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1. 发明专利

MX9700303A UTILIZACION DE ENTRAMADO DE MODULACION DE FRECUENCIA PARA ALIGERAR EN IMPRESION POR TRANSFERENCIA LAS SUPERFICIES IMPRESORAS. 未知
公开(公告)号：MX9700303A
公开(公告)日：1998-01-31
申请号：MX9700303
申请日：1995-07-12
申请人： NOUEL JEAN-MARIE
发明人： NOUEL JEAN-MARIE
IPC分类号： G03F05/24 , G03F01/00 , G03F05/00
摘要： La presente invencion tiene por objetivo la realizacion de entramado para modulacion de frecuencia o entramado estocástico para aligerar las superficies impresoras, en técnicas de impresion por transferencia en seco o transferencia en humedo. Esta tiene igualmente por objetivo las películas y placas, utilizadas en estas técnicas de impresion que, de manera característica, generan superficies impresoras aligeradas de acuerdo a un entramado estocástico (o entramado para modulacion de frecuencia).

2. 发明申请

WO1991013384A1 THREE DIMENSIONAL PLATING OR ETCHING PROCESS AND MASKS THEREFOR 审中-公开
标题翻译：三维涂层或蚀刻过程及其掩模
公开(公告)号：WO1991013384A1
公开(公告)日：1991-09-05
申请号：PCT/US1991001209
申请日：1991-02-21
申请人： GENERAL ELECTRIC COMPANY
发明人： GENERAL ELECTRIC COMPANY , METTLER, John, Herbert , JOHNSON, William, Lloyd , STRICKLAND, William, Charles , ZADEREJ, Victor, Vasyl
IPC分类号： G03F01/00
CPC分类号： G03F1/68 , H05K1/0284 , H05K3/0002 , H05K3/0082 , H05K2203/056 , H05K2203/085 , H05K2203/107 , Y10T156/1028
摘要： .n a process for plating or etching metalization patterns on the surface of a three dimensional substrate, a flexible plastic mask is fabricated by first coating the surface of a thin plastic sheet with vacuum formable ink. The mask is then molded into the shape of the surface into which the pattern is to be formed. A low power YAG laser is used to remove areas of the ink through which light is to be allowed to pass. This mask may then be used in either a print and plate process or a print and etch process by drawing the mask into intimate contact with the workpiece by applying a vacuum between the mask and the workpiece. The workpiece may then be exposed to light through the clear areas of the mask.

3. 发明申请

WO1981002206A1 PROCESS FOR OBTAINING A BETTER IMAGE RESTITUTION IN THE REPRODUCTION TECHNIQUE 审中-公开
标题翻译：在复制技术中获得更好的图像重现的过程
公开(公告)号：WO1981002206A1
公开(公告)日：1981-08-06
申请号：PCT/DE1981000016
申请日：1981-01-17
申请人： HELL GMBH R , SING G , WELLENDORF K
发明人： HELL GMBH R
IPC分类号： G03F01/00
CPC分类号： H04N1/4055 , H04N1/3871
摘要： In order to obtain an improved recording of the line contours in the electronic reproduction technique, the recording is carried out by means of several recording beams, which can be selectively controlled, within a raster point, with a higher resolution than the scanning. The control signals of the individual beams are obtained from the density values of the surroundings of the raster points to be recorded, stored during the scanning.
摘要翻译：为了在电子再现技术中获得线轮廓的改进的记录，通过可以在光栅点内以比扫描更高的分辨率被选择性地控制的几个记录光束进行记录。各个光束的控制信号从扫描期间存储的要记录的光栅点的周围的密度值获得。

4. 发明申请

WO1979000507A1 PHOTOMECHANICAL PROCESSING MACHINE 审中-公开
标题翻译：光电加工机
公开(公告)号：WO1979000507A1
公开(公告)日：1979-08-09
申请号：PCT/JP1979000007
申请日：1979-01-13
申请人： YAMATOYASHOKAI KK , NUMAKURA T , OKAMOTO K , MOERITZ P
发明人： YAMATOYASHOKAI KK
IPC分类号： G03F01/00
CPC分类号： H04N1/6027
摘要： A highly developed photomechanical processing machine including, an input mechanism (5) for information indicative of density, gradation and tone The information is obtained from a collecting mechanism (4) for gray scales and color batches simultaneously exposed together with ordinary color photographic images. The processing machine further includes a mechanism (6) which stores input information indicative of density, gradation and tone of a standard color photograph, a mechanism (8) which stores input information indicative of a desired density, gradation and tone, an adjusting mechanism (7, 9) for adjusting the density, gradation and tone of ordinary images based on the difference between random points in the information from mechanism (5), (6) or (8) when the information indicative of the density and tone of the ordinary image is entered into the respective mechanisms whereby the desired gradation and tone of the image of a halftone dot are obtained.
摘要翻译：一种高度发展的光机械处理机，包括用于指示密度，灰度和色调的信息的输入机构（5）。从与普通彩色摄影图像同时曝光的灰度级和色彩批次的收集机构（4）获得信息。处理机还包括存储指示标准彩色照片的浓度，灰度和色调的输入信息的机构（6），存储表示所需密度，灰度和色调的输入信息的机构（8），调节机构根据来自机构（5），（6）或（8）的信息中的随机点之间的差异，调整普通图像的浓度，灰度和色调时，当表示普通图像的浓度和色调的信息时图像被输入到相应的机构中，从而获得半色调点的图像的期望灰度和色调。

5. 发明申请

WO1998016874A1 PROCESS FOR IMAGING A FLEXO-GRAPHIC PRINTING PLATE FROM LIQUID PHOTOPOLYMERS AND WITHOUT USING PHOTOTOOLS 审中-公开
标题翻译：从液晶光刻胶中成像柔性图形印刷版并且不使用光刻胶的方法
公开(公告)号：WO1998016874A1
公开(公告)日：1998-04-23
申请号：PCT/IL1997000330
申请日：1997-10-14
申请人： J.G. SYSTEMS INC. , GRUNWALD, John, J.
发明人： J.G. SYSTEMS INC.
IPC分类号： G03F01/00
CPC分类号： G03F7/202
摘要： In the process of making a flexographic printing plate, the liquid photopolymerizable composition is cast against an IR laser-imageable element which then acts as an in situ negative for subsequent UV flood exposure.
摘要翻译：在制造柔版印刷版的过程中，将液体可光聚合的组合物浇注到IR可激光成像元件上，然后将其作为原位阴极用于随后的紫外线曝光。

6. 发明申请

WO1997042547A1 PROCESS AND DEVICE FOR PREPARATION OF EXPOSED TYPESETTING FILMS FOR PHOTOTYPESETTING 审中-公开
标题翻译：方法和设备曝光的胶片一套LIGHT一整套的生产
公开(公告)号：WO1997042547A1
公开(公告)日：1997-11-13
申请号：PCT/EP1996001806
申请日：1996-05-02
申请人： WINDI WINDERLICH GMBH , COSTARD, Herbert
发明人： WINDI WINDERLICH GMBH
IPC分类号： G03F01/00
CPC分类号： G03F1/68
摘要： The invention relates to a process and a device for preparing exposed typesetting films for phototypesetting. In said process, a typesetting film which has a transparent plastic base sheet and at least one surface layer applied thereto is scanned with a laser beam and exposed with respect to picture elements while being guided by the typesetting information. To prepare a typesetting films in a simple and economical manner, it is proposed to use a typesetting film with a carbon black and/or graphite-containing surface layer on the transparent plastic base sheet, and to burn away with the laser beam the surface layer at picture elements to be exposed. Consequently, only the transparent plastic base sheet remains in the exposed areas.
摘要翻译：本发明涉及一种用于生产用于光组设定曝光的胶片的方法和装置。在这样的过程中，一组的膜，其具有在透明塑料基膜和至少一个涂覆的涂布层进行扫描的激光束，并通过暴露该组信息成像控制。为了使一个简单和廉价的生产一套薄膜，建议使用具有在透明塑料基膜上的煤烟和/或含石墨的层的一组膜和燃烧掉覆盖层由激光束要曝光的像素，以使得在曝光区域仅在透明塑料基膜残留。

7. 发明申请

WO1997038355A1 SYSTEMS AND METHODS FOR DEPOSITION OF DIELECTRIC FILMS 审中-公开
标题翻译：用于沉积介质膜的系统和方法
公开(公告)号：WO1997038355A1
公开(公告)日：1997-10-16
申请号：PCT/US1997005742
申请日：1997-04-07
申请人： MICRION CORPORATION
发明人： MICRION CORPORATION , CASEY, J., David, Jr. , STEWART, Diane, K. , SUNDARAM, Ganesh , DOYLE, Andrew, F.
IPC分类号： G03F01/00
CPC分类号： G03F1/72 , G03F1/26 , H01L21/02164 , H01L21/02216 , H01L21/31608
摘要： The present invention provides systems and methods for the water-based deposition of silicon dioxide films. In one aspect, the invention provides methods for depositing a dielectric material to the surface of a workpiece. The workpiece can be, for example, an integrated circuit, a phase shift mask, or any other device that has features suitable for processing by a focused ion beam system. The method for depositing the dielectric material includes the steps of providing a chamber that has an interior portion with a stage element for holding the workpiece and that also includes an injection element for introducing reactant material into that interior portion, introducing through the injection elements a silicon-containing reactant material, introducing through the injection element a water-containing reactant material, and passing an ion beam through the interior portion and to the surface of the workpiece for depositing the dielectric material thereon. The process of the invention is suitable for focused ion beam induced deposition of a silicon dioxide film on top of an integrated circuit for forming an insulated layer or for depositing a silicon dioxide film on a phase shift mask for repairing a defect in the mask such as a bump or a void.
摘要翻译：本发明提供了用于二氧化硅膜的水基沉积的系统和方法。一方面，本发明提供了将电介质材料沉积到工件的表面上的方法。工件可以是例如集成电路，相移掩模或具有适合于聚焦离子束系统处理的特征的任何其它器件。沉积电介质材料的方法包括以下步骤：提供具有内部部分的室，其具有用于保持工件的载物台元件，并且还包括用于将反应物材料引入该内部部分的注入元件，通过注入元件引入硅通过注射元件引入含水反应物质，并使离子束通过内部部分和工件表面，以沉积其上的电介质材料。本发明的方法适用于在用于形成绝缘层的集成电路的顶部上的聚焦离子束感应沉积二氧化硅膜或用于在相位掩模上沉积二氧化硅膜以修复掩模中的缺陷，例如一个碰撞或一个空白。

8. 发明申请

WO1990005326A1 PATTERN CORRECTION METHOD 审中-公开
标题翻译：模式校正方法
公开(公告)号：WO1990005326A1
公开(公告)日：1990-05-17
申请号：PCT/JP1989001041
申请日：1989-10-11
申请人： KYODO PRINTING CO., LTD. , FURUKAWA, Tadahiro , KIKUCHI, Toshiaki , KONNO, Hitoshi
发明人： KYODO PRINTING CO., LTD.
IPC分类号： G03F01/00
CPC分类号： G03F1/72
摘要： This invention relates to a technique for correcting a pattern formed on one of the surfaces of a substrate and having defect(s) at its part. The pattern correction technique in accordance with the present invention includes a step of covering one surface of the substrate (12) including the pattern (20) with a protective film (60) for correction, a step of exposing the one surface of the substrate (12) at a part where a defect (30, 40, 50) exists, a step of filling the part of the exposed one surface of the substrate (12) with a correcting material (70) and a step of removing the protective film (60) for correction. Either one of the protective film (60) for correction and the correcting material (70) consists of a water-soluble material and the other consists of an oil-soluble material.

9. 发明申请

WO1987000940A1 METHOD OF PRINTING LEAFLETS AND CATALOGS 审中-公开
标题翻译：打印叶片和目录的方法
公开(公告)号：WO1987000940A1
公开(公告)日：1987-02-12
申请号：PCT/JP1986000397
申请日：1986-07-29
申请人： DAI NIPPON INSATSU KABUSHIKI KAISHA , KUBOTA, Yasuo , HIKOSAKA, Shinichi , OHKI, Shigekazu , MODEGI, Toshio , TOMODA, Yasunori
发明人： DAI NIPPON INSATSU KABUSHIKI KAISHA
IPC分类号： G03F01/00
CPC分类号： G06Q30/02 , B41B19/01 , B41B25/00 , B41B27/40 , B41B27/41 , G06T11/60 , H04N1/3872 , H04N1/3873 , H04N1/3875 , H04N1/6011
摘要： A method fo preparing an original plate for printing leaflets and catalogs by using a computer. Designs of leaflets and catalogs are classified into line drawings, photographs and characters, are input to the computer via the respective input devices, and are laid out while being displayed on a display. Layout conditions are confirmed by using a hard copy. The original plate for printing is prepared based upon data output from a computer. The invention discloses a method for efficient layout of line drawings, photographs and characters on a display. As for the layout of line drawings, the line drawings are laid out being designated in an analog manner on the display. As for the photographs, only contours are displayed and laid out on the display. As for the characters, data to be given to the rule block copy and to the photocomposing machine are produced based upon the characters laid out on the display. The invention further discloses a method of efficiently designating colors on the display. Ratios of reference color concentrations are designated in an analog manner on the display, and a color that is obtained when the designated reference colors are mixed together is displayed on the display.

10. 发明申请

WO1997044709A1 ATTENUATING EMBEDDED PHASE SHIFT PHOTOMASK BLANKS 审中-公开
标题翻译：嵌入式相位移动光电白皮书
公开(公告)号：WO1997044709A1
公开(公告)日：1997-11-27
申请号：PCT/US1997007954
申请日：1997-05-09
申请人： E.I. DU PONT DE NEMOURS AND COMPANY
发明人： E.I. DU PONT DE NEMOURS AND COMPANY , CARCIA, Peter, Francis , FRENCH, Roger, Harquail
IPC分类号： G03F01/00
CPC分类号： G03F1/32
摘要： Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180 DEG and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths
摘要翻译：衰减的嵌入式相移光掩模坯料能够产生180°的相移，并且在选定的光刻波长<400nm处具有至少0.001的光学透射率，包括至少一层铝化合物和至少一种更光学吸收的组分比选择的光刻波长<400nm的铝化合物，并且通过将至少一层铝化合物和至少一种比铝化合物更光学吸收的成分沉积到基底上而制成。

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