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    • 2. 发明授权
    • Cleaning composition
    • 清洁组合物
    • US06720297B2
    • 2004-04-13
    • US10351880
    • 2003-01-27
    • Earl Jenevein
    • Earl Jenevein
    • C11D162
    • C11D3/48C11D1/62C11D3/046C11D3/201C11D3/33C11D3/3753C11D17/049
    • A cleaning composition for treating and removing stains from a non-porous surface has one or more salts, such as quaternary ammonium salts, sulfates and chlorides, a chelator and a dispersant, dissolved in an aqueous solution of alcohol. The preferred salts are myristyltrimethylammonium bromide and benzethonium chloride, the chelator is tetrasodium salt ethylenediamine of tetraacetic acid, and the dispersant is polyvinyl alcohol. The cleaning composition is incorporated into a product, which has a non-woven polyester carrier impregnated with the cleaning composition.
    • 用于从无孔表面处理和除去污渍的清洁组合物具有溶解在醇的水溶液中的一种或多种盐,例如季铵盐,硫酸盐和氯化物,螯合剂和分散剂。 优选的盐是肉豆蔻基三甲基溴化铵和苄索氯铵,螯合剂是四乙酸的四钠盐乙二胺,分散剂是聚乙烯醇。 将清洁组合物掺入到具有浸渍有清洁组合物的无纺聚酯载体的产品中。
    • 3. 发明授权
    • Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor device
    • 半导体装置用清洗剂及半导体装置的制造方法
    • US06462005B1
    • 2002-10-08
    • US08369215
    • 1995-01-05
    • Hideto GotohTetsuo AoyamaRieko NakanoHideki Fukuda
    • Hideto GotohTetsuo AoyamaRieko NakanoHideki Fukuda
    • C11D162
    • H01L21/02071G03F7/425H01L21/02052
    • A cleaning agent for use in the manufacture of a semiconductor device comprising an aqueous solution containing a quarternary ammonium salt and a fluoro compound, or an aqueous solution containing a quarternary ammonium salt and a fluoro compound, as well as an organic solvent selected from the group consisting of amides, lactones, nitriles, alcohols and esters. In the semiconductor device manufacturing process, after forming a mask with a photoresist, a wiring structure is formed by dry etching of a conductive layer, wherein a protecting deposition film has been formed on side walls of the conductive layer. Use of the cleaning agent enables the protecting deposition film to be removed in a highly reliable manner with the surface of the conductive layer being decontaminated and cleaned such that no corrosion of the conductive layer occurs.
    • 一种用于制造半导体器件的清洁剂,其包含含有季铵盐和氟化合物的水溶液,或含有季铵盐和氟化合物的水溶液,以及选自下组的有机溶剂 由酰胺,内酯,腈,醇和酯组成。 在半导体器件制造方法中,在用光致抗蚀剂形成掩模之后,通过干蚀刻导电层形成布线结构,其中在导电层的侧壁上形成保护沉积膜。 使用清洁剂能够以高度可靠的方式去除保护性沉积膜,同时导电层的表面被净化和清洁,使得不会发生导电层的腐蚀。
    • 7. 发明授权
    • Hair conditioning composition
    • 头发调理组成
    • US06730641B2
    • 2004-05-04
    • US10106465
    • 2002-03-26
    • Gilles M. VerboomKari L. Bauer
    • Gilles M. VerboomKari L. Bauer
    • C11D162
    • A61Q5/12A61K8/342A61K8/416
    • The present invention provides a hair conditioning composition that comprises stearalkonium chloride and cetrimonium chloride. The hair conditioner composition of the invention preferably imparts a silky wet feel to hair and inhibits fly-away at 34% relative humidity when applied as a rinse off conditioner. In some embodiments, the hair conditioner of the invention is essentially free of an amidoamine; is characterized by a weight ratio of cetrimonium chloride to stearalkonium chloride of from about 0.65 to about 2; and/or the total combined amount of stearalkonium chloride and cetrimonium chloride is at most about 1% by weight of the composition. The present invention also provides a method of conditioning hair.
    • 本发明提供一种头发调理组合物,其包含十八烷基氯化铵和氯化三西铵。 本发明的护发素组合物优选地赋予头发柔滑的湿感,并且当以冲洗掉的调理剂施用时,抑制在相对湿度为34%时飞散。 在一些实施方案中,本发明的护发素基本上不含酰胺胺; 其特征在于氯化三铵与十八烷基氯化铵的重量比为约0.65至约2; 和/或十八烷基氯化铵和氯化十六烷基铵的总合量为组合物重量的至多约1%。 本发明还提供一种调理头发的方法。