专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06743084B1 Emery polishing machine 失效
标题翻译：金刚砂抛光机
公开(公告)号：US06743084B1
公开(公告)日：2004-06-01
申请号：US10422693
申请日：2003-04-25
申请人： Mao Nan Cheng
发明人： Mao Nan Cheng
IPC分类号： B24B2100
CPC分类号： B24B21/12
摘要： An emery polishing machine is provided with plural adjusting devices positioned between the opposite shaft ends of two emery polishing wheels and machine box. The adjusting devices enable the two emery-polishing wheels to be micro-adjusted to move upward and downward independently. Emery paper tapes of different-sized sands can be fitted on the two emery-polishing wheels to carry out rough and fine polishing at the same time. Two dust-collecting pipes are provided at one side of the dust-preventing cover of the machine box, and plural rollers are provided on the dust-preventing cover. Thus, after a wooden board has one side polished, it can be turned over and directly placed on the rollers on the dust-preventing cover to be moved in a feeding opening to have the other side polished. Thus a wooden board is quickly moved with less force and less space.
摘要翻译：金刚砂抛光机设置有位于两个砂轮抛光轮和机箱的相对的轴端之间的多个调节装置。调整装置使得两个砂轮抛光轮被微调以独立地向上和向下移动。不同尺寸的沙子的砂纸可以安装在两个砂轮抛光轮上，同时进行粗糙和精细的抛光。在机箱的防尘罩的一侧设置有两个集尘管，在防尘罩上设置有多个辊。因此，在木板一面抛光后，可以将其翻转并直接放置在防尘罩上的辊上，以在进给口中移动以使另一面抛光。因此，木板快速移动，力量较小，空间更小。

2. 发明授权

US06585576B2 Rollers′ position moving device for a sand belt machine 失效
公开(公告)号：US06585576B2
公开(公告)日：2003-07-01
申请号：US09826886
申请日：2001-04-06
申请人： Bor Yann Chuang
发明人： Bor Yann Chuang
IPC分类号： B24B2100
CPC分类号： B24B21/22
摘要： A rollers' position moving device for a sand belt machine includes a conveyor in the machine, a sand belt, and plural rollers moving the sand belt. The rollers are deposited across on the conveyor. Further, a first wheel and a second wheel are pivotally connected with one side of each roller, and the first and the second wheel have different diameters so as to rotate with different speeds. The rotating speed disparity of the two wheels can make the two wheels move laterally right and left within a preset distance because of an inner projection surface of the two wheels. Then the rollers are rotated and moved laterally right and left by one of the wheels so that sand grinding of the rollers rotating and moving laterally right and left at the same time can grind a work being ground smooth and glossy.

3. 发明授权

US06503132B2 Hybrid burnish/glide head with advanced air bearing fly height control rails 有权
公开(公告)号：US06503132B2
公开(公告)日：2003-01-07
申请号：US09873710
申请日：2001-06-04
申请人： Robert P. Ekstrum , William O. Liners , Mark J. Schaenzer , Laurie J. Schulz , Zuxuan Lin
发明人： Robert P. Ekstrum , William O. Liners , Mark J. Schaenzer , Laurie J. Schulz , Zuxuan Lin
IPC分类号： B24B2100
CPC分类号： G11B5/6005 , G11B21/21
摘要： A disc burnishing system configured to contact and level irregularities located on a surface of a disc is provided. The system includes a motor to rotate the disc and an armature. A slider is carried on the armature over the surface of the disc. The slider includes at least one raised air bearing rail disposed on and extending from a bottom surface that faces the disc. At least one burnish pad is disposed on the bottom surface and extends towards the disc. Each burnish pad is spaced apart from each raised air bearing rail. In accordance with one embodiment of the system, a defect detection apparatus is operably disposed relative the slider and is utilized to first detect an irregularity before it is burnished.

4. 发明授权

US06454641B1 Hydrostatic fluid bearing support with adjustable inlet heights 失效
标题翻译：静压流体轴承支架，可调入口高度
公开(公告)号：US06454641B1
公开(公告)日：2002-09-24
申请号：US09708219
申请日：2000-11-07
申请人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
发明人： David E. Weldon , Shu-Hsin Kao , Tim H. Huynh
IPC分类号： B24B2100
CPC分类号： F16C32/06 , B24B21/10 , B24B37/04 , B24B37/042 , B24B41/04 , B24B41/042 , H01L21/302
摘要： A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of inlets to extend areas of elevated support pressure around the inlets. Another aspect modulates or reverses fluid flow in the bearing to reduce deviations in the time averaged support pressure and to induce vibrations in the polishing pads to improve polishing performance. Another aspect provides a hydrostatic bearing with a cavity having a lateral extent greater than that of an object being polished. The depth and bottom contour of cavity can be adjusted to provide nearly uniform support pressure across an area that is surrounded by a retaining ring support. Changing fluid pressure to the retaining ring support adjusts the fluid film thickness of the bearing. Yet another aspect of the invention provides a hydrostatic bearing with spiral or partial cardiod drain grooves. This bearing has a non-uniform support pressure profile but provides a uniform average pressure to a wafer that is rotated relative to the center of the bearing. Another aspect of the invention provides a hydrostatic bearing with constant fluid pressure at inlets but a support pressure profile that is adjustable by changing the relative heights of fluid inlets to alter local fluid film thicknesses in the hydrostatic bearing.
摘要翻译：诸如化学机械带抛光机的抛光系统包括支撑抛光垫并且包含以下新颖方面中的一个或多个的静压流体轴承。一个方面使用围绕入口阵列的流体入口周围的顺应性表面来延伸围绕入口的升高的支撑压力的区域。另一方面调节或反转轴承中的流体流动，以减少时间平均支撑压力的偏差并且引起抛光垫中的振动以改善抛光性能。另一方面提供一种具有空腔的静压轴承，该空腔的横向范围大于被抛光物体的横向范围。可以调节空腔的深度和底部轮廓，以在由保持环支撑件包围的区域上提供几乎均匀的支撑压力。将流体压力改变到保持环支架可调节轴承的流体膜厚度。本发明的另一方面提供一种具有螺旋或部分心碘排泄槽的静压轴承。该轴承具有不均匀的支撑压力分布，但是相对于轴承的中心旋转的晶片提供均匀的平均压力。本发明的另一方面提供了一种静压轴承，其在入口处具有恒定的流体压力，但是支撑压力分布可通过改变流体入口的相对高度来调节，以改变静压轴承中的局部流体膜厚度。

5. 发明授权

US06422929B1 Polishing pad for a linear polisher and method for forming 有权
标题翻译：线性抛光机用抛光垫及成型方法
公开(公告)号：US06422929B1
公开(公告)日：2002-07-23
申请号：US09541070
申请日：2000-03-31
申请人： Syun-Ming Jang , Ying-Ho Chen
发明人： Syun-Ming Jang , Ying-Ho Chen
IPC分类号： B24B2100
CPC分类号： B24B37/24 , B24B21/04 , B24B37/26 , B24D18/0063
摘要： A polishing pad for use in a linear polisher, and more specifically, for a linear chemical mechanical polishing apparatus that has improved polishing uniformity is described. The polishing pad is provided with a top surface for engaging a wafer surface to be polished. The top surface has a center portion and two oppositely situated edge portions. The polishing pad is further provided with a multiplicity of voids situated in the top surface of the pad body such that the top surface has a void-to-surface ratio that is greater in the two edge portions than in the center portion of the top surface. The present invention novel polishing pad provides a more uniform polishing across a wafer surface, together with an improved planarity after polishing.
摘要翻译：描述了一种用于线性抛光机的抛光垫，更具体地说，涉及具有改善的抛光均匀性的线性化学机械抛光装置。抛光垫设置有用于接合要抛光的晶片表面的顶表面。顶表面具有中心部分和两个相对设置的边缘部分。抛光垫还设置有位于衬垫主体的顶表面中的多个空隙，使得顶表面在两个边缘部分中的空隙与表面之比大于顶表面的中心部分。本发明的新型抛光垫在晶片表面上提供更均匀的抛光以及抛光后的改进的平面度。

6. 发明授权

US06406363B1 Unsupported chemical mechanical polishing belt 有权
标题翻译：不支持化学机械抛光带
公开(公告)号：US06406363B1
公开(公告)日：2002-06-18
申请号：US09386741
申请日：1999-08-31
申请人： Cangshan Xu , Brian S. Lombardo
发明人： Cangshan Xu , Brian S. Lombardo
IPC分类号： B24B2100
CPC分类号： B24B37/205 , B24B37/26 , B24D11/001 , B24D18/0009
摘要： A belt for polishing a workpiece such as a semiconductor wafer in a chemical mechanical polishing system includes a polymeric layer forming an endless loop and having a polishing surface on one side of the endless loop. The belt is manufactured by molding a polymeric material such as urethane in a cylindrical mold. The belt is thus made from a single layer, reducing weight, size, cost and maintenance requirements.
摘要翻译：用于在化学机械抛光系统中抛光诸如半导体晶片的工件的带包括形成无端环的聚合物层，并且在无端环的一侧具有抛光表面。带通过在圆柱形模具中模制诸如聚氨酯的聚合物材料来制造。因此，皮带由单层制成，减轻重量，尺寸，成本和维护要求。

7. 发明授权

US06325706B1 Use of zeta potential during chemical mechanical polishing for end point detection 失效
标题翻译：化学机械抛光期间使用ζ电位进行终点检测
公开(公告)号：US06325706B1
公开(公告)日：2001-12-04
申请号：US09182570
申请日：1998-10-29
申请人： Wilbur C. Krusell , Andrew J. Nagengast , Anil K. Pant
发明人： Wilbur C. Krusell , Andrew J. Nagengast , Anil K. Pant
IPC分类号： B24B2100
CPC分类号： B24B37/013 , B24B21/08 , B24B49/16 , G01N1/32 , H01L21/3212 , H01L21/76807
摘要： A technique for utilizing a sensor to monitor fluid pressure from a fluid bearing located under a polishing pad to detect a polishing end point. A sensor is located at the leading edge of a fluid bearing of a linear polisher, which is utilized to perform chemical-mechanical polishing on a semiconductor wafer. The sensor monitors the fluid pressure to detect a change in the fluid pressure during polishing, which change corresponds to a change in the shear force when the polishing transitions from one material layer to the next. In order to ensure that there is a noticeable difference in the shear force variation at the polishing end point, a slurry having a particular pH level is selected. The pH level ensures that the zeta potential changes noticeably from one material to the next, so as to induce a change in the shear force, which is detected by a change in the fluid pressure.
摘要翻译：一种利用传感器来监测来自位于抛光垫下方的流体轴承的流体压力以检测抛光终点的技术。传感器位于线性抛光机的流体轴承的前缘，用于在半导体晶片上执行化学机械抛光。传感器监测流体压力以检测抛光期间的流体压力的变化，该变化对应于当抛光从一个材料层转移到下一个材料层时的剪切力的变化。为了确保在抛光终点处的剪切力变化存在显着的差异，选择具有特定pH值的浆料。 pH值确保ζ电位从一种材料明显变化到另一种材料，从而引起由流体压力变化所检测的剪切力的变化。

8. 发明授权

US06283841B1 Sander having adjustable sander member 失效
标题翻译：砂光机具有可调砂轮部件
公开(公告)号：US06283841B1
公开(公告)日：2001-09-04
申请号：US09556159
申请日：2000-04-21
申请人： Tian Wang Wang
发明人： Tian Wang Wang
IPC分类号： B24B2100
CPC分类号： B23Q37/002 , B24B21/00 , B24B27/0084 , B24B41/068
摘要： A sander includes a base having a platform for supporting a work piece. A casing is rotatably secured to the base at a pivot shaft and has a plate for supporting a sander member. A lock device may secure the casing and the sander member to the base at any selected angular positions. The casing has two rotatable barrels for supporting the sander member. A motor is secured to the casing and secured to one of the barrels for driving the sander member via the barrels. The barrels may be adjusted relative to each other to tighten the sander member.
摘要翻译：砂光机包括具有用于支撑工件的平台的底座。壳体在枢轴处可旋转地固定到基座，并且具有用于支撑砂光构件的板。锁定装置可以在任何选定的角度位置将壳体和砂光机构件固定到基座。壳体具有用于支撑砂光机构件的两个可旋转的滚筒。马达被固定到壳体并固定到一个滚筒中，用于通过滚筒驱动砂光机构件。可以相对于彼此调节桶以收紧砂光机构件。

9. 发明授权

US06752706B1 Adjusting device for the sanding drum of a double-drum sander 失效
标题翻译：双滚筒砂光机砂轮的调整装置
公开(公告)号：US06752706B1
公开(公告)日：2004-06-22
申请号：US10453626
申请日：2003-06-04
申请人： Po Chang Chuang
发明人： Po Chang Chuang
IPC分类号： B24B2100
CPC分类号： B24B21/00
摘要： An adjusting device for the sanding drum of a double-drum sander is installed between the opposite ends of the rear grinding drum and the machine frame of a sander for adjusting a rear sanding drum to a most suitable height to match with the size number of the emery of the front sanding drum of the sander so as to carry out abrading with excellent effect.
摘要翻译：用于双滚筒砂光机的打磨鼓的调节装置安装在后研磨滚筒的相对两端和砂光机的机架之间，用于将后砂磨机调整到最适合的高度，以匹配尺寸数磨砂机的前砂磨砂轮，以进行研磨，效果极佳。

10. 发明授权

US06729944B2 Chemical mechanical polishing apparatus with rotating belt 有权
公开(公告)号：US06729944B2
公开(公告)日：2004-05-04
申请号：US10174476
申请日：2002-06-17
申请人： Manoocher Birang , Lawrence M Rosenberg , Sasson R Somekh , John M White
发明人： Manoocher Birang , Lawrence M Rosenberg , Sasson R Somekh , John M White
IPC分类号： B24B2100
CPC分类号： B24B21/004 , B24B21/008 , B24B21/04 , B24B27/0023 , B24B37/04 , B24B37/16 , B24B37/24 , B24B37/245 , B24B53/017 , B24D7/12 , H01L21/30625
摘要： A chemical mechanical polishing apparatus has a rotatable platen, a polishing sheet that is wider than the substrate extending between two reels, a drive mechanism to advance the polishing sheet, and a chucking mechanism to intermittently secure the polishing sheet to the platen. The platen can have a platen base that is adaptable to receive either a circular platen top or a rectangular platen top.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式