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1. 发明申请

US20040263823A1 Lithographic projection assembly, load lock and method for transferring objects 有权
标题翻译：光刻投影组件，负载锁定和传送对象的方法
公开(公告)号：US20040263823A1
公开(公告)日：2004-12-30
申请号：US10797725
申请日：2004-03-11
申请人： ASML Netherlands B.V.
发明人： Albert Jan Hendrik Klomp , Jan Frederik Hoogkamp , Josephus Cornelius Johannes Antonius Vugts , Robert Gordon Livesey , Johannes Hendrikus Gertrudis Franssen
IPC分类号： G03B027/62
CPC分类号： G03F7/70975 , G03F7/7075 , G03F7/70858 , G03F7/70991
摘要： Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.
摘要翻译：光刻投影组件包括用于在第一环境和第二环境之间传送物体，特别是基底的至少一个装载锁，所述第二环境优选地具有比所述第一环境更低的压力; 一个对象处理器，包括处理器室，其中第二个环境占优势; 以及包括投影室的光刻投影装置。处理器室和投影室可以通信用于传送物体。负载锁包括一个负载锁定室; 排气装置，用于排空负载锁定室; 以及用于在排空期间关闭装载锁定室并且用于打开装载锁定室以将物体进入物体或从装载锁定室移除物体的门装置。负载锁定室可以设置有至少两个相互不同的物体支撑位置。

2. 发明申请

US20040165159A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20040165159A1
公开(公告)日：2004-08-26
申请号：US10705805
申请日：2003-11-12
申请人： ASML Netherlands B.V.
发明人： Joeri Lof , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman
IPC分类号： G03B027/52 , G03B027/62
CPC分类号： G03F9/7088 , G03F7/70341 , G03F7/707 , G03F7/7085
摘要： In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
摘要翻译：在浸没式光刻设备中，构件围绕投影系统和衬底台之间的空间。形成密封件以在该空间中容纳液体。

3. 发明申请

US20040160593A1 Continuous paper feed system 失效
标题翻译：连续进纸系统
公开(公告)号：US20040160593A1
公开(公告)日：2004-08-19
申请号：US10617645
申请日：2003-07-11
申请人： BAKER HUGHES, INCORPORATED , ROLON ENGINEERING
发明人： Arnoldo Rolon , Harold Andrade , John Salyer
IPC分类号： G03B027/62
CPC分类号： B65H23/26 , B26D1/205 , B26D5/00 , B26D5/08 , B26D5/34 , B41J11/006 , B41J11/0075 , B41J11/0095 , B41J11/46 , B41J11/706 , B41J13/103 , B65H16/00 , B65H23/18 , B65H23/182
摘要： A paper handler, in combination with a printer comprising, a paper inlet into that which paper enters the paper handler; where the paper has leading edge. The paper handler further comprises a paper exit where paper exits the paper handler and travels from the paper handler to the inlet of the printer. A drag system is also included that contributes to handle the paper handled by the paper handler thereby providing for seamless continuous paper flow through the printer. The paper handler further comprises an optic sensor capable of sensing marks on the paper. The optic sensor communicates with the printer indicating sensing of the marks by the optic sensor.
摘要翻译：一种纸张处理器，与打印机组合，包括：纸入口，纸进入纸张处理器; 纸张领先。纸张处理器还包括纸张出口，纸张离开纸张处理器并从纸张处理器传送到打印机的入口。还包括拖曳系统，其有助于处理由纸张处理器处理的纸张，从而提供通过打印机的无缝连续纸张流动。纸张处理器还包括能够感测纸张上的标记的光学传感器。光学传感器与打印机通信，指示由光学传感器检测标记。

4. 发明申请

US20040125354A1 Pellicle distortion reduction 失效
公开(公告)号：US20040125354A1
公开(公告)日：2004-07-01
申请号：US10737046
申请日：2003-12-16
发明人： Michael S. Hibbs
IPC分类号： G03B027/62
CPC分类号： G03F1/64 , G03B27/62
摘要： The invention provides systems and a method for reducing pellicle distortion. One feature of the invention reduces distortion of a pellicle by providing an airtight mounting structure for coupling a pellicle to a mask; and a port on the mounting structure though which a pressure difference can be created between the interior portion and an exterior environment. Hence, distortion can be reduced by controlling the pressure in the interior portion between the pellicle, the pellicle mounting structure and the mask. Another feature places an aerodynamic fairing adjacent the mask to reduce aerodynamic drag and, hence, suppress turbulent air flow over the pellicle. The features can be used separately or in combination.

5. 发明申请

US20040119965A1 Apparatus for reducing pellicle darkening 失效
标题翻译：减少皮肤变暗的装置
公开(公告)号：US20040119965A1
公开(公告)日：2004-06-24
申请号：US10327251
申请日：2002-12-20
发明人： James M. Powers
IPC分类号： G03B027/62
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70933 , G03F7/70983
摘要： Pellicles separated by a distance sufficient to allow a purge gas help repair damage to at least one of the pellicles caused by exposure to an incident radiation and allowing at least a minimum amount of radiation to reach a semiconductor wafer sufficient to perform a desired photolythography process. Moreover, the two pellicles separated by a sufficient distance such that a dispersed purge gas dispersed between the pellicles will not absorb more than an amount of energy from the incident radiation so as to prevent a desired amount of the radiation to reach a semiconductor wafer located a certain distance away from the pellicles.
摘要翻译：分离足以允许吹扫气体的距离的隔膜有助于修复由暴露于入射辐射引起的至少一个防护薄膜的损伤，并允许至少最少量的辐射到达足以执行所需光刻图工艺的半导体晶片。此外，两个薄膜分离足够的距离，使得分散在薄膜之间的分散的净化气体将不会吸收大于来自入射辐射的能量的量，以便防止所需量的辐射到达位于距离防护薄膜一定距离。

6. 发明申请

US20040109153A1 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same 有权
标题翻译：膜和掩模版防护薄膜组件，其使用相同的带有防护薄膜 - 标线间隙
公开(公告)号：US20040109153A1
公开(公告)日：2004-06-10
申请号：US10677706
申请日：2003-10-02
发明人： Christopher J. Vroman , Nathan Abbott
IPC分类号： G03B027/62
CPC分类号： G03F1/64 , G03F7/70933 , G03F7/70983
摘要： The present invention provides a gas porous media, the bulk matrix of which comprises a material having a low coefficient of thermal expansion that is also capable of retaining 99.99% or more of particles of a size of about 0.003 microns and larger at 0.2 slpm/cm2 while demonstrating a permeability of 3.5null10null12 m2 and a porosity of around 62%. The porous media, preferably a membrane, is also fabricated into in such a way that the resultant assembly, in this case a frame, is capable of retaining 99.9999999% of particles greater than 0.003 um in diameter at 8.3 sccm/cm2 with a permeability of 3.0null10null13 m2 and a porosity of around 53%. Both porous medias can be tailored by changing the raw materials and process to yield a range of porosities and exhibit permeability between 1.0Enull13 and 1.0Enull11 m2. The present invention further provides the application of this porous media in frames for supporting a pellicle and a reticle, such frames positioned in parallel relationship to each other. The frames may comprise porous media in its entirety or porous media fabricated and sealed into a solid support frame. It is possible to fabricate membrane in a variety of different porosities and desired properties.
摘要翻译：本发明提供了一种气体多孔介质，其主体基体包括具有低热膨胀系数的材料，该材料也能够以0.2slpm / cm的量保持99.99％或更大的尺寸为约0.003微米和更大的颗粒 <2>，同时表现出3.5×10 12 m 2的渗透率和约62％的孔隙率。多孔介质，优选膜也被制造成使得所得到的组件（在这种情况下为框架）能够以8.3sccm / cm 2将99.9999999％的直径大于0.003μm的颗粒保持在8.3sccm / cm 2，渗透率为3.0×10-13 m 2，孔隙率为53％左右。两种多孔介质可以通过改变原材料和工艺来定制，以产生一定范围的孔隙率，并且在1.0E≤-13>和1.0E-11m 2之间显示渗透性。本发明还提供了这种多孔介质在框架中的应用，用于支撑防护薄膜组件和掩模版，这些框架彼此平行地定位。框架可以包括其整体的多孔介质或制造并密封成固体支撑框架的多孔介质。可以制造各种不同孔隙度和所需性质的膜。

7. 发明申请

US20040091788A1 Using perfluoropoly-ethers to form pellicles 有权
标题翻译：使用全氟聚醚形成薄膜
公开(公告)号：US20040091788A1
公开(公告)日：2004-05-13
申请号：US10289611
申请日：2002-11-07
发明人： James M. Powers , Robert P. Meagley
IPC分类号： G03F009/00 , G03B027/62 , G03B027/00
CPC分类号： G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Exposure systems may use pellicles made of perfluoropoly-ether. These materials may exhibit reduced darkening upon repeated exposures compared to other materials.
摘要翻译：曝光系统可以使用由全氟聚醚制成的薄膜。与其他材料相比，这些材料在反复曝光时可能表现出减少的变暗。

8. 发明申请

US20040036846A1 Mask producing method 失效
标题翻译：面膜生产方法
公开(公告)号：US20040036846A1
公开(公告)日：2004-02-26
申请号：US10648518
申请日：2003-08-27
申请人： Nikon Corporation
发明人： Kenji Nishi
IPC分类号： G03B027/00 , G03B027/32 , G03B027/52 , G03B027/62 , G03B027/54 , G03F001/00 , G21K005/00 , G03F007/20 , G21G005/00 , G03B027/42
CPC分类号： G03F7/70733 , G03F7/70358 , G03F7/70475
摘要： A pattern region of a working reticle is divided into existing pattern portions and newly-forming pattern portions. With respect to the existing pattern portions, already-formed master reticle patterns are reduction-projected while stitching screens using an optical-type projection exposure apparatus. With respect to the newly-forming portions, enlarged patterns are formed by an electron beam drawing apparatus to form new master reticles, and reduced images of the newly formed master reticles are exposed while stitching screens using an optical-type projection exposure apparatus.
摘要翻译：作业掩模版的图案区域被划分为现有图案部分和新形成图案部分。对于现有的图案部分，已经形成的主掩模图案使用光学型投影曝光装置在缝合屏幕的同时进行缩小投影。对于新形成部分，通过电子束描绘装置形成放大的图案，以形成新的主标线，并且使用光学型投影曝光装置在缝合屏幕的同时露出新形成的主标线的缩小图像。

9. 发明申请

US20030067592A1 Reticle stage with reaction force cancellation 失效
公开(公告)号：US20030067592A1
公开(公告)日：2003-04-10
申请号：US09971923
申请日：2001-10-09
发明人： Alex K. Tim Poon , W. Thomas Novak
IPC分类号： G03B027/62
CPC分类号： G03F7/70766 , G03B27/62
摘要： A three-degree-of-freedom guideless reticle stage is used with a reaction force-countermass assembly. An anti-gravity device such as a flexure is provided between the reticle stage and the reaction force-countermass assembly. The anti-gravity device offsets the weight of the stage to the reaction force-countermass assembly. Improved reticle-positioning is provided, with minimized distortion to the stage base, reduced forces on the frame, high servo bandwidth, three-degree-of-freedom positioning, high throughput, minimized geometry and low moving mass.

10. 发明申请

US20020085192A1 Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems 有权
标题翻译：气体驱动级包括用于带电粒子束微光刻系统的反作用力消除机构
公开(公告)号：US20020085192A1
公开(公告)日：2002-07-04
申请号：US10003357
申请日：2001-11-14
申请人： Nikon Corporation
发明人： Takaharu Miura , Keiichi Tanaka
IPC分类号： G03B027/60 , G05B011/00 , G03B027/62
CPC分类号： F16C29/025 , B82Y10/00 , B82Y40/00 , F16C32/0603 , F16C33/748 , F16C2300/62 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70758 , G03F7/70766 , G03F7/709 , H01J37/3174 , H01J2237/202 , H01L21/68
摘要： Stage devices are disclosed that include gas-actuation and reaction-force-canceling mechanisms. In an embodiment, an X-axis moving guide extending in the X direction engages a lower stage via a gas bearing. Y-axis sliders (movable elements) are provided at both ends of the X-axis moving guide. A Y-axis fixed guide 8 engages each Y-axis slider via a gas bearing. Each Y-axis slider and respective fixed guide constitute a respective pneumatic actuator. Respective mounting members are provided near the ends of each fixed guide, with interposed gas bearings, and each fixed guide is slidably affixed to a base plate. An actuator for stroke correction is provided in association with each mounting member.
摘要翻译：公开了包括气体致动和反作用力消除机构的平台装置。在一个实施例中，沿X方向延伸的X轴移动引导件通过气体轴承接合下部级。 Y轴滑动件（可移动元件）设置在X轴移动引导件的两端。 Y轴固定引导件8通过气体轴承与每个Y轴滑块接合。每个Y轴滑块和相应的固定导轨构成相应的气动致动器。各安装构件设置在每个固定引导件的端部附近，具有插入的气体轴承，并且每个固定引导件可滑动地固定到基板。与每个安装构件相关联地提供用于行程校正的致动器。

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