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1. 发明申请

US20040051984A1 Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments 审中-公开
标题翻译：用于冷却光学系统中光学元件的设备和方法，包括在真空环境中使用的光学系统
公开(公告)号：US20040051984A1
公开(公告)日：2004-03-18
申请号：US10607392
申请日：2003-06-25
申请人： Nikon Corporation
发明人： Tetsuya Oshino , Kazuya Ota , Hiroyuki Kondo , Keiichi Tanaka
IPC分类号： G02B005/08 , G02B007/195
CPC分类号： G03F7/70891 , G02B7/008
摘要： Devices are disclosed that cool optical elements with which the devices are associated, most advantageously reflective optical elements such as mirrors and reflective reticles. The devices have especial utility for reducing deformation and other undesired thermal changes of the respective optical elements, such as optical elements used in extremely demanding optical systems such as used in microlithography systems, most notably EUVL systems. Many of the subject devices typically include a heat-receiving plate or analogous feature that receives heat radiated from the optical element across a gap between the optical element and the heat-receiving plate. Some devices include a plate-cooling device for removing heat from the heat-receiving plate. Other devices employ conduction of heat away from the optical element. Yet other devices employ a flowing heat-transfer medium for removing heat from the optical element. Certain devices also are configured to provide mechanical support for the respective optical elements, notably in a manner that limits deformation of the optical elements.
摘要翻译：公开了与设备相关联的冷光学元件的装置，最有利的是反射光学元件，例如反射镜和反射型掩模版。这些装置具有特别的用途，用于减少相应光学元件的变形和其它不期望的热变化，例如用于非常苛刻的光学系统中的光学元件，例如用在微光刻系统中，尤其是EUVL系统。许多目标装置通常包括热接收板或类似特征，其接收穿过光学元件和热接收板之间的间隙从光学元件辐射的热量。一些装置包括用于从热接收板移除热量的板冷却装置。其他器件使用远离光学元件的热传导。还有其它装置采用流动的热传递介质来从光学元件去除热量。某些设备还被配置为为各个光学元件提供机械支撑，特别是以限制光学元件的变形的方式。

2. 发明申请

US20020096640A1 Magnetic shielding for charged-particle-beam optical systems 审中-公开
标题翻译：带电粒子束光学系统的磁屏蔽
公开(公告)号：US20020096640A1
公开(公告)日：2002-07-25
申请号：US10021603
申请日：2001-12-11
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： G01K001/08 , G21K005/10 , H01J003/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G21K1/093 , H01J37/09 , H01J2237/0264 , H01J2237/3175
摘要： Charged-particle-beam microlithographic exposure apparatus are disclosed that effectively block adverse effects of magnetic fields on the trajectory of the charged particle beam. An exemplary apparatus includes an illumination-optical system and a projection-optical system each contained in a respective vacuum chamber. The apparatus includes at least one magnetic shield structure comprising a superconducting material. A multilayer magnetic shield (including a ferromagnetic body and an electrically conductive body) can be situated outside the magnetic shield structure, with a defined gap therebetween. Such a shield structure can be located, e.g., adjacent a beam-trajectory region in an illumination-optical system between a beam deflector and the reticle, in association with a vacuum chamber of the apparatus, and/or in association with an electromagnetic actuator (e.g., linear motor used to actuate a stage device).
摘要翻译：公开了带电粒子束微光刻曝光装置，其有效地阻止磁场对带电粒子束的轨迹的不利影响。示例性装置包括各自包含在相应的真空室中的照明光学系统和投影光学系统。该装置包括至少一个包含超导材料的磁屏蔽结构。多层磁屏蔽（包括铁磁体和导电体）可以位于磁屏蔽结构外部，其间具有限定的间隙。这样的屏蔽结构可以被定位成例如在与设备的真空室相关联的光束偏转器和光罩之间的照明光学系统中的光束轨迹区域和/或与电磁致动器相关联例如，用于致动平台装置的线性电动机）。

3. 发明申请

US20040051854A1 System and method for resetting a reaction mass assembly of a stage assembly 失效
标题翻译：用于复位舞台组件的反作用质量组件的系统和方法
公开(公告)号：US20040051854A1
公开(公告)日：2004-03-18
申请号：US10458384
申请日：2003-06-11
申请人： Nikon Corporation
发明人： Keiichi Tanaka , Mike Binnard , Andrew J. Hazelton
IPC分类号： G03B027/42
CPC分类号： G03B27/62 , G03F7/707 , G03F7/70708 , G03F7/70766 , G03F7/709
摘要： A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.
摘要翻译：本文提供了用于移动和定位设备的台架组件。舞台组件包括舞台基座，舞台，舞台推动器组件，反作用组件，反作用器组件和控制系统。平台移动器组件相对于舞台底座移动舞台。反应物料组件减少由载物台组件产生的反应力，这些反作用力被传递到载物台底部。反应动子组件调整反应物料组件相对于载物台的位置。独特地，控制系统以最小化由反应动子组件产生在舞台组件上的扰动的影响的方式来控制和引导电流到反应动子组件。更具体地，改变来自引导到反应动子组件的控制系统的时间和/或电流量，以最小化由反应动子组件产生在舞台组件上的扰动的影响。通过这种设计，反作用器组件对舞台底座的位置的影响较小。这允许通过平台组件更好地定位设备并且更好地实现舞台组件的性能。

4. 发明申请

US20030178579A1 Stage devices exhibiting reduced deformation, and microlithography systems comprising same 审中-公开
标题翻译：表现出减小的变形的阶段装置，以及包括它们的微光刻系统
公开(公告)号：US20030178579A1
公开(公告)日：2003-09-25
申请号：US10355446
申请日：2003-01-31
申请人： Nikon Corporation
发明人： Keiichi Tanaka , Yasushi Yoda , Yukiharu Okubo , Hiroaki Narushima
IPC分类号： G01J001/00
CPC分类号： G03F7/70708 , F16C23/04 , F16C32/067 , G03F7/707 , G03F7/70716 , G03F7/70816 , H01J2237/202 , H01J2237/3175
摘要： Stage apparatus are disclosed that exhibit reduced deformation that otherwise arises during assembly, as well as reduced deformation that otherwise accompanies vacuum evacuation of a vacuum chamber in which the stage apparatus is mounted. The stage apparatus include spherical static-pressure bearings situated between a stage base and the wall of the vacuum chamber to which the stage apparatus is mounted. Torque or other deformation-inducing stress otherwise exerted on the stage base and/or vacuum chamber is ameliorated by respective rotations of the spherical static-pressure bearings. By ameliorating such stress, stage deformation otherwise arising during assembly and chamber deformation otherwise arising during vacuum evacuation are reduced.
摘要翻译：展示了在装配过程中出现减小的变形的阶段装置，以及否则伴随真空室的真空抽真空的减小的变形，其中安装了平台装置。舞台装置包括位于舞台底座和安装舞台装置的真空室壁之间的球形静压轴承。通过球形静压轴承的相应旋转，可以改善施加在台架底座和/或真空室上的扭矩或其它变形诱发应力。通过改善这种应力，减少了在真空排气过程中否则出现的装配和室变形过程中出现的阶段变形。

5. 发明申请

US20020075469A1 Stage device and exposure apparatus and method 失效
公开(公告)号：US20020075469A1
公开(公告)日：2002-06-20
申请号：US09736156
申请日：2000-12-15
申请人： NIKON CORPORATION
发明人： Keiichi Tanaka
IPC分类号： G03B027/58
CPC分类号： G03F7/70716 , G03F7/70758 , G03F7/70866 , G03F7/709
摘要： A stage device includes a reaction-force-discharging structure in which a stationary member of a driving mechanism configured with a linear motor and the like disposed in a wafer chamber is connected to an external frame while maintaining the wafer chamber in a hermetic state. When a wafer stage is driven by the linear motor, a reaction force generated by driving the stage is applied to the stationary member. The reaction force is discharged to, e.g., a floor by the reaction-force-discharging structure via an external frame. For example, when the wafer chamber is set to a predetermined atmosphere of gas (including air from which organic substances and the like have been removed), the reaction force caused by driving the wafer stage can be discharged to the outside while maintaining the predetermined atmosphere. In an exposure apparatus using the stage device, accurate exposure is possible by reducing effects of vibration to the greatest extent possible.

6. 发明申请

US20020070699A1 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same 失效
标题翻译：包括不含气体轴承的台架装置和包括它的微光刻装置
公开(公告)号：US20020070699A1
公开(公告)日：2002-06-13
申请号：US09899946
申请日：2001-07-06
申请人： Nikon Corporation
发明人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
IPC分类号： G05B011/00
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0618 , G03F7/70716 , G03F7/70725 , G03F7/70758 , H01J37/20 , H01J2237/20278
摘要： Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow null-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings. The sliders can be driven by a combination of a linear motor and a gas cylinder, the latter assisting the driving force by the linear motor during acceleration and deceleration of the stage.
摘要翻译：公开了用于在微光刻系统中保持物体（例如，基板或掩模版）的平台装置，特别是用于在真空环境中执行微光刻的系统。舞台装置提供在导向平面的X和Y方向上的舞台（用于保持物体）的运动。平台安装到臂构件，臂构件具有至少第一和第二端相对于平台对称设置。端部包括与相应的定子相互作用的线性马达驱动器，并且当载物台在引导平面内移动时，包括在相对于其它表面滑动的表面上的气体轴承。线性马达移动器可以是一维或二维移动器，并且期望地允许载物台的θ方向运动。其他构造包括引导构件和滑块，其经由非接触气体轴承相对于引导构件经历滑动运动。滑块可以通过线性马达和气瓶的组合来驱动，后者在加速和减速阶段通过线性马达来辅助驱动力。

7. 发明申请

US20030226976A1 Stage-actuators that do not generate fluctuating magnetic fields, and stage devices comprising same 失效
标题翻译：不产生波动磁场的级致动器，以及包括其的载物台
公开(公告)号：US20030226976A1
公开(公告)日：2003-12-11
申请号：US10360886
申请日：2003-02-07
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： G21K005/10
CPC分类号： H02N2/021 , G03F7/707 , G03F7/70708 , G03F7/70716 , H01J37/20 , H01J2237/20264 , H01L41/0913 , H02N2/028
摘要： Stage devices are disclosed having especial utility in certain types of microlithography systems. The stage devices impart controlled motion to a stage or platform without generating fluctuating electromagnetic fields. The stage devices include stage-actuators that do not rely on electromagnetics for operation. Multiple stage-actuators achieve motion of a slider relative to a guide bar. Each stage-actuator includes at least two actuator-portions that collectively provide an nullinchwormnull walking manner of motion of the slider relative to the guide bar. Each actuator-portion includes a respective pressure-application member. The pressure-application members are selectively actuated so as to engage a respective guide bar in a coordinated manner that serves to nullpushnull the slider along the guide bar. Each actuator-portion includes a respective first piezoelectric element that urges the respective pressure-application member against the guide bar and retracts the pressure-application member from the guide bar, and a respective second piezoelectric element that moves the respective pressure-application member in the longitudinal direction of the guide bar.
摘要翻译：公开了在某些类型的微光刻系统中具有特别实用性的舞台装置。舞台装置将控制的运动传递到舞台或平台，而不产生波动的电磁场。舞台装置包括不依靠电磁学操作的舞台致动器。多级致动器实现滑块相对于导杆的运动。每个级致动器包括至少两个致动器部分，其共同地提供滑块相对于引导杆的“蚯蚓”步行移动方式。每个致动器部分包括相应的压力施加构件。压力施加构件被选择性地致动以便以协调的方式接合相应的导杆，用于沿着导杆“推动”滑块。每个致动器部分包括相应的第一压电元件，所述第一压电元件将相应的压力施加部件推压在引导杆上并使压力施加部件从引导杆缩回，并且相应的第二压电元件使相应的压力施加部件移动到导杆的纵向。

8. 发明申请

US20030123041A1 Stage device and exposure apparatus 失效
公开(公告)号：US20030123041A1
公开(公告)日：2003-07-03
申请号：US10314128
申请日：2002-12-09
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： G03B027/58
CPC分类号： G03F7/70733 , G03F7/70716 , G03F7/70758
摘要： A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a second direction perpendicular to the first direction. The moving member can cooperate with the first stationary member and with the second stationary member. The positioning devices selectively position the moving member into cooperation with one of the first and second stationary members without physically contacting the moving member with the first and second stationary members. In addition, a stage device provided with a moving member that can move within a two-dimensional plane having a first direction and a second direction perpendicular to the first direction includes a first stationary member and a second stationary member. The first stationary member extends in the first direction and is supported at a first position in a third direction that is perpendicular to the two-dimensional plane. The second stationary member extends in the first direction and is supported at a second position in the third direction, different from the first position. The moving member has a first part that can cooperate with the first stationary member, and a second part that can cooperate with the second stationary member. When two stages are replaced, generation of a positional shift on an object on the stages is prevented, and separate processing can be performed simultaneously with respect to objects on the stages.

9. 发明申请

US20030111614A1 Stage devices including linear motors that produce reduced beam-perturbing stray magnetic fields, and charged-particle-beam microlithography systems comprising same 失效
标题翻译：包括产生减小的束扰动杂散磁场的线性电动机的舞台装置，以及包括它的带电粒子束微光刻系统
公开(公告)号：US20030111614A1
公开(公告)日：2003-06-19
申请号：US10318999
申请日：2002-12-12
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： H01J037/20
CPC分类号： H01J37/20 , H01J2237/202 , H01J2237/3175
摘要： Stage devices are disclosed that achieve high positioning and movement accuracy while producing substantially reduced outwardly extending stray magnetic fields. The stage devices are especially suitable for use in a charged-particle-beam (CPB) microlithography system because they cause substantially reduced beam perturbations. A stage device comprises multiple linear motors and a slider arranged relative to each other such that the intersection point of drive forces applied by the linear motors to move the slider coincides with the center of gravity of the slider. Each linear motor includes a respective yoke in which permanent magnets are disposed such that pairs of opposing magnets face one another across a gap, each pair of opposing magnets has similarly oriented respective poles, and the orientation is alternatingly reversed in each subsequent pair of opposing magnets in the yoke. Also, the poles of respective opposing pairs of magnets in adjacent yokes are similarly oriented, with the orientation being alternatingly reversed in each subsequent pair in the yokes. Consequently, circuits of magnetic flux are kept tightly confined to the yokes, which substantially reduces interaction of the magnetic flux with the charged particle beam.
摘要翻译：公开了实现高定位和移动精度同时产生大大减小的向外延伸的杂散磁场的平台装置。舞台装置特别适合用于带电粒子束（CPB）微光刻系统，因为它们引起实质上减小的束扰动。舞台装置包括多个线性电动机和相对于彼此布置的滑块，使得由线性电动机施加的移动滑块的驱动力的交点与滑块的重心重合。每个线性电动机包括相应的磁轭，其中永磁体被布置成使得成对的相对磁体跨越间隙彼此面对，每对相对的磁体具有相似的取向的各个极，并且在随后的每对相对的磁体中交替地反向取向在轭。而且，相邻磁轭中相应的相对磁体对的磁极类似地定向，其中在磁轭中的每个后续对中的取向交替地反向。因此，磁通量的电路被紧密地限制在磁轭上，这大大降低了磁通与带电粒子束的相互作用。

10. 发明申请

US20020180312A1 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same 失效
标题翻译：具有六个微小自由度的低质量和紧凑的平台装置，以及包括它们的微光刻系统
公开(公告)号：US20020180312A1
公开(公告)日：2002-12-05
申请号：US10159411
申请日：2002-05-29
申请人： Nikon Corporation
发明人： Keiichi Tanaka
IPC分类号： H01L041/08
CPC分类号： H01J37/20 , B82Y10/00 , B82Y40/00 , G03F7/70716 , G03F7/70758 , H01J37/3174 , H01J2237/2005 , H01J2237/202
摘要： Low-mass and compact stage devices are disclosed that exhibit, compared to conventional stage devices, reduced magnetic field fluctuations. An embodiment of such a stage device includes an X-Y coarse-movement stage portion that is drivable in the X-Y directions using respective air cylinders. A fine-movement stage portion is mounted on the X-Y coarse-movement stage portion. The fine-movement stage portion is drivable in any of the six degrees of freedom of motion (i.e., X, Y, Z, nullX, nullY, and nullZ motions) relative to the coarse-movement stage portion. Such fine movements are achieved using six piezo actuators. In a stage device configured for use in a microlithography apparatus, a wafer table or reticle table can be mounted on the fine-movement table.
摘要翻译：公开了与传统的平台装置相比，减小的磁场波动的低质量和紧凑的平台装置。这种舞台装置的一个实施例包括可使用相应气缸在X-Y方向上驱动的X-Y粗动台部分。精细运动台部安装在X-Y粗动台部上。细运动台部分可以相对于粗移动台部分的六个运动自由度（即，X，Y，Z，θX，θY和θZ运动）中的任何一个是可驱动的。使用六个压电致动器实现这种精细的运动。在配置用于微光刻设备的台装置中，可以将晶片台或分划板台安装在微动台上。

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