stanislav
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G02B17/08 , G02B17/0892 , G03F7/70275
摘要： The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and the beam-splitter, a concave mirror, a concave mirror optical group, where the concave mirror optical group is placed between the concave mirror and the beam-splitter, a fold mirror, where the fold mirror is placed between the beam-splitter and the wafer, and a wafer optical group, where the wafer optical group is placed between the beam-splitter and the wafer. In the present invention, a beam of light is directed through the reticle and the reticle optical group to the beam-splitter, then it is reflected by the beam-splitter onto the concave mirror. Concave mirror reflects the light onto the fold mirror through the beam-splitter. Fold mirror reflects the light onto the wafer through the wafer optical group. The present invention forms an intermediate image between the fold mirror and the wafer optical group. Furthermore, in an embodiment an aperture stop can be placed between the concave mirror optical group and the concave mirror.
摘要翻译：本发明涉及具有晶片的高数值孔径曝光系统。本发明的曝光系统包括光束分离器，光罩，光罩光学组，其中标线片光学组放置在光罩和分光器之间，凹面镜，凹面镜光学组，其中凹面镜面光学组放置在凹面镜和分光器之间，折叠镜放置在分束器和晶片之间的折叠镜和晶片光学组，其中晶片光学组放置在光束分配器和晶圆。在本发明中，光束被引导通过光罩和光掩模光学组到分束器，然后被分束器反射到凹面镜上。凹面镜通过分光镜将光反射到折叠镜上。折叠镜通过晶片光学组将光反射到晶片上。本发明在折射镜和晶片光学组之间形成中间图像。此外，在一个实施例中，可以在凹面镜光学组和凹面镜之间放置孔径光阑。

199. 发明公开

EP1293830A1 Projection exposure apparatus and method 审中-公开
标题翻译：用于投影曝光方法和设备
公开(公告)号：EP1293830A1
公开(公告)日：2003-03-19
申请号：EP02024574.2
申请日：1999-06-07
申请人： NIKON CORPORATION
发明人： Omura, Yasuhiro, Intellectual Property HQ , Takahashi, Tetsuo, Intellectual Property HQ , Ikeda, Masatoshi, Intellectual Property HQ , Li, Shiwen, Intellectual Property HQ , Ichihara, Yutaka, Intellectual Property HQ
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70808 , G03F7/70825 , G03F7/70833
摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.

200. 发明授权

EP1069448B1 Catadioptric optical system and projection exposure apparatus equipped with the same 有权
标题翻译：与这样的系统中的反射折射光学系统及投影曝光装置
公开(公告)号：EP1069448B1
公开(公告)日：2003-03-19
申请号：EP00305938.3
申请日：2000-07-13
申请人： NIKON CORPORATION
发明人： Suenaga, Yutaka, Nikon Corp. , Miyashita, Tomohiro, Nikon Corp. , Yamaguchi, Kotaro, Nikon Corp.
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70358
摘要： A catadioptric optical system comprising a first imaging optical system for forming an intermediate image of a first plane surface, a second imaging optical system for forming a final image of the first plane surface onto a second plane surface which is substantially parallel to the first plane surface, and a catadioptric type optical system disposed in the optical path from the first plane surface to the second plane surface and including a first reflecting surface which reflects light coming from through the first plane surface and a second reflecting surface for directing the light reflected by the first reflecting surface toward the second plane surface. At least one of the first and second reflecting surfaces is a concave reflecting surface. All of the optical elements of the catadioptric optical system are disposed on a single linear optical axis.

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