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1. 发明授权

US09119572B2 Monitoring trajectory of surgical instrument during the placement of a pedicle screw 有权
标题翻译：在椎弓根螺钉放置期间手术器械的监测轨迹
公开(公告)号：US09119572B2
公开(公告)日：2015-09-01
申请号：US12739950
申请日：2008-10-24
申请人： Josef Gorek , Eric Finley , Albert C. Kim , Jeff Barnes , Rick Eis
发明人： Josef Gorek , Eric Finley , Albert C. Kim , Jeff Barnes , Rick Eis
IPC分类号： A61B6/00 , A61B6/12 , A61B17/17 , A61B19/00 , A61B5/04 , A61N1/05
CPC分类号： A61B34/10 , A61B5/04001 , A61B6/12 , A61B6/4441 , A61B6/461 , A61B6/547 , A61B17/1703 , A61B34/20 , A61B90/37 , A61B2034/2046 , A61B2090/067 , A61F2/4657 , A61F2002/4668 , A61N1/0551
摘要： The present invention relates to a system and methods generally aimed at monitoring the trajectory of surgical instruments and especially for monitoring the trajectory of surgical instrument used during pedicle fixation to ensure the proper placement of pedicle screws.
摘要翻译：本发明涉及通常旨在监测外科器械的轨迹的系统和方法，特别是用于监测椎弓根固定期间使用的手术器械的轨迹，以确保椎弓根螺钉的适当放置。

2. 发明授权

US07923423B2 Compositions for processing of semiconductor substrates 有权
标题翻译：用于处理半导体衬底的组合物
公开(公告)号：US07923423B2
公开(公告)日：2011-04-12
申请号：US11046262
申请日：2005-01-27
申请人： Elizabeth Walker , Shahri Naghshineh , Jeff Barnes , Ewa Oldak
发明人： Elizabeth Walker , Shahri Naghshineh , Jeff Barnes , Ewa Oldak
IPC分类号： C11D7/50
CPC分类号： C11D7/3218 , C11D7/261 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D7/3281 , C11D11/0047
摘要： Compositions useful in semiconductor manufacturing for surface preparation and/or cleaning of wafer substrates such as semiconductor device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of semiconductor wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.
摘要翻译：可用于半导体制造用于诸如半导体器件前体结构的晶片衬底的表面制备和/或清洁的组合物。组合物可用于处理具有或将要进一步加工以包括铜金属化的晶片，例如在诸如表面处理，预镀清洗，后蚀刻清洁和后化学机械抛光清洁半导体晶圆。组合物包含（i）链烷醇胺，（ii）季铵氢氧化物和（iii）络合剂，并且是储存稳定的，以及在暴露于氧气时不变暗和降解。

3. 发明申请

US20060166847A1 Compositions for processing of semiconductor substrates 有权
标题翻译：用于处理半导体衬底的组合物
公开(公告)号：US20060166847A1
公开(公告)日：2006-07-27
申请号：US11046262
申请日：2005-01-27
申请人： Elizabeth Walker , Shahri Naghshineh , Jeff Barnes , Ewa Oldak
发明人： Elizabeth Walker , Shahri Naghshineh , Jeff Barnes , Ewa Oldak
IPC分类号： C11D7/32
CPC分类号： C11D7/3218 , C11D7/261 , C11D7/265 , C11D7/3209 , C11D7/3245 , C11D7/3281 , C11D11/0047
摘要： Compositions useful in semiconductor manufacturing for surface preparation and/or cleaning of wafer substrates such as semiconductor device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of semiconductor wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.
摘要翻译：可用于半导体制造用于诸如半导体器件前体结构的晶片衬底的表面制备和/或清洁的组合物。组合物可用于处理具有或将要进一步加工以包括铜金属化的晶片，例如在诸如表面处理，预镀清洗，后蚀刻清洁和后化学机械抛光清洁半导体晶圆。组合物包含（i）链烷醇胺，（ii）季铵氢氧化物和（iii）络合剂，并且是储存稳定的，以及在暴露于氧气时不变暗和降解。

4. 发明授权

US06723691B2 Post chemical-mechanical planarization (CMP) cleaning composition 有权
标题翻译：后化学机械平面化（CMP）清洗组合物
公开(公告)号：US06723691B2
公开(公告)日：2004-04-20
申请号：US09781859
申请日：2001-02-12
申请人： Shahriar Naghshineh , Jeff Barnes , Ewa B. Oldak
发明人： Shahriar Naghshineh , Jeff Barnes , Ewa B. Oldak
IPC分类号： C11D162
CPC分类号： H01L21/02074 , C11D1/62 , C11D3/0073 , C11D3/28 , C11D3/30 , C11D7/261 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3254 , C11D11/0047 , C23G1/20 , G03F7/425 , H01L21/02063
摘要： A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, optionally an organic acid, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, gallic acid ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.
摘要翻译：用于清洁微电子基板的清洁溶液，特别是用于后CMP或通孔形成清洁。清洗溶液包括季铵氢氧化物，有机胺，腐蚀抑制剂，任选的有机酸和水。优选的清洁溶液包括四甲基氢氧化铵，单乙醇胺，没食子酸抗坏血酸和水，其清洗溶液的碱度为每克溶液大于0.073毫当量碱。

5. 发明授权

US06194366B1 Post chemical-mechanical planarization (CMP) cleaning composition 有权
标题翻译：后化学机械平面化（CMP）清洗组合物
公开(公告)号：US06194366B1
公开(公告)日：2001-02-27
申请号：US09440917
申请日：1999-11-16
申请人： Shahriar Naghshineh , Jeff Barnes , Yassaman Hashemi , Ewa B. Oldak
发明人： Shahriar Naghshineh , Jeff Barnes , Yassaman Hashemi , Ewa B. Oldak
IPC分类号： C11D726
CPC分类号： C11D11/0047 , C11D1/62 , C11D3/0073 , C11D3/2058 , C11D3/2065 , C11D3/2072 , C11D3/2086 , C11D3/28 , C11D3/30 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/3245 , G03F7/425
摘要： A cleaning solution is provided for cleaning copper-containing microelectronic substrates, particularly for post-CMP or Via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethanolamine, gallic acid, and water. The pH of the cleaning solution is greater than 10.
摘要翻译：提供清洁溶液用于清洗含铜微电子基板，特别是用于后CMP或Via地层清洗。清洗溶液包含季铵氢氧化物，有机胺，腐蚀抑制剂和水。优选的清洁溶液包括四甲基氢氧化铵，单乙醇胺，没食子酸和水。清洗液的pH值大于10。

6. 发明授权

US06492308B1 Post chemical-mechanical planarization (CMP) cleaning composition 有权
标题翻译：后化学机械平面化（CMP）清洗组合物
公开(公告)号：US06492308B1
公开(公告)日：2002-12-10
申请号：US09587883
申请日：2000-06-06
申请人： Shahriar Naghshineh , Jeff Barnes , Dingying Xu
发明人： Shahriar Naghshineh , Jeff Barnes , Dingying Xu
IPC分类号： C11D162
CPC分类号： H01L21/02063 , C11D1/62 , C11D3/0073 , C11D3/28 , C11D3/30 , C11D7/265 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3254 , C11D11/0047 , G03F7/425 , H01L21/02074
摘要： A cleaning solution for cleaning microelectronic substrates, particularly for post-CMP or via formation cleaning. The cleaning solution comprises a quaternary ammonium hydroxide, an organic amine, a corrosion inhibitor, and water. A preferred cleaning solution comprises tetramethylammonium hydroxide, monoethylanolamine, ascorbic acid, and water with the alkalinity of the cleaning solution greater than 0.073 milliequivalents base per gram of solution.
摘要翻译：用于清洁微电子基板的清洁溶液，特别是用于后CMP或通孔形成清洁。清洗溶液包含季铵氢氧化物，有机胺，腐蚀抑制剂和水。优选的清洁溶液包含四甲基氢氧化铵，单乙醇胺，抗坏血酸和水，洗涤溶液的碱度大于每克溶液0.073毫当量碱。

7. 发明授权

US5698288A Protective covering for swim platform located on a boat 失效
标题翻译：位于船上的游泳池的防护罩
公开(公告)号：US5698288A
公开(公告)日：1997-12-16
申请号：US726692
申请日：1996-10-07
申请人： Jeff Barnes
发明人： Jeff Barnes
IPC分类号： B63B17/02 , B32B9/00
CPC分类号： B63B17/02 , Y10T428/239 , Y10T428/23907 , Y10T428/23957 , Y10T428/24008 , Y10T428/24174 , Y10T428/24182 , Y10T428/2419 , Y10T428/24215 , Y10T428/24231 , Y10T428/24273 , Y10T428/24289 , Y10T428/24322
摘要： A protective covering for a swim platform located on a boat is provided. The protective covering may be detachably attached over the top of a swim platform, such as those platforms which are located about the rear of boats or other marine craft. Use of the protective covering will prevent waterfowl or other animals from defecating, loitering or nesting on the swim platform. The covering includes a generally rectangular portion located intermediate a right wing portion and a left wing portion. A plurality of apertures designed to secure the covering to the swim platform are provided on the rectangular portion, right wing portion and left wing portion. Both the right wing and the left wing fold forming a right sidewall and a left sidewall. The sidewalls and rectangular portion form a hollow, generally triangular structure which is placed atop and resides in the area immediately atop the swim platform. The covering is securely attached to the swim platform by any of a variety of attachment means. This prevents any other objects from occupying the swim platform. By extending the length of the rectangular portion, the protective covering may also have application in preventing birds from defecating, loitering or nesting on building ledges.
摘要翻译：提供了一种位于船上的游泳平台的防护罩。保护性覆盖物可以可拆卸地附接在游泳平台的顶部上，例如位于船或其他海洋工艺的后部的那些平台。使用防护罩可防止水禽或其他动物在游泳池上排便，游荡或嵌套。覆盖物包括位于右翼部分和左翼部分之间的大致矩形的部分。在矩形部分，右翼部分和左翼部分上设置有多个设计用于将覆盖物固定到游泳平台的孔。右翼和左翼折叠都形成右侧壁和左侧壁。侧壁和矩形部分形成中空的，大致三角形的结构，其被放置在顶部并且位于紧邻游泳平台顶部的区域中。覆盖物通过各种附接装置中的任何一个牢固地附接到游泳平台。这可以防止任何其他物体占据游泳平台。通过延长矩形部分的长度，防护罩也可以用于防止鸟类在建筑物突起上排便，游荡或嵌套。

8. 发明授权

US09750508B1 Insulated pedicle access system and related methods 有权
公开(公告)号：US09750508B1
公开(公告)日：2017-09-05
申请号：US12945705
申请日：2010-11-12
申请人： Jeff Barnes , Eric Finley , Thomas Scholl
发明人： Jeff Barnes , Eric Finley , Thomas Scholl
IPC分类号： A61B17/16
CPC分类号： A61B17/1671 , A61B17/7092
摘要： The present invention relates to devices and methods directed towards accessing and forming holes in bone tissue including penetrating vertebral bones during surgical treatments of the spine, for example, to cannulate pedicles and form pilot holes for placing pedicle screws.

9. 发明申请

US20100312103A1 Surgical Trajectory Monitoring System and Related Methods 有权
标题翻译：手术轨迹监测系统及相关方法
公开(公告)号：US20100312103A1
公开(公告)日：2010-12-09
申请号：US12739950
申请日：2008-10-24
申请人： Josef Gorek , Eric Finley , Albert C. Kim , Jeff Barnes , Rick Eis
发明人： Josef Gorek , Eric Finley , Albert C. Kim , Jeff Barnes , Rick Eis
IPC分类号： A61B6/00
CPC分类号： A61B34/10 , A61B5/04001 , A61B6/12 , A61B6/4441 , A61B6/461 , A61B6/547 , A61B17/1703 , A61B34/20 , A61B90/37 , A61B2034/2046 , A61B2090/067 , A61F2/4657 , A61F2002/4668 , A61N1/0551
摘要： The present invention relates to a system and methods generally aimed at monitoring the trajectory of surgical instruments and especially for monitoring the trajectory of surgical instrument used during pedicle fixation to ensure the proper placement of pedicle screws.
摘要翻译：本发明涉及通常旨在监测外科器械的轨迹的系统和方法，特别是用于监测椎弓根固定期间使用的手术器械的轨迹，以确保椎弓根螺钉的适当放置。

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