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1. 发明公开

EP1997620A1 LAMINATED BODY AND CARBON FILM DEPOSITION METHOD 有权
标题翻译：层压体和碳膜沉积方法
公开(公告)号：EP1997620A1
公开(公告)日：2008-12-03
申请号：EP07738668.8
申请日：2007-03-15
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , TSUGAWA, Kazuo , ISHIHARA, Masatou , KOGA, Yoshinori
IPC分类号： B32B9/00 , B32B9/04 , C23C16/26
CPC分类号： B32B9/04 , C23C16/0281 , C23C16/26 , Y10T428/24612 , Y10T428/269
摘要： An object of the invention is to provide a resin material having further improved thermal conductivity, slidability, heat resistance, strength and rigidity of a resin material and having imparted thereto characteristics such as high thermal conductivity, rigidity, scratch prevention, high slidability and the like, and a method for producing the same. A laminate is obtained by laminating the resin material and a carbon film having a thermal conductivity of from 70 to 700 W/mK, a resistance value of 1 × 10 7 Ωcm or more (100°C) and a film thickness of from 50 nm to 10 µm, the carbon film having a spectrum peak at a Brag's angle (2θ ± 0.3°) of from 41 to 42° in an X-ray diffraction spectrum by CuK α1 ray, or the laminate has a plasma-resistant film integrally molded on the resin material according to need. As a method for depositing a carbon film on the resin material, a method in which a reaction gas is used by mixing argon and/or hydrogen therewith, plasma is generated at a gas pressure of from 1 to 100 pascals, the substrate having provided thereon a plasma-resistant film is placed at a position that an electron temperature of plasma is from 0.5 to 3.0 eV, and radical species in the plasma are moved toward the substrate of the generation origin of the plasma such that the radical species almost uniformly reach on the surface of the substrate, is employed.
摘要翻译：本发明的目的在于提供一种树脂材料，其进一步提高了导热性，滑动性，耐热性，树脂材料的强度和刚性，并赋予了高导热性，刚性，防刮伤性，高滑动性等特性以及其制造方法。通过将树脂材料和导热率为70至700W / mK，电阻值为1×10 7Ωcm或更高（100℃）且膜厚度为50nm至50nm的碳膜所述碳膜在CuKα1射线的X射线衍射光谱中在布拉格角（2θ±0.3°）具有41至42°的谱线峰，或者所述叠层具有一体成型于所述树脂材料根据需要。作为在树脂材料上沉积碳膜的方法，可以采用通过混合氩气和/或氢气来使用反应气体的方法，其中在1至100帕斯卡的气体压力下产生等离子体，在等离子体的电子温度为0.5〜3.0eV的位置配置耐等离子体性膜，使等离子体中的自由基种类向等离子体的产生起点的基板移动，使自由基物质几乎均匀地到达采用衬底的表面。

2. 发明公开

EP2540862A1 CARBON FILM LAMINATE 有权
标题翻译： KOHLENSTOFFFILMBESCHICHTUNG
公开(公告)号：EP2540862A1
公开(公告)日：2013-01-02
申请号：EP11747486.6
申请日：2011-02-25
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , ISHIHARA, Masatou , KOGA, Yoshinori , KIM, Jaeho , TSUGAWA, Kazuo , IIJIMA, Sumio
IPC分类号： C23C16/26 , C01B31/04
CPC分类号： C23C16/0281 , B82Y30/00 , B82Y40/00 , C01B32/05 , C01B32/186 , C01B32/50 , C23C16/26 , C30B29/02 , C30B29/04 , C30B29/20 , Y10T428/30 , Y10T428/31678
摘要： An object of the present invention is to solve a problem such as a small crystal size, which is the issue of a conventional method for formation of a film of graphene by a thermal CVD technique using a copper foil as a substrate, and thus providing a carbon film laminate in which graphene having a larger crystal size is formed. The carbon film laminate is configured to include a sapphire (0001) single crystal having a surface composed of terrace surfaces which are flat at the atomic level, and atomic-layer steps, a copper (111) single crystal thin film formed by epitaxial growth on the substrate, and graphene deposited on the copper (111) single crystal thin film, and thus enabling formation of graphene having a large crystal size.
摘要翻译：本发明的目的是解决诸如小晶体尺寸的问题，这是通过使用铜箔作为基板的热CVD技术形成石墨烯的常规方法的问题，因此提供形成具有较大晶体尺寸的石墨烯的碳膜层压体。碳膜层叠体被构造为包括具有由原子层平坦的台面表面构成的表面的蓝宝石（0001）单晶，以及原子层台阶，通过外延生长形成的铜（111）单晶薄膜衬底和沉积在铜（111）单晶薄膜上的石墨烯，从而能够形成具有大晶体尺寸的石墨烯。

3. 发明授权

EP2276328B1 MICROWAVE PLASMA PROCESSING DEVICE 有权
标题翻译：微波等离子体处理装置
公开(公告)号：EP2276328B1
公开(公告)日：2017-05-10
申请号：EP09724062.6
申请日：2009-03-27
申请人： National Institute of Advanced Industrial Science and Technology
发明人： KIM, Jaeho , TSUGAWA, Kazuo , ISHIHARA, Masatou , HASEGAWA, Masataka , KOGA, Yoshinori
IPC分类号： H05H1/46 , C23C16/511 , H01J37/32
CPC分类号： C23C16/511 , H01J37/32192 , H01J37/32229 , H05H1/46

4. 发明授权

EP2540862B1 CARBON FILM LAMINATE 有权
标题翻译：碳薄膜包衣
公开(公告)号：EP2540862B1
公开(公告)日：2016-11-23
申请号：EP11747486.6
申请日：2011-02-25
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , ISHIHARA, Masatou , KOGA, Yoshinori , KIM, Jaeho , TSUGAWA, Kazuo , IIJIMA, Sumio
IPC分类号： C23C16/26 , C01B31/04 , B82Y30/00 , B82Y40/00 , C01B31/02 , C01B31/20 , C23C16/02 , C30B29/02 , C30B29/04 , C30B29/20
CPC分类号： C23C16/0281 , B82Y30/00 , B82Y40/00 , C01B32/05 , C01B32/186 , C01B32/50 , C23C16/26 , C30B29/02 , C30B29/04 , C30B29/20 , Y10T428/30 , Y10T428/31678

5. 发明授权

EP2075091B1 LAMINATE, ABRASIVE AND GRINDING MATERIALS MADE BY USING THE SAME, AND PROCESS FOR FORMATION OF THE LAMINATE 有权
标题翻译：层压板使用相同的生产打磨，抛光材料和制造方法层压
公开(公告)号：EP2075091B1
公开(公告)日：2014-12-10
申请号：EP07829735.5
申请日：2007-10-12
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , TSUGAWA, Kazuo , ISHIHARA, Masatou , KOGA, Yoshinori
IPC分类号： B24D3/00
CPC分类号： B24D11/003 , B24B9/16 , B24D18/00 , C23C16/0254 , C23C16/26 , C23C30/00 , Y10T428/24372 , Y10T428/30

6. 发明公开

EP2075091A1 LAMINATE, ABRASIVE AND GRINDING MATERIALS MADE BY USING THE SAME, AND PROCESS FOR FORMATION OF THE LAMINATE 有权
标题翻译：层压板使用相同的生产打磨，抛光材料和制造方法层压
公开(公告)号：EP2075091A1
公开(公告)日：2009-07-01
申请号：EP07829735.5
申请日：2007-10-12
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , TSUGAWA, Kazuo , ISHIHARA, Masatou , KOGA, Yoshinori
IPC分类号： B24D3/00
CPC分类号： B24D11/003 , B24B9/16 , B24D18/00 , C23C16/0254 , C23C16/26 , C23C30/00 , Y10T428/24372 , Y10T428/30
摘要： The invention provides a laminate capable of polishing and grinding the surface of a material having a high hardness such as diamond, sapphire or hard carbon film, rapidly and in a simplified manner with high planarity and high accuracy, utilizing the high adhesiveness to substrates, the hardness and the surface planarity that a carbon film has, but using neither diamond abrasive grains nor alkali slurry. The laminate comprises a substrate and a carbon layer provided on the substrate, wherein the carbon layer comprises a diamond fine grain provided on the substrate and crushed by impact given thereto, a formation/growth inhibiting material that inhibits the formation of an impurity inhibiting the growth of a carbon grain and/or inhibits the growth of a carbon grain, and a carbon grain, and an amount (amount per unit volume) of the formation/growth inhibiting material decreases from a lower layer toward an upper layer on the substrate side. Preferably, the formation/growth inhibiting material is an SiO 2 material or an Al 2 O 3 material, and optionally an adhesiveness-reinforcing layer comprising titanium or a titanium alloy or the like may be provided between the substrate and the carbon layer.
摘要翻译：本发明提供了能抛光和研磨材料的表面具有高硬度的层压：例如金刚石，蓝宝石或硬碳膜，电影，迅速且以高平面度和高精确度以简化的方式，利用高粘接性的基板，所述硬度和表面平面做了羧酸电影有，但既不使用金刚石磨粒也不碱性浆液。所述层压板包括基板和设置在该基片的碳层，worin碳层包括由此，一个形成/生长抑制材料做给定的冲击设置在衬底和压碎的金刚石细晶粒抑制杂质抑制生长的形成碳颗粒和/或抑制碳颗粒的形成/生长抑制材料的生长，和碳颗粒，并且在量（每单位体积的量）从朝向对衬底侧上层的下层减小。优选地，形成/生长抑制材料是SiO 2材料或Al 2 O 3材料，并且任选地密合性增强层包含钛或钛合金，或者可以在基板和碳层之间设置等。

7. 发明授权

EP1997620B1 LAMINATED BODY AND CARBON FILM DEPOSITION METHOD 有权
标题翻译：层压体和碳膜沉积方法
公开(公告)号：EP1997620B1
公开(公告)日：2016-06-15
申请号：EP07738668.8
申请日：2007-03-15
申请人： National Institute of Advanced Industrial Science and Technology
发明人： HASEGAWA, Masataka , TSUGAWA, Kazuo , ISHIHARA, Masatou , KOGA, Yoshinori
IPC分类号： C23C16/02 , C23C16/26 , B32B9/04
CPC分类号： B32B9/04 , C23C16/0281 , C23C16/26 , Y10T428/24612 , Y10T428/269

8. 发明公开

EP2708617A1 CARBON FILM LAMINATE, METHOD OF MANUFACTURING SAID LAMINATE, AND LUBRICANT USING SAID LAMINATE 审中-公开
标题翻译： CARBONFILMLAMINAT，VERFAHREN ZUR HERSTELLUNG DIESES LAMINATS UND SCHMIERMITTEL MIT DIESEM LAMINAT
公开(公告)号：EP2708617A1
公开(公告)日：2014-03-19
申请号：EP12781837.5
申请日：2012-05-10
申请人： National Institute of Advanced Industrial Science and Technology
发明人： TSUGAWA, Kazuo , KAWAKI, Shunsuke , ISHIHARA, Masatou , KOGA, Yoshinori , HASEGAWA, Masataka , KIM, Jaeho
IPC分类号： C23C16/27 , C10M103/02 , C10N30/06 , C10N40/02
CPC分类号： C10M103/02 , C10M103/06 , C10M177/00 , C10M2201/041 , C10M2201/042 , C10M2201/081 , C10M2201/102 , C10N2230/06 , C10N2240/10 , C10N2250/08 , C10N2250/10 , C10N2250/141 , C23C16/0272 , C23C16/26 , C23C16/511 , Y10T428/24355 , Y10T428/30
摘要： An object of the invention is to provide a carbon film laminate having a sliding surface with low friction, low abrasion, and low counterpart aggressiveness using high adhesiveness to a base material, hardness, surface flatness, low counterpart aggressiveness, transparency, and high thermal conductivity which are provided to the carbon film without using liquid and semiliquid lubricants such as lubricating oil. Provided is a carbon film laminate including a base material, a carbon film adhesion reinforcing layer which is provided on the base material and which is formed from silicon oxide (SiOx, x= 1 to 2) containing fluorine atoms (F) in a concentration of 1×10 19 atoms/cm 3 or more, and a carbon film that is formed on the carbon film adhesion reinforcing layer. The carbon film contains fluorine atoms in the film in a concentration of 1×10 19 to 1×10 21 atoms/cm 3 , and has an approximate spectrum curve obtained by superimposing, on a peak fitting curve A at a Bragg angle (2θ±0.5°) of 43.9° in an X-ray diffraction spectrum by CuKα 1 rays, a peak fitting curve B at 41.7° and a baseline.
摘要翻译：本发明的目的是提供一种具有低摩擦滑动面，低磨损性和低对比度侵蚀性的碳膜层叠体，其使用对基材的高粘附性，硬度，表面平整度，低对应物侵蚀性，透明性和高导热性其不使用液体和半液体润滑剂如润滑油而提供给碳膜。本发明提供一种碳膜层压体，其包括基材，碳膜附着增强层，其设置在基材上，并且由含有氟原子（F）的氧化硅（SiO x，x = 1〜2）形成，浓度为 1×10 19原子/ cm 3以上，以及形成在碳膜附着增强层上的碳膜。该碳膜的浓度为1×10 19〜1×10 21原子/ cm 3的膜中含有氟原子，并且具有通过在布拉格角（2θ）上的峰值拟合曲线A上叠加而获得的近似光谱曲线 ±0.5°）为43.9°，通过CuK±1射线在X射线衍射光谱中，峰拟合曲线B为41.7°，基线为。

9. 发明公开

EP2276328A1 MICROWAVE PLASMA PROCESSING DEVICE 有权
标题翻译： MIKROWELLENPLASMA-VERARBEITUNGSEINRICHTUNG
公开(公告)号：EP2276328A1
公开(公告)日：2011-01-19
申请号：EP09724062.6
申请日：2009-03-27
申请人： National Institute of Advanced Industrial Science and Technology
发明人： KIM, Jaeho , TSUGAWA, Kazuo , ISHIHARA, Masatou , HASEGAWA, Masataka , KOGA, Yoshinori
IPC分类号： H05H1/46 , C23C16/511 , H01L21/3065
CPC分类号： C23C16/511 , H01J37/32192 , H01J37/32229 , H05H1/46
摘要： To provide a microwave plasma-treating apparatus which is capable of generating plasma having a high degree of uniformity of density and a high density for executing large-quantity and high-speed processing, capable of generating plasma of a large area, and capable of preventing dielectric windows from being thermally broken despite the apparatus being operated with large electric power for extended periods of time. The microwave plasma-treating apparatus includes a waveguide arranged to feed microwave electric power, a plurality of microwave coupling holes formed in the waveguide in the axial direction thereof, a dielectric member of a piece of plate capable of transmitting microwaves arranged in the waveguide in the axial direction thereof under the microwave coupling holes, a gap formed between the plurality of microwave coupling holes and the dielectric member, and a cooling member for cooling the dielectric member. Desirably, the microwave coupling holes have an annular shape.
摘要翻译：为了提供能够产生具有高密度均匀性和高密度的等离子体的微波等离子体处理装置，用于执行大量和高速处理，能够产生大面积的等离子体，并且能够防止电介质窗不受热破坏，尽管设备长时间以大电力运行。微波等离子体处理装置包括布置成馈送微波电力的波导管，在波导管的轴向形成的多个微波耦合孔，能够传输布置在波导管中的微波的电介质部件在微波耦合孔之下的轴向方向，在多个微波耦合孔和电介质构件之间形成的间隙，以及用于冷却电介质构件的冷却构件。理想地，微波耦合孔具有环形形状。

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