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1. 发明公开

EP0153616A3 Heat-sensitive recording materials 失效
标题翻译：感应记录材料
公开(公告)号：EP0153616A3
公开(公告)日：1988-06-01
申请号：EP85101151
申请日：1985-02-04
申请人： KANZAKI PAPER MANUFACTURING COMPANY LIMITED
发明人： Ishida, Katsuhiko , Nojima, Masaharu , Okamoto, Tosaku
IPC分类号： B41M05/26 , G03C01/60
CPC分类号： G03C1/52 , G03C1/615
摘要： This invention provides a heat-sensitive recording material comprising a substrate and a heat-sensitive recording layer which is formed over the substrate and which contains a diazonium salt, a coupler and at least one of heat-fusible basic amidine and diamidine compounds. The heat-sensitive recording material is especially excellent in storage stability.

2. 发明申请

WO1989005475A1 IMAGE-REVERSIBLE DRY-FILM PHOTORESISTS 审中-公开
标题翻译：图像可逆干膜电影
公开(公告)号：WO1989005475A1
公开(公告)日：1989-06-15
申请号：PCT/US1988002676
申请日：1988-08-08
申请人： MACDERMID, INCORPORATED
发明人： MACDERMID, INCORPORATED , GAL, Chava , BEN-SHUSHAN, Giora , ARONHIME, Marc, T. , JOHN, J., Grunwald
IPC分类号： G03C01/60
CPC分类号： G03F7/0226
摘要： A dry-film photoresist is described which comprises a film of a light-sensitive image-reversible photoresist composition supported on a removable backing sheet and, optionally, having a removable cover sheet extending substantially completely over the exposed surface of the film. The photoresist composition employed in the film comprises a mixture of at least one phenolic resin, a 1,2-quinonediazide sensitizer and, optionally, at least one organic solubilizing agent containing phenolic and/or carboxylic acid groups and present in the mixture in an amount to promote the solubility of the mixture in alkaline developer. The dry-film photoresist can be used to produce either positive or negative resists on a substrate. The dry-film photoresist is laminated to the substrate and then exposed imagewise to actinic radiation. To produce a positive image the exposed film is developed using an alkaline developer. To produce a negative image the exposed film is first baked to a temperature and for a time sufficient to render the exposed portions of the photoresist insoluble in alkaline developer and is then developed, optionally after flood exposure to actinic radiation, using an alkaline developer to remove the unwanted portions of the photoresist.
摘要翻译：描述了一种干膜光致抗蚀剂，其包含支撑在可移除背衬片上的感光图像可逆光致抗蚀剂组合物的膜，并且可选地具有基本上完全延伸到膜的暴露表面上的可移除覆盖片。用于薄膜中的光致抗蚀剂组合物包含至少一种酚醛树脂，1,2-醌二叠氮化物增感剂和任选的至少一种含有酚和/或羧酸基团的有机增溶剂并以混合物的量存在的混合物以促进混合物在碱性显影剂中的溶解度。干膜光致抗蚀剂可用于在基材上产生正或负的抗蚀剂。将干膜光致抗蚀剂层压到基底上，然后成像曝光于光化辐射。为了产生正像，使用碱性显影剂显影曝光的胶片。为了产生负像，首先将曝光的薄膜烘烤至足以使光致抗蚀剂的曝光部分不溶于碱性显影剂并随后显影的温度，任选地在曝光于光化辐射之后，使用碱性显影剂除去光刻胶的不想要的部分。

3. 发明申请

WO1981001756A1 DIAZONIUM IMAGING SYSTEM 审中-公开
标题翻译： DIAZONIUM成像系统
公开(公告)号：WO1981001756A1
公开(公告)日：1981-06-25
申请号：PCT/US1980001444
申请日：1980-10-27
申请人： MINNESOTA MINING & MFG CO
发明人： MINNESOTA MINING & MFG CO , GATZKE K
IPC分类号： G03C01/60
CPC分类号： G03C1/732 , G03C1/61
摘要： Novel light sensitive, heat developable imaging system incorporating a diazonium salt and a leuco dye in a binder.
摘要翻译：在粘合剂中掺入重氮盐和无色染料的新型光敏，可热显影成像系统。

4. 发明公开

EP0161655A3 Light-sensitive composition and two-component diazotype material prepared therefrom 有权
标题翻译：光敏组合物和双组分双极性材料制备
公开(公告)号：EP0161655A3
公开(公告)日：1987-05-27
申请号：EP85105849
申请日：1985-05-13
申请人： HOECHST AKTIENGESELLSCHAFT
发明人： Scheler, Siegfried, Dr. Dipl.-Chem.
IPC分类号： G03C01/52 , G03C01/60 , G03C01/58
CPC分类号： G03C1/58 , G03C1/52 , G03C1/60

5. 发明公开

EP0066452A3 Photosensitive composition for photosensitive printing plate 失效
标题翻译：感光性印版的感光性组合物
公开(公告)号：EP0066452A3
公开(公告)日：1983-03-16
申请号：EP82302708
申请日：1982-05-26
申请人： KONISHIROKU PHOTO INDUSTRY CO. LTD.
发明人： Kurita, Yoshio , Kita, Noriyasu , Suzuki, Norihito , Noguchi, Kazuo
IPC分类号： G03F07/08 , G03C01/60
CPC分类号： G03F7/0212
摘要： A photosensitive composition for photosensitive print- ' ing plates, containing a photosensitive diazo compound and an organic macromolecular carrier possessing improved storage stability and development properties by containing tartaric acid.
摘要翻译：含有感光性重氮化合物和有机高分子载体的光敏印刷用感光性组合物，其具有通过含有酒石酸而具有改善的储存稳定性和显影性。

6. 发明公开

EP0080241A3 Diazotype material 有权
标题翻译： DIAZOTYPE材料
公开(公告)号：EP0080241A3
公开(公告)日：1983-08-03
申请号：EP82201473
申请日：1982-11-19
申请人： Océ-Nederland B.V.
发明人： Van de Vorle, Wilhelmus, J.M.
IPC分类号： G03C01/60 , G03F01/00
CPC分类号： G03C1/60
摘要： A diazotype material is disclosed the light sensitive layer of which comprises a particular film forming binder (a partially hydrolyzed polyvinyl acetate) and a special kind of silica filler. Through this specific combination of binder and filler a diazotype material with a good wet-rub-resistance and with good writing and drafting properties is obtained. Upon use of a transparent support this material may be used as a so-called intermediate original.

7. 发明公开

EP0068808A3 Photoresist composition 失效
标题翻译：光电组合物
公开(公告)号：EP0068808A3
公开(公告)日：1983-04-27
申请号：EP82303276
申请日：1982-06-23
申请人： JAPAN SYNTHETIC RUBBER CO., LTD.
发明人： Kamoshida, Youichi , Yoshihara, Toshiaki , Harita, Yoshiyuki , Harada, Kunihiro
IPC分类号： G03F07/26 , C07C97/10 , C08L09/00 , C08F36/04 , C08F136/04 , C08F236/04 , C08K05/18 , G03C01/71 , G03C01/60 , H01L21/312 , H01L21/47 , H05K03/06
CPC分类号： G03F7/091 , C08K5/18 , G03C1/83 , Y10S430/127 , Y10S430/128 , Y10S522/901 , C08L15/00
摘要： By adding a compound of formula (I) or (II):
(in which R'-R" are the same or different and each represents a hydrogen atom or an alkyl group) to a conventional photoresist composition comprising a cyclized product of a conjugated diene polymer (which may be a homopolymer or a copolymer) and a photocrosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained. even when a base board having a highly reflecting surface is used, with a high degree of reproducibility and without being affected by prebaking conditions.

8. 发明公开

EP0054258A3 Photosensitive compositions 失效
标题翻译：光敏组合物
公开(公告)号：EP0054258A3
公开(公告)日：1983-04-27
申请号：EP81110287
申请日：1981-12-09
申请人： KONISHIROKU PHOTO INDUSTRY CO. LTD.
发明人： Takeshi, Yamamoto , Kiyoshi, Goto , Masafumi, Uehara
IPC分类号： G03C01/52 , G03C01/60 , G03F07/08
CPC分类号： G03F7/0236 , C08G8/20 , C08G8/24 , C08K5/28 , C08L61/12
摘要： There is disclosed a photosensitive composition comprising an o-quinonediazide compound and, as a binder resin, a resin containing in the molecule the unit represented by the following formula
wherein R 1 R 2 , R 3 and R 4 have the same meanings as defined in the specification. The photosensitive composition according to the present invention has excellent resistance to chemicals and long press-life, and is excellent in alkali-solubility and difficult to form scumming.
摘要翻译：公开了一种光敏组合物，其包含邻醌二叠氮化合物和作为粘合剂树脂的分子中含有下式所示单元的树脂，其中R1，R2，R3和R4具有与说明书中所定义的相同的含义。根据本发明的光敏组合物具有优异的耐化学品性和长的压制寿命，并且碱溶性优异并且难以形成起泡。

9. 发明公开

EP0122523A3 Diazotype compositions and materials 失效
标题翻译： DIAZOTYPE组合物和材料
公开(公告)号：EP0122523A3
公开(公告)日：1987-05-27
申请号：EP84103434
申请日：1984-03-28
申请人： Andrews Paper and Chemical Co., Inc.
发明人： Muller, Peter , Mustacchi, Henry
IPC分类号： G03C01/60
CPC分类号： G03C1/61
摘要： The use of soluble methylol compounds from primary or secondary amines or ammonia with formaldehyde in diazotypes improves solution compatibility and prevents coupler migration upon storage of diazotype materials. The methylol compounds may be reacted with couplers separately or added to the coating preparations.

10. 发明公开

EP0118086A3 Two-component diazo type material 有权
标题翻译：双组分DIAZO型材料
公开(公告)号：EP0118086A3
公开(公告)日：1987-05-27
申请号：EP84101944
申请日：1984-02-24
申请人： HOECHST AKTIENGESELLSCHAFT
发明人： Scheler, Siegfried, Dr.
IPC分类号： G03C01/60
CPC分类号： G03C1/61

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