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    • 3. 发明授权
    • Inductor for semiconductor device and method for making the same
    • 半导体器件用电感器及其制造方法
    • US06303971B1
    • 2001-10-16
    • US08974371
    • 1997-11-19
    • Tae-Pok Rhee
    • Tae-Pok Rhee
    • H01L2941
    • H01L28/10H01F17/0033H01L27/08
    • An inductor for a semiconductor device is formed within a groove in an insulating layer on a semiconductor substrate. A number of lower conductive lines are formed across the groove. A cylindrical insulator is formed over the lower conductive lines and aligned with the groove. Upper conductive lines are formed over the cylindrical insulator. The upper and lower conductive lines are slanted lengthwise along the groove in opposite directions to form a spiral coil having a circular cross-section, thereby preventing abrupt changes in the magnetic field. The ends of upper conductive lines contact the ends of the lower conductive lines so that the thickness of the coil is controlled by the thickness of the cylindrical insulator, thereby allowing the self-inductance to be increased and the positional density of the conductive lines to be freely controlled.
    • 用于半导体器件的电感器形成在半导体衬底上的绝缘层的沟槽内。 多个下导电线跨越沟槽形成。 在下导电线上形成圆柱形绝缘体,并与凹槽对准。 上导电线形成在圆柱形绝缘体上。 上下导线沿相反方向的槽沿纵向倾斜以形成具有圆形横截面的螺旋线圈,从而防止磁场的突然变化。 上导电线的端部接触下导电线的端部,使得线圈的厚度由圆柱形绝缘体的厚度控制,从而允许增加自感并且使导线的位置密度为 自由控制。
    • 4. 发明授权
    • Semiconductor device with bipolar and J-FET transistors
    • 具有双极和J-FET晶体管的半导体器件
    • US06278143B1
    • 2001-08-21
    • US09145431
    • 1998-09-01
    • Hirokazu Ejiri
    • Hirokazu Ejiri
    • H01L2941
    • H01L21/8248H01L27/0623
    • In a semiconductor device by a complex-type bipolar transistor device in which a junction-type field effect transistor is connected to a bipolar transistor, to make it possible to ensure a good and stable characteristic of the bipolar transistor without incurring a larger area in the junction-type field effect transistor J-FET. In a semiconductor device having a bipolar transistor (TR) and a junction-type field effect transistor (J-FET), in which a collector of the bipolar transistor and a source of the junction-type field effect transistor are connected, a gate region (14) of the junction-type field effect transistor, a gate contact conductive layer 17G, and a drain contact conductive layer 18D for a drain region are formed of conductive layers which are formed as respectively different layers with a same conductive material or mutually different materials and an arrangement surface of an edge portion 17G1 on the drain side of the gate contact conductive layer is positioned below an arrangement surface of an edge portion 18D1 on the gate side of the drain contact conductive layer.
    • 在其中结型场效应晶体管连接到双极晶体管的复合型双极晶体管器件的半导体器件中,为了确保双极型晶体管的良好且稳定的特性而不会产生更大的面积, 结型场效应晶体管J-FET。在具有双极型晶体管(TR)和结型场效应晶体管(J-FET)的半导体器件中,其中双极晶体管的集电极和结型场效应晶体管的源极, 连接型场效应晶体管,接合型场效应晶体管的栅极区域(14),栅极接触导电层17G和漏极区域的漏极接触导电层18D由分别形成的导电层形成 具有相同导电材料或相互不同的材料的不同层和栅极接触导电层的漏极侧上的边缘部分17G1的布置表面位于ar 在漏极接触导电层的栅极侧的边缘部分18D1的尺寸表面。
    • 5. 发明授权
    • Semiconductor device having patterned metal layer over a polysilicon line and method of fabrication thereof
    • 具有多晶硅线上的图案化金属层的半导体器件及其制造方法
    • US06249032B1
    • 2001-06-19
    • US09165051
    • 1998-10-01
    • Homi E. NarimanH. Jim FulfordCharles E. May
    • Homi E. NarimanH. Jim FulfordCharles E. May
    • H01L2941
    • H01L23/528H01L2924/0002H01L2924/00
    • A semiconductor device and fabrication process are provided in which a patterned metal layer is formed over a polysilicon line. The polysilicon line is disposed on a substrate and may, for example, be a gate electrode. A dielectric layer is disposed adjacent the polysilicon line and the patterned metal layer is formed over the polysilicon line. The device may further include a second polysilicon line, such as a gate electrode, and the patterned metal layer may extend over the top of the second polysilicon line and interconnect the two polysilicon lines. A contact for the polysilicon line is coupled to the patterned metal layer. The use of a patterned metal line may provide a larger footprint for the contact then the underlying polysilicon line(s) and may decrease the sheet resistance to the polysilicon line(s).
    • 提供半导体器件和制造工艺,其中在多晶硅线上形成图案化的金属层。 多晶硅线路设置在基板上,并且可以例如是栅电极。 介电层设置在多晶硅线附近并且在多晶硅线上形成图案化的金属层。 该器件还可以包括第二多晶硅线,例如栅电极,并且图案化的金属层可以在第二多晶硅线的顶部上延伸并互连两个多晶硅线。 用于多晶硅线的触点耦合到图案化的金属层。 使用图案化金属线可以为接触提供更大的覆盖,然后是下面的多晶硅线,并且可以降低对多晶硅线的薄层电阻。
    • 6. 发明授权
    • Switching circuit with improved signal blocking effect in off mode
    • 开关电路在关断模式下具有改善的信号阻塞效应
    • US06800935B2
    • 2004-10-05
    • US10256692
    • 2002-09-27
    • Toshiharu Yoneda
    • Toshiharu Yoneda
    • H01L2941
    • H05K1/0243H05K3/3421H05K2201/09481H05K2201/10174H05K2201/10969
    • A switching circuit includes an insulating substrate including two signal transmission lines; a switching diode mounted, in series between the two signal transmission lines, on the insulating substrate, wherein an anode terminal and a cathode terminal are connected to the two signal transmission lines, and the switching diode is turned on or off; and a conductive pattern formed, below the switching diode, on a mounting face of the insulating substrate on which the switching diode is mounted, wherein the conductive pattern is grounded. There are stray capacitances between the anode terminal and the conductive pattern and between the cathode terminal and the conductive pattern.
    • 开关电路包括:绝缘基板,包括两条信号传输线; 串联在两个信号传输线之间的绝缘基板上的开关二极管,其中阳极端子和阴极端子连接到两个信号传输线,并且开关二极管导通或关断; 以及在开关二极管的下方形成在其上安装有开关二极管的绝缘基板的安装面上的导电图案,其中导电图案接地。 在阳极端子和导电图案之间以及阴极端子和导电图案之间存在杂散电容。
    • 10. 发明授权
    • SOI FET body contact structure
    • SOI FET体接触结构
    • US06177708B1
    • 2001-01-23
    • US09324324
    • 1999-06-02
    • Jente B. KuangJohn P. PenningsGeorge E. Smith, IIIMichael H. Wood
    • Jente B. KuangJohn P. PenningsGeorge E. Smith, IIIMichael H. Wood
    • H01L2941
    • H01L27/1203H01L29/42384H01L29/78606H01L29/78618
    • A self-aligned SOI FET device with an “L” shaped gate structure allows an integral diode junction to be formed between the source and the body of the device. Two devices with this gate geometry can be advantageously placed side-by-side in a single rx opening that could accommodate but a single device with a “T” shaped gate structure. The devices in accordance with the teachings of this invention can be easily formed using standard prior art SOI processing steps. An aspect of this invention includes the use of these novel SOI devices with their body and source connected together in circuit applications, such as memory cell sense amplifiers, where high speed operation commends the use of SOI technology, but physical space considerations have limited their application.
    • 具有“L”形栅极结构的自对准SOI FET器件允许在器件的源极和主体之间形成整体二极管结。 具有该栅极几何形状的两个器件可以有利地并排布置在可容纳但具有“T”形栅极结构的单个器件的单个rx开口中。 根据本发明的教导的器件可以使用标准的现有技术的SOI处理步骤容易地形成。 本发明的一个方面包括使用这些新颖的SOI器件,其主体和源极在诸如存储器单元读出放大器的电路应用中连接在一起,其中高速操作表示使用SOI技术,但是物理空间考虑限制了它们的应用 。